+@Article{hofker74,
+ author = "W. Hofker and H. Werner and D. Oosthoek and N.
+ Koeman",
+ affiliation = "N. V. Philips' Gloeilampenfabrieken Philips Research
+ Laboratories Eindhoven Netherlands Eindhoven
+ Netherlands",
+ title = "Boron implantations in silicon: {A} comparison of
+ charge carrier and boron concentration profiles",
+ journal = "Applied Physics A: Materials Science &
+ Processing",
+ publisher = "Springer Berlin / Heidelberg",
+ ISSN = "0947-8396",
+ keyword = "Physics and Astronomy",
+ pages = "125--133",
+ volume = "4",
+ issue = "2",
+ URL = "http://dx.doi.org/10.1007/BF00884267",
+ note = "10.1007/BF00884267",
+ year = "1974",
+ notes = "first time ted (only for boron?)",
+}
+
+@Article{michel87,
+ author = "A. E. Michel and W. Rausch and P. A. Ronsheim and R.
+ H. Kastl",
+ collaboration = "",
+ title = "Rapid annealing and the anomalous diffusion of ion
+ implanted boron into silicon",
+ publisher = "AIP",
+ year = "1987",
+ journal = "Applied Physics Letters",
+ volume = "50",
+ number = "7",
+ pages = "416--418",
+ keywords = "SILICON; ION IMPLANTATION; ANNEALING; DIFFUSION;
+ BORON; ATOM TRANSPORT; CHARGEDPARTICLE TRANSPORT; VERY
+ HIGH TEMPERATURE; PN JUNCTIONS; SURFACE CONDUCTIVITY",
+ URL = "http://link.aip.org/link/?APL/50/416/1",
+ doi = "10.1063/1.98160",
+ notes = "ted of boron in si",
+}
+
+@Article{cowern90,
+ author = "N. E. B. Cowern and K. T. F. Janssen and H. F. F.
+ Jos",
+ collaboration = "",
+ title = "Transient diffusion of ion-implanted {B} in Si: Dose,
+ time, and matrix dependence of atomic and electrical
+ profiles",
+ publisher = "AIP",
+ year = "1990",
+ journal = "Journal of Applied Physics",
+ volume = "68",
+ number = "12",
+ pages = "6191--6198",
+ keywords = "BORON IONS; ION IMPLANTATION; SILICON; DIFFUSION; TIME
+ DEPENDENCE; ANNEALING; VERY HIGH TEMPERATURE; SIMS;
+ CRYSTALS; AMORPHIZATION",
+ URL = "http://link.aip.org/link/?JAP/68/6191/1",
+ doi = "10.1063/1.346910",
+ notes = "ted of boron in si",
+}
+