carbon, both mechanisms explained + refs",
}
+@Article{skorupa96,
+ title = "Carbon-mediated effects in silicon and in
+ silicon-related materials",
+ journal = "Materials Chemistry and Physics",
+ volume = "44",
+ number = "2",
+ pages = "101--143",
+ year = "1996",
+ note = "",
+ ISSN = "0254-0584",
+ doi = "DOI: 10.1016/0254-0584(95)01673-I",
+ URL = "http://www.sciencedirect.com/science/article/B6TX4-3VR9V74-2/2/4ab972315eb79eaa76b55ffab5aed982",
+ author = "W. Skorupa and R. A. Yankov",
+ notes = "review of silicon carbon compound",
+}
+
@Book{laplace,
author = "P. S. de Laplace",
title = "Th\'eorie analytique des probabilit\'es",
notes = "sic intro, properties",
}
-@Article{neudeck95,
- author = "P. G. Neudeck",
- title = "{PROGRESS} {IN} {SILICON}-{CARBIDE} {SEMICONDUCTOR}
- {ELECTRONICS} {TECHNOLOGY}",
- journal = "Journal of Electronic Materials",
- year = "1995",
- volume = "24",
- number = "4",
- pages = "283--288",
- month = apr,
-}
-
@Article{foo,
author = "Noch Unbekannt",
title = "How to find references",
author = "Yu. M. Tairov and V. F. Tsvetkov",
}
+@Article{tairov81,
+ title = "General principles of growing large-size single
+ crystals of various silicon carbide polytypes",
+ journal = "Journal of Crystal Growth",
+ volume = "52",
+ number = "Part 1",
+ pages = "146--150",
+ year = "1981",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(81)90184-6",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46FVMF6-2Y/2/b7c4025f0ef07ceec37fbd596819d529",
+ author = "Yu.M. Tairov and V. F. Tsvetkov",
+}
+
+@Article{barrett91,
+ title = "Si{C} boule growth by sublimation vapor transport",
+ journal = "Journal of Crystal Growth",
+ volume = "109",
+ number = "1-4",
+ pages = "17--23",
+ year = "1991",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(91)90152-U",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46FJ4VX-KF/2/fb802a6d67a8074a672007e972b264e1",
+ author = "D. L. Barrett and R. G. Seidensticker and W. Gaida and
+ R. H. Hopkins and W. J. Choyke",
+}
+
+@Article{barrett93,
+ title = "Growth of large Si{C} single crystals",
+ journal = "Journal of Crystal Growth",
+ volume = "128",
+ number = "1-4",
+ pages = "358--362",
+ year = "1993",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(93)90348-Z",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46YKSGB-4D/2/bc26617f48735a9ffbf5c61a5e164d9c",
+ author = "D. L. Barrett and J. P. McHugh and H. M. Hobgood and
+ R. H. Hopkins and P. G. McMullin and R. C. Clarke and
+ W. J. Choyke",
+}
+
+@Article{stein93,
+ title = "Control of polytype formation by surface energy
+ effects during the growth of Si{C} monocrystals by the
+ sublimation method",
+ journal = "Journal of Crystal Growth",
+ volume = "131",
+ number = "1-2",
+ pages = "71--74",
+ year = "1993",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(93)90397-F",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46FX1XJ-1X/2/493b180c29103dba5dba351e0fae5b9d",
+ author = "R. A. Stein and P. Lanig",
+ notes = "6h and 4h, sublimation technique",
+}
+
@Article{nishino83,
author = "Shigehiro Nishino and J. Anthony Powell and Herbert A.
Will",
notes = "blue light emitting diodes (led)",
}
+@Article{powell87_2,
+ author = "J. A. Powell and L. G. Matus and M. A. Kuczmarski and
+ C. M. Chorey and T. T. Cheng and P. Pirouz",
+ collaboration = "",
+ title = "Improved beta-Si{C} heteroepitaxial films using
+ off-axis Si substrates",
+ publisher = "AIP",
+ year = "1987",
+ journal = "Applied Physics Letters",
+ volume = "51",
+ number = "11",
+ pages = "823--825",
+ keywords = "VAPOR PHASE EPITAXY; SILICON CARBIDES; VAPOR DEPOSITED
+ COATINGS; SILICON; EPITAXIAL LAYERS; INTERFACE
+ STRUCTURE; SURFACE STRUCTURE; FILM GROWTH; STACKING
+ FAULTS; CRYSTAL DEFECTS; ANTIPHASE BOUNDARIES;
+ OXIDATION; CHEMICAL VAPOR DEPOSITION; ROUGHNESS",
+ URL = "http://link.aip.org/link/?APL/51/823/1",
+ doi = "10.1063/1.98824",
+ notes = "improved sic on off-axis si substrates, reduced apbs",
+}
+
+@Article{ueda90,
+ title = "Crystal growth of Si{C} by step-controlled epitaxy",
+ journal = "Journal of Crystal Growth",
+ volume = "104",
+ number = "3",
+ pages = "695--700",
+ year = "1990",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(90)90013-B",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46CC6CX-KN/2/d5184c7bd29063985f7d1dd4112b12c9",
+ author = "Tetsuzo Ueda and Hironori Nishino and Hiroyuki
+ Matsunami",
+ notes = "step-controlled epitaxy model",
+}
+
@Article{kimoto93,
author = "Tsunenobu Kimoto and Hironori Nishino and Woo Sik Yoo
and Hiroyuki Matsunami",
notes = "cvd of 6h-sic on 6h-sic, twinned 3c-sic",
}
+@Article{powell90_2,
+ author = "J. A. Powell and D. J. Larkin and L. G. Matus and W.
+ J. Choyke and J. L. Bradshaw and L. Henderson and M.
+ Yoganathan and J. Yang and P. Pirouz",
+ collaboration = "",
+ title = "Growth of high quality 6{H}-Si{C} epitaxial films on
+ vicinal (0001) 6{H}-Si{C} wafers",
+ publisher = "AIP",
+ year = "1990",
+ journal = "Applied Physics Letters",
+ volume = "56",
+ number = "15",
+ pages = "1442--1444",
+ keywords = "SILICON CARBIDES; CHEMICAL VAPOR DEPOSITION; SORPTIVE
+ PROPERTIES; WAFERS; CARRIER DENSITY; CARRIER MOBILITY;
+ TRANSMISSION ELECTRON MICROSCOPY; CRYSTAL DEFECTS;
+ DISLOCATIONS; PHOTOLUMINESCENCE; VAPOR PHASE EPITAXY",
+ URL = "http://link.aip.org/link/?APL/56/1442/1",
+ doi = "10.1063/1.102492",
+ notes = "cvd of 6h-sic on 6h-sic",
+}
+
+@Article{kong88_2,
+ author = "H. S. Kong and J. T. Glass and R. F. Davis",
+ collaboration = "",
+ title = "Chemical vapor deposition and characterization of
+ 6{H}-Si{C} thin films on off-axis 6{H}-Si{C}
+ substrates",
+ publisher = "AIP",
+ year = "1988",
+ journal = "Journal of Applied Physics",
+ volume = "64",
+ number = "5",
+ pages = "2672--2679",
+ keywords = "THIN FILMS; CHEMICAL VAPOR DEPOSITION; VAPOR DEPOSITED
+ COATINGS; SILICON CARBIDES; TRANSMISSION ELECTRON
+ MICROSCOPY; MONOCRYSTALS; MORPHOLOGY; CRYSTAL
+ STRUCTURE; CRYSTAL DEFECTS; CARRIER DENSITY; VAPOR
+ PHASE EPITAXY; CRYSTAL ORIENTATION",
+ URL = "http://link.aip.org/link/?JAP/64/2672/1",
+ doi = "10.1063/1.341608",
+}
+
@Article{powell90,
author = "J. A. Powell and D. J. Larkin and L. G. Matus and W.
J. Choyke and J. L. Bradshaw and L. Henderson and M.
notes = "cvd of 3c-sic on 6h-sic",
}
+@Article{kong88,
+ author = "H. S. Kong and B. L. Jiang and J. T. Glass and G. A.
+ Rozgonyi and K. L. More",
+ collaboration = "",
+ title = "An examination of double positioning boundaries and
+ interface misfit in beta-Si{C} films on alpha-Si{C}
+ substrates",
+ publisher = "AIP",
+ year = "1988",
+ journal = "Journal of Applied Physics",
+ volume = "63",
+ number = "8",
+ pages = "2645--2650",
+ keywords = "SILICON CARBIDES; INTERFACES; SILICON; STACKING
+ FAULTS; TRANSMISSION ELECTRON MICROSCOPY; EPITAXY; THIN
+ FILMS; OPTICAL MICROSCOPY; TOPOGRAPHY; NUCLEATION;
+ MORPHOLOGY; ROTATION; SURFACE STRUCTURE; INTERFACE
+ STRUCTURE; XRAY TOPOGRAPHY; EPITAXIAL LAYERS",
+ URL = "http://link.aip.org/link/?JAP/63/2645/1",
+ doi = "10.1063/1.341004",
+}
+
+@Article{powell91,
+ author = "J. A. Powell and J. B. Petit and J. H. Edgar and I. G.
+ Jenkins and L. G. Matus and J. W. Yang and P. Pirouz
+ and W. J. Choyke and L. Clemen and M. Yoganathan",
+ collaboration = "",
+ title = "Controlled growth of 3{C}-Si{C} and 6{H}-Si{C} films
+ on low-tilt-angle vicinal (0001) 6{H}-Si{C} wafers",
+ publisher = "AIP",
+ year = "1991",
+ journal = "Applied Physics Letters",
+ volume = "59",
+ number = "3",
+ pages = "333--335",
+ keywords = "SILICON CARBIDES; SURFACE TREATMENTS; SORPTIVE
+ PROPERTIES; CHEMICAL VAPOR DEPOSITION; MATHEMATICAL
+ MODELS; CRYSTAL STRUCTURE; VERY HIGH TEMPERATURE",
+ URL = "http://link.aip.org/link/?APL/59/333/1",
+ doi = "10.1063/1.105587",
+}
+
@Article{yuan95,
author = "C. Yuan and A. J. Steckl and J. Chaudhuri and R.
Thokala and M. J. Loboda",
notes = "mbe 3c-sic on si and 6h-sic",
}
+@Article{fissel96,
+ author = "Andreas Fissel and Ute Kaiser and Kay Pfennighaus and
+ Bernd Schr{\"{o}}ter and Wolfgang Richter",
+ collaboration = "",
+ title = "Growth of 6{H}--Si{C} on 6{H}--Si{C}(0001) by
+ migration enhanced epitaxy controlled to an atomic
+ level using surface superstructures",
+ publisher = "AIP",
+ year = "1996",
+ journal = "Applied Physics Letters",
+ volume = "68",
+ number = "9",
+ pages = "1204--1206",
+ keywords = "MICROSTRUCTURE; MOLECULAR BEAM EPITAXY; MORPHOLOGY;
+ NUCLEATION; SILICON CARBIDES; SURFACE RECONSTRUCTION;
+ SURFACE STRUCTURE",
+ URL = "http://link.aip.org/link/?APL/68/1204/1",
+ doi = "10.1063/1.115969",
+ notes = "ss mbe sic, superstructure, reconstruction",
+}
+
+@Article{righi03,
+ title = "Ab initio Simulations of Homoepitaxial Si{C} Growth",
+ author = "M. C. Righi and C. A. Pignedoli and R. Di Felice and
+ C. M. Bertoni and A. Catellani",
+ journal = "Phys. Rev. Lett.",
+ volume = "91",
+ number = "13",
+ pages = "136101",
+ numpages = "4",
+ year = "2003",
+ month = sep,
+ doi = "10.1103/PhysRevLett.91.136101",
+ publisher = "American Physical Society",
+ notes = "dft calculations mbe sic growth",
+}
+
@Article{borders71,
author = "J. A. Borders and S. T. Picraux and W. Beezhold",
collaboration = "",
metastable",
}
+@Article{chaussende07,
+ author = "D. Chaussende and P. J. Wellmann and M. Pons",
+ title = "Status of Si{C} bulk growth processes",
+ journal = "Journal of Physics D: Applied Physics",
+ volume = "40",
+ number = "20",
+ pages = "6150",
+ URL = "http://stacks.iop.org/0022-3727/40/i=20/a=S02",
+ year = "2007",
+ notes = "review of sic single crystal growth methods, process
+ modelling",
+}
+
@Article{feynman39,
title = "Forces in Molecules",
author = "R. P. Feynman",
model, interface",
}
+@Article{kitabatake97,
+ author = "Makoto Kitabatake",
+ title = "Simulations and Experiments of 3{C}-Si{C}/Si
+ Heteroepitaxial Growth",
+ publisher = "WILEY-VCH Verlag",
+ year = "1997",
+ journal = "physica status solidi (b)",
+ volume = "202",
+ pages = "405--420",
+ URL = "http://dx.doi.org/10.1002/1521-3951(199707)202:1<405::AID-PSSB405>3.0.CO;2-5",
+ doi = "10.1002/1521-3951(199707)202:1<405::AID-PSSB405>3.0.CO;2-5",
+ notes = "3c-sic heteroepitaxial growth on si off-axis model",
+}
+
@Article{chirita97,
title = "Strain relaxation and thermal stability of the
3{C}-Si{C}(001)/Si(001) interface: {A} molecular
year = "1907",
author = "H. J. Round",
}
+
+@Article{vashishath08,
+ title = "Recent trends in silicon carbide device research",
+ journal = "Mj. Int. J. Sci. Tech.",
+ volume = "2",
+ number = "03",
+ pages = "444--470",
+ year = "2008",
+ author = "Munish Vashishath and Ashoke K. Chatterjee",
+ URL = "http://www.doaj.org/doaj?func=abstract&id=286746",
+ notes = "sic polytype electronic properties",
+}
+
+@Article{nelson69,
+ author = "W. E. Nelson and F. A. Halden and A. Rosengreen",
+ collaboration = "",
+ title = "Growth and Properties of beta-Si{C} Single Crystals",
+ publisher = "AIP",
+ year = "1966",
+ journal = "Journal of Applied Physics",
+ volume = "37",
+ number = "1",
+ pages = "333--336",
+ URL = "http://link.aip.org/link/?JAP/37/333/1",
+ doi = "10.1063/1.1707837",
+ notes = "sic melt growth",
+}
+
+@Article{arkel25,
+ author = "A. E. van Arkel and J. H. de Boer",
+ title = "Darstellung von reinem Titanium-, Zirkonium-, Hafnium-
+ und Thoriummetall",
+ publisher = "WILEY-VCH Verlag GmbH",
+ year = "1925",
+ journal = "Z. Anorg. Chem.",
+ volume = "148",
+ pages = "345--350",
+ URL = "http://dx.doi.org/10.1002/zaac.19251480133",
+ doi = "10.1002/zaac.19251480133",
+ notes = "van arkel apparatus",
+}
+
+@Article{moers31,
+ author = "K. Moers",
+ year = "1931",
+ journal = "Z. Anorg. Chem.",
+ volume = "198",
+ pages = "293",
+ notes = "sic by van arkel apparatus, pyrolitical vapor growth
+ process",
+}
+
+@Article{kendall53,
+ author = "J. T. Kendall",
+ title = "Electronic Conduction in Silicon Carbide",
+ publisher = "AIP",
+ year = "1953",
+ journal = "The Journal of Chemical Physics",
+ volume = "21",
+ number = "5",
+ pages = "821--827",
+ URL = "http://link.aip.org/link/?JCP/21/821/1",
+ notes = "sic by van arkel apparatus, pyrolitical vapor growth
+ process",
+}
+
+@Article{lely55,
+ author = "J. A. Lely",
+ year = "1955",
+ journal = "Ber. Deut. Keram. Ges.",
+ volume = "32",
+ pages = "229",
+ notes = "lely sublimation growth process",
+}
+
+@Article{knippenberg63,
+ author = "W. F. Knippenberg",
+ year = "1963",
+ journal = "Philips Res. Repts.",
+ volume = "18",
+ pages = "161",
+ notes = "acheson process",
+}
+
+@Article{hoffmann82,
+ author = "L. Hoffmann and G. Ziegler and D. Theis and C.
+ Weyrich",
+ collaboration = "",
+ title = "Silicon carbide blue light emitting diodes with
+ improved external quantum efficiency",
+ publisher = "AIP",
+ year = "1982",
+ journal = "Journal of Applied Physics",
+ volume = "53",
+ number = "10",
+ pages = "6962--6967",
+ keywords = "light emitting diodes; silicon carbides; quantum
+ efficiency; visible radiation; experimental data;
+ epitaxy; fabrication; medium temperature; layers;
+ aluminium; nitrogen; substrates; pn junctions;
+ electroluminescence; spectra; current density;
+ optimization",
+ URL = "http://link.aip.org/link/?JAP/53/6962/1",
+ doi = "10.1063/1.330041",
+ notes = "blue led, sublimation process",
+}
+
+@Article{neudeck95,
+ author = "Philip Neudeck",
+ affiliation = "NASA Lewis Research Center M.S. 77-1, 21000 Brookpark
+ Road 44135 Cleveland OH",
+ title = "Progress in silicon carbide semiconductor electronics
+ technology",
+ journal = "Journal of Electronic Materials",
+ publisher = "Springer Boston",
+ ISSN = "0361-5235",
+ keyword = "Chemistry and Materials Science",
+ pages = "283--288",
+ volume = "24",
+ issue = "4",
+ URL = "http://dx.doi.org/10.1007/BF02659688",
+ note = "10.1007/BF02659688",
+ year = "1995",
+ notes = "sic data, advantages of 3c sic",
+}
+
+@Article{bhatnagar93,
+ author = "M. Bhatnagar and B. J. Baliga",
+ journal = "Electron Devices, IEEE Transactions on",
+ title = "Comparison of 6{H}-Si{C}, 3{C}-Si{C}, and Si for power
+ devices",
+ year = "1993",
+ month = mar,
+ volume = "40",
+ number = "3",
+ pages = "645--655",
+ keywords = "3C-SiC;50 to 5000 V;6H-SiC;Schottky
+ rectifiers;Si;SiC;breakdown voltages;drift region
+ properties;output characteristics;power MOSFETs;power
+ semiconductor devices;switching characteristics;thermal
+ analysis;Schottky-barrier diodes;electric breakdown of
+ solids;insulated gate field effect transistors;power
+ transistors;semiconductor materials;silicon;silicon
+ compounds;solid-state rectifiers;thermal analysis;",
+ doi = "10.1109/16.199372",
+ ISSN = "0018-9383",
+ notes = "comparison 3c 6h sic and si devices",
+}
+
+@Article{neudeck94,
+ author = "P. G. Neudeck and D. J. Larkin and J. E. Starr and J.
+ A. Powell and C. S. Salupo and L. G. Matus",
+ journal = "Electron Devices, IEEE Transactions on",
+ title = "Electrical properties of epitaxial 3{C}- and
+ 6{H}-Si{C} p-n junction diodes produced side-by-side on
+ 6{H}-Si{C} substrates",
+ year = "1994",
+ month = may,
+ volume = "41",
+ number = "5",
+ pages = "826--835",
+ keywords = "20 nA;200 micron;300 to 1100 V;3C-SiC layers;400
+ C;6H-SiC layers;6H-SiC substrates;CVD
+ process;SiC;chemical vapor deposition;doping;electrical
+ properties;epitaxial layers;light
+ emission;low-tilt-angle 6H-SiC substrates;p-n junction
+ diodes;polytype;rectification characteristics;reverse
+ leakage current;reverse voltages;temperature;leakage
+ currents;power electronics;semiconductor
+ diodes;semiconductor epitaxial layers;semiconductor
+ growth;semiconductor materials;silicon
+ compounds;solid-state rectifiers;substrates;vapour
+ phase epitaxial growth;",
+ doi = "10.1109/16.285038",
+ ISSN = "0018-9383",
+ notes = "comparison 6h 3c sic, cvd of 3c and 6h on single 6h
+ substrate",
+}
+
+@Article{schulze98,
+ author = "N. Schulze and D. L. Barrett and G. Pensl",
+ collaboration = "",
+ title = "Near-equilibrium growth of micropipe-free 6{H}-Si{C}
+ single crystals by physical vapor transport",
+ publisher = "AIP",
+ year = "1998",
+ journal = "Applied Physics Letters",
+ volume = "72",
+ number = "13",
+ pages = "1632--1634",
+ keywords = "silicon compounds; semiconductor materials;
+ semiconductor growth; crystal growth from vapour;
+ photoluminescence; Hall mobility",
+ URL = "http://link.aip.org/link/?APL/72/1632/1",
+ doi = "10.1063/1.121136",
+ notes = "micropipe free 6h-sic pvt growth",
+}
+
+@Article{pirouz87,
+ author = "P. Pirouz and C. M. Chorey and J. A. Powell",
+ collaboration = "",
+ title = "Antiphase boundaries in epitaxially grown beta-Si{C}",
+ publisher = "AIP",
+ year = "1987",
+ journal = "Applied Physics Letters",
+ volume = "50",
+ number = "4",
+ pages = "221--223",
+ keywords = "SILICON CARBIDES; DOMAIN STRUCTURE; SCANNING ELECTRON
+ MICROSCOPY; NUCLEATION; EPITAXIAL LAYERS; CHEMICAL
+ VAPOR DEPOSITION; ETCHING; ETCH PITS; TRANSMISSION
+ ELECTRON MICROSCOPY; ELECTRON MICROSCOPY; ANTIPHASE
+ BOUNDARIES",
+ URL = "http://link.aip.org/link/?APL/50/221/1",
+ doi = "10.1063/1.97667",
+ notes = "apb 3c-sic heteroepitaxy on si",
+}
+
+@Article{shibahara86,
+ title = "Surface morphology of cubic Si{C}(100) grown on
+ Si(100) by chemical vapor deposition",
+ journal = "Journal of Crystal Growth",
+ volume = "78",
+ number = "3",
+ pages = "538--544",
+ year = "1986",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(86)90158-2",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46D26F7-1R/2/cfdbc7607352f3bc99d321303e3934e9",
+ author = "Kentaro Shibahara and Shigehiro Nishino and Hiroyuki
+ Matsunami",
+ notes = "defects in 3c-sis cvd on si, anti phase boundaries",
+}
+
+@Article{desjardins96,
+ author = "P. Desjardins and J. E. Greene",
+ collaboration = "",
+ title = "Step-flow epitaxial growth on two-domain surfaces",
+ publisher = "AIP",
+ year = "1996",
+ journal = "Journal of Applied Physics",
+ volume = "79",
+ number = "3",
+ pages = "1423--1434",
+ keywords = "ADATOMS; COMPUTERIZED SIMULATION; DIFFUSION; EPITAXY;
+ FILM GROWTH; SURFACE STRUCTURE",
+ URL = "http://link.aip.org/link/?JAP/79/1423/1",
+ doi = "10.1063/1.360980",
+ notes = "apb model",
+}
+
+@Article{henke95,
+ author = "S. Henke and B. Stritzker and B. Rauschenbach",
+ collaboration = "",
+ title = "Synthesis of epitaxial beta-Si{C} by {C}[sub 60]
+ carbonization of silicon",
+ publisher = "AIP",
+ year = "1995",
+ journal = "Journal of Applied Physics",
+ volume = "78",
+ number = "3",
+ pages = "2070--2073",
+ keywords = "SILICON CARBIDES; THIN FILMS; EPITAXY; CARBONIZATION;
+ FULLERENES; ANNEALING; XRD; RBS; TWINNING; CRYSTAL
+ STRUCTURE",
+ URL = "http://link.aip.org/link/?JAP/78/2070/1",
+ doi = "10.1063/1.360184",
+ notes = "ssmbe of sic on si, lower temperatures",
+}
+
+@Article{fuyuki89,
+ title = "Atomic layer epitaxy of cubic Si{C} by gas source
+ {MBE} using surface superstructure",
+ journal = "Journal of Crystal Growth",
+ volume = "95",
+ number = "1-4",
+ pages = "461--463",
+ year = "1989",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(89)90442-9",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46DFS6F-GF/2/a8e0abaef892c6d96992ff4751fdeda2",
+ author = "Takashi Fuyuki and Michiaki Nakayama and Tatsuo
+ Yoshinobu and Hiromu Shiomi and Hiroyuki Matsunami",
+ notes = "gas source mbe of 3c-sic on 6h-sic",
+}
+
+@Article{yoshinobu92,
+ author = "Tatsuo Yoshinobu and Hideaki Mitsui and Iwao Izumikawa
+ and Takashi Fuyuki and Hiroyuki Matsunami",
+ collaboration = "",
+ title = "Lattice-matched epitaxial growth of single crystalline
+ 3{C}-Si{C} on 6{H}-Si{C} substrates by gas source
+ molecular beam epitaxy",
+ publisher = "AIP",
+ year = "1992",
+ journal = "Applied Physics Letters",
+ volume = "60",
+ number = "7",
+ pages = "824--826",
+ keywords = "SILICON CARBIDES; HOMOJUNCTIONS; MOLECULAR BEAM
+ EPITAXY; TWINNING; RHEED; TEMPERATURE EFFECTS;
+ INTERFACE STRUCTURE",
+ URL = "http://link.aip.org/link/?APL/60/824/1",
+ doi = "10.1063/1.107430",
+ notes = "gas source mbe of 3c-sic on 6h-sic",
+}
+
+@Article{yoshinobu90,
+ title = "Atomic level control in gas source {MBE} growth of
+ cubic Si{C}",
+ journal = "Journal of Crystal Growth",
+ volume = "99",
+ number = "1-4",
+ pages = "520--524",
+ year = "1990",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(90)90575-6",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46YKT9W-HY/2/04dd57af2f42ee620895844e480a2736",
+ author = "Tatsuo Yoshinobu and Michiaki Nakayama and Hiromu
+ Shiomi and Takashi Fuyuki and Hiroyuki Matsunami",
+ notes = "gas source mbe of 3c-sic on 3c-sic",
+}
+
+@Article{fuyuki93,
+ title = "Atomic layer epitaxy controlled by surface
+ superstructures in Si{C}",
+ journal = "Thin Solid Films",
+ volume = "225",
+ number = "1-2",
+ pages = "225--229",
+ year = "1993",
+ note = "",
+ ISSN = "0040-6090",
+ doi = "DOI: 10.1016/0040-6090(93)90159-M",
+ URL = "http://www.sciencedirect.com/science/article/B6TW0-46NY79X-40/2/c9675e1d8c4bcebc7ce7d06e44e14f1f",
+ author = "Takashi Fuyuki and Tatsuo Yoshinobu and Hiroyuki
+ Matsunami",
+ notes = "gas source mbe of 3c-sic on 3c-sic, atomic layer
+ epitaxy, ale",
+}
+
+@Article{hara93,
+ title = "Microscopic mechanisms of accurate layer-by-layer
+ growth of [beta]-Si{C}",
+ journal = "Thin Solid Films",
+ volume = "225",
+ number = "1-2",
+ pages = "240--243",
+ year = "1993",
+ note = "",
+ ISSN = "0040-6090",
+ doi = "DOI: 10.1016/0040-6090(93)90162-I",
+ URL = "http://www.sciencedirect.com/science/article/B6TW0-46NY79X-43/2/18694bfe0e75b1f29a3cf5f90d19987c",
+ author = "Shiro Hara and T. Meguro and Y. Aoyagi and M. Kawai
+ and S. Misawa and E. Sakuma and S. Yoshida",
+ notes = "gas source mbe of 3c-sic on 3c-sic, atomic layer
+ epitaxy, ale",
+}
+
+@Article{tanaka94,
+ author = "Satoru Tanaka and R. Scott Kern and Robert F. Davis",
+ collaboration = "",
+ title = "Effects of gas flow ratio on silicon carbide thin film
+ growth mode and polytype formation during gas-source
+ molecular beam epitaxy",
+ publisher = "AIP",
+ year = "1994",
+ journal = "Applied Physics Letters",
+ volume = "65",
+ number = "22",
+ pages = "2851--2853",
+ keywords = "SILICON CARBIDES; MOLECULAR BEAM EPITAXY; RHEED;
+ TRANSMISSION ELECTRON MICROSCOPY; MORPHOLOGY;
+ NUCLEATION; COALESCENCE; SURFACE RECONSTRUCTION; GAS
+ FLOW; FLOW RATE",
+ URL = "http://link.aip.org/link/?APL/65/2851/1",
+ doi = "10.1063/1.112513",
+ notes = "gas source mbe of 6h-sic on 6h-sic",
+}
+
+@Article{fuyuki97,
+ author = "T. Fuyuki and T. Hatayama and H. Matsunami",
+ title = "Heterointerface Control and Epitaxial Growth of
+ 3{C}-Si{C} on Si by Gas Source Molecular Beam Epitaxy",
+ publisher = "WILEY-VCH Verlag",
+ year = "1997",
+ journal = "physica status solidi (b)",
+ volume = "202",
+ pages = "359--378",
+ notes = "3c-sic heteroepitaxial growth on si by gsmbe, lower
+ temperatures 750",
+}
+
+@Article{takaoka98,
+ title = "Initial stage of Si{C} growth on Si(1 0 0) surface",
+ journal = "Journal of Crystal Growth",
+ volume = "183",
+ number = "1-2",
+ pages = "175--182",
+ year = "1998",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/S0022-0248(97)00391-6",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-3W8STD4-V/2/8de695de037d5e20b8326c4107547918",
+ author = "T. Takaoka and H. Saito and Y. Igari and I. Kusunoki",
+ keywords = "Reflection high-energy electron diffraction (RHEED)",
+ keywords = "Scanning electron microscopy (SEM)",
+ keywords = "Silicon carbide",
+ keywords = "Silicon",
+ keywords = "Island growth",
+ notes = "lower temperature, 550-700",
+}
+
+@Article{hatayama95,
+ title = "Low-temperature heteroepitaxial growth of cubic Si{C}
+ on Si using hydrocarbon radicals by gas source
+ molecular beam epitaxy",
+ journal = "Journal of Crystal Growth",
+ volume = "150",
+ number = "Part 2",
+ pages = "934--938",
+ year = "1995",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(95)80077-P",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-47RY2F6-1P/2/49acd5c4545dd9fd3486f70a6c25586e",
+ author = "Tomoaki Hatayama and Yoichiro Tarui and Takashi Fuyuki
+ and Hiroyuki Matsunami",
+}