X-Git-Url: https://hackdaworld.org/gitweb/?a=blobdiff_plain;f=bibdb%2Fbibdb.bib;h=92eba98adbb6cdf810181bcbd81153a9e3a40f0b;hb=0127fc6e8906f9b16769fa067f65bc309e37d70a;hp=0f1d404ab79f8982ff65b6fd8304631f0267ffc2;hpb=67f277f9e3fe7dea7f9158e4d776749c1571c5c1;p=lectures%2Flatex.git diff --git a/bibdb/bibdb.bib b/bibdb/bibdb.bib index 0f1d404..92eba98 100644 --- a/bibdb/bibdb.bib +++ b/bibdb/bibdb.bib @@ -133,6 +133,17 @@ } @Article{capano97, + author = "M. A. Capano and R. J. Trew", + title = "Silicon carbide electronic materials and devices", + journal = "MRS Bull.", + year = "1997", + volume = "22", + number = "3", + pages = "19--22", + publisher = "MATERIALS RESEARCH SOCIETY", +} + +@Article{capano97_old, author = "M. A. Capano and R. J. Trew", title = "Silicon Carbide Electronic Materials and Devices", journal = "MRS Bull.", @@ -1524,15 +1535,21 @@ } @Article{zirkelbach11, - title = "Combined ab initio and classical potential simulation - study on silicon carbide precipitation", - journal = "accepted for publication in Phys. Rev. B", - volume = "", - number = "", - pages = "", - year = "2011", + journal = "Phys. Rev. B", + month = aug, + URL = "http://link.aps.org/doi/10.1103/PhysRevB.84.064126", + publisher = "American Physical Society", author = "F. Zirkelbach and B. Stritzker and K. Nordlund and J. K. N. Lindner and W. G. Schmidt and E. Rauls", + title = "Combined \textit{ab initio} and classical potential + simulation study on silicon carbide precipitation in + silicon", + year = "2011", + pages = "064126", + numpages = "18", + volume = "84", + doi = "10.1103/PhysRevB.84.064126", + issue = "6", abstract = "Atomistic simulations on the silicon carbide precipitation in bulk silicon employing both, classical potential and first-principles methods are presented. @@ -1588,7 +1605,6 @@ year = "1994", doi = "10.1557/PROC-354-171", URL = "http://dx.doi.org/10.1557/PROC-354-171", - eprint = "http://journals.cambridge.org/article_S1946427400420853", notes = "first time ibs at moderate temperatures", } @@ -1721,6 +1737,22 @@ notes = "c int diffusion barrier", } +@Article{haeberlen10, + title = "Structural characterization of cubic and hexagonal + Ga{N} thin films grown by {IBA}-{MBE} on Si{C}/Si", + journal = "Journal of Crystal Growth", + volume = "312", + number = "6", + pages = "762--769", + year = "2010", + note = "", + ISSN = "0022-0248", + doi = "10.1016/j.jcrysgro.2009.12.048", + URL = "http://www.sciencedirect.com/science/article/pii/S0022024809011452", + author = "M. H{\"a}berlen and J. W. Gerlach and B. Murphy and J. + K. N. Lindner and B. Stritzker", +} + @Article{ito04, title = "Ion beam synthesis of 3{C}-Si{C} layers in Si and its application in buffer layer for Ga{N} epitaxial @@ -2209,6 +2241,22 @@ notes = "cvd of 3c-sic on si, sic buffer layer", } +@Article{nagasawa06, + author = "H. Nagasawa and K. Yagi and T. Kawahara and N. Hatta", + title = "Reducing Planar Defects in 3{C}¿Si{C}", + journal = "Chemical Vapor Deposition", + volume = "12", + number = "8-9", + publisher = "WILEY-VCH Verlag", + ISSN = "1521-3862", + URL = "http://dx.doi.org/10.1002/cvde.200506466", + doi = "10.1002/cvde.200506466", + pages = "502--508", + keywords = "Defect structures, Epitaxy, Silicon carbide", + year = "2006", + notes = "cvd on si", +} + @Article{nishino87, author = "Shigehiro Nishino and Hajime Suhara and Hideyuki Ono and Hiroyuki Matsunami", @@ -3433,7 +3481,7 @@ } @Article{parcas_md, - title = "{PARCAS} molecular dynamics code", + journal = "{PARCAS} molecular dynamics code", author = "K. Nordlund", year = "2008", } @@ -3995,7 +4043,6 @@ title = "The Fitting of Pseudopotentials to Experimental Data and Their Subsequent Application", editor = "Frederick Seitz Henry Ehrenreich and David Turnbull", - booktitle = "", publisher = "Academic Press", year = "1970", volume = "24", @@ -4610,7 +4657,7 @@ Road 44135 Cleveland OH", title = "Progress in silicon carbide semiconductor electronics technology", - journal = "Journal of Electronic Materials", + journal = "J. Electron. Mater.", publisher = "Springer Boston", ISSN = "0361-5235", keyword = "Chemistry and Materials Science", @@ -4623,6 +4670,57 @@ notes = "sic data, advantages of 3c sic", } +@InProceedings{pribble02, + author = "W. L. Pribble and J. W. Palmour and S. T. Sheppard and + R. P. Smith and S. T. Allen and T. J. Smith and Z. Ring + and J. J. Sumakeris and A. W. Saxler and J. W. + Milligan", + booktitle = "Microwave Symposium Digest, 2002 IEEE MTT-S + International", + title = "Applications of Si{C} {MESFET}s and Ga{N} {HEMT}s in + power amplifier design", + year = "2002", + month = "", + volume = "", + number = "", + pages = "1819--1822", + doi = "10.1109/MWSYM.2002.1012216", + ISSN = "", + notes = "hdtv", +} + +@InProceedings{temcamani01, + author = "F. Temcamani and P. Pouvil and O. Noblanc and C. + Brylinski and P. Bannelier and B. Darges and J. P. + Prigent", + booktitle = "Microwave Symposium Digest, 2001 IEEE MTT-S + International", + title = "Silicon carbide {MESFET}s performances and application + in broadcast power amplifiers", + year = "2001", + month = "", + volume = "", + number = "", + pages = "641--644", + doi = "10.1109/MWSYM.2001.966976", + ISSN = "", + notes = "hdtv", +} + +@Article{pensl00, + author = "Gerhard Pensl and Michael Bassler and Florin Ciobanu + and Valeri Afanas'ev and Hiroshi Yano and Tsunenobu + Kimoto and Hiroyuki Matsunami", + title = "Traps at the Si{C}/Si{O2}-Interface", + journal = "MRS Proc.", + volume = "640", + number = "", + pages = "", + year = "2000", + doi = "10.1557/PROC-640-H3.2", + URL = "http://dx.doi.org/10.1557/PROC-640-H3.2", +} + @Article{bhatnagar93, author = "M. Bhatnagar and B. J. Baliga", journal = "Electron Devices, IEEE Transactions on", @@ -5128,3 +5226,45 @@ year = "1994", publisher = "Suhrkamp", } + +@Misc{attenberger03, + author = "Wilfried Attenberger and Jörg Lindner and Bernd + Stritzker", + title = "A {method} {for} {forming} {a} {layered} + {semiconductor} {structure} {and} {corresponding} + {structure}", + year = "2003", + month = apr, + day = "24", + note = "WO 2003/034484 A3R4", + version = "A3R4", + howpublished = "Patent Application", + nationality = "WO", + filing_num = "EP0211423", + yearfiled = "2002", + monthfiled = "10", + dayfiled = "11", + pat_refs = "", + ipc_class = "7B 81C 1/00 B; 7H 01L 21/04 B; 7H 01L 21/265 B; 7H 01L + 21/322 B; 7H 01L 21/324 B; 7H 01L 21/74 A; 7H 01L + 21/762 B; 7H 01L 29/165 B; 7H 01L 33/00 B", + us_class = "", + abstract = "The following invention provides a method for forming + a layered semiconductor structure having a layer (5) of + a first semiconductor material on a substrate (1; 1') + of at least one second semiconductor material, + comprising the steps of: providing said substrate (1; + 1'); burying said layer (5) of said first semiconductor + material in said substrate (1; 1'), said buried layer + (5) having an upper surface (105) and a lower surface + (105) and dividing said substrate (1; 1') into an upper + part (1a) and a lower part (1b; 1b', 1c); creating a + buried damage layer (10; 10'; 10'', 100'') which at + least partly adjoins and/or at least partly includes + said upper surface (105) of said buried layer (5); and + removing said upper part (1a) of said substrate (1; 1') + and said buried damage layer (10; 10'; 10'', 100'') for + exposing said buried layer (5). The invention also + provides a corresponding layered semiconductor + structure.", +}