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+\documentclass[portrait,a0b,final]{a0poster}
+\usepackage{epsf,psfig,pstricks,multicol,pst-grad,color}
+\usepackage{graphicx,amsmath,amssymb}
+\graphicspath{{../img/}}
+\usepackage[english,german]{babel}
+
+\input{a0poster-kh}
+
+\selectlanguage{english}
+
+\renewcommand\labelitemii{{\color{black}$\bullet$}}
+
+\begin{document}
+
+% Fliessenden Hintergrund von RGB-Farbe 1. .98 .98 nach 1. .85 .85
+% und wieder nach 1. .98 .98 (1. .85 .85 wird nach 0.1=10% des Hinter-
+% grunds angenommen)
+% Achtung Werte unter .8 verbrauchen zu viel Tinte!!!
+
+%\background{.95 .95 1.}{.78 .78 1.}{0.05}
+%\background{.50 .50 .50}{.85 .85 .85}{0.5}
+\background{.40 .48 .71}{.99 .99 .99}{0.5}
+
+\newrgbcolor{si-yellow}{.6 .6 0}
+
+% Groesse der einzelnen Spalten als Anteil der Gesamt-Textbreite
+\renewcommand{\columnfrac}{.31}
+
+% header
+\begin{header}
+ \centerline{{\Huge \bfseries Molecular dynamics simulation
+ of defect formation and precipitation}}
+ \vspace*{0.5cm}
+ \centerline{{\Huge \bfseries in heavily carbon doped silicon}}
+ \vspace*{1cm}
+ \centerline{\huge\textsc {\underline{F.~Zirkelbach}$^1$,
+ J.~K.~N.~Lindner$^1$,
+ K.~Nordlund$^2$, B.~Stritzker$^1$}}
+ \vspace*{1cm}
+ \begin{center}
+ \begin{minipage}{.065\textwidth}
+ \includegraphics[height=5.5cm]{uni-logo.eps}
+ \end{minipage}
+ \begin{minipage}{.57\textwidth}
+ \centerline{\Large $^1$ Experimentalphysik IV, Institut f\"ur Physik,
+ Universit\"at Augsburg,}
+ \centerline{\Large Universit\"atsstr. 1, D-86135 Augsburg, Germany}
+ \end{minipage}
+ \begin{minipage} {.065\textwidth}
+ \includegraphics[height=5cm]{Lehrstuhl-Logo.eps}
+ \end{minipage}
+ \end{center}
+ \begin{center}
+ \begin{minipage}{.20\textwidth}
+ \includegraphics[height=5.5cm]{logo_eng.eps}
+ \end{minipage}
+ \begin{minipage}{.50\textwidth}
+ \centerline{\Large $^2$ Accelerator Laboratory,
+ Department of Physical Sciences,
+ University of Helsinki,}
+ \centerline{\Large Pietari Kalmink. 2, 00014 Helsinki, Finland}
+ \end{minipage}
+ \end{center}
+\end{header}
+
+\begin{poster}
+
+\begin{pcolumn}
+ \begin{pbox}
+ \section*{Motivation}
+ {\bf Reasons for understanding the 3C-SiC precipitation process}
+ \begin{itemize}
+ \item Significant technological progress
+ in 3C-SiC wide band gap semiconductor thin film formation [1].
+ \item New perspectives for processes relying upon prevention of
+ precipitation, e.g. fabrication of strained pseudomorphic
+ $\text{Si}_{1-y}\text{C}_y$ heterostructures [2].
+ \end{itemize}
+ {\tiny
+ [1] J. H. Edgar, J. Mater. Res. 7 (1992) 235.}\\
+ {\tiny
+ [2] J. W. Strane, S. R. Lee, H. J. Stein, S. T. Picraux,
+ J. K. Watanabe, J. W. Mayer, J. Appl. Phys. 79 (1996) 637.}
+ \end{pbox}
+ \begin{pbox}
+ \section*{Crystalline silicon and cubic silicon carbide}
+ {\bf Lattice types and unit cells:}
+ \begin{itemize}
+ \item Crystalline silicon (c-Si) has diamond structure\\
+ $\Rightarrow {\color{si-yellow}\bullet}$ and
+ ${\color{gray}\bullet}$ are Si atoms
+ \item Cubic silicon carbide (3C-SiC) has zincblende structure\\
+ $\Rightarrow {\color{si-yellow}\bullet}$ are Si atoms,
+ ${\color{gray}\bullet}$ are C atoms
+ \end{itemize}
+ \begin{minipage}{15cm}
+ {\bf Lattice constants:}
+ \[
+ 4a_{\text{c-Si}}\approx5a_{\text{3C-SiC}}
+ \]
+ {\bf Silicon density:}
+ \[
+ \frac{n_{\text{3C-SiC}}}{n_{\text{c-Si}}}=97,66\,\%
+ \]
+ \end{minipage}
+ \begin{minipage}{10cm}
+ \includegraphics[width=10cm]{sic_unit_cell.eps}
+ \end{minipage}
+ \end{pbox}
+ \begin{pbox}
+ \section*{Supposed Si to 3C-SiC conversion}
+ {\bf Schematic of the conversion mechanism}\\\\
+ \begin{minipage}{7.8cm}
+ \includegraphics[width=7.7cm]{sic_prec_seq_01.eps}
+ \end{minipage}
+ \hspace{0.6cm}
+ \begin{minipage}{7.8cm}
+ \includegraphics[width=7.7cm]{sic_prec_seq_02.eps}
+ \end{minipage}
+ \hspace{0.6cm}
+ \begin{minipage}{7.8cm}
+ \includegraphics[width=7.7cm]{sic_prec_seq_03.eps}
+ \end{minipage}
+ \vspace{1cm}
+ \begin{enumerate}
+ \item Formation of C-Si dumbbells on regular c-Si lattice sites
+ \item Agglomeration into large clusters (embryos)
+ \item Precipitation of 3C-SiC + Creation of interstitials
+ \end{enumerate}
+ \vspace{1cm}
+ {\bf Experimental observations} [3]
+ \begin{itemize}
+ \item Minimal diameter of precipitation: 2 - 4 nm
+ \item Equal orientation of c-Si and 3C-SiC (hkl)-planes
+ \end{itemize}
+ {\tiny
+ [3] J. K. N. Lindner, Appl. Phys. A 77 (2003) 27.
+ }
+ \end{pbox}
+
+\end{pcolumn}
+\begin{pcolumn}
+
+ \begin{pbox}
+ \section*{Simulation algorithm}
+ Hier die Simulation rein!
+ \end{pbox}
+ \begin{pbox}
+ \section*{Results}
+ Hier die Resultate!
+ \end{pbox}
+\end{pcolumn}
+\begin{pcolumn}
+
+ \begin{pbox}
+ \section*{Structural/compositional information}
+ blabla
+ \end{pbox}
+ \begin{pbox}
+ \section*{Recipe for thick films of ordered lamellae}
+ blabla
+ \end{pbox}
+ \begin{pbox}
+ \section*{Conclusions}
+ Hier die Zusammenfassung
+ \end{pbox}
+
+\end{pcolumn}
+\end{poster}
+\end{document}
+