-For defects far away from each other the formation energy of the defect combination should approximately become the sum of the formation energies of the individual defects.
-The interaction of such defects is low resulting in $E=0$.
-In fact, for another \hkl<0 0 -1> dumbbell interstitial created at position $\frac{a_{\text{Si}}}{2}\hkl<3 2 3>$ relative to the initial one an energy of \ldots eV is obtained.
+For defects far away from each other the formation energy of the defect combination should approximately become the sum of the formation energies of the individual defects with zero interaction resulting in $E=0$.
+In fact, for another \hkl<0 0 -1> dumbbell interstitial created at position $\frac{a_{\text{Si}}}{2}\hkl<3 2 3>$ ($\approx 10.2$ \AA) and $\frac{a_{\text{Si}}}{2}\hkl<2 3 2>$ ($\approx 12.8$ \AA, maximum distance due to periodic boundary conditions) relative to the initial one an energy of -0.19 eV and ... is obtained.