After the initial configuration is constructed, some of the atoms located at the 3C-SiC/c-Si interface show small distances, which results in high repulsive forces acting on the atoms.
Thus, the system is equilibrated using strong coupling to the heat bath, which is set to be \unit[20]{$^{\circ}$C}.
After the initial configuration is constructed, some of the atoms located at the 3C-SiC/c-Si interface show small distances, which results in high repulsive forces acting on the atoms.
Thus, the system is equilibrated using strong coupling to the heat bath, which is set to be \unit[20]{$^{\circ}$C}.