pages = "827--835",
month = mar,
year = "2003",
+ URL = "http://www.springerlink.com/content/jr8xj33mqc5vpwwj/",
notes = "dual implantation, sic prec enhanced by vacancies,
precipitation by interstitial and substitutional
carbon, both mechanisms explained + refs",
doi = "10.1063/1.110334",
}
+@article{goorsky92,
+author = {M. S. Goorsky and S. S. Iyer and K. Eberl and F. Legoues and J. Angilello and F. Cardone},
+collaboration = {},
+title = {Thermal stability of Si[sub 1 - x]C[sub x]/Si strained layer superlattices},
+publisher = {AIP},
+year = {1992},
+journal = {Applied Physics Letters},
+volume = {60},
+number = {22},
+pages = {2758-2760},
+keywords = {SILICON ALLOYS; CARBON ALLOYS; BINARY ALLOYS; MOLECULAR BEAM EPITAXY; SUPERLATTICES; ANNEALING; CHEMICAL COMPOSITION; INTERNAL STRAINS; STRESS RELAXATION; THERMAL INSTABILITIES; INTERFACE STRUCTURE; DIFFUSION; PRECIPITATION; TEMPERATURE EFFECTS},
+url = {http://link.aip.org/link/?APL/60/2758/1},
+doi = {10.1063/1.106868}
+}
+
@Article{strane94,
author = "J. W. Strane and H. J. Stein and S. R. Lee and S. T.
Picraux and J. K. Watanabe and J. W. Mayer",
pages = "71--81",
URL = "http://www.informaworld.com/10.1080/00337578608209614",
notes = "ibs, comparison with sio and sin, higher temp or
- time",
+ time, no c redistribution",
}
@Article{reeson87,
eprint = "http://journals.cambridge.org/article_S1946427400543681",
}
+@Article{mukashev82,
+ title = "Defects in Carbon-Implanted Silicon",
+ author = "Bulat N. Mukashev and Alexey V. Spitsyn and Noboru
+ Fukuoka and Haruo Saito",
+ journal = "Japanese Journal of Applied Physics",
+ volume = "21",
+ number = "Part 1, No. 2",
+ pages = "399--400",
+ numpages = "1",
+ year = "1982",
+ URL = "http://jjap.jsap.jp/link?JJAP/21/399/",
+ doi = "10.1143/JJAP.21.399",
+ publisher = "The Japan Society of Applied Physics",
+}
+
@Article{puska98,
title = "Convergence of supercell calculations for point
defects in semiconductors: Vacancy in silicon",
URL = "http://link.aip.org/link/?JAP/77/2978/1",
doi = "10.1063/1.358714",
}
+
+@Article{romano-rodriguez96,
+ title = "Detailed analysis of [beta]-Si{C} formation by high
+ dose carbon ion implantation in silicon",
+ journal = "Materials Science and Engineering B",
+ volume = "36",
+ number = "1-3",
+ pages = "282--285",
+ year = "1996",
+ note = "European Materials Research Society 1995 Spring
+ Meeting, Symposium N: Carbon, Hydrogen, Nitrogen, and
+ Oxygen in Silicon and in Other Elemental
+ Semiconductors",
+ ISSN = "0921-5107",
+ doi = "DOI: 10.1016/0921-5107(95)01283-4",
+ URL = "http://www.sciencedirect.com/science/article/B6TXF-3VR7691-25/2/995fd57b9e5c1100558f80c472620408",
+ author = "A. Romano-Rodriguez and C. Serre and L. Calvo-Barrio
+ and A. Pérez-Rodríguez and J. R. Morante and R. Kögler
+ and W. Skorupa",
+ keywords = "Silicon",
+ keywords = "Ion implantation",
+ notes = "incoherent 3c-sic precipitate",
+}