author = "G. R. Fisher and P. Barnes",
title = "Towards a unified view of polytypism in silicon
carbide",
- journal = "Philosophical Magazine Part B",
+ journal = "Philos. Mag. B",
volume = "61",
pages = "217--236",
year = "1990",
title = "Synthesis of nano-sized Si{C} precipitates in Si by
simultaneous dual-beam implantation of {C}+ and Si+
ions",
- journal = "Applied Physics A: Materials Science \& Processing",
+ journal = "Appl. Phys. A: Mater. Sci. Process.",
volume = "76",
pages = "827--835",
month = mar,
carbon, both mechanisms explained + refs",
}
+@Article{skorupa96,
+ title = "Carbon-mediated effects in silicon and in
+ silicon-related materials",
+ journal = "Materials Chemistry and Physics",
+ volume = "44",
+ number = "2",
+ pages = "101--143",
+ year = "1996",
+ note = "",
+ ISSN = "0254-0584",
+ doi = "DOI: 10.1016/0254-0584(95)01673-I",
+ URL = "http://www.sciencedirect.com/science/article/B6TX4-3VR9V74-2/2/4ab972315eb79eaa76b55ffab5aed982",
+ author = "W. Skorupa and R. A. Yankov",
+ notes = "review of silicon carbon compound",
+}
+
@Book{laplace,
author = "P. S. de Laplace",
title = "Th\'eorie analytique des probabilit\'es",
title = "Molecular dynamics with coupling to an external bath",
publisher = "AIP",
year = "1984",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "81",
number = "8",
pages = "3684--3690",
title = "Molecular dynamics determination of defect energetics
in beta -Si{C} using three representative empirical
potentials",
- journal = "Modelling and Simulation in Materials Science and
- Engineering",
+ journal = "Modell. Simul. Mater. Sci. Eng.",
volume = "3",
number = "5",
pages = "615--627",
@Article{devanathan98,
title = "Computer simulation of a 10 ke{V} Si displacement
cascade in Si{C}",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "141",
number = "1-4",
pages = "118--122",
@Article{devanathan98_2,
title = "Displacement threshold energies in [beta]-Si{C}",
- journal = "Journal of Nuclear Materials",
+ journal = "J. Nucl. Mater.",
volume = "253",
number = "1-3",
pages = "47--52",
presence of carbon and boron",
publisher = "AIP",
year = "1998",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "84",
number = "4",
pages = "1963--1967",
publisher = "American Physical Society",
}
+@Article{bloechl93,
+ title = "First-principles calculations of self-diffusion
+ constants in silicon",
+ author = "Peter E. Bl{\"o}chl and Enrico Smargiassi and R. Car
+ and D. B. Laks and W. Andreoni and S. T. Pantelides",
+ journal = "Phys. Rev. Lett.",
+ volume = "70",
+ number = "16",
+ pages = "2435--2438",
+ numpages = "3",
+ year = "1993",
+ month = apr,
+ doi = "10.1103/PhysRevLett.70.2435",
+ publisher = "American Physical Society",
+ notes = "si self int diffusion by ab initio md, formation
+ entropy calculations",
+}
+
@Article{colombo02,
title = "Tight-binding theory of native point defects in
silicon",
silicon, si self interstitials, free energy",
}
+@Article{goedecker02,
+ title = "A Fourfold Coordinated Point Defect in Silicon",
+ author = "Stefan Goedecker and Thierry Deutsch and Luc Billard",
+ journal = "Phys. Rev. Lett.",
+ volume = "88",
+ number = "23",
+ pages = "235501",
+ numpages = "4",
+ year = "2002",
+ month = may,
+ doi = "10.1103/PhysRevLett.88.235501",
+ publisher = "American Physical Society",
+ notes = "first time ffcd, fourfold coordinated point defect in
+ silicon",
+}
+
+@Article{sahli05,
+ title = "Ab initio molecular dynamics simulation of
+ self-interstitial diffusion in silicon",
+ author = "Beat Sahli and Wolfgang Fichtner",
+ journal = "Phys. Rev. B",
+ volume = "72",
+ number = "24",
+ pages = "245210",
+ numpages = "6",
+ year = "2005",
+ month = dec,
+ doi = "10.1103/PhysRevB.72.245210",
+ publisher = "American Physical Society",
+ notes = "si self int, diffusion, barrier height, voronoi
+ mapping applied",
+}
+
+@Article{hobler05,
+ title = "Ab initio calculations of the interaction between
+ native point defects in silicon",
+ journal = "Mater. Sci. Eng., B",
+ volume = "124-125",
+ number = "",
+ pages = "368--371",
+ year = "2005",
+ note = "EMRS 2005, Symposium D - Materials Science and Device
+ Issues for Future Technologies",
+ ISSN = "0921-5107",
+ doi = "DOI: 10.1016/j.mseb.2005.08.072",
+ URL = "http://www.sciencedirect.com/science/article/B6TXF-4H6PKRB-3/2/e217bd3d7ee1fffee899eeb4a2f133a4",
+ author = "G. Hobler and G. Kresse",
+ notes = "vasp intrinsic si defect interaction study, capture
+ radius",
+}
+
@Article{ma10,
title = "Ab initio study of self-diffusion in silicon over a
wide temperature range: Point defect states and
@Article{gao02,
title = "Empirical potential approach for defect properties in
3{C}-Si{C}",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "191",
number = "1-4",
- pages = "504--508",
+ pages = "487--496",
year = "2002",
note = "",
ISSN = "0168-583X",
in cubic silicon carbide",
publisher = "AIP",
year = "2007",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "90",
number = "22",
eid = "221915",
month = oct,
doi = "10.1103/PhysRevB.58.9845",
publisher = "American Physical Society",
- notes = "carbon pairs in si",
+ notes = "c_i c_s pair configuration, theoretical results",
+}
+
+@Article{song90_2,
+ title = "Bistable interstitial-carbon--substitutional-carbon
+ pair in silicon",
+ author = "L. W. Song and X. D. Zhan and B. W. Benson and G. D.
+ Watkins",
+ journal = "Phys. Rev. B",
+ volume = "42",
+ number = "9",
+ pages = "5765--5783",
+ numpages = "18",
+ year = "1990",
+ month = sep,
+ doi = "10.1103/PhysRevB.42.5765",
+ publisher = "American Physical Society",
+ notes = "c_i c_s pair configuration, experimental results",
+}
+
+@Article{liu02,
+ author = "Chun-Li Liu and Wolfgang Windl and Len Borucki and
+ Shifeng Lu and Xiang-Yang Liu",
+ collaboration = "",
+ title = "Ab initio modeling and experimental study of {C}--{B}
+ interactions in Si",
+ publisher = "AIP",
+ year = "2002",
+ journal = "Appl. Phys. Lett.",
+ volume = "80",
+ number = "1",
+ pages = "52--54",
+ keywords = "silicon; boron; carbon; elemental semiconductors;
+ impurity-defect interactions; ab initio calculations;
+ secondary ion mass spectra; diffusion; interstitials",
+ URL = "http://link.aip.org/link/?APL/80/52/1",
+ doi = "10.1063/1.1430505",
+ notes = "c-c 100 split, lower as a and b states of capaz",
}
@Article{dal_pino93,
author = "A K Tipping and R C Newman",
title = "The diffusion coefficient of interstitial carbon in
silicon",
- journal = "Semiconductor Science and Technology",
+ journal = "Semicond. Sci. Technol.",
volume = "2",
number = "5",
pages = "315--317",
@Article{laveant2002,
title = "Epitaxy of carbon-rich silicon with {MBE}",
- journal = "Materials Science and Engineering B",
+ journal = "Mater. Sci. Eng., B",
volume = "89",
number = "1-3",
pages = "241--245",
silicon by transmission electron microscopy",
publisher = "AIP",
year = "1997",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "70",
number = "2",
pages = "252--254",
volume = "",
number = "",
pages = "675--678",
- keywords = "beta;-SiC precipitates;30 s;700 to 1300 C;C
- atom/radiation induced defect interaction;C depth
- distribution;C precipitation;C-Si defects;C-Si
- dimers;CZ Si;HREM;Si:C;TEM;buried layer morphology;high
- energy ion implantation;ion implantation;metastable
- agglomerates;microdefects;positron annihilation
- spectroscopy;rapid thermal annealing;secondary ion mass
- spectrometry;vacancy clusters;buried
- layers;carbon;elemental semiconductors;impurity-defect
- interactions;ion implantation;positron
- annihilation;precipitation;rapid thermal
- annealing;secondary ion mass
- spectra;silicon;transmission electron
- microscopy;vacancies (crystal);",
doi = "10.1109/IIT.1996.586497",
ISSN = "",
notes = "c-si agglomerates dumbbells",
}
+@Article{werner98,
+ author = "P. Werner and U. G{\"{o}}sele and H.-J. Gossmann and
+ D. C. Jacobson",
+ collaboration = "",
+ title = "Carbon diffusion in silicon",
+ publisher = "AIP",
+ year = "1998",
+ journal = "Appl. Phys. Lett.",
+ volume = "73",
+ number = "17",
+ pages = "2465--2467",
+ keywords = "silicon; carbon; elemental semiconductors; diffusion;
+ secondary ion mass spectra; semiconductor epitaxial
+ layers; annealing; impurity-defect interactions;
+ impurity distribution",
+ URL = "http://link.aip.org/link/?APL/73/2465/1",
+ doi = "10.1063/1.122483",
+ notes = "c diffusion in si, kick out mechnism",
+}
+
@Article{strane94,
author = "J. W. Strane and H. J. Stein and S. R. Lee and S. T.
Picraux and J. K. Watanabe and J. W. Mayer",
y]{C}[sub y]/Si heterostructures",
publisher = "AIP",
year = "1994",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "76",
number = "6",
pages = "3656--3668",
strained Si[sub 1 - y]{C}[sub y] /Si heterostructures",
publisher = "AIP",
year = "1995",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "77",
number = "5",
pages = "1934--1937",
NETHERLANDS",
}
+@Article{zirkelbach09,
+ title = "Molecular dynamics simulation of defect formation and
+ precipitation in heavily carbon doped silicon",
+ journal = "Mater. Sci. Eng., B",
+ volume = "159-160",
+ number = "",
+ pages = "149--152",
+ year = "2009",
+ note = "EMRS 2008 Spring Conference Symposium K: Advanced
+ Silicon Materials Research for Electronic and
+ Photovoltaic Applications",
+ ISSN = "0921-5107",
+ doi = "DOI: 10.1016/j.mseb.2008.10.010",
+ URL = "http://www.sciencedirect.com/science/article/B6TXF-4TX1547-2/2/cb9f4921f324735087020ccce7843e39",
+ author = "F. Zirkelbach and J. K. N. Lindner and K. Nordlund and
+ B. Stritzker",
+ keywords = "Silicon",
+ keywords = "Carbon",
+ keywords = "Silicon carbide",
+ keywords = "Nucleation",
+ keywords = "Defect formation",
+ keywords = "Molecular dynamics simulations",
+}
+
+@Article{zirkelbach10a,
+ title = "Defects in carbon implanted silicon calculated by
+ classical potentials and first-principles methods",
+ author = "F. Zirkelbach and B. Stritzker and K. Nordlund and J.
+ K. N. Lindner and W. G. Schmidt and E. Rauls",
+ journal = "Phys. Rev. B",
+ volume = "82",
+ number = "9",
+ pages = "094110",
+ numpages = "6",
+ year = "2010",
+ month = sep,
+ doi = "10.1103/PhysRevB.82.094110",
+ publisher = "American Physical Society",
+}
+
+@Article{zirkelbach10b,
+ title = "First principles study of defects in carbon implanted
+ silicon",
+ journal = "to be published",
+ volume = "",
+ number = "",
+ pages = "",
+ year = "2010",
+ author = "F. Zirkelbach and B. Stritzker and K. Nordlund and J.
+ K. N. Lindner and W. G. Schmidt and E. Rauls",
+}
+
+@Article{zirkelbach10c,
+ title = "...",
+ journal = "to be published",
+ volume = "",
+ number = "",
+ pages = "",
+ year = "2010",
+ author = "F. Zirkelbach and B. Stritzker and K. Nordlund and J.
+ K. N. Lindner and W. G. Schmidt and E. Rauls",
+}
+
@Article{lindner99,
title = "Controlling the density distribution of Si{C}
nanocrystals for the ion beam synthesis of buried Si{C}
layers in silicon",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "147",
number = "1-4",
pages = "249--255",
@Article{lindner99_2,
title = "Mechanisms in the ion beam synthesis of Si{C} layers
in silicon",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "148",
number = "1-4",
pages = "528--533",
@Article{lindner01,
title = "Ion beam synthesis of buried Si{C} layers in silicon:
Basic physical processes",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "178",
number = "1-4",
pages = "44--54",
notes = "ibs, burried sic layers",
}
+@Article{lindner06,
+ title = "On the balance between ion beam induced nanoparticle
+ formation and displacive precipitate resolution in the
+ {C}-Si system",
+ journal = "Mater. Sci. Eng., C",
+ volume = "26",
+ number = "5-7",
+ pages = "857--861",
+ year = "2006",
+ note = "Current Trends in Nanoscience - from Materials to
+ Applications",
+ ISSN = "0928-4931",
+ doi = "DOI: 10.1016/j.msec.2005.09.099",
+ URL = "http://www.sciencedirect.com/science/article/B6TXG-4HSXVVM-1/2/5b0e351198cc2e8f5f4446a80a73d04a",
+ author = "J. K. N. Lindner and M. H{\"a}berlen and G. Thorwarth
+ and B. Stritzker",
+ notes = "c int diffusion barrier",
+}
+
@Article{ito04,
title = "Ion beam synthesis of 3{C}-Si{C} layers in Si and its
application in buffer layer for Ga{N} epitaxial
URL = "http://www.sciencedirect.com/science/article/B6THY-4CTTNGX-B/2/d24ee637db87f3f1a6ef7fe6820f267c",
author = "Y. Ito and T. Yamauchi and A. Yamamoto and M. Sasase
and S. Nishio and K. Yasuda and Y. Ishigami",
+ notes = "gan on 3c-sic, focus on ibs of 3c-sic",
+}
+
+@Article{yamamoto04,
+ title = "Organometallic vapor phase epitaxial growth of Ga{N}
+ on a 3c-Si{C}/Si(1Â 1Â 1) template formed by {C}+-ion
+ implantation into Si(1Â 1Â 1) substrate",
+ journal = "Journal of Crystal Growth",
+ volume = "261",
+ number = "2-3",
+ pages = "266--270",
+ year = "2004",
+ note = "Proceedings of the 11th Biennial (US) Workshop on
+ Organometallic Vapor Phase Epitaxy (OMVPE)",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/j.jcrysgro.2003.11.041",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-4B5BFSX-2/2/55e79e024f2a23b487d19c6fd8dbf166",
+ author = "A. Yamamoto and T. Yamauchi and T. Tanikawa and M.
+ Sasase and B. K. Ghosh and A. Hashimoto and Y. Ito",
notes = "gan on 3c-sic",
}
+@Article{liu_l02,
+ title = "Substrates for gallium nitride epitaxy",
+ journal = "Materials Science and Engineering: R: Reports",
+ volume = "37",
+ number = "3",
+ pages = "61--127",
+ year = "2002",
+ note = "",
+ ISSN = "0927-796X",
+ doi = "DOI: 10.1016/S0927-796X(02)00008-6",
+ URL = "http://www.sciencedirect.com/science/article/B6TXH-45DFBSV-2/2/38c47e77fa91f23f8649a044e7135401",
+ author = "L. Liu and J. H. Edgar",
+ notes = "gan substrates",
+}
+
+@Article{takeuchi91,
+ title = "Growth of single crystalline Ga{N} film on Si
+ substrate using 3{C}-Si{C} as an intermediate layer",
+ journal = "Journal of Crystal Growth",
+ volume = "115",
+ number = "1-4",
+ pages = "634--638",
+ year = "1991",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(91)90817-O",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46FJ525-TY/2/7bb50016a50b1dd1dbc36b43c46b3140",
+ author = "Tetsuya Takeuchi and Hiroshi Amano and Kazumasa
+ Hiramatsu and Nobuhiko Sawaki and Isamu Akasaki",
+ notes = "gan on 3c-sic (first time?)",
+}
+
@Article{alder57,
author = "B. J. Alder and T. E. Wainwright",
title = "Phase Transition for a Hard Sphere System",
publisher = "AIP",
year = "1957",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "27",
number = "5",
pages = "1208--1209",
title = "Studies in Molecular Dynamics. {I}. General Method",
publisher = "AIP",
year = "1959",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "31",
number = "2",
pages = "459--466",
@Article{wesch96,
title = "Silicon carbide: synthesis and processing",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "116",
number = "1-4",
pages = "305--321",
ZnSe-based semiconductor device technologies",
publisher = "AIP",
year = "1994",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "76",
number = "3",
pages = "1363--1398",
notes = "sic intro, properties",
}
-@Article{neudeck95,
- author = "P. G. Neudeck",
- title = "{PROGRESS} {IN} {SILICON}-{CARBIDE} {SEMICONDUCTOR}
- {ELECTRONICS} {TECHNOLOGY}",
- journal = "Journal of Electronic Materials",
- year = "1995",
- volume = "24",
- number = "4",
- pages = "283--288",
- month = apr,
-}
-
@Article{foo,
author = "Noch Unbekannt",
title = "How to find references",
@Article{tairov78,
title = "Investigation of growth processes of ingots of silicon
carbide single crystals",
- journal = "Journal of Crystal Growth",
+ journal = "J. Cryst. Growth",
volume = "43",
number = "2",
pages = "209--212",
author = "Yu. M. Tairov and V. F. Tsvetkov",
}
+@Article{tairov81,
+ title = "General principles of growing large-size single
+ crystals of various silicon carbide polytypes",
+ journal = "Journal of Crystal Growth",
+ volume = "52",
+ number = "Part 1",
+ pages = "146--150",
+ year = "1981",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(81)90184-6",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46FVMF6-2Y/2/b7c4025f0ef07ceec37fbd596819d529",
+ author = "Yu.M. Tairov and V. F. Tsvetkov",
+}
+
+@Article{barrett91,
+ title = "Si{C} boule growth by sublimation vapor transport",
+ journal = "Journal of Crystal Growth",
+ volume = "109",
+ number = "1-4",
+ pages = "17--23",
+ year = "1991",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(91)90152-U",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46FJ4VX-KF/2/fb802a6d67a8074a672007e972b264e1",
+ author = "D. L. Barrett and R. G. Seidensticker and W. Gaida and
+ R. H. Hopkins and W. J. Choyke",
+}
+
+@Article{barrett93,
+ title = "Growth of large Si{C} single crystals",
+ journal = "Journal of Crystal Growth",
+ volume = "128",
+ number = "1-4",
+ pages = "358--362",
+ year = "1993",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(93)90348-Z",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46YKSGB-4D/2/bc26617f48735a9ffbf5c61a5e164d9c",
+ author = "D. L. Barrett and J. P. McHugh and H. M. Hobgood and
+ R. H. Hopkins and P. G. McMullin and R. C. Clarke and
+ W. J. Choyke",
+}
+
+@Article{stein93,
+ title = "Control of polytype formation by surface energy
+ effects during the growth of Si{C} monocrystals by the
+ sublimation method",
+ journal = "Journal of Crystal Growth",
+ volume = "131",
+ number = "1-2",
+ pages = "71--74",
+ year = "1993",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(93)90397-F",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46FX1XJ-1X/2/493b180c29103dba5dba351e0fae5b9d",
+ author = "R. A. Stein and P. Lanig",
+ notes = "6h and 4h, sublimation technique",
+}
+
@Article{nishino83,
author = "Shigehiro Nishino and J. Anthony Powell and Herbert A.
Will",
cubic Si{C} for semiconductor devices",
publisher = "AIP",
year = "1983",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "42",
number = "5",
pages = "460--462",
Si{C} on silicon",
publisher = "AIP",
year = "1987",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "61",
number = "10",
pages = "4889--4893",
epitaxy",
publisher = "AIP",
year = "1993",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "73",
number = "2",
pages = "726--732",
6{H}-Si{C} substrates",
publisher = "AIP",
year = "1990",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "56",
number = "14",
pages = "1353--1355",
silacyclobutane",
publisher = "AIP",
year = "1995",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "78",
number = "2",
pages = "1271--1273",
title = "Epitaxial growth of Si{C} thin films on Si-stabilized
[alpha]-Si{C}(0001) at low temperatures by solid-source
molecular beam epitaxy",
- journal = "Journal of Crystal Growth",
+ journal = "J. Cryst. Growth",
volume = "154",
number = "1-2",
pages = "72--80",
6{H}--Si{C} by solid-source molecular beam epitaxy",
publisher = "AIP",
year = "1995",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "66",
number = "23",
pages = "3182--3184",
{IMPLANTATION}",
publisher = "AIP",
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- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "18",
number = "11",
pages = "509--511",
beam synthesis and incoherent lamp annealing",
publisher = "AIP",
year = "1987",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "51",
number = "26",
pages = "2242--2244",
title = "Solubility of Carbon in Silicon and Germanium",
publisher = "AIP",
year = "1959",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "30",
number = "6",
pages = "1551--1555",
{B} in silicon",
publisher = "AIP",
year = "1996",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "68",
number = "8",
pages = "1150--1152",
@Article{stolk95,
title = "Implantation and transient boron diffusion: the role
of the silicon self-interstitial",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "96",
number = "1-2",
pages = "187--195",
diffusion in ion-implanted silicon",
publisher = "AIP",
year = "1997",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "81",
number = "9",
pages = "6031--6050",
of Si[sub 1 - y]{C}[sub y] random alloy layers",
publisher = "AIP",
year = "1994",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "64",
number = "3",
pages = "324--326",
- x - y]Ge[sub x]{C}[sub y]",
publisher = "AIP",
year = "1991",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "70",
number = "4",
pages = "2470--2472",
molecular beam epitaxy",
publisher = "AIP",
year = "1999",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "74",
number = "6",
pages = "836--838",
month = may,
doi = "10.1103/PhysRevLett.72.3578",
publisher = "American Physical Society",
- notes = "high c concentration in si, heterostructure, starined
+ notes = "high c concentration in si, heterostructure, strained
si, dft",
}
title = "Electron Transport Model for Strained Silicon-Carbon
Alloy",
author = "Shu-Tong Chang and Chung-Yi Lin",
- journal = "Japanese Journal of Applied Physics",
+ journal = "Japanese J. Appl. Phys.",
volume = "44",
number = "4B",
pages = "2257--2262",
Si(001)",
publisher = "AIP",
year = "1997",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "82",
number = "10",
pages = "4977--4981",
potential energy surfaces",
publisher = "AIP",
year = "2009",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "130",
number = "11",
eid = "114711",
molecular dynamics method",
publisher = "AIP",
year = "1981",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "52",
number = "12",
pages = "7182--7190",
simulation of infrequent events",
publisher = "AIP",
year = "1997",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "106",
number = "11",
pages = "4665--4677",
}
@Article{sorensen2000,
- author = "Mads R. S\o rensen and Arthur F. Voter",
+ author = "Mads R. S{\o }rensen and Arthur F. Voter",
collaboration = "",
title = "Temperature-accelerated dynamics for simulation of
infrequent events",
publisher = "AIP",
year = "2000",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "112",
number = "21",
pages = "9599--9606",
simulation",
publisher = "AIP",
year = "1999",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "110",
number = "19",
pages = "9401--9410",
to the production of amorphous silicon",
publisher = "AIP",
year = "2005",
- journal = "The Journal of Chemical Physics",
+ journal = "J. Chem. Phys.",
volume = "122",
number = "15",
eid = "154509",
difficult?",
publisher = "AIP",
year = "1993",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "62",
number = "25",
pages = "3336--3338",
@Article{chaussende08,
title = "Prospects for 3{C}-Si{C} bulk crystal growth",
- journal = "Journal of Crystal Growth",
+ journal = "J. Cryst. Growth",
volume = "310",
number = "5",
pages = "976--981",
metastable",
}
+@Article{chaussende07,
+ author = "D. Chaussende and P. J. Wellmann and M. Pons",
+ title = "Status of Si{C} bulk growth processes",
+ journal = "Journal of Physics D: Applied Physics",
+ volume = "40",
+ number = "20",
+ pages = "6150",
+ URL = "http://stacks.iop.org/0022-3727/40/i=20/a=S02",
+ year = "2007",
+ notes = "review of sic single crystal growth methods, process
+ modelling",
+}
+
@Article{feynman39,
title = "Forces in Molecules",
author = "R. P. Feynman",
3{C}-Si{C}/Si (001) interface",
publisher = "AIP",
year = "2009",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "106",
number = "7",
eid = "073522",
growth on Si(001) surface",
publisher = "AIP",
year = "1993",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "74",
number = "7",
pages = "4438--4445",
notes = "dislocations in diamond lattice",
}
+@Article{deguchi92,
+ title = "Synthesis of $\beta$-Si{C} Layer in Silicon by Carbon
+ Ion `Hot' Implantation",
+ author = "Masahiro Deguchi and Makoto Kitabatake and Takashi
+ Hirao and Naoki Arai and Tomio Izumi",
+ journal = "Japanese Journal of Applied Physics",
+ volume = "31",
+ number = "Part 1, No. 2A",
+ pages = "343--347",
+ numpages = "4",
+ year = "1992",
+ URL = "http://jjap.ipap.jp/link?JJAP/31/343/",
+ doi = "10.1143/JJAP.31.343",
+ publisher = "The Japan Society of Applied Physics",
+ notes = "c-c bonds in c implanted si, hot implantation
+ efficiency, c-c hard to break by thermal annealing",
+}
+
@Article{eichhorn99,
author = "F. Eichhorn and N. Schell and W. Matz and R.
K{\"{o}}gler",
synchrotron x-ray diffraction",
publisher = "AIP",
year = "1999",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "86",
number = "8",
pages = "4184--4187",
carbon ion implantation",
publisher = "AIP",
year = "2002",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "91",
number = "3",
pages = "1287--1292",
URL = "http://link.aip.org/link/?JAP/91/1287/1",
doi = "10.1063/1.1428105",
notes = "3c-sic alignement to si host in ibs depending on
- temperature, might explain c int to c sub trafo",
+ temperature, might explain c into c sub trafo",
}
@Article{lucas10,
silicon carbide: calculation of bulk properties,
high-pressure phases, point and extended defects, and
amorphous structures",
- journal = "Journal of Physics: Condensed Matter",
+ journal = "J. Phys.: Condens. Matter",
volume = "22",
number = "3",
pages = "035802",
Beauchamp",
title = "Comparison between classical potentials and ab initio
methods for silicon under large shear",
- journal = "Journal of Physics: Condensed Matter",
+ journal = "J. Phys.: Condens. Matter",
volume = "15",
number = "41",
pages = "6943",
title = "Verification of Tersoff's Potential for Static
Structural Analysis of Solids of Group-{IV} Elements",
author = "Koji Moriguchi and Akira Shintani",
- journal = "Japanese Journal of Applied Physics",
+ journal = "Japanese J. Appl. Phys.",
volume = "37",
number = "Part 1, No. 2",
pages = "414--422",
@Article{nordlund97,
title = "Repulsive interatomic potentials calculated using
Hartree-Fock and density-functional theory methods",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "132",
number = "1",
pages = "45--54",
title = "Efficiency of ab-initio total energy calculations for
metals and semiconductors using a plane-wave basis
set",
- journal = "Computational Materials Science",
+ journal = "Comput. Mater. Sci.",
volume = "6",
number = "1",
pages = "15--50",
title = "Accurate and simple density functional for the
electronic exchange energy: Generalized gradient
approximation",
- author = "John P. Perdew and Wang Yue",
+ author = "John P. Perdew and Yue Wang",
journal = "Phys. Rev. B",
volume = "33",
number = "12",
@Article{zhu98,
title = "Ab initio pseudopotential calculations of dopant
diffusion in Si",
- journal = "Computational Materials Science",
+ journal = "Comput. Mater. Sci.",
volume = "12",
number = "4",
pages = "309--318",
950 [degree]{C}",
publisher = "AIP",
year = "1995",
- journal = "Applied Physics Letters",
+ journal = "Appl. Phys. Lett.",
volume = "66",
number = "20",
pages = "2646--2648",
alloys",
publisher = "AIP",
year = "1998",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "84",
number = "8",
pages = "4631--4633",
author = "R Jones and B J Coomer and P R Briddon",
title = "Quantum mechanical modelling of defects in
semiconductors",
- journal = "Journal of Physics: Condensed Matter",
+ journal = "J. Phys.: Condens. Matter",
volume = "16",
number = "27",
pages = "S2643",
molecular-beam epitaxy",
publisher = "AIP",
year = "2002",
- journal = "Journal of Applied Physics",
+ journal = "J. Appl. Phys.",
volume = "91",
number = "9",
pages = "5716--5727",
carbon defect, formation energies",
}
+@Article{besson91,
+ title = "Electronic structure of interstitial carbon in
+ silicon",
+ author = "Morgan Besson and Gary G. DeLeo",
+ journal = "Phys. Rev. B",
+ volume = "43",
+ number = "5",
+ pages = "4028--4033",
+ numpages = "5",
+ year = "1991",
+ month = feb,
+ doi = "10.1103/PhysRevB.43.4028",
+ publisher = "American Physical Society",
+}
+
@Article{kaxiras96,
title = "Review of atomistic simulations of surface diffusion
and growth on semiconductors",
- journal = "Computational Materials Science",
+ journal = "Comput. Mater. Sci.",
volume = "6",
number = "2",
pages = "158--172",
@Article{chen98,
title = "Production and recovery of defects in Si{C} after
irradiation and deformation",
- journal = "Journal of Nuclear Materials",
+ journal = "J. Nucl. Mater.",
volume = "258-263",
number = "Part 2",
pages = "1803--1808",
@Article{weber01,
title = "Accumulation, dynamic annealing and thermal recovery
of ion-beam-induced disorder in silicon carbide",
- journal = "Nuclear Instruments and Methods in Physics Research
- Section B: Beam Interactions with Materials and Atoms",
+ journal = "Nucl. Instrum. Methods Phys. Res. B",
volume = "175-177",
number = "",
pages = "26--30",
doi = "DOI: 10.1016/S0168-583X(00)00542-5",
URL = "http://www.sciencedirect.com/science/article/B6TJN-435KH7Y-2R/2/8acc176700c95bb8614d96c40cfc5577",
author = "W. J. Weber and W. Jiang and S. Thevuthasan",
- keywords = "Amorphization",
- keywords = "Irradiation effects",
- keywords = "Thermal recovery",
- keywords = "Silicon carbide",
}
@Article{bockstedte03,
doi = "10.1103/PhysRevB.68.155208",
publisher = "American Physical Society",
}
+
+@Article{losev27,
+ journal = "Telegrafiya i Telefoniya bez Provodov",
+ volume = "44",
+ pages = "485--494",
+ year = "1927",
+ author = "O. V. Lossev",
+}
+
+@Article{losev28,
+ title = "Luminous carborundum detector and detection effect and
+ oscillations with crystals",
+ journal = "Philosophical Magazine Series 7",
+ volume = "6",
+ number = "39",
+ pages = "1024--1044",
+ year = "1928",
+ URL = "http://www.informaworld.com/10.1080/14786441108564683",
+ author = "O. V. Lossev",
+}
+
+@Article{losev29,
+ journal = "Physik. Zeitschr.",
+ volume = "30",
+ pages = "920--923",
+ year = "1929",
+ author = "O. V. Lossev",
+}
+
+@Article{losev31,
+ journal = "Physik. Zeitschr.",
+ volume = "32",
+ pages = "692--696",
+ year = "1931",
+ author = "O. V. Lossev",
+}
+
+@Article{losev33,
+ journal = "Physik. Zeitschr.",
+ volume = "34",
+ pages = "397--403",
+ year = "1933",
+ author = "O. V. Lossev",
+}
+
+@Article{round07,
+ title = "A note on carborundum",
+ journal = "Electrical World",
+ volume = "49",
+ pages = "308",
+ year = "1907",
+ author = "H. J. Round",
+}
+
+@Article{vashishath08,
+ title = "Recent trends in silicon carbide device research",
+ journal = "Mj. Int. J. Sci. Tech.",
+ volume = "2",
+ number = "03",
+ pages = "444--470",
+ year = "2008",
+ author = "Munish Vashishath and Ashoke K. Chatterjee",
+ URL = "http://www.doaj.org/doaj?func=abstract&id=286746",
+ notes = "sic polytype electronic properties",
+}
+
+@Article{nelson69,
+ author = "W. E. Nelson and F. A. Halden and A. Rosengreen",
+ collaboration = "",
+ title = "Growth and Properties of beta-Si{C} Single Crystals",
+ publisher = "AIP",
+ year = "1966",
+ journal = "Journal of Applied Physics",
+ volume = "37",
+ number = "1",
+ pages = "333--336",
+ URL = "http://link.aip.org/link/?JAP/37/333/1",
+ doi = "10.1063/1.1707837",
+ notes = "sic melt growth",
+}
+
+@Article{arkel25,
+ author = "A. E. van Arkel and J. H. de Boer",
+ title = "Darstellung von reinem Titanium-, Zirkonium-, Hafnium-
+ und Thoriummetall",
+ publisher = "WILEY-VCH Verlag GmbH",
+ year = "1925",
+ journal = "Z. Anorg. Chem.",
+ volume = "148",
+ pages = "345--350",
+ URL = "http://dx.doi.org/10.1002/zaac.19251480133",
+ doi = "10.1002/zaac.19251480133",
+ notes = "van arkel apparatus",
+}
+
+@Article{moers31,
+ author = "K. Moers",
+ year = "1931",
+ journal = "Z. Anorg. Chem.",
+ volume = "198",
+ pages = "293",
+ notes = "sic by van arkel apparatus, pyrolitical vapor growth
+ process",
+}
+
+@Article{kendall53,
+ author = "J. T. Kendall",
+ title = "Electronic Conduction in Silicon Carbide",
+ publisher = "AIP",
+ year = "1953",
+ journal = "The Journal of Chemical Physics",
+ volume = "21",
+ number = "5",
+ pages = "821--827",
+ URL = "http://link.aip.org/link/?JCP/21/821/1",
+ notes = "sic by van arkel apparatus, pyrolitical vapor growth
+ process",
+}
+
+@Article{lely55,
+ author = "J. A. Lely",
+ year = "1955",
+ journal = "Ber. Deut. Keram. Ges.",
+ volume = "32",
+ pages = "229",
+ notes = "lely sublimation growth process",
+}
+
+@Article{knippenberg63,
+ author = "W. F. Knippenberg",
+ year = "1963",
+ journal = "Philips Res. Repts.",
+ volume = "18",
+ pages = "161",
+ notes = "acheson process",
+}
+
+@Article{hoffmann82,
+ author = "L. Hoffmann and G. Ziegler and D. Theis and C.
+ Weyrich",
+ collaboration = "",
+ title = "Silicon carbide blue light emitting diodes with
+ improved external quantum efficiency",
+ publisher = "AIP",
+ year = "1982",
+ journal = "Journal of Applied Physics",
+ volume = "53",
+ number = "10",
+ pages = "6962--6967",
+ keywords = "light emitting diodes; silicon carbides; quantum
+ efficiency; visible radiation; experimental data;
+ epitaxy; fabrication; medium temperature; layers;
+ aluminium; nitrogen; substrates; pn junctions;
+ electroluminescence; spectra; current density;
+ optimization",
+ URL = "http://link.aip.org/link/?JAP/53/6962/1",
+ doi = "10.1063/1.330041",
+ notes = "blue led, sublimation process",
+}
+
+@Article{neudeck95,
+ author = "Philip Neudeck",
+ affiliation = "NASA Lewis Research Center M.S. 77-1, 21000 Brookpark
+ Road 44135 Cleveland OH",
+ title = "Progress in silicon carbide semiconductor electronics
+ technology",
+ journal = "Journal of Electronic Materials",
+ publisher = "Springer Boston",
+ ISSN = "0361-5235",
+ keyword = "Chemistry and Materials Science",
+ pages = "283--288",
+ volume = "24",
+ issue = "4",
+ URL = "http://dx.doi.org/10.1007/BF02659688",
+ note = "10.1007/BF02659688",
+ year = "1995",
+ notes = "sic data, advantages of 3c sic",
+}
+
+@Article{bhatnagar93,
+ author = "M. Bhatnagar and B. J. Baliga",
+ journal = "Electron Devices, IEEE Transactions on",
+ title = "Comparison of 6{H}-Si{C}, 3{C}-Si{C}, and Si for power
+ devices",
+ year = "1993",
+ month = mar,
+ volume = "40",
+ number = "3",
+ pages = "645--655",
+ keywords = "3C-SiC;50 to 5000 V;6H-SiC;Schottky
+ rectifiers;Si;SiC;breakdown voltages;drift region
+ properties;output characteristics;power MOSFETs;power
+ semiconductor devices;switching characteristics;thermal
+ analysis;Schottky-barrier diodes;electric breakdown of
+ solids;insulated gate field effect transistors;power
+ transistors;semiconductor materials;silicon;silicon
+ compounds;solid-state rectifiers;thermal analysis;",
+ doi = "10.1109/16.199372",
+ ISSN = "0018-9383",
+ notes = "comparison 3c 6h sic and si devices",
+}
+
+@Article{neudeck94,
+ author = "P. G. Neudeck and D. J. Larkin and J. E. Starr and J.
+ A. Powell and C. S. Salupo and L. G. Matus",
+ journal = "Electron Devices, IEEE Transactions on",
+ title = "Electrical properties of epitaxial 3{C}- and
+ 6{H}-Si{C} p-n junction diodes produced side-by-side on
+ 6{H}-Si{C} substrates",
+ year = "1994",
+ month = may,
+ volume = "41",
+ number = "5",
+ pages = "826--835",
+ keywords = "20 nA;200 micron;300 to 1100 V;3C-SiC layers;400
+ C;6H-SiC layers;6H-SiC substrates;CVD
+ process;SiC;chemical vapor deposition;doping;electrical
+ properties;epitaxial layers;light
+ emission;low-tilt-angle 6H-SiC substrates;p-n junction
+ diodes;polytype;rectification characteristics;reverse
+ leakage current;reverse voltages;temperature;leakage
+ currents;power electronics;semiconductor
+ diodes;semiconductor epitaxial layers;semiconductor
+ growth;semiconductor materials;silicon
+ compounds;solid-state rectifiers;substrates;vapour
+ phase epitaxial growth;",
+ doi = "10.1109/16.285038",
+ ISSN = "0018-9383",
+ notes = "comparison 6h 3c sic, cvd of 3c and 6h on single 6h
+ substrate",
+}
+
+@Article{schulze98,
+ author = "N. Schulze and D. L. Barrett and G. Pensl",
+ collaboration = "",
+ title = "Near-equilibrium growth of micropipe-free 6{H}-Si{C}
+ single crystals by physical vapor transport",
+ publisher = "AIP",
+ year = "1998",
+ journal = "Applied Physics Letters",
+ volume = "72",
+ number = "13",
+ pages = "1632--1634",
+ keywords = "silicon compounds; semiconductor materials;
+ semiconductor growth; crystal growth from vapour;
+ photoluminescence; Hall mobility",
+ URL = "http://link.aip.org/link/?APL/72/1632/1",
+ doi = "10.1063/1.121136",
+ notes = "micropipe free 6h-sic pvt growth",
+}
+
+@Article{pirouz87,
+ author = "P. Pirouz and C. M. Chorey and J. A. Powell",
+ collaboration = "",
+ title = "Antiphase boundaries in epitaxially grown beta-Si{C}",
+ publisher = "AIP",
+ year = "1987",
+ journal = "Applied Physics Letters",
+ volume = "50",
+ number = "4",
+ pages = "221--223",
+ keywords = "SILICON CARBIDES; DOMAIN STRUCTURE; SCANNING ELECTRON
+ MICROSCOPY; NUCLEATION; EPITAXIAL LAYERS; CHEMICAL
+ VAPOR DEPOSITION; ETCHING; ETCH PITS; TRANSMISSION
+ ELECTRON MICROSCOPY; ELECTRON MICROSCOPY; ANTIPHASE
+ BOUNDARIES",
+ URL = "http://link.aip.org/link/?APL/50/221/1",
+ doi = "10.1063/1.97667",
+ notes = "apb 3c-sic heteroepitaxy on si",
+}