\small
- \begin{minipage}{4cm}
+ \begin{minipage}{5.5cm}
\begin{itemize}
\item $E_f=0.47$ eV
\item sehr h"aufig beobachtet
- \item energetisch g"unstigste Konfiguration
- \item experimentelle und theoretische Best"atigungen
+ \item energetisch g"unstigste\\ Konfiguration
+ \item experimentelle und theoretische Hinweise
f"ur die Existenz dieser Konfiguration
\end{itemize}
+ \includegraphics[width=5.6cm]{c_in_si_100.ps}
\end{minipage}
- \begin{minipage}{8cm}
- \includegraphics[width=9cm]{100-c-si-db_s.eps}
+ \begin{minipage}{7cm}
+ \includegraphics[width=8cm]{100-c-si-db_s.eps}
\end{minipage}
\end{slide}
\includegraphics[width=6.3cm]{pc_si-c_c-c.eps}
\includegraphics[width=6.3cm]{pc_si-si.eps}
- \begin{minipage}[t]{6.3cm}
- \scriptsize
- \begin{itemize}
- \item C-C, 0.15 nm: NN-Abstand in Graphit bzw. Diamant\\
- $\Rightarrow$ Formation of strong C-C bonds
- (almost only for high C concentrations)
- \item Si-C, 0.19 nm: NN-Abstand in 3C-SiC
- \item C-C, 0.31 nm: C-C Abstand in 3C-SiC\\
- (vekettetrkettete, verschieden orientierte 100 C-Si Dumbbells)
- \item Si-Si shows non-zero g(r) values around 0.31 nm like in 3C-SiC\\
- and a decrease at regular distances\\
- (no clear peak,
- interval of enhanced g(r) corresponds to C-C peak width)
- \end{itemize}
- \end{minipage}
- \begin{minipage}[t]{6.3cm}
- \tiny
- \begin{itemize}
- \item Low C concentration (i.e. $V_1$):
- The <100> dumbbell configuration
- \begin{itemize}
- \item is identified to stretch the Si-Si next neighbour distance
- to 0.3 nm
- \item is identified to contribute to the Si-C peak at 0.19 nm
- \item explains further C-Si peaks (dashed vertical lines)
- \end{itemize}
- $\Rightarrow$ C atoms are first elements arranged at distances
- expected for 3C-SiC\\
- $\Rightarrow$ C atoms pull the Si atoms into the right
- configuration at a later stage
- \item High C concentration (i.e. $V_2$ and $V_3$):
- \begin{itemize}
- \item High amount of damage introduced into the system
- \item Short range order observed but almost no long range order
- \end{itemize}
- $\Rightarrow$ Start of amorphous SiC-like phase formation\\
- $\Rightarrow$ Higher temperatures required for proper SiC formation
- \end{itemize}
- \end{minipage}
+ \vspace{-0.1cm}
+
+ \footnotesize
+ \underline{C-C, 0.15 nm}:\\
+ NN-Abstand in Graphit/Diamant\\
+ $\Rightarrow$ starke C-C Bindungen bei hohen Konz.\\
+ \underline{Si-C, 0.19 nm}:\\
+ NN-Abstand in 3C-SiC\\
+ \underline{C-C, 0.31 nm}:\\
+ C-C Abstand in 3C-SiC\\
+ vekettete, verschieden orientierte 100 C-Si DBs\\
+ \underline{Si-Si, $\sim$ 0.31 nm}:\\
+ g(r) erh"oht, Si-Si in 3C-SiC\\
+ Intervall entspricht C-C Peakbreite\\
+ Abfall bei regul"aren Abst"anden
+
+ \begin{picture}(0,0)(-175,-40)
+ \includegraphics[width=4.0cm]{conc_100_c-si-db_02.eps}
+ \end{picture}
+ \begin{picture}(0,0)(-278,-10)
+ \includegraphics[width=4.0cm]{conc_100_c-si-db_01.eps}
+ \end{picture}
+
+ \end{slide}
+
+ \begin{slide}
+
+ {\large\bf
+ Simulationen zum Ausscheidungsvorgang
+ }
+
+ \includegraphics[width=6.3cm]{pc_si-c_c-c.eps}
+ \includegraphics[width=6.3cm]{c_in_si_100.ps}
+
+ \footnotesize
+
+ \underline{Niedrige C-Konzentration ($V_1$)}:
+ 100 Dumbbell-Konfiguration
+ \begin{itemize}
+ \item dehnt Si-Si NN-Abstand auf 0.3 nm
+ \item Beitrag zum Si-C Peak bei 0.19 nm
+ \item erkl"art weitere Si-C Peaks (gestrichelte Linien)
+ \end{itemize}
+ $\Rightarrow$ C-Atome als erstes im erwarteten 3C-SiC-Abstand
+ \underline{Hohe C-Konzentration ($V_2$ und $V_3$)}:
+ \begin{itemize}
+ \item High amount of damage introduced into the system
+ \item Short range order observed but almost no long range order
+ \end{itemize}
+ $\Rightarrow$ Start of amorphous SiC-like phase formation\\
+ $\Rightarrow$ Higher temperatures required for proper SiC formation
\end{slide}