\vspace{0.2cm}
-\includegraphics[width=7cm]{ibs_3c-sic.eps}\\
-
+\begin{center}
\begin{itemize}
\item \underline{Implantation step 1}\\[0.1cm]
Almost stoichiometric dose | \unit[180]{keV} | \degc{500}\\
\unit[10]{h} at \degc{1250}\\
$\Rightarrow$ Homogeneous 3C-SiC layer with sharp interfaces
\end{itemize}
+\end{center}
+\begin{minipage}{7cm}
+\includegraphics[width=7cm]{ibs_3c-sic.eps}
+\end{minipage}
+\begin{minipage}{5cm}
\begin{pspicture}(0,0)(0,0)
-\rput(10.0,4.5){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=white,linecolor=blue,linestyle=solid]{
+\rnode{box}{
+\psframebox[fillstyle=solid,fillcolor=white,linecolor=blue,linestyle=solid]{
\begin{minipage}{5.3cm}
\begin{center}
{\color{blue}
upon prevention of SiC precipitation
\end{itemize}
\end{minipage}
-}}}
+}}
+\rput(-6.8,5.4){\pnode{h0}}
+\rput(-3.0,5.4){\pnode{h1}}
+\ncline[linecolor=blue]{-}{h0}{h1}
+\ncline[linecolor=blue]{->}{h1}{box}
\end{pspicture}
-
+\end{minipage}
\end{slide}