However, each side length and the total volume of the simulation box is increased by \unit[0.20]{\%} and \unit[0.61]{\%} respectively compared to plain c-Si at \unit[20]{$^{\circ}$C}.
Since the c-Si surrounding resides in an uncompressed state, the excess increase must be attributed to relaxation of strain with the strain resulting from either the compressed precipitate or the 3C-SiC/c-Si interface region.
This also explains the possibly identified slight increase of the c-Si lattice constant in the surrounding as mentioned earlier.
However, each side length and the total volume of the simulation box is increased by \unit[0.20]{\%} and \unit[0.61]{\%} respectively compared to plain c-Si at \unit[20]{$^{\circ}$C}.
Since the c-Si surrounding resides in an uncompressed state, the excess increase must be attributed to relaxation of strain with the strain resulting from either the compressed precipitate or the 3C-SiC/c-Si interface region.
This also explains the possibly identified slight increase of the c-Si lattice constant in the surrounding as mentioned earlier.