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diff --git a/posic/thesis/sic.tex b/posic/thesis/sic.tex
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--- a/posic/thesis/sic.tex
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@@ -153,7 +153,7 @@ Further efforts have to be expended to find relations between the growth paramet
 \subsection{SiC epitaxial thin film growth}
 
 Crystalline SiC layers have been grown by a large number of techniques on the surfaces of different substrates.
-Most of the crystal growth processes are based on chemical vapor deposition (CVD), solid-source molecular beam epitaxy (MBE) and gas-source MBE on Si as well as SiC substrates.
+Most of the crystal growth processes are based on chemical vapor deposition (CVD), solid-source molecular beam epitaxy (MBE) and gas-source MBE (GSMBE) on Si as well as SiC substrates.
 In CVD as well as gas-source MBE, C and Si atoms are supplied by C containing gases like CH$_4$, C$_3$H$_8$, C$_2$H$_2$ or C$_2$H$_4$ and Si containing gases like SiH$_4$, Si$_2$H$_6$, SiH$_2$Cl$_2$, SiHCl$_3$ or SiCl$_4$ respectively.
 In the case of solid-source MBE atoms are provided by electron beam evaporation of graphite and solid Si or thermal evaporation of fullerenes.
 The following review will exclusively focus on CVD and MBE techniques.
@@ -173,9 +173,37 @@ However, the number of such defects can be reduced by off-axis growth on a Si \h
 This results in the thermodynamically favored growth of a single phase due to the uni-directional contraction of Si-C-Si bond chains perpendicular to the terrace steps edges during carbonization and the fast growth parallel to the terrace edges during growth under Si rich conditions \cite{kitabatake97}.
 By MBE, lower process temperatures than these typically employed in CVD have been realized \cite{hatayama95,henke95,fuyuki97,takaoka98}, which is essential for limiting thermal stresses and to avoid resulting substrate bending, a key issue in obtaining large area 3C-SiC surfaces.
 In summary, the almost universal use of Si has allowed significant progress in the understanding of heteroepitaxial growth of SiC on Si.
-However, mismatches in the thermal expansion coefficient and the lattice parameter cause a considerably high concentration of various defects, which is responsible for structural and electrical qualities that are not not yet statisfactory.
-
-SiC on SiC epitaxy ...
+However, mismatches in the thermal expansion coefficient and the lattice parameter cause a considerably high concentration of various defects, which is responsible for structural and electrical qualities that are not yet statisfactory.
+
+The alternative attempt to grow SiC on SiC substrates has shown to drastically reduce the concentration of defects in deposited layers.
+By CVD, both, the 3C \cite{kong88,powell90} as well as the 6H \cite{kong88_2,powell90_2} polytype could be successfully grown.
+In order to obtain the homoepitaxially grown 6H polytype, off-axis 6H-SiC wafers are required as a substrate \cite{kimoto93}.
+%In the so called step-controlled epitaxy, lateral growth proceeds from atomic steps without the necessity of preceding nucleation events.
+Investigations indicate that in the so-called step-controlled epitaxy, crystal growth proceeds through the adsorbtion of Si species at atomic steps and their carbonization by hydrocarbon molecules.
+This growth mechanism does not require two-dimensional nucleation.
+Instead, crystal growth is governed by mass transport, i.e. the diffusion of reactants in a stagnant layer.
+In contrast, layers of the 3C polytype are formed on exactly oriented \hkl(0 0 0 1) 6H-SiC substrates by two-dimensional nucleation on terraces.
+{\color{red} Source of APB defects ...}
+However, lateral 3C-SiC growth was also observed on low tilt angle off-axis substrates originating from intentionally induced dislocations \cite{powell91}.
+Additionally, 6H-SiC was observed on clean substrates even for a tilt angle as low as \unit[0.1]{$^{\circ}$} due to low surface mobilities that facilitate arriving molecules to reach surface steps.
+Thus, 3C nucleation is assumed as a result of migrating Si and C cointaining molecules interacting with surface disturbances by a yet unknown mechanism, in contrast to a model \cite{ueda90}, in which the competing 6H versus 3C growth depends on the density of surface steps.
+{\color{red} This can be employed to create 3C layers with reduced density of APB defects.}
+
+Lower growth temperatures, a clean growth ambient, in situ control of the growth process, layer-by-layer deposition and the possibility to achieve dopant profiles within atomic dimensions due to the reduced diffusion at low growth temperatures reveal MBE as a promising technique to produce SiC epitaxial layers.
+Using alternating supply of the gas beams Si$_2$H$_6$ and C$_2$H$_2$ in GSMBE, 3C-SiC epilayers were obtained on 6H-SiC substrates \cite{yoshinobu92}.
+On \hkl(000-1) substrates ...
+gas source ... 3C homoeptiaxy \cite{yoshinobu90}
+3C on 3C homoepitaxy by ALE \cite{fuyuki89,fuyuki93,hara93}
+6H on 6H ... \cite{tanaka94}
+Problem of gas source ... strong adsorption and incorporation of atomic decomposited hydrogen of the gas phase reactants at low temperatures.
+Growth rate lower than desorption rate of hydrogen ...
+Solid source MBE may be the key to avoid such problems ...
+Realized on and off-axis 3C on 4H and ... \cite{fissel95,fissel95_apl} ...
+Nonstoichiometric reconstruction plays a relevenat role ... handled by Si/C flux ratio ... \cite{fissel96,righi03} ...
+change in adlayer thickness and, consequently, in the surface super structure leading to growth of another polytype \cite{fissel95} ...
+Possibility to grow heterostructures (band gap engineering) by careful control of the Si/C ratio and Si excess.
+
+To summarize ... remaining obstacles are ... APB in 3C ... and micropipes in hexagonal SiC?
 
 \section{Ion beam synthesis of cubic silicon carbide}