X-Git-Url: https://hackdaworld.org/gitweb/?a=blobdiff_plain;f=posic%2Ftalks%2Fmpi_app.tex;h=4f0f76c74f97610289614585dcd702e04b5328fb;hb=acc13142c245dde66027f86a444b652da7af3e00;hp=9931ba16bb1a0f2d05c7b3f9147e1c6a6b0ec785;hpb=448bf217190b3d815e3d749631af50cbcbd21834;p=lectures%2Flatex.git diff --git a/posic/talks/mpi_app.tex b/posic/talks/mpi_app.tex index 9931ba1..4f0f76c 100644 --- a/posic/talks/mpi_app.tex +++ b/posic/talks/mpi_app.tex @@ -143,6 +143,9 @@ E\\ \end{center} \end{slide} +% no vertical centering +\centerslidesfalse + \ifnum1=0 % intro @@ -296,7 +299,6 @@ Thermal conductivity [W/cmK] & 5.0 & 4.9 & 4.9 & 1.5 & 1.3 & 22 \\ \end{slide} -\fi % fabrication \begin{slide} @@ -317,7 +319,7 @@ Thermal conductivity [W/cmK] & 5.0 & 4.9 & 4.9 & 1.5 & 1.3 & 22 \\ \vspace{2pt} -SiC thin film by MBE \& CVD +SiC thin films by MBE \& CVD \begin{itemize} \item Much progress achieved in homo/heteroepitaxial SiC thin film growth \item \underline{Commercially available} semiconductor power devices based on @@ -330,33 +332,33 @@ SiC thin film by MBE \& CVD \includegraphics[width=2.0cm]{cree.eps} \end{picture} -\vspace{-0.4cm} +\vspace{-0.2cm} Alternative approach: Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0) +\vspace{0.2cm} + \scriptsize -\begin{minipage}{6.5cm} - \begin{itemize} - \item \underline{Implantation step 1}\\ - 180 keV C$^+$, $D=7.9\times 10^{17}$ cm$^{-2}$, $T_{\text{i}}=500\,^{\circ}\mathrm{C}$\\[0.1cm] - Box-like distribution of equally sized \&\\ - epitaxially oriented SiC precipitates - - \item \underline{Implantation step 2}\\ - 180 keV C$^+$, $D=0.6\times 10^{17}$ cm$^{-2}$, $T_{\text{i}}=250\,^{\circ}\mathrm{C}$\\[0.1cm] - Destruction of SiC nanocrystals\\ - in growing amorphous interface layers - \item \underline{Annealing}\\ - $T=1250\,^{\circ}\mathrm{C}$, $t=10\,\text{h}$\\[0.1cm] - Homogeneous, stoichiometric SiC layer\\ - with sharp interfaces - \end{itemize} +\framebox{ +\begin{minipage}{3.15cm} + \begin{center} +\includegraphics[width=3cm]{imp.eps}\\ + {\tiny + Carbon implantation + } + \end{center} \end{minipage} -\begin{minipage}{0.3cm} -\hfill +\begin{minipage}{3.15cm} + \begin{center} +\includegraphics[width=3cm]{annealing.eps}\\ + {\tiny + \unit[12]{h} annealing at \degc{1200} + } + \end{center} \end{minipage} +} \begin{minipage}{5.5cm} \includegraphics[width=5.8cm]{ibs_3c-sic.eps}\\[-0.2cm] \begin{center} @@ -366,26 +368,25 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0) \end{center} \end{minipage} -\framebox{ - \begin{minipage}{6.3cm} - \begin{center} - {\color{blue} - Precipitation mechanism not yet fully understood! - } - \renewcommand\labelitemi{$\Rightarrow$} - \small - \underline{Understanding the SiC precipitation} - \begin{itemize} - \item significant technological progress in SiC thin film formation - \item perspectives for processes relying upon prevention of SiC precipitation - \end{itemize} - \end{center} - \end{minipage} +\end{slide} + +% contents + +\begin{slide} + +{\large\bf + Systematic investigation of C implantations into Si } +\vspace{1.7cm} +\begin{center} +\hspace{-1.0cm} +\includegraphics[width=0.75\textwidth]{imp_inv.eps} +\end{center} + \end{slide} -% contents +% outline \begin{slide} @@ -393,31 +394,119 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0) Outline } - \begin{itemize} - \item Implantation of C in Si --- Overview of experimental observations - \item Utilized simulation techniques and modeled problems - \begin{itemize} - \item {\color{blue}Diploma thesis}\\ - \underline{Monte Carlo} simulations - modeling the selforganization process - leading to periodic arrays of nanometric amorphous SiC - precipitates - \item {\color{blue}Doctoral studies}\\ - Classical potential \underline{molecular dynamics} simulations - \ldots\\ - \underline{Density functional theory} calculations - \ldots\\[0.2cm] - \ldots on defects and SiC precipitation in Si - \end{itemize} - \item Summary / Conclusion / Outlook - \end{itemize} +\vspace{1.7cm} +\begin{center} +\hspace{-1.0cm} +\includegraphics[width=0.75\textwidth]{imp_inv.eps} +\end{center} + +\begin{pspicture}(0,0)(0,0) +\rput(6.0,7.0){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=white]{ +\begin{minipage}{11cm} +{\color{red}Diploma thesis}\\ + \underline{Monte Carlo} simulation modeling the selforganization process\\ + leading to periodic arrays of nanometric amorphous SiC precipitates +\end{minipage} +}}} +\end{pspicture} +\begin{pspicture}(0,0)(0,0) +\rput(6.0,-0.5){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=white]{ +\begin{minipage}{11cm} +{\color{blue}Doctoral studies}\\ + Classical potential \underline{molecular dynamics} simulations \ldots\\ + \underline{Density functional theory} calculations \ldots\\[0.2cm] + \ldots on defect formation and SiC precipitation in Si +\end{minipage} +}}} +\end{pspicture} +\begin{pspicture}(0,0)(0,0) +\psellipse[linecolor=red,linewidth=0.05cm](5,3.0)(0.8,1.0) +\end{pspicture} +\begin{pspicture}(0,0)(0,0) +\psellipse[linecolor=blue,linewidth=0.05cm](8.2,3.2)(1.5,1.6) +\end{pspicture} + +\end{slide} + +\begin{slide} + +{\large\bf + Selforganization of nanometric amorphous SiC lamellae +} + +\small + +\vspace{0.2cm} + +\begin{itemize} + \item Regularly spaced, nanometric spherical\\ + and lamellar amorphous inclusions\\ + at the upper a/c interface + \item Carbon accumulation\\ + in amorphous volumes +\end{itemize} + +\vspace{0.4cm} + +\begin{minipage}{12cm} +\includegraphics[width=9cm]{../../nlsop/img/k393abild1_e_l.eps}\\ +{\scriptsize +XTEM bright-field, \unit[180]{keV} C$^+ \rightarrow$ Si, \degc{150}, +Dose: \unit[4.3 $\times 10^{17}$]{cm$^{-2}$} +} +\end{minipage} + +\begin{picture}(0,0)(-182,-215) +\begin{minipage}{6.5cm} +\begin{center} +\includegraphics[width=6.5cm]{../../nlsop/img/eftem.eps}\\[-0.2cm] +{\scriptsize +XTEM bright-field and respective EFTEM C map +} +\end{center} +\end{minipage} +\end{picture} \end{slide} +% continue here +\fi + +\begin{slide} + +{\large\bf + Model displaying the formation of ordered lamellae +} + +\end{slide} \end{document} \ifnum1=0 +\begin{slide} + +{\large\bf + Model displaying the formation of ordered lamellae +} + +\framebox{ + \begin{minipage}{6.3cm} + \begin{center} + {\color{blue} + Precipitation mechanism not yet fully understood! + } + \renewcommand\labelitemi{$\Rightarrow$} + \small + \underline{Understanding the SiC precipitation} + \begin{itemize} + \item significant technological progress in SiC thin film formation + \item perspectives for processes relying upon prevention of SiC precipitation + \end{itemize} + \end{center} + \end{minipage} +} + +\end{slide} \begin{slide}