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final version (->boss)
author
hackbard
<hackbard>
Tue, 12 Sep 2006 15:34:12 +0000
(15:34 +0000)
committer
hackbard
<hackbard>
Tue, 12 Sep 2006 15:34:12 +0000
(15:34 +0000)
nlsop/poster/nlsop_ibmm2006_ver2.tex
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diff --git
a/nlsop/poster/nlsop_ibmm2006_ver2.tex
b/nlsop/poster/nlsop_ibmm2006_ver2.tex
index
713b62c
..
a7e6d0b
100644
(file)
--- a/
nlsop/poster/nlsop_ibmm2006_ver2.tex
+++ b/
nlsop/poster/nlsop_ibmm2006_ver2.tex
@@
-14,14
+14,15
@@
% Achtung Werte unter .8 verbrauchen zu viel Tinte!!!
%\background{.95 .95 1.}{.78 .78 1.}{0.05}
% Achtung Werte unter .8 verbrauchen zu viel Tinte!!!
%\background{.95 .95 1.}{.78 .78 1.}{0.05}
-\background{.50 .50 .50}{.85 .85 .85}{0.5}
+%\background{.50 .50 .50}{.85 .85 .85}{0.5}
+\background{.40 .48 .71}{.99 .99 .99}{0.5}
%\newrgbcolor{blue1}{.9 .9 1.}
% Groesse der einzelnen Spalten als Anteil der Gesamt-Textbreite
\renewcommand{\columnfrac}{.31}
% header
%\newrgbcolor{blue1}{.9 .9 1.}
% Groesse der einzelnen Spalten als Anteil der Gesamt-Textbreite
\renewcommand{\columnfrac}{.31}
% header
-\vspace{-1.
5
cm}
+\vspace{-1.
2
cm}
\begin{header}
\begin{minipage} {.13\textwidth}
\includegraphics[height=11cm]{uni-logo.eps}
\begin{header}
\begin{minipage} {.13\textwidth}
\includegraphics[height=11cm]{uni-logo.eps}
@@
-43,12
+44,12
@@
\begin{poster}
\begin{poster}
-\vspace{-
1.1
cm}
+\vspace{-
0.35
cm}
\begin{pcolumn}
\begin{pbox}
\section*{Motivation}
{\bf
\begin{pcolumn}
\begin{pbox}
\section*{Motivation}
{\bf
- Experimentally observe
rd sefl
organisation process at high-dose carbon
+ Experimentally observe
d self
organisation process at high-dose carbon
implantations under certain implantation conditions.}
\begin{itemize}
\item Regularly spaced, nanometric spherical and lamellar
implantations under certain implantation conditions.}
\begin{itemize}
\item Regularly spaced, nanometric spherical and lamellar
@@
-56,7
+57,7
@@
\begin{center}
\includegraphics[width=20cm]{k393abild1_e.eps}
\end{center}
\begin{center}
\includegraphics[width=20cm]{k393abild1_e.eps}
\end{center}
- Cross-section TEM bright-field image:\\
+ Cross-section TEM bright-field image
s
:\\
$180 \, keV$ $C^+ \rightarrow Si$,
$T_i=150 \, ^{\circ} \mathrm{C}$,
Dose: $4.3 \times 10^{17} \, cm^{-2}$\\
$180 \, keV$ $C^+ \rightarrow Si$,
$T_i=150 \, ^{\circ} \mathrm{C}$,
Dose: $4.3 \times 10^{17} \, cm^{-2}$\\
@@
-81,7
+82,7
@@
E. D. Specht et al., Nucl. Instr. and Meth. B 84 (1994) 323.\\
M. Ishimaru et al., Nucl. Instr. and Meth. B 166-167 (2000) 390.}
\end{pbox}
E. D. Specht et al., Nucl. Instr. and Meth. B 84 (1994) 323.\\
M. Ishimaru et al., Nucl. Instr. and Meth. B 166-167 (2000) 390.}
\end{pbox}
- \vspace{-1.
5
cm}
+ \vspace{-1.
4
cm}
\begin{pbox}
\section*{Model}
{\bf
\begin{pbox}
\section*{Model}
{\bf
@@
-100,7
+101,7
@@
\item $20 - 30\,\%$ lower silicon density of $a-SiC_x$ compared to $c-Si$\\
$\rightarrow$ {\bf Lateral strain} (black arrows)
\item Implantation range near surface\\
\item $20 - 30\,\%$ lower silicon density of $a-SiC_x$ compared to $c-Si$\\
$\rightarrow$ {\bf Lateral strain} (black arrows)
\item Implantation range near surface\\
- $\rightarrow$ {\bf R
a
laxation} of {\bf vertical strain component}
+ $\rightarrow$ {\bf R
e
laxation} of {\bf vertical strain component}
\item Reduction of the carbon supersaturation in $c-Si$\\
$\rightarrow$ {\bf Carbon diffusion} into amorphous volumina
(white arrows)
\item Reduction of the carbon supersaturation in $c-Si$\\
$\rightarrow$ {\bf Carbon diffusion} into amorphous volumina
(white arrows)
@@
-211,13
+212,13
@@
p_{a \rightarrow c}(\vec r) = (1 - p_{c \rightarrow a}(\vec r)) \Big(1 - \frac{\
an empty, crystalline $3 \, nm$ bottom layer
\end{itemize}
\begin{picture}(0,0)(+40,-32)
an empty, crystalline $3 \, nm$ bottom layer
\end{itemize}
\begin{picture}(0,0)(+40,-32)
- \includegraphics[height=39.2cm]{loop-arrow.eps}
+ \includegraphics[height=39.2cm]{loop-arrow
_ver2
.eps}
\end{picture}%
{\bf
Simulation parameters $d_v$, $d_r$ and $n$ control the
diffusion and sputtering process.}
\end{pbox}
\end{picture}%
{\bf
Simulation parameters $d_v$, $d_r$ and $n$ control the
diffusion and sputtering process.}
\end{pbox}
- \vspace{-
0.27
cm}
+ \vspace{-
1.2
cm}
\begin{pbox}
\section*{Comparison of experiment and simulation}
\begin{center}
\begin{pbox}
\section*{Comparison of experiment and simulation}
\begin{center}
@@
-267,7
+268,7
@@
p_{a \rightarrow c}(\vec r) = (1 - p_{c \rightarrow a}(\vec r)) \Big(1 - \frac{\
\end{itemize}
\end{minipage}
\end{pbox}
\end{itemize}
\end{minipage}
\end{pbox}
- \vspace{-1.
5
cm}
+ \vspace{-1.
4
cm}
\begin{pbox}
\section*{Recipe for thick films of ordered lamellae}
\begin{minipage}{0.33\textwidth}
\begin{pbox}
\section*{Recipe for thick films of ordered lamellae}
\begin{minipage}{0.33\textwidth}
@@
-312,7
+313,7
@@
p_{a \rightarrow c}(\vec r) = (1 - p_{c \rightarrow a}(\vec r)) \Big(1 - \frac{\
photoluminescence}\\
{\scriptsize Dihu Chen et al. Opt. Mater. 23 (2003) 65.}
\end{pbox}
photoluminescence}\\
{\scriptsize Dihu Chen et al. Opt. Mater. 23 (2003) 65.}
\end{pbox}
- \vspace{-1.
5
cm}
+ \vspace{-1.
4
cm}
\begin{pbox}
\section*{Conclusions}
\begin{itemize}
\begin{pbox}
\section*{Conclusions}
\begin{itemize}
@@
-332,9
+333,10
@@
p_{a \rightarrow c}(\vec r) = (1 - p_{c \rightarrow a}(\vec r)) \Big(1 - \frac{\
of lamellar structure
\end{itemize}
\end{pbox}
of lamellar structure
\end{itemize}
\end{pbox}
- \vspace{-1.
5
cm}
+ \vspace{-1.
4
cm}
\begin{pbox}
\begin{pbox}
- \section*{Literature}
+ %\section*{Literature}
+ {\bf Literature}\\
{\scriptsize
F. Zirkelbach, M. H"aberlen, J. K. N. Lindner,
B. Stritzker. Comp. Mater. Sci. 33 (2005) 310.\\
{\scriptsize
F. Zirkelbach, M. H"aberlen, J. K. N. Lindner,
B. Stritzker. Comp. Mater. Sci. 33 (2005) 310.\\