X-Git-Url: https://hackdaworld.org/gitweb/?a=blobdiff_plain;f=posic%2Fthesis%2Fmd.tex;h=648e5aa42b116434634744a1a8334ebff042e8cb;hb=e753808561e45a45157ef51bef412a5b77b15f1b;hp=2318a656d4accf8495570c45fa518d70a088fa39;hpb=41987f78ca9b9ab7ee0f4b31fd3d5596cfa385d6;p=lectures%2Flatex.git diff --git a/posic/thesis/md.tex b/posic/thesis/md.tex index 2318a65..648e5aa 100644 --- a/posic/thesis/md.tex +++ b/posic/thesis/md.tex @@ -264,15 +264,67 @@ Due to the limitations of short range potentials and conventional MD as discusse The simulation sequence and other parameters aside system temperature remain unchanged as in section \ref{subsection:initial_sims}. Since there is no significant difference among the $V_2$ and $V_3$ simulations only the $V_1$ and $V_2$ simulations are carried on and refered to as low carbon and high carbon concentration simulations. Temperatures ranging from $450\,^{\circ}\mathrm{C}$ up to $2050\,^{\circ}\mathrm{C}$ are used. -A quality value $Q$ is introduced, which is defined as + +A simple quality value $Q$ is introduced, which helps to estimate the progress of structural evolution. +In bulk 3C-SiC every C atom has four next neighboured Si atoms and every Si atom four next neighboured C atoms. +The quality could be determined by counting the amount of atoms which form bonds to four atoms of the other species. +However, the aim of the simulation on hand is to reproduce the formation of a 3C-SiC precipitate embedded in c-Si. +The amount of Si atoms and, thus, the amount of Si atoms remaining in the silicon diamond lattice is much higher than the amount of inserted C atoms. +Thus, counting the atoms, which exhibit proper coordination is limited to the C atoms. +The quality value is defined to be \begin{equation} Q = \frac{\text{Amount of C atoms with 4 next neighboured Si atoms}} {\text{Total amount of C atoms}} \text{ .} \label{eq:md:qdef} \end{equation} -In 3C-SiC every C atom has four next neighboured Si atoms resulting in $Q=1$. +By this, bulk 3C-SiC will still result in $Q=1$ and precipitates will also reach values close to one. +However, since the quality value does not account for bond lengthes, bond angles, crystallinity or the stacking sequence high values of $Q$ not necessarily correspond to structures close to 3C-SiC. +Structures that look promising due to high quality values need to be further investigated by other means. + +\begin{figure}[!ht] +\begin{center} +\includegraphics[width=12cm]{tot_pc_thesis.ps}\\ +\includegraphics[width=12cm]{tot_ba.ps} +\end{center} +\caption[Si-C radial distribution and quality evolution for the low concentration simulations at different elevated temperatures.]{Si-C radial distribution and quality evolution for the low concentration simulations at different elevated temperatures. All structures are cooled down to $20\,^{\circ}\mathrm{C}$. The grey line shows resulting Si-C bonds in a configuration of substitutional C in c-Si (C$_\text{sub}$) at zero temperature. Arrows in the quality plot mark the end of carbon insertion and the start of the cooling down step. A fit function according to equation \eqref{eq:md:fit} shows the estimated evolution of quality in the absence of the cooling down sequence.} +\label{fig:md:tot_si-c_q} +\end{figure} +Figure \ref{fig:md:tot_si-c_q} shows the radial distribution of Si-C bonds for different temperatures and the corresponding quality evolution as defined earlier for the low concentration simulaton, that is the $V_1$ simulation. +The first noticeable and promising change in the Si-C radial distribution is the successive decline of the artificial peak at the Si-C cut-off distance with increasing temperature up to the point of disappearance at temperatures above $1650\,^{\circ}\mathrm{C}$. +The system provides enough kinetic energy to affected atoms, which are able to escape the cut-off region. +Another important observation in structural change is exemplified in the two shaded areas. +In the grey shaded region a decrease of the peak at 0.186 nm and the bump at 0.175 nm and a concurrent increase of the peak at 0.197 nm with increasing temperature is visible. +Similarly the peaks at 0.335 nm and 0.386 nm shrink in contrast to a new peak forming at 0.372 nm as can be seen in the yellow shaded region. +Obviously the structure obtained from the $450\,^{\circ}\mathrm{C}$ simulations, which is dominated by the existence of \hkl<1 0 0> C-Si dumbbells transforms into a different structure with increasing simulation temperature. +Investigations of the atomic data reveal substitutional carbon to be responsible for the new Si-C bonds. +The peak at 0.197 nm corresponds to the distance of a substitutional carbon to the next neighboured silicon atoms. +The one at 0.372 is the distance of the substitutional carbon atom to the second next silicon neighbour along the \hkl<1 1 0> direction. +Comparing the radial distribution for the Si-C bonds at $2050\,^{\circ}\mathrm{C}$ to the resulting Si-C bonds in a configuration of a substitutional carbon atom in crystalline silicon excludes all possibility of doubt. +The resulting bonds perfectly match and, thus, explain the peaks observed for the increased temperature simulations. +To conclude, by increasing the simulation temperature, the \hkl<1 0 0> C-Si dumbbell characterized structure transforms into a structure dominated by substitutional C. + +This is also reflected in the quality values obtained for different temperatures. +While simulations at $450\,^{\circ}\mathrm{C}$ exhibit 10 \% of fourfold coordinated carbon simulations at $2050\,^{\circ}\mathrm{C}$ exceed the 80 \% range. +Since substitutional carbon has four next neighboured silicon atoms and is the preferential type of defect in elevated temperature simulations the increase of the quality values become evident. +The quality values at a fixed temperature increase with simulation time. +After the end of the insertion sequence marked by the first arrow the quality is increasing and a saturation behaviour, yet before the cooling process starts, can be expected. +The evolution of the quality value of the simulation at $2050\,^{\circ}\mathrm{C}$ inside the range in which the simulation is continued at constant temperature for 100 fs is well approximated by the simple fit function +\begin{equation} +f(t)=a-\frac{b}{t} \text{ ,} +\label{eq:md:fit} +\end{equation} +which results in a saturation value of 93 \%. +Obviously the decrease in temperature accelerates the saturation and inhibits further formation of substitutional carbon. +Conclusions drawn from investigations of the quality evolution correlate well with the findings of the radial distribution results. -Figure ... shows the radial distribution of Si-C bonds and the corresponding quality paragraphs. +\begin{figure}[!ht] +\begin{center} +\includegraphics[width=12cm]{tot_pc2_thesis.ps}\\ +\includegraphics[width=12cm]{tot_pc3_thesis.ps} +\end{center} +\caption[C-C and Si-Si radial distribution for the low concentration simulations at different elevated temperatures.]{C-C and Si-Si radial distribution for the low concentration simulations at different elevated temperatures. All structures are cooled down to $20\,^{\circ}\mathrm{C}$.} +\label{fig:md:tot_c-c_si-si} +\end{figure} \subsection{Constructed 3C-SiC precipitate in crystalline silicon}