From: hackbard Date: Wed, 25 Aug 2010 16:15:17 +0000 (+0200) Subject: finished c_i c_s started c_i v X-Git-Url: https://hackdaworld.org/cgi-bin/gitweb.cgi?a=commitdiff_plain;h=454a5ec080be482c45fe0008c0e60f59589e613f;p=lectures%2Flatex.git finished c_i c_s started c_i v --- diff --git a/posic/publications/defect_combos.tex b/posic/publications/defect_combos.tex index 16b9c04..05b5095 100644 --- a/posic/publications/defect_combos.tex +++ b/posic/publications/defect_combos.tex @@ -135,7 +135,7 @@ Fig.~\ref{fig:sep_def} shows the obtained structures while the corresponding ene \begin{table*} \begin{ruledtabular} \begin{tabular}{l c c c c c c c c c} - & Si$_{\text{i}}$ \hkl<1 1 0> DB & Si$_{\text{i}}$ H & Si$_{\text{i}}$ T & Si \hkl<1 0 0> DB & V & C$_{\text{s}}$ & C$_{\text{i}}$ \hkl<1 0 0> DB & C$_{\text{i}}$ \hkl<1 1 0> DB & C$_{\text{i}}$ BC \\ + & Si$_{\text{i}}$ \hkl<1 1 0> DB & Si$_{\text{i}}$ H & Si$_{\text{i}}$ T & Si$_{\text{i}}$ \hkl<1 0 0> DB & V & C$_{\text{s}}$ & C$_{\text{i}}$ \hkl<1 0 0> DB & C$_{\text{i}}$ \hkl<1 1 0> DB & C$_{\text{i}}$ BC \\ \hline Present study & 3.39 & 3.42 & 3.77 & 4.41 & 3.63 & 1.95 & 3.72 & 4.16 & 4.66 \\ \multicolumn{10}{c}{Other ab initio studies} \\ @@ -356,16 +356,35 @@ This is due to tensile strain originating from both, the C$_{\text{i}}$ DB and t This finding agrees well with results by Mattoni et~al.\cite{mattoni2002}. % all other investigated results: attractive interaction. stress compensation. In contrast, all other investigated configurations show attractive interactions. -Explain all three remaining confs, from most fav to less fav conf ... +The most favorable configuration is found for C$_{\text{s}}$ at position 3, which corresponds to the lattice site of one of the upper next neighbored Si atoms of the DB structure that is compressively strained along \hkl[1 -1 0] and \hkl[0 0 1] by the C-Si DB. +The substitution with C allows for most effective compensation of strain. +This structure is followed by C$_{\text{s}}$ located at position 2, the next neighbour atom below the two Si atoms bound to the C$_{\text{i}}$ DB atom. +As mentioned earlier these two lower Si atoms indeed experience tensile strain along the \hkl[1 1 0] bond chain, however, additional compressive strain along \hkl[0 0 1] exists. +The latter is partially compensated by the C$_{\text{s}}$ atom. +Yet less of compensation is realized if C$_{\text{s}}$ is located at position 4 due to a larger separation although both bottom Si atoms of the DB structure are indirectly affected, i.e. each of them is connected by another Si atom to the C atom enabling the reduction of strain along \hkl[0 0 1]. % c agglomeration vs c clustering ... migs to b conf % 2 more migs: 051 -> 128 and 026! forgot why ... probably it's about probability of C clustering -Whether C agglomeration or clustering is expected has, again, been answered by investigating migration barriers. -Therefor, several migration paths were investigated, which result in configuration b. - +Obviously agglomeration of C$_{\text{i}}$ and C$_{\text{s}}$ is energetically favorable except for seprations along one of the \hkl<1 1 0> directions. +The eneregtically most favorable configuration (configuration b) forms a strong but compressively strained C-C bond with a separation distance of \unit[0.142]{nm} sharing a Si lattice site. +Again, conclusions concerning the probability of formation are drawn by investigating migration paths. +Since C$_{\text{s}}$ is unlikely to exhibit a low activation energy for migration the focus is on C$_{\text{i}}$. +Pathways starting from the two next most favored configurations were investigated, all of them showing activation energies above \unit[2.?-2.?]{eV}. +Although lower than the barriers for obtaining the ground state of two C$_{\text{i}}$ defects the activation energy is yet considered too high. +For the same reasons as in the last subsection, structures other than the ground state configuration are, thus, assumed to arise more likely due to much lower activation energies necessary for their formation and still comparatively low binding energies. \subsection{C$_{\text{i}}$ next to V} +In the last subsection configurations of a C$_{\text{i}}$ DB with C$_{\text{s}}$ occupying a vacant site created by the implantation process have been investigated. +Additionally, configurations might arise in IBS, in which the impinging C atom creates a vacant site near a C$_{\text{i}}$ DB but does not occupy it. +Resulting binding energies of a C$_{\text{i}}$ DB with a nearby vacancy are listed in the second row of Table~\ref{table:dc_c-sv}. +Obviously all investigated structures are prefered compared to isolated largely separated defects of this type. +Even for the largest possible distance (R) achieved in the calculations of the periodic supercell a binding energy as low as \unit[-0.31]{eV} is observed. +The ground state configuration is obtained for a V at position 1. +The C atom of the DB moves towards the vacant site forming a stable C$_{\text{s}}$ configuration. +Figure + + \subsection{C$_{\text{s}}$ next to Si$_{\text{i}}$} Non-zero temperature, entropy, spatial separation of these defects possible, indeed observed in ab initio MD run. @@ -390,25 +409,5 @@ We gratefully acknowledge financial support by the Bayerische Forschungsstiftung \bibliography{../../bibdb/bibdb}{} \bibliographystyle{h-physrev3} -%\begin{thebibliography}{99} -%\bibitem{kresse96} G. 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