\r
Concerning the mobility of the ground state Si$_{\text{i}}$, an activation energy of \unit[0.67]{eV} was found for the Si$_{\text{i}}$ \hkl[0 1 -1] to \hkl[1 1 0] DB configuration located at the next neighbored Si lattice site in \hkl[1 1 -1] direction.\r
Further investigations revealed a barrier of \unit[0.94]{eV} for the Si$_{\text{i}}$ \hkl[1 1 0] DB to Si$_{\text{i}}$ H, \unit[0.53]{eV} for the Si$_{\text{i}}$ \hkl[1 1 0] DB to Si$_{\text{i}}$ T and \unit[0.35]{eV} for the Si$_{\text{i}}$ H to Si$_{\text{i}}$ T transition.\r
\r
Concerning the mobility of the ground state Si$_{\text{i}}$, an activation energy of \unit[0.67]{eV} was found for the Si$_{\text{i}}$ \hkl[0 1 -1] to \hkl[1 1 0] DB configuration located at the next neighbored Si lattice site in \hkl[1 1 -1] direction.\r
Further investigations revealed a barrier of \unit[0.94]{eV} for the Si$_{\text{i}}$ \hkl[1 1 0] DB to Si$_{\text{i}}$ H, \unit[0.53]{eV} for the Si$_{\text{i}}$ \hkl[1 1 0] DB to Si$_{\text{i}}$ T and \unit[0.35]{eV} for the Si$_{\text{i}}$ H to Si$_{\text{i}}$ T transition.\r