X-Git-Url: https://hackdaworld.org/gitweb/?p=lectures%2Flatex.git;a=blobdiff_plain;f=posic%2Ftalks%2Fdefense.tex;h=209fbd7bbad361233afe838694866a3ab982365b;hp=e1c938b85facf32da14401b1e18b7b98d7952070;hb=92940de7270a1e537755dd580bd1ff8871f18a4a;hpb=f48ab8ab048458b22a9aecfe7b47c7f07bd5a019

diff --git a/posic/talks/defense.tex b/posic/talks/defense.tex
index e1c938b..209fbd7 100644
--- a/posic/talks/defense.tex
+++ b/posic/talks/defense.tex
@@ -246,61 +246,9 @@ E\\
 
 \end{slide}
 
-% motivation
-
-\begin{slide}
-
-\headphd
- {\large\bf
-  Polytypes of SiC\\[0.6cm]
- }
-
-\vspace{0.6cm}
-
-\includegraphics[width=3.8cm]{cubic_hex.eps}\\
-\begin{minipage}{1.9cm}
-{\tiny cubic (twist)}
-\end{minipage}
-\begin{minipage}{2.9cm}
-{\tiny hexagonal (no twist)}
-\end{minipage}
-
-\begin{picture}(0,0)(-150,0)
- \includegraphics[width=7cm]{polytypes.eps}
-\end{picture}
-
-\vspace{0.6cm}
-
-\footnotesize
-
-\begin{tabular}{l c c c c c c}
-\hline
- & 3C-SiC & 4H-SiC & 6H-SiC & Si & GaN & Diamond\\
-\hline
-Hardness [Mohs] & \multicolumn{3}{c}{------ 9.6 ------}& 6.5 & - & 10 \\
-Band gap [eV] & 2.36 & 3.23 & 3.03 & 1.12 & 3.39 & 5.5 \\
-Break down field [$10^6$ V/cm] & 4 & 3 & 3.2 & 0.6 & 5 & 10 \\
-Saturation drift velocity [$10^7$ cm/s] & 2.5 & 2.0 & 2.0 & 1 & 2.7 & 2.7 \\
-Electron mobility [cm$^2$/Vs] & 800 & 900 & 400 & 1100 & 900 & 2200 \\
-Hole mobility [cm$^2$/Vs] & 320 & 120 & 90 & 420 & 150 & 1600 \\
-Thermal conductivity [W/cmK] & 5.0 & 4.9 & 4.9 & 1.5 & 1.3 & 22 \\
-\hline
-\end{tabular}
-
-\begin{pspicture}(0,0)(0,0)
-\psellipse[linecolor=green](5.7,2.05)(0.4,0.50)
-\end{pspicture}
-\begin{pspicture}(0,0)(0,0)
-\psellipse[linecolor=green](5.6,0.89)(0.4,0.20)
-\end{pspicture}
-\begin{pspicture}(0,0)(0,0)
-\psellipse[linecolor=red](10.45,0.42)(0.4,0.20)
-\end{pspicture}
-
-\end{slide}
-
 % fabrication
 
+\ifnum1=0
 \begin{slide}
 
 \headphd
@@ -393,6 +341,7 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0)
 %\end{minipage}
 
 \end{slide}
+\fi
 
 \begin{slide}
 
@@ -412,7 +361,7 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0)
         $\Rightarrow$ Epitaxial {\color{blue}3C-SiC} layer \&
         {\color{blue}precipitates}
  \item \underline{Implantation step 2}\\[0.1cm]
-        Little remaining dose | \unit[180]{keV} | \degc{250}\\
+        Low remaining amount of dose | \unit[180]{keV} | \degc{250}\\
         $\Rightarrow$
         Destruction/Amorphization of precipitates at layer interface
  \item \underline{Annealing}\\[0.1cm]
@@ -689,7 +638,7 @@ r = \unit[2--4]{nm}
 \begin{itemize}
 \item High-temperature implantation {\tiny\color{gray}/Nejim~et~al./}
  \begin{itemize}
-  \item C incorporated {\color{blue}substitutionally} on regular Si lattice sites
+  \item {\color{blue}Substitutionally} incorporated C on regular Si lattice sites
   \item \si{} reacting with further C in cleared volume
  \end{itemize}
 \item Annealing behavior {\tiny\color{gray}/Serre~et~al./}
@@ -699,10 +648,10 @@ r = \unit[2--4]{nm}
  \end{itemize}
  $\Rightarrow$ mobile {\color{red}\ci} opposed to
  stable {\color{blue}\cs{}} configurations
-\item Strained silicon \& Si/SiC heterostructures
+\item Strained silicon \& Si$_{1-y}$C$_y$ heterostructures
       {\tiny\color{gray}/Strane~et~al./Guedj~et~al./}
  \begin{itemize}
-  \item {\color{blue}Coherent} SiC precipitates (tensile strain)
+  \item Initial {\color{blue}coherent} SiC precipitates (tensile strain)
   \item Incoherent SiC (strain relaxation)
  \end{itemize}
 \end{itemize}
@@ -936,77 +885,6 @@ $E_{\text{b}}\rightarrow 0$: non-interacting, isolated defects\\
 
 \footnotesize
 
-\headphd
-{\large\bf
- Si self-interstitial point defects in silicon\\[0.1cm]
-}
-
-\begin{center}
-\begin{tabular}{l c c c c c}
-\hline
- $E_{\text{f}}$ [eV] & \hkl<1 1 0> DB & H & T & \hkl<1 0 0> DB & V \\
-\hline
- \textsc{vasp} & \underline{3.39} & 3.42 & 3.77 & 4.41 & 3.63 \\
- Erhart/Albe & 4.39 & 4.48$^*$ & \underline{3.40} & 5.42 & 3.13 \\
-\hline
-\end{tabular}\\[0.4cm]
-\end{center}
-
-\begin{minipage}{3cm}
-\begin{center}
-\underline{Vacancy}\\
-\includegraphics[width=2.8cm]{si_pd_albe/vac.eps}
-\end{center}
-\end{minipage}
-\begin{minipage}{3cm}
-\begin{center}
-\underline{\hkl<1 1 0> DB}\\
-\includegraphics[width=2.8cm]{si_pd_albe/110_bonds.eps}
-\end{center}
-\end{minipage}
-\begin{minipage}{3cm}
-\begin{center}
-\underline{\hkl<1 0 0> DB}\\
-\includegraphics[width=2.8cm]{si_pd_albe/100_bonds.eps}
-\end{center}
-\end{minipage}
-\begin{minipage}{3cm}
-\begin{center}
-\underline{Tetrahedral}\\
-\includegraphics[width=2.8cm]{si_pd_albe/tet_bonds.eps}
-\end{center}
-\end{minipage}\\
-
-\underline{Hexagonal} \hspace{2pt}
-\href{../video/si_self_int_hexa.avi}{$\rhd$}\\[0.1cm]
-\framebox{
-\begin{minipage}{2.7cm}
-$E_{\text{f}}^*=4.48\text{ eV}$\\
-\includegraphics[width=2.7cm]{si_pd_albe/hex_a_bonds.eps}
-\end{minipage}
-\begin{minipage}{0.4cm}
-\begin{center}
-$\Rightarrow$
-\end{center}
-\end{minipage}
-\begin{minipage}{2.7cm}
-$E_{\text{f}}=3.96\text{ eV}$\\
-\includegraphics[width=2.8cm]{si_pd_albe/hex_bonds.eps}
-\end{minipage}
-}
-\begin{minipage}{5.5cm}
-\begin{center}
-{\tiny nearly T $\rightarrow$ T}\\
-\end{center}
-\includegraphics[width=6.0cm]{nhex_tet.ps}
-\end{minipage}
-
-\end{slide}
-
-\begin{slide}
-
-\footnotesize
-
 \headphd
 {\large\bf
  C interstitial point defects in silicon\\
@@ -1083,246 +961,111 @@ $E_{\text{f}}=5.18\text{ eV}$\\
 
 \headphd
 {\large\bf\boldmath
- C-Si dimer \& bond-centered interstitial configuration
+ C interstitial migration --- ab initio
 }
 
-\footnotesize
+\scriptsize
 
-\vspace{0.1cm}
+\vspace{0.3cm}
 
-\begin{minipage}[t]{4.1cm}
-{\bf\boldmath C \hkl<1 0 0> DB interstitial}\\[0.1cm]
+\begin{minipage}{6.8cm}
+\framebox{\hkl[0 0 -1] $\rightarrow$ \hkl[0 0 1]}\\
 \begin{minipage}{2.0cm}
-\begin{center}
-\underline{Erhart/Albe}
-\includegraphics[width=2.0cm]{c_pd_albe/100_cmp.eps}
-\end{center}
+\includegraphics[width=2.0cm]{c_pd_vasp/100_2333.eps}
+\end{minipage}
+\begin{minipage}{0.2cm}
+$\rightarrow$
 \end{minipage}
 \begin{minipage}{2.0cm}
-\begin{center}
-\underline{\textsc{vasp}}
-\includegraphics[width=2.0cm]{c_pd_vasp/100_cmp.eps}
-\end{center}
-\end{minipage}\\[0.2cm]
-Si-C-Si bond angle $\rightarrow$ \unit[180]{$^{\circ}$}\\
-$\Rightarrow$ $sp$ hybridization\\[0.1cm]
-Si-Si-Si bond angle $\rightarrow$ \unit[120]{$^{\circ}$}\\
-$\Rightarrow$ $sp^2$ hybridization
-\begin{center}
-\includegraphics[width=3.4cm]{c_pd_vasp/eden.eps}\\[-0.1cm]
-{\tiny Charge density isosurface}
-\end{center}
+\includegraphics[width=2.0cm]{c_pd_vasp/bc_2333.eps}
 \end{minipage}
 \begin{minipage}{0.2cm}
-\hfill
+$\rightarrow$
 \end{minipage}
-\begin{minipage}[t]{8.1cm}
-\begin{flushright}
-{\bf Bond-centered interstitial}\\[0.1cm]
-\begin{minipage}{4.4cm}
-%\scriptsize
+\begin{minipage}{2.0cm}
+\includegraphics[width=2.0cm]{c_pd_vasp/100_next_2333.eps}
+\end{minipage}\\[0.1cm]
+Symmetry:\\
+$\Rightarrow$ Sufficient to consider \hkl[00-1] to BC transition\\
+$\Rightarrow$ Migration barrier to reach BC | $\Delta E=\unit[1.2]{eV}$
+\end{minipage}
+\begin{minipage}{5.4cm}
+\includegraphics[width=6.0cm]{im_00-1_nosym_sp_fullct_thesis_vasp_s.ps}
+%\end{minipage}\\[0.2cm]
+\end{minipage}\\[0.4cm]
+%\hrule
+%
+\begin{minipage}{6.8cm}
+\framebox{\hkl[0 0 -1] $\rightarrow$ \hkl[0 -1 0]}\\
+\begin{minipage}{2.0cm}
+\includegraphics[width=2.0cm]{c_pd_vasp/100_2333.eps}
+\end{minipage}
+\begin{minipage}{0.2cm}
+$\rightarrow$
+\end{minipage}
+\begin{minipage}{2.0cm}
+\includegraphics[width=2.0cm]{c_pd_vasp/00-1-0-10_2333.eps}
+\end{minipage}
+\begin{minipage}{0.2cm}
+$\rightarrow$
+\end{minipage}
+\begin{minipage}{2.0cm}
+\includegraphics[width=2.0cm]{c_pd_vasp/0-10_2333.eps}
+\end{minipage}\\[0.1cm]
+$\Delta E=\unit[0.9]{eV}$ | Experimental values: \unit[0.70--0.87]{eV}\\
+$\Rightarrow$ {\color{red}Migration mechanism identified!}\\
+Note: Change in orientation
+\end{minipage}
+\begin{minipage}{5.4cm}
+\includegraphics[width=6.0cm]{00-1_0-10_vasp_s.ps}
+\end{minipage}\\[0.1cm]
+%
+%\begin{center}
+%Reorientation pathway composed of two consecutive processes of the above type
+%\end{center}
+
+\end{slide}
+
+\begin{slide}
+
+\headphd
+{\large\bf\boldmath
+ C interstitial migration --- analytical potential
+}
+
+\scriptsize
+
+\vspace{0.3cm}
+
+\begin{minipage}[t]{6.0cm}
+{\bf\boldmath BC to \hkl[0 0 -1] transition}\\[0.2cm]
+\includegraphics[width=6.0cm]{bc_00-1_albe_s.ps}\\
 \begin{itemize}
- \item Linear Si-C-Si bond
- \item Si: one C \& 3 Si neighbours
- \item Spin polarized calculations
- \item No saddle point!\\
-       Real local minimum!
+ \item Lowermost migration barrier
+ \item $\Delta E \approx \unit[2.2]{eV}$
+ \item 2.4 times higher than ab initio result
+ \item Different pathway
 \end{itemize}
 \end{minipage}
-\begin{minipage}{2.7cm}
-%\includegraphics[width=2.8cm]{c_pd_vasp/bc_2333.eps}\\
-\vspace{0.2cm}
-\includegraphics[width=2.8cm]{c_pd_albe/bc_bonds.eps}\\
-\end{minipage}
-
-\framebox{
- \tiny
- \begin{minipage}[t]{6.5cm}
-  \begin{minipage}[t]{1.2cm}
-  {\color{red}Si}\\
-  {\tiny sp$^3$}\\[0.8cm]
-  \underline{${\color{black}\uparrow}$}
-  \underline{${\color{black}\uparrow}$}
-  \underline{${\color{black}\uparrow}$}
-  \underline{${\color{red}\uparrow}$}\\
-  sp$^3$
-  \end{minipage}
-  \begin{minipage}[t]{1.4cm}
-  \begin{center}
-  {\color{red}M}{\color{blue}O}\\[0.8cm]
-  \underline{${\color{blue}\uparrow}{\color{white}\downarrow}$}\\
-  $\sigma_{\text{ab}}$\\[0.5cm]
-  \underline{${\color{red}\uparrow}{\color{blue}\downarrow}$}\\
-  $\sigma_{\text{b}}$
-  \end{center}
-  \end{minipage}
-  \begin{minipage}[t]{1.0cm}
-  \begin{center}
-  {\color{blue}C}\\
-  {\tiny sp}\\[0.2cm]
-  \underline{${\color{white}\uparrow\uparrow}$}
-  \underline{${\color{white}\uparrow\uparrow}$}\\
-  2p\\[0.4cm]
-  \underline{${\color{blue}\uparrow}{\color{blue}\downarrow}$}
-  \underline{${\color{blue}\uparrow}{\color{blue}\downarrow}$}\\
-  sp
-  \end{center}
-  \end{minipage}
-  \begin{minipage}[t]{1.4cm}
-  \begin{center}
-  {\color{blue}M}{\color{green}O}\\[0.8cm]
-  \underline{${\color{blue}\uparrow}{\color{white}\downarrow}$}\\
-  $\sigma_{\text{ab}}$\\[0.5cm]
-  \underline{${\color{green}\uparrow}{\color{blue}\downarrow}$}\\
-  $\sigma_{\text{b}}$
-  \end{center}
-  \end{minipage}
-  \begin{minipage}[t]{1.2cm}
-  \begin{flushright}
-  {\color{green}Si}\\
-  {\tiny sp$^3$}\\[0.8cm]
-  \underline{${\color{green}\uparrow}$}
-  \underline{${\color{black}\uparrow}$}
-  \underline{${\color{black}\uparrow}$}
-  \underline{${\color{black}\uparrow}$}\\
-  sp$^3$
-  \end{flushright}
-  \end{minipage}
- \end{minipage}
-}\\[0.4cm]
-
-%\framebox{
-\begin{minipage}{3.0cm}
-%\scriptsize
-\underline{Charge density}\\
-{\color{gray}$\bullet$} Spin up\\
-{\color{green}$\bullet$} Spin down\\
-{\color{blue}$\bullet$} Resulting spin up\\
-{\color{yellow}$\bullet$} Si atoms\\
-{\color{red}$\bullet$} C atom
-\end{minipage}
-\begin{minipage}{3.6cm}
-\includegraphics[width=3.8cm]{c_100_mig_vasp/im_spin_diff.eps}
-\end{minipage}
-%}
-
-\end{flushright}
-
-\end{minipage}
-\begin{pspicture}(0,0)(0,0)
-\psline[linecolor=gray,linewidth=0.05cm](-7.8,-8.7)(-7.8,0)
-\end{pspicture}
-
-\end{slide}
-
-\begin{slide}
-
-\headphd
-{\large\bf\boldmath
- C interstitial migration --- ab initio
-}
-
-\scriptsize
-
-\vspace{0.1cm}
-
-\begin{minipage}{6.8cm}
-\framebox{\hkl[0 0 -1] $\rightarrow$ \hkl[0 0 1]}\\
-\begin{minipage}{2.0cm}
-\includegraphics[width=2.0cm]{c_pd_vasp/100_2333.eps}
-\end{minipage}
-\begin{minipage}{0.2cm}
-$\rightarrow$
-\end{minipage}
-\begin{minipage}{2.0cm}
-\includegraphics[width=2.0cm]{c_pd_vasp/bc_2333.eps}
-\end{minipage}
-\begin{minipage}{0.2cm}
-$\rightarrow$
-\end{minipage}
-\begin{minipage}{2.0cm}
-\includegraphics[width=2.0cm]{c_pd_vasp/100_next_2333.eps}
-\end{minipage}\\[0.1cm]
-Spin polarization\\
-$\Rightarrow$ BC configuration constitutes local minimum\\
-$\Rightarrow$ Migration barrier to reach BC | $\Delta E=\unit[1.2]{eV}$
-\end{minipage}
-\begin{minipage}{5.4cm}
-\includegraphics[width=6.0cm]{im_00-1_nosym_sp_fullct_thesis_vasp_s.ps}
-\end{minipage}\\[0.2cm]
-%\hrule
-%
-\begin{minipage}{6.8cm}
-\framebox{\hkl[0 0 -1] $\rightarrow$ \hkl[0 -1 0]}\\
-\begin{minipage}{2.0cm}
-\includegraphics[width=2.0cm]{c_pd_vasp/100_2333.eps}
-\end{minipage}
-\begin{minipage}{0.2cm}
-$\rightarrow$
-\end{minipage}
-\begin{minipage}{2.0cm}
-\includegraphics[width=2.0cm]{c_pd_vasp/00-1-0-10_2333.eps}
-\end{minipage}
-\begin{minipage}{0.2cm}
-$\rightarrow$
-\end{minipage}
-\begin{minipage}{2.0cm}
-\includegraphics[width=2.0cm]{c_pd_vasp/0-10_2333.eps}
-\end{minipage}\\[0.1cm]
-$\Delta E=\unit[0.9]{eV}$ | Experimental values: \unit[0.70--0.87]{eV}\\
-$\Rightarrow$ {\color{red}Migration mechanism identified!}\\
-Note: Change in orientation
-\end{minipage}
-\begin{minipage}{5.4cm}
-\includegraphics[width=6.0cm]{00-1_0-10_vasp_s.ps}
-\end{minipage}\\[0.1cm]
-%
-\begin{center}
-Reorientation pathway composed of two consecutive processes of the above type
-\end{center}
-
-\end{slide}
-
-\begin{slide}
-
-\headphd
-{\large\bf\boldmath
- C interstitial migration --- analytical potential
-}
-
-\scriptsize
-
-\vspace{0.3cm}
-
-\begin{minipage}[t]{6.0cm}
-{\bf\boldmath BC to \hkl[0 0 -1] transition}\\[0.2cm]
-\includegraphics[width=6.0cm]{bc_00-1_albe_s.ps}\\
-\begin{itemize}
- \item Lowermost migration barrier
- \item $\Delta E \approx \unit[2.2]{eV}$
- \item 2.4 times higher than ab initio result
- \item Different pathway
-\end{itemize}
-\end{minipage}
-\begin{minipage}[t]{0.2cm}
-\hfill
-\end{minipage}
-\begin{minipage}[t]{6.0cm}
-{\bf\boldmath Transition involving a \hkl<1 1 0> configuration}
-\vspace{0.1cm}
-\begin{itemize}
- \item Bond-centered configuration unstable\\
-       $\rightarrow$ \ci{} \hkl<1 1 0> dumbbell
- \item Minima of the \hkl[0 0 -1] to \hkl[0 -1 0] transition\\
-       $\rightarrow$ \ci{} \hkl<1 1 0> DB
-\end{itemize}
-\vspace{0.1cm}
-\includegraphics[width=6.0cm]{00-1_110_0-10_mig_albe.ps}
-\begin{itemize}
- \item $\Delta E \approx \unit[2.2]{eV} \text{ \& } \unit[0.9]{eV}$
- \item 2.4 -- 3.4 times higher than ab initio result
- \item After all: Change of the DB orientation
-\end{itemize}
+\begin{minipage}[t]{0.2cm}
+\hfill
+\end{minipage}
+\begin{minipage}[t]{6.0cm}
+{\bf\boldmath Transition involving a \hkl<1 1 0> configuration}
+\vspace{0.1cm}
+\begin{itemize}
+ \item Bond-centered configuration unstable\\
+       $\rightarrow$ \ci{} \hkl<1 1 0> dumbbell
+ \item Minima of the \hkl[0 0 -1] to \hkl[0 -1 0] transition\\
+       $\rightarrow$ \ci{} \hkl<1 1 0> DB
+\end{itemize}
+\vspace{0.1cm}
+\includegraphics[width=6.0cm]{00-1_110_0-10_mig_albe.ps}
+\begin{itemize}
+ \item $\Delta E \approx \unit[2.2]{eV} \text{ \& } \unit[0.9]{eV}$
+ \item 2.4 -- 3.4 times higher than ab initio result
+ \item After all: Change of the DB orientation
+\end{itemize}
 \end{minipage}
 
 \vspace{0.5cm}
@@ -1340,7 +1083,7 @@ Reorientation pathway composed of two consecutive processes of the above type
 
 \headphd
 {\large\bf\boldmath
- Defect combinations
+ Defect combinations --- ab inito
 }
 
 \footnotesize
@@ -2301,15 +2044,9 @@ High C \& low T implants
  \underline{Augsburg}
  \begin{itemize}
   \item Prof. B. Stritzker
-  \item Prof. F. Haider
   \item Ralf Utermann
  \end{itemize}
  
- \underline{Berlin/Brandenburg}
- \begin{itemize}
-  \item PD V. Eyert
- \end{itemize}
- 
  \underline{Helsinki}
  \begin{itemize}
   \item Prof. K. Nordlund
@@ -2327,15 +2064,273 @@ High C \& low T implants
   \item Dr. E. Rauls
  \end{itemize}
 
-\vspace{0.1cm}
+\vspace{ 0.2cm}
 
 \begin{center}
 \framebox{
-\bf Thank you for your attention!
+\normalsize\bf Thank you for your attention!
 }
 \end{center}
 
 \end{slide}
 
+\begin{slide}
+
+\headphd
+ {\large\bf
+  Polytypes of SiC\\[0.6cm]
+ }
+
+\vspace{0.6cm}
+
+\includegraphics[width=3.8cm]{cubic_hex.eps}\\
+\begin{minipage}{1.9cm}
+{\tiny cubic (twist)}
+\end{minipage}
+\begin{minipage}{2.9cm}
+{\tiny hexagonal (no twist)}
+\end{minipage}
+
+\begin{picture}(0,0)(-150,0)
+ \includegraphics[width=7cm]{polytypes.eps}
+\end{picture}
+
+\vspace{0.6cm}
+
+\footnotesize
+
+\begin{tabular}{l c c c c c c}
+\hline
+ & 3C-SiC & 4H-SiC & 6H-SiC & Si & GaN & Diamond\\
+\hline
+Hardness [Mohs] & \multicolumn{3}{c}{------ 9.6 ------}& 6.5 & - & 10 \\
+Band gap [eV] & 2.36 & 3.23 & 3.03 & 1.12 & 3.39 & 5.5 \\
+Break down field [$10^6$ V/cm] & 4 & 3 & 3.2 & 0.6 & 5 & 10 \\
+Saturation drift velocity [$10^7$ cm/s] & 2.5 & 2.0 & 2.0 & 1 & 2.7 & 2.7 \\
+Electron mobility [cm$^2$/Vs] & 800 & 900 & 400 & 1100 & 900 & 2200 \\
+Hole mobility [cm$^2$/Vs] & 320 & 120 & 90 & 420 & 150 & 1600 \\
+Thermal conductivity [W/cmK] & 5.0 & 4.9 & 4.9 & 1.5 & 1.3 & 22 \\
+\hline
+\end{tabular}
+
+\begin{pspicture}(0,0)(0,0)
+\psellipse[linecolor=green](5.7,2.05)(0.4,0.50)
+\end{pspicture}
+\begin{pspicture}(0,0)(0,0)
+\psellipse[linecolor=green](5.6,0.89)(0.4,0.20)
+\end{pspicture}
+\begin{pspicture}(0,0)(0,0)
+\psellipse[linecolor=red](10.45,0.42)(0.4,0.20)
+\end{pspicture}
+
+\end{slide}
+
+\begin{slide}
+
+\footnotesize
+
+\headphd
+{\large\bf
+ Si self-interstitial point defects in silicon\\[0.1cm]
+}
+
+\begin{center}
+\begin{tabular}{l c c c c c}
+\hline
+ $E_{\text{f}}$ [eV] & \hkl<1 1 0> DB & H & T & \hkl<1 0 0> DB & V \\
+\hline
+ \textsc{vasp} & \underline{3.39} & 3.42 & 3.77 & 4.41 & 3.63 \\
+ Erhart/Albe & 4.39 & 4.48$^*$ & \underline{3.40} & 5.42 & 3.13 \\
+\hline
+\end{tabular}\\[0.4cm]
+\end{center}
+
+\begin{minipage}{3cm}
+\begin{center}
+\underline{Vacancy}\\
+\includegraphics[width=2.8cm]{si_pd_albe/vac.eps}
+\end{center}
+\end{minipage}
+\begin{minipage}{3cm}
+\begin{center}
+\underline{\hkl<1 1 0> DB}\\
+\includegraphics[width=2.8cm]{si_pd_albe/110_bonds.eps}
+\end{center}
+\end{minipage}
+\begin{minipage}{3cm}
+\begin{center}
+\underline{\hkl<1 0 0> DB}\\
+\includegraphics[width=2.8cm]{si_pd_albe/100_bonds.eps}
+\end{center}
+\end{minipage}
+\begin{minipage}{3cm}
+\begin{center}
+\underline{Tetrahedral}\\
+\includegraphics[width=2.8cm]{si_pd_albe/tet_bonds.eps}
+\end{center}
+\end{minipage}\\
+
+\underline{Hexagonal} \hspace{2pt}
+\href{../video/si_self_int_hexa.avi}{$\rhd$}\\[0.1cm]
+\framebox{
+\begin{minipage}{2.7cm}
+$E_{\text{f}}^*=4.48\text{ eV}$\\
+\includegraphics[width=2.7cm]{si_pd_albe/hex_a_bonds.eps}
+\end{minipage}
+\begin{minipage}{0.4cm}
+\begin{center}
+$\Rightarrow$
+\end{center}
+\end{minipage}
+\begin{minipage}{2.7cm}
+$E_{\text{f}}=3.96\text{ eV}$\\
+\includegraphics[width=2.8cm]{si_pd_albe/hex_bonds.eps}
+\end{minipage}
+}
+\begin{minipage}{5.5cm}
+\begin{center}
+{\tiny nearly T $\rightarrow$ T}\\
+\end{center}
+\includegraphics[width=6.0cm]{nhex_tet.ps}
+\end{minipage}
+
+\end{slide}
+
+\begin{slide}
+
+\headphd
+{\large\bf\boldmath
+ C-Si dimer \& bond-centered interstitial configuration
+}
+
+\footnotesize
+
+\vspace{0.1cm}
+
+\begin{minipage}[t]{4.1cm}
+{\bf\boldmath C \hkl<1 0 0> DB interstitial}\\[0.1cm]
+\begin{minipage}{2.0cm}
+\begin{center}
+\underline{Erhart/Albe}
+\includegraphics[width=2.0cm]{c_pd_albe/100_cmp.eps}
+\end{center}
+\end{minipage}
+\begin{minipage}{2.0cm}
+\begin{center}
+\underline{\textsc{vasp}}
+\includegraphics[width=2.0cm]{c_pd_vasp/100_cmp.eps}
+\end{center}
+\end{minipage}\\[0.2cm]
+Si-C-Si bond angle $\rightarrow$ \unit[180]{$^{\circ}$}\\
+$\Rightarrow$ $sp$ hybridization\\[0.1cm]
+Si-Si-Si bond angle $\rightarrow$ \unit[120]{$^{\circ}$}\\
+$\Rightarrow$ $sp^2$ hybridization
+\begin{center}
+\includegraphics[width=3.4cm]{c_pd_vasp/eden.eps}\\[-0.1cm]
+{\tiny Charge density isosurface}
+\end{center}
+\end{minipage}
+\begin{minipage}{0.2cm}
+\hfill
+\end{minipage}
+\begin{minipage}[t]{8.1cm}
+\begin{flushright}
+{\bf Bond-centered interstitial}\\[0.1cm]
+\begin{minipage}{4.4cm}
+%\scriptsize
+\begin{itemize}
+ \item Linear Si-C-Si bond
+ \item Si: one C \& 3 Si neighbours
+ \item Spin polarized calculations
+ \item No saddle point!\\
+       Real local minimum!
+\end{itemize}
+\end{minipage}
+\begin{minipage}{2.7cm}
+%\includegraphics[width=2.8cm]{c_pd_vasp/bc_2333.eps}\\
+\vspace{0.2cm}
+\includegraphics[width=2.8cm]{c_pd_albe/bc_bonds.eps}\\
+\end{minipage}
+
+\framebox{
+ \tiny
+ \begin{minipage}[t]{6.5cm}
+  \begin{minipage}[t]{1.2cm}
+  {\color{red}Si}\\
+  {\tiny sp$^3$}\\[0.8cm]
+  \underline{${\color{black}\uparrow}$}
+  \underline{${\color{black}\uparrow}$}
+  \underline{${\color{black}\uparrow}$}
+  \underline{${\color{red}\uparrow}$}\\
+  sp$^3$
+  \end{minipage}
+  \begin{minipage}[t]{1.4cm}
+  \begin{center}
+  {\color{red}M}{\color{blue}O}\\[0.8cm]
+  \underline{${\color{blue}\uparrow}{\color{white}\downarrow}$}\\
+  $\sigma_{\text{ab}}$\\[0.5cm]
+  \underline{${\color{red}\uparrow}{\color{blue}\downarrow}$}\\
+  $\sigma_{\text{b}}$
+  \end{center}
+  \end{minipage}
+  \begin{minipage}[t]{1.0cm}
+  \begin{center}
+  {\color{blue}C}\\
+  {\tiny sp}\\[0.2cm]
+  \underline{${\color{white}\uparrow\uparrow}$}
+  \underline{${\color{white}\uparrow\uparrow}$}\\
+  2p\\[0.4cm]
+  \underline{${\color{blue}\uparrow}{\color{blue}\downarrow}$}
+  \underline{${\color{blue}\uparrow}{\color{blue}\downarrow}$}\\
+  sp
+  \end{center}
+  \end{minipage}
+  \begin{minipage}[t]{1.4cm}
+  \begin{center}
+  {\color{blue}M}{\color{green}O}\\[0.8cm]
+  \underline{${\color{blue}\uparrow}{\color{white}\downarrow}$}\\
+  $\sigma_{\text{ab}}$\\[0.5cm]
+  \underline{${\color{green}\uparrow}{\color{blue}\downarrow}$}\\
+  $\sigma_{\text{b}}$
+  \end{center}
+  \end{minipage}
+  \begin{minipage}[t]{1.2cm}
+  \begin{flushright}
+  {\color{green}Si}\\
+  {\tiny sp$^3$}\\[0.8cm]
+  \underline{${\color{green}\uparrow}$}
+  \underline{${\color{black}\uparrow}$}
+  \underline{${\color{black}\uparrow}$}
+  \underline{${\color{black}\uparrow}$}\\
+  sp$^3$
+  \end{flushright}
+  \end{minipage}
+ \end{minipage}
+}\\[0.4cm]
+
+%\framebox{
+\begin{minipage}{3.0cm}
+%\scriptsize
+\underline{Charge density}\\
+{\color{gray}$\bullet$} Spin up\\
+{\color{green}$\bullet$} Spin down\\
+{\color{blue}$\bullet$} Resulting spin up\\
+{\color{yellow}$\bullet$} Si atoms\\
+{\color{red}$\bullet$} C atom
+\end{minipage}
+\begin{minipage}{3.6cm}
+\includegraphics[width=3.8cm]{c_100_mig_vasp/im_spin_diff.eps}
+\end{minipage}
+%}
+
+\end{flushright}
+
+\end{minipage}
+\begin{pspicture}(0,0)(0,0)
+\psline[linecolor=gray,linewidth=0.05cm](-7.8,-8.7)(-7.8,0)
+\end{pspicture}
+
+\end{slide}
+
 \end{document}