+\begin{slide}
+
+ {\large\bf
+ Brainstorming: Point defects in Si (as grown and as implanted)
+ }
+
+ \small
+
+ Supercell size: $2$ - $2000 \cdot 10^{-21}\text{ cm}^3$
+
+ \underline{After crystal growth}
+ \begin{itemize}
+ \item Si point defects at $450\, ^{\circ}\text{C}$
+ \begin{itemize}
+ \item Interstitials:
+ \item Vacancies:
+ \end{itemize}
+ \item C impurities: $10^{17}\text{ cm}^{-3}$\\
+ $\Rightarrow$ $10^{-4}$ -- $10^{-1}$ per sc
+ $\rightarrow$ neglected in simulations
+ \end{itemize}
+
+ \underline{After/during implantation}
+ \begin{itemize}
+ \item Si point defects\\
+ $E_{\text{d}}^{\text{av}}=35\text{ eV}$,
+ $D_{\text{imp}}=1\text{ -- }4 \cdot 10^{17}\text{ cm }^{-2}$,
+ $d_{\text{sc}}=3\text{ -- }30\cdot 4.38\text { \AA}$,
+ $A=(3\text{ -- }30\text{ \AA})^2$,\\
+ Amount of collisions with $\Delta E > E_{\text{d}}$
+ in depth region $[h,h+d_{\text{sc}}]$: $n=$ .. (SRIM)\\
+ $\Rightarrow N_{\text{FP}}=nAD$
+ \item C point defects
+ \begin{itemize}
+ \item Substitutional C: ...
+ \item Intesrtitial C: ...
+ \end{itemize}
+ \end{itemize}
+
+\end{slide}
+