X-Git-Url: https://hackdaworld.org/gitweb/?a=blobdiff_plain;f=bibdb%2Fbibdb.bib;h=df700f14906679d1f1b72835a60ff450e56cbfad;hb=d57ca885a977e235d7603be3520e88dc315de264;hp=7e985e19f3121c5ae7ffcee5b51e77447c1a38d5;hpb=1ce657a7616d6ea2d08abf66696988bae2d568ce;p=lectures%2Flatex.git diff --git a/bibdb/bibdb.bib b/bibdb/bibdb.bib index 7e985e1..df700f1 100644 --- a/bibdb/bibdb.bib +++ b/bibdb/bibdb.bib @@ -68,7 +68,7 @@ author = "G. R. Fisher and P. Barnes", title = "Towards a unified view of polytypism in silicon carbide", - journal = "Philosophical Magazine Part B", + journal = "Philos. Mag. B", volume = "61", pages = "217--236", year = "1990", @@ -82,7 +82,7 @@ title = "Synthesis of nano-sized Si{C} precipitates in Si by simultaneous dual-beam implantation of {C}+ and Si+ ions", - journal = "Applied Physics A: Materials Science \& Processing", + journal = "Appl. Phys. A: Mater. Sci. Process.", volume = "76", pages = "827--835", month = mar, @@ -218,7 +218,7 @@ title = "Molecular dynamics with coupling to an external bath", publisher = "AIP", year = "1984", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "81", number = "8", pages = "3684--3690", @@ -235,8 +235,7 @@ title = "Molecular dynamics determination of defect energetics in beta -Si{C} using three representative empirical potentials", - journal = "Modelling and Simulation in Materials Science and - Engineering", + journal = "Modell. Simul. Mater. Sci. Eng.", volume = "3", number = "5", pages = "615--627", @@ -318,8 +317,7 @@ @Article{devanathan98, title = "Computer simulation of a 10 ke{V} Si displacement cascade in Si{C}", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "141", number = "1-4", pages = "118--122", @@ -334,7 +332,7 @@ @Article{devanathan98_2, title = "Displacement threshold energies in [beta]-Si{C}", - journal = "Journal of Nuclear Materials", + journal = "J. Nucl. Mater.", volume = "253", number = "1-3", pages = "47--52", @@ -386,7 +384,7 @@ presence of carbon and boron", publisher = "AIP", year = "1998", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "84", number = "4", pages = "1963--1967", @@ -495,6 +493,41 @@ silicon", } +@Article{sahli05, + title = "Ab initio molecular dynamics simulation of + self-interstitial diffusion in silicon", + author = "Beat Sahli and Wolfgang Fichtner", + journal = "Phys. Rev. B", + volume = "72", + number = "24", + pages = "245210", + numpages = "6", + year = "2005", + month = dec, + doi = "10.1103/PhysRevB.72.245210", + publisher = "American Physical Society", + notes = "si self int, diffusion, barrier height, voronoi + mapping applied", +} + +@Article{hobler05, + title = "Ab initio calculations of the interaction between + native point defects in silicon", + journal = "Mater. Sci. Eng., B", + volume = "124-125", + number = "", + pages = "368--371", + year = "2005", + note = "EMRS 2005, Symposium D - Materials Science and Device + Issues for Future Technologies", + ISSN = "0921-5107", + doi = "DOI: 10.1016/j.mseb.2005.08.072", + URL = "http://www.sciencedirect.com/science/article/B6TXF-4H6PKRB-3/2/e217bd3d7ee1fffee899eeb4a2f133a4", + author = "G. Hobler and G. Kresse", + notes = "vasp intrinsic si defect interaction study, capture + radius", +} + @Article{ma10, title = "Ab initio study of self-diffusion in silicon over a wide temperature range: Point defect states and @@ -565,11 +598,10 @@ @Article{gao02, title = "Empirical potential approach for defect properties in 3{C}-Si{C}", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "191", number = "1-4", - pages = "504--508", + pages = "487--496", year = "2002", note = "", ISSN = "0168-583X", @@ -608,7 +640,7 @@ in cubic silicon carbide", publisher = "AIP", year = "2007", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "90", number = "22", eid = "221915", @@ -687,7 +719,44 @@ month = oct, doi = "10.1103/PhysRevB.58.9845", publisher = "American Physical Society", - notes = "carbon pairs in si", + notes = "c_i c_s pair configuration, theoretical results", +} + +@Article{song90_2, + title = "Bistable interstitial-carbon--substitutional-carbon + pair in silicon", + author = "L. W. Song and X. D. Zhan and B. W. Benson and G. D. + Watkins", + journal = "Phys. Rev. B", + volume = "42", + number = "9", + pages = "5765--5783", + numpages = "18", + year = "1990", + month = sep, + doi = "10.1103/PhysRevB.42.5765", + publisher = "American Physical Society", + notes = "c_i c_s pair configuration, experimental results", +} + +@Article{liu02, + author = "Chun-Li Liu and Wolfgang Windl and Len Borucki and + Shifeng Lu and Xiang-Yang Liu", + collaboration = "", + title = "Ab initio modeling and experimental study of {C}--{B} + interactions in Si", + publisher = "AIP", + year = "2002", + journal = "Appl. Phys. Lett.", + volume = "80", + number = "1", + pages = "52--54", + keywords = "silicon; boron; carbon; elemental semiconductors; + impurity-defect interactions; ab initio calculations; + secondary ion mass spectra; diffusion; interstitials", + URL = "http://link.aip.org/link/?APL/80/52/1", + doi = "10.1063/1.1430505", + notes = "c-c 100 split, lower as a and b states of capaz", } @Article{dal_pino93, @@ -826,7 +895,7 @@ author = "A K Tipping and R C Newman", title = "The diffusion coefficient of interstitial carbon in silicon", - journal = "Semiconductor Science and Technology", + journal = "Semicond. Sci. Technol.", volume = "2", number = "5", pages = "315--317", @@ -852,7 +921,7 @@ @Article{laveant2002, title = "Epitaxy of carbon-rich silicon with {MBE}", - journal = "Materials Science and Engineering B", + journal = "Mater. Sci. Eng., B", volume = "89", number = "1-3", pages = "241--245", @@ -873,7 +942,7 @@ silicon by transmission electron microscopy", publisher = "AIP", year = "1997", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "70", number = "2", pages = "252--254", @@ -899,25 +968,31 @@ volume = "", number = "", pages = "675--678", - keywords = "beta;-SiC precipitates;30 s;700 to 1300 C;C - atom/radiation induced defect interaction;C depth - distribution;C precipitation;C-Si defects;C-Si - dimers;CZ Si;HREM;Si:C;TEM;buried layer morphology;high - energy ion implantation;ion implantation;metastable - agglomerates;microdefects;positron annihilation - spectroscopy;rapid thermal annealing;secondary ion mass - spectrometry;vacancy clusters;buried - layers;carbon;elemental semiconductors;impurity-defect - interactions;ion implantation;positron - annihilation;precipitation;rapid thermal - annealing;secondary ion mass - spectra;silicon;transmission electron - microscopy;vacancies (crystal);", doi = "10.1109/IIT.1996.586497", ISSN = "", notes = "c-si agglomerates dumbbells", } +@Article{werner98, + author = "P. Werner and U. G{\"{o}}sele and H.-J. Gossmann and + D. C. Jacobson", + collaboration = "", + title = "Carbon diffusion in silicon", + publisher = "AIP", + year = "1998", + journal = "Appl. Phys. Lett.", + volume = "73", + number = "17", + pages = "2465--2467", + keywords = "silicon; carbon; elemental semiconductors; diffusion; + secondary ion mass spectra; semiconductor epitaxial + layers; annealing; impurity-defect interactions; + impurity distribution", + URL = "http://link.aip.org/link/?APL/73/2465/1", + doi = "10.1063/1.122483", + notes = "c diffusion in si, kick out mechnism", +} + @Article{strane94, author = "J. W. Strane and H. J. Stein and S. R. Lee and S. T. Picraux and J. K. Watanabe and J. W. Mayer", @@ -926,7 +1001,7 @@ y]{C}[sub y]/Si heterostructures", publisher = "AIP", year = "1994", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "76", number = "6", pages = "3656--3668", @@ -947,7 +1022,7 @@ strained Si[sub 1 - y]{C}[sub y] /Si heterostructures", publisher = "AIP", year = "1995", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "77", number = "5", pages = "1934--1937", @@ -1026,12 +1101,70 @@ NETHERLANDS", } +@Article{zirkelbach09, + title = "Molecular dynamics simulation of defect formation and + precipitation in heavily carbon doped silicon", + journal = "Mater. Sci. Eng., B", + volume = "159-160", + number = "", + pages = "149--152", + year = "2009", + note = "EMRS 2008 Spring Conference Symposium K: Advanced + Silicon Materials Research for Electronic and + Photovoltaic Applications", + ISSN = "0921-5107", + doi = "DOI: 10.1016/j.mseb.2008.10.010", + URL = "http://www.sciencedirect.com/science/article/B6TXF-4TX1547-2/2/cb9f4921f324735087020ccce7843e39", + author = "F. Zirkelbach and J. K. N. Lindner and K. Nordlund and + B. Stritzker", + keywords = "Silicon", + keywords = "Carbon", + keywords = "Silicon carbide", + keywords = "Nucleation", + keywords = "Defect formation", + keywords = "Molecular dynamics simulations", +} + +@Article{zirkelbach10a, + title = "Defects in carbon implanted silicon calculated by + classical potentials and first-principles methods", + journal = "Phys. Rev. B", + volume = "82", + number = "9", + pages = "066033", + year = "2010", + author = "F. Zirkelbach and B. Stritzker and K. Nordlund and J. + K. N. Lindner and W. G. Schmidt and E. Rauls", +} + +@Article{zirkelbach10b, + title = "First principles study of defects in carbon implanted + silicon", + journal = "to be published", + volume = "", + number = "", + pages = "", + year = "2010", + author = "F. Zirkelbach and B. Stritzker and K. Nordlund and J. + K. N. Lindner and W. G. Schmidt and E. Rauls", +} + +@Article{zirkelbach10c, + title = "...", + journal = "to be published", + volume = "", + number = "", + pages = "", + year = "2010", + author = "F. Zirkelbach and B. Stritzker and K. Nordlund and J. + K. N. Lindner and W. G. Schmidt and E. Rauls", +} + @Article{lindner99, title = "Controlling the density distribution of Si{C} nanocrystals for the ion beam synthesis of buried Si{C} layers in silicon", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "147", number = "1-4", pages = "249--255", @@ -1047,8 +1180,7 @@ @Article{lindner99_2, title = "Mechanisms in the ion beam synthesis of Si{C} layers in silicon", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "148", number = "1-4", pages = "528--533", @@ -1063,8 +1195,7 @@ @Article{lindner01, title = "Ion beam synthesis of buried Si{C} layers in silicon: Basic physical processes", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "178", number = "1-4", pages = "44--54", @@ -1088,6 +1219,25 @@ notes = "ibs, burried sic layers", } +@Article{lindner06, + title = "On the balance between ion beam induced nanoparticle + formation and displacive precipitate resolution in the + {C}-Si system", + journal = "Mater. Sci. Eng., C", + volume = "26", + number = "5-7", + pages = "857--861", + year = "2006", + note = "Current Trends in Nanoscience - from Materials to + Applications", + ISSN = "0928-4931", + doi = "DOI: 10.1016/j.msec.2005.09.099", + URL = "http://www.sciencedirect.com/science/article/B6TXG-4HSXVVM-1/2/5b0e351198cc2e8f5f4446a80a73d04a", + author = "J. K. N. Lindner and M. H{\"a}berlen and G. Thorwarth + and B. Stritzker", + notes = "c int diffusion barrier", +} + @Article{ito04, title = "Ion beam synthesis of 3{C}-Si{C} layers in Si and its application in buffer layer for Ga{N} epitaxial @@ -1111,7 +1261,7 @@ title = "Phase Transition for a Hard Sphere System", publisher = "AIP", year = "1957", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "27", number = "5", pages = "1208--1209", @@ -1124,7 +1274,7 @@ title = "Studies in Molecular Dynamics. {I}. General Method", publisher = "AIP", year = "1959", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "31", number = "2", pages = "459--466", @@ -1237,8 +1387,7 @@ @Article{wesch96, title = "Silicon carbide: synthesis and processing", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "116", number = "1-4", pages = "305--321", @@ -1258,7 +1407,7 @@ ZnSe-based semiconductor device technologies", publisher = "AIP", year = "1994", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "76", number = "3", pages = "1363--1398", @@ -1372,7 +1521,7 @@ @Article{tairov78, title = "Investigation of growth processes of ingots of silicon carbide single crystals", - journal = "Journal of Crystal Growth", + journal = "J. Cryst. Growth", volume = "43", number = "2", pages = "209--212", @@ -1392,7 +1541,7 @@ cubic Si{C} for semiconductor devices", publisher = "AIP", year = "1983", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "42", number = "5", pages = "460--462", @@ -1411,7 +1560,7 @@ Si{C} on silicon", publisher = "AIP", year = "1987", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "61", number = "10", pages = "4889--4893", @@ -1446,7 +1595,7 @@ epitaxy", publisher = "AIP", year = "1993", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "73", number = "2", pages = "726--732", @@ -1467,7 +1616,7 @@ 6{H}-Si{C} substrates", publisher = "AIP", year = "1990", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "56", number = "14", pages = "1353--1355", @@ -1489,7 +1638,7 @@ silacyclobutane", publisher = "AIP", year = "1995", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "78", number = "2", pages = "1271--1273", @@ -1505,7 +1654,7 @@ title = "Epitaxial growth of Si{C} thin films on Si-stabilized [alpha]-Si{C}(0001) at low temperatures by solid-source molecular beam epitaxy", - journal = "Journal of Crystal Growth", + journal = "J. Cryst. Growth", volume = "154", number = "1-2", pages = "72--80", @@ -1525,7 +1674,7 @@ 6{H}--Si{C} by solid-source molecular beam epitaxy", publisher = "AIP", year = "1995", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "66", number = "23", pages = "3182--3184", @@ -1543,7 +1692,7 @@ {IMPLANTATION}", publisher = "AIP", year = "1971", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "18", number = "11", pages = "509--511", @@ -1561,7 +1710,7 @@ beam synthesis and incoherent lamp annealing", publisher = "AIP", year = "1987", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "51", number = "26", pages = "2242--2244", @@ -1578,7 +1727,7 @@ title = "Solubility of Carbon in Silicon and Germanium", publisher = "AIP", year = "1959", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "30", number = "6", pages = "1551--1555", @@ -1595,7 +1744,7 @@ {B} in silicon", publisher = "AIP", year = "1996", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "68", number = "8", pages = "1150--1152", @@ -1610,8 +1759,7 @@ @Article{stolk95, title = "Implantation and transient boron diffusion: the role of the silicon self-interstitial", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "96", number = "1-2", pages = "187--195", @@ -1635,7 +1783,7 @@ diffusion in ion-implanted silicon", publisher = "AIP", year = "1997", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "81", number = "9", pages = "6031--6050", @@ -1651,7 +1799,7 @@ of Si[sub 1 - y]{C}[sub y] random alloy layers", publisher = "AIP", year = "1994", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "64", number = "3", pages = "324--326", @@ -1671,7 +1819,7 @@ - x - y]Ge[sub x]{C}[sub y]", publisher = "AIP", year = "1991", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "70", number = "4", pages = "2470--2472", @@ -1704,7 +1852,7 @@ molecular beam epitaxy", publisher = "AIP", year = "1999", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "74", number = "6", pages = "836--838", @@ -1769,7 +1917,7 @@ title = "Electron Transport Model for Strained Silicon-Carbon Alloy", author = "Shu-Tong Chang and Chung-Yi Lin", - journal = "Japanese Journal of Applied Physics", + journal = "Japanese J. Appl. Phys.", volume = "44", number = "4B", pages = "2257--2262", @@ -1789,7 +1937,7 @@ Si(001)", publisher = "AIP", year = "1997", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "82", number = "10", pages = "4977--4981", @@ -1843,7 +1991,7 @@ potential energy surfaces", publisher = "AIP", year = "2009", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "130", number = "11", eid = "114711", @@ -1864,7 +2012,7 @@ molecular dynamics method", publisher = "AIP", year = "1981", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "52", number = "12", pages = "7182--7190", @@ -1989,7 +2137,7 @@ simulation of infrequent events", publisher = "AIP", year = "1997", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "106", number = "11", pages = "4665--4677", @@ -2010,7 +2158,7 @@ infrequent events", publisher = "AIP", year = "2000", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "112", number = "21", pages = "9599--9606", @@ -2044,7 +2192,7 @@ simulation", publisher = "AIP", year = "1999", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "110", number = "19", pages = "9401--9410", @@ -2063,7 +2211,7 @@ to the production of amorphous silicon", publisher = "AIP", year = "2005", - journal = "The Journal of Chemical Physics", + journal = "J. Chem. Phys.", volume = "122", number = "15", eid = "154509", @@ -2084,7 +2232,7 @@ difficult?", publisher = "AIP", year = "1993", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "62", number = "25", pages = "3336--3338", @@ -2098,7 +2246,7 @@ @Article{chaussende08, title = "Prospects for 3{C}-Si{C} bulk crystal growth", - journal = "Journal of Crystal Growth", + journal = "J. Cryst. Growth", volume = "310", number = "5", pages = "976--981", @@ -2175,7 +2323,7 @@ 3{C}-Si{C}/Si (001) interface", publisher = "AIP", year = "2009", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "106", number = "7", eid = "073522", @@ -2199,7 +2347,7 @@ growth on Si(001) surface", publisher = "AIP", year = "1993", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "74", number = "7", pages = "4438--4445", @@ -2310,7 +2458,7 @@ synchrotron x-ray diffraction", publisher = "AIP", year = "1999", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "86", number = "8", pages = "4184--4187", @@ -2331,7 +2479,7 @@ carbon ion implantation", publisher = "AIP", year = "2002", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "91", number = "3", pages = "1287--1292", @@ -2350,7 +2498,7 @@ silicon carbide: calculation of bulk properties, high-pressure phases, point and extended defects, and amorphous structures", - journal = "Journal of Physics: Condensed Matter", + journal = "J. Phys.: Condens. Matter", volume = "22", number = "3", pages = "035802", @@ -2364,7 +2512,7 @@ Beauchamp", title = "Comparison between classical potentials and ab initio methods for silicon under large shear", - journal = "Journal of Physics: Condensed Matter", + journal = "J. Phys.: Condens. Matter", volume = "15", number = "41", pages = "6943", @@ -2378,7 +2526,7 @@ title = "Verification of Tersoff's Potential for Static Structural Analysis of Solids of Group-{IV} Elements", author = "Koji Moriguchi and Akira Shintani", - journal = "Japanese Journal of Applied Physics", + journal = "Japanese J. Appl. Phys.", volume = "37", number = "Part 1, No. 2", pages = "414--422", @@ -2427,8 +2575,7 @@ @Article{nordlund97, title = "Repulsive interatomic potentials calculated using Hartree-Fock and density-functional theory methods", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "132", number = "1", pages = "45--54", @@ -2445,7 +2592,7 @@ title = "Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set", - journal = "Computational Materials Science", + journal = "Comput. Mater. Sci.", volume = "6", number = "1", pages = "15--50", @@ -2508,7 +2655,7 @@ title = "Accurate and simple density functional for the electronic exchange energy: Generalized gradient approximation", - author = "John P. Perdew and Wang Yue", + author = "John P. Perdew and Yue Wang", journal = "Phys. Rev. B", volume = "33", number = "12", @@ -2574,7 +2721,7 @@ @Article{zhu98, title = "Ab initio pseudopotential calculations of dopant diffusion in Si", - journal = "Computational Materials Science", + journal = "Comput. Mater. Sci.", volume = "12", number = "4", pages = "309--318", @@ -2600,7 +2747,7 @@ 950 [degree]{C}", publisher = "AIP", year = "1995", - journal = "Applied Physics Letters", + journal = "Appl. Phys. Lett.", volume = "66", number = "20", pages = "2646--2648", @@ -2622,7 +2769,7 @@ alloys", publisher = "AIP", year = "1998", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "84", number = "8", pages = "4631--4633", @@ -2639,7 +2786,7 @@ author = "R Jones and B J Coomer and P R Briddon", title = "Quantum mechanical modelling of defects in semiconductors", - journal = "Journal of Physics: Condensed Matter", + journal = "J. Phys.: Condens. Matter", volume = "16", number = "27", pages = "S2643", @@ -2658,7 +2805,7 @@ molecular-beam epitaxy", publisher = "AIP", year = "2002", - journal = "Journal of Applied Physics", + journal = "J. Appl. Phys.", volume = "91", number = "9", pages = "5716--5727", @@ -2703,10 +2850,25 @@ carbon defect, formation energies", } +@Article{besson91, + title = "Electronic structure of interstitial carbon in + silicon", + author = "Morgan Besson and Gary G. DeLeo", + journal = "Phys. Rev. B", + volume = "43", + number = "5", + pages = "4028--4033", + numpages = "5", + year = "1991", + month = feb, + doi = "10.1103/PhysRevB.43.4028", + publisher = "American Physical Society", +} + @Article{kaxiras96, title = "Review of atomistic simulations of surface diffusion and growth on semiconductors", - journal = "Computational Materials Science", + journal = "Comput. Mater. Sci.", volume = "6", number = "2", pages = "158--172", @@ -2762,7 +2924,7 @@ @Article{chen98, title = "Production and recovery of defects in Si{C} after irradiation and deformation", - journal = "Journal of Nuclear Materials", + journal = "J. Nucl. Mater.", volume = "258-263", number = "Part 2", pages = "1803--1808", @@ -2777,8 +2939,7 @@ @Article{weber01, title = "Accumulation, dynamic annealing and thermal recovery of ion-beam-induced disorder in silicon carbide", - journal = "Nuclear Instruments and Methods in Physics Research - Section B: Beam Interactions with Materials and Atoms", + journal = "Nucl. Instrum. Methods Phys. Res. B", volume = "175-177", number = "", pages = "26--30",