X-Git-Url: https://hackdaworld.org/gitweb/?p=lectures%2Flatex.git;a=blobdiff_plain;f=posic%2Fpublications%2Fsic_prec_reply01.txt;h=502510a2d2ff1b6b5e7c66d919acfabd8cf04c59;hp=648bac361d3218de0b1060c494c122bce8e5e9e6;hb=94afb95da60b2cdbcd5c328661715eda4416de19;hpb=fdf1f976b879c9b7403c1d76c9906aa850614862 diff --git a/posic/publications/sic_prec_reply01.txt b/posic/publications/sic_prec_reply01.txt index 648bac3..502510a 100644 --- a/posic/publications/sic_prec_reply01.txt +++ b/posic/publications/sic_prec_reply01.txt @@ -4,6 +4,12 @@ Re: BC11912 silicon carbide precipitation in silicon by F. Zirkelbach, B. Stritzker, K. Nordlund, et al. +and related to + +Re: BA11443 + First-principles study of defects in carbon-implanted silicon + by F. Zirkelbach, B. Stritzker, J. K. N. Lindner, et al. + Dear Dr. Dahal, @@ -12,13 +18,13 @@ manuscript. The referee - i) requests a clarification of the relation of the present + i) has reservations about the methodology used in the present work + ii) requests a clarification of the relation of the present manuscript to a previous submission of ours (BA11443) - ii) has reservations about the methodology used in the present work iii) suggests to possibly combine some account of the present work with the previous submission BA11443. -What concerns (ii), the classical potential molecular dynamics used in +What concerns (i), the classical potential molecular dynamics used in the present work certainly has limitations. Precisely in order to quantify these limitations, a comparison is made with ab initio calculations as well as earlier first-principles work (BA11443). @@ -28,7 +34,7 @@ silicon carbide precipitation on length and time scales which are not accessible to more accurate ab initio techniques. A detailed response to the referee's concerns is given below. -Concerning (i) and (iii), the ab initio work BA11443 is a +Concerning (ii) and (iii), the ab initio work BA11443 is a self-contained and comprehensive manuscript, which already now has an appreciable length. It is a first-principles study on defects in carbon-implanted silicon. In contrast, the present study mainly