+\begin{figure}[!h]
+\begin{center}
+\includegraphics[width=15cm]{if_cmp2_e.eps}
+\caption[Comparison of a simulation result and a cross-sectional TEM snapshot of $180 \, keV$ implanted carbon in silicon at $150 \,^{\circ} \mathrm{C}$ with $4.3 \times 10^{17} cm^{-2}$]{} \label{4}
+\end{center}
+\end{figure}
+
+\begin{figure}[!h]
+\begin{center}
+\includegraphics[width=15cm]{mit_ohne_diff.eps}
+\caption[Identical simulation cycles, with diffusion switched off (left) and on (right)]{} \label{5}
+\end{center}
+\end{figure}
+