% Achtung Werte unter .8 verbrauchen zu viel Tinte!!!
%\background{.95 .95 1.}{.78 .78 1.}{0.05}
-\background{.50 .50 .50}{.85 .85 .85}{0.5}
+%\background{.50 .50 .50}{.85 .85 .85}{0.5}
+\background{.40 .48 .71}{.99 .99 .99}{0.5}
%\newrgbcolor{blue1}{.9 .9 1.}
% Groesse der einzelnen Spalten als Anteil der Gesamt-Textbreite
\renewcommand{\columnfrac}{.31}
% header
-\vspace{-1.5cm}
+\vspace{-1.2cm}
\begin{header}
\begin{minipage} {.13\textwidth}
\includegraphics[height=11cm]{uni-logo.eps}
\begin{poster}
-\vspace{-1.1cm}
+\vspace{-0.35cm}
\begin{pcolumn}
\begin{pbox}
\section*{Motivation}
{\bf
- Experimentally observerd seflorganisation process at high-dose carbon
+ Experimentally observed selforganisation process at high-dose carbon
implantations under certain implantation conditions.}
\begin{itemize}
\item Regularly spaced, nanometric spherical and lamellar
\begin{center}
\includegraphics[width=20cm]{k393abild1_e.eps}
\end{center}
- Cross-section TEM bright-field image:\\
+ Cross-section TEM bright-field images:\\
$180 \, keV$ $C^+ \rightarrow Si$,
$T_i=150 \, ^{\circ} \mathrm{C}$,
Dose: $4.3 \times 10^{17} \, cm^{-2}$\\
E. D. Specht et al., Nucl. Instr. and Meth. B 84 (1994) 323.\\
M. Ishimaru et al., Nucl. Instr. and Meth. B 166-167 (2000) 390.}
\end{pbox}
- \vspace{-1.5cm}
+ \vspace{-1.4cm}
\begin{pbox}
\section*{Model}
{\bf
\item $20 - 30\,\%$ lower silicon density of $a-SiC_x$ compared to $c-Si$\\
$\rightarrow$ {\bf Lateral strain} (black arrows)
\item Implantation range near surface\\
- $\rightarrow$ {\bf Ralaxation} of {\bf vertical strain component}
+ $\rightarrow$ {\bf Relaxation} of {\bf vertical strain component}
\item Reduction of the carbon supersaturation in $c-Si$\\
$\rightarrow$ {\bf Carbon diffusion} into amorphous volumina
(white arrows)
an empty, crystalline $3 \, nm$ bottom layer
\end{itemize}
\begin{picture}(0,0)(+40,-32)
- \includegraphics[height=39.2cm]{loop-arrow.eps}
+ \includegraphics[height=39.2cm]{loop-arrow_ver2.eps}
\end{picture}%
{\bf
Simulation parameters $d_v$, $d_r$ and $n$ control the
diffusion and sputtering process.}
\end{pbox}
- \vspace{-0.27cm}
+ \vspace{-1.2cm}
\begin{pbox}
\section*{Comparison of experiment and simulation}
\begin{center}
\end{itemize}
\end{minipage}
\end{pbox}
- \vspace{-1.5cm}
+ \vspace{-1.4cm}
\begin{pbox}
\section*{Recipe for thick films of ordered lamellae}
\begin{minipage}{0.33\textwidth}
photoluminescence}\\
{\scriptsize Dihu Chen et al. Opt. Mater. 23 (2003) 65.}
\end{pbox}
- \vspace{-1.5cm}
+ \vspace{-1.4cm}
\begin{pbox}
\section*{Conclusions}
\begin{itemize}
of lamellar structure
\end{itemize}
\end{pbox}
- \vspace{-1.5cm}
+ \vspace{-1.4cm}
\begin{pbox}
- \section*{Literature}
+ %\section*{Literature}
+ {\bf Literature}\\
{\scriptsize
F. Zirkelbach, M. H"aberlen, J. K. N. Lindner,
B. Stritzker. Comp. Mater. Sci. 33 (2005) 310.\\