X-Git-Url: https://hackdaworld.org/gitweb/?p=lectures%2Flatex.git;a=blobdiff_plain;f=posic%2Ftalks%2Fmpi_app.tex;h=e4cdd485901ab5dbde0bc2bf829d7f9e861eaf1f;hp=e90f38fe4177feeb6db1594c093e698ce9507bfb;hb=ab8104bce0b6ea93877f9a5102a9fa933c4bf17f;hpb=d3b0a76fe369fc79a1d014e8eef3dec01323c8fa diff --git a/posic/talks/mpi_app.tex b/posic/talks/mpi_app.tex index e90f38f..e4cdd48 100644 --- a/posic/talks/mpi_app.tex +++ b/posic/talks/mpi_app.tex @@ -7,6 +7,7 @@ \usepackage[latin1]{inputenc} \usepackage[T1]{fontenc} \usepackage{amsmath} +\usepackage{stmaryrd} \usepackage{latexsym} \usepackage{ae} @@ -55,6 +56,28 @@ \usepackage{upgreek} +\newcommand{\headdiplom}{ +\begin{pspicture}(0,0)(0,0) +\rput(6.0,0.2){\psframebox[fillstyle=gradient,gradbegin=red,gradend=white,gradlines=1000,gradmidpoint=1,linestyle=none]{ +\begin{minipage}{14cm} +\hfill +\vspace{0.7cm} +\end{minipage} +}} +\end{pspicture} +} + +\newcommand{\headphd}{ +\begin{pspicture}(0,0)(0,0) +\rput(6.0,0.2){\psframebox[fillstyle=gradient,gradbegin=blue,gradend=white,gradlines=1000,gradmidpoint=1,linestyle=none]{ +\begin{minipage}{14cm} +\hfill +\vspace{0.7cm} +\end{minipage} +}} +\end{pspicture} +} + \begin{document} \extraslideheight{10in} @@ -391,8 +414,6 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0) % outline -\fi - \begin{slide} {\large\bf @@ -406,7 +427,7 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0) \end{center} \begin{pspicture}(0,0)(0,0) -\rput(6.0,7.0){\rnode{init}{\psframebox[fillstyle=gradient,gradbegin=white,gradend=red,gradlines=1000,gradmidpoint=0.5,linestyle=none]{ +\rput(6.0,7.0){\rnode{init}{\psframebox[fillstyle=gradient,gradbegin=red,gradend=white,gradlines=1000,gradmidpoint=1.0,linestyle=none]{ \begin{minipage}{11cm} {\color{black}Diploma thesis}\\ \underline{Monte Carlo} simulation modeling the selforganization process\\ @@ -415,7 +436,7 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0) }}} \end{pspicture} \begin{pspicture}(0,0)(0,0) -\rput(6.0,-0.5){\rnode{init}{\psframebox[fillstyle=gradient,gradbegin=white,gradend=blue,gradmidpoint=0.5,gradlines=1000,linestyle=none]{ +\rput(6.0,-0.5){\rnode{init}{\psframebox[fillstyle=gradient,gradbegin=blue,gradend=white,gradmidpoint=1.0,gradlines=1000,linestyle=none]{ \begin{minipage}{11cm} {\color{black}Doctoral studies}\\ Classical potential \underline{molecular dynamics} simulations \ldots\\ @@ -435,19 +456,11 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0) \begin{slide} +\headdiplom {\large\bf Selforganization of nanometric amorphous SiC lamellae } -\begin{pspicture}(0,0)(0,0) -\psframebox[fillstyle=gradient,gradbegin=white,gradend=red,gradlines=1000,gradmidpoint=0.5,linestyle=none]{ -\begin{minipage}{14cm} -\hfill -\vspace*{0.5cm} -\end{minipage} -} -\end{pspicture} - \small \vspace{0.2cm} @@ -465,7 +478,8 @@ Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0) \begin{minipage}{12cm} \includegraphics[width=9cm]{../../nlsop/img/k393abild1_e_l.eps}\\ {\scriptsize -XTEM bright-field, \unit[180]{keV} C$^+ \rightarrow$ Si, \degc{150}, +XTEM bright-field, \unit[180]{keV} C$^+ \rightarrow$ Si, +{\color{red}\underline{\degc{150}}}, Dose: \unit[4.3 $\times 10^{17}$]{cm$^{-2}$} } \end{minipage} @@ -483,11 +497,9 @@ XTEM bright-field and respective EFTEM C map \end{slide} -\end{document} -\ifnum1=0 - \begin{slide} +\headdiplom {\large\bf Model displaying the formation of ordered lamellae } @@ -524,6 +536,7 @@ XTEM bright-field and respective EFTEM C map \begin{slide} +\headdiplom {\large\bf Implementation of the Monte Carlo code } @@ -569,38 +582,46 @@ p_{a \rightarrow c}(\vec r) = (1 - p_{c \rightarrow a}(\vec r)) \Big(1 - \frac{\ \begin{slide} \begin{minipage}{3.7cm} +\begin{pspicture}(0,0)(0,0) +\rput(1.7,0.2){\psframebox[fillstyle=gradient,gradbegin=red,gradend=white,gradlines=1000,gradangle=10,gradmidpoint=1,linestyle=none]{ +\begin{minipage}{3.7cm} +\hfill +\vspace{0.7cm} +\end{minipage} +}} +\end{pspicture} {\large\bf Results } \footnotesize -\vspace{1.0cm} +\vspace{1.2cm} Evolution of the \ldots \begin{itemize} \item continuous\\ amorphous layer \item a/c interface - \item lamella precipitates + \item lamellar precipitates \end{itemize} -\ldots reproduced!\\[1.5cm] +\ldots reproduced!\\[1.4cm] {\color{blue} \begin{center} Experiment \& simulation\\ in good agreement\\[1.0cm] -Simulation is able to model the whole depth region\\[1.0cm] +Simulation is able to model the whole depth region\\[1.2cm] \end{center} } \end{minipage} -\begin{minipage}{0.4cm} +\begin{minipage}{0.5cm} \vfill \end{minipage} \begin{minipage}{8.0cm} - \vspace{-0.2cm} + \vspace{-0.3cm} \includegraphics[width=9cm]{../../nlsop/img/dosis_entwicklung_ng_e_1-2.eps}\\ \includegraphics[width=9cm]{../../nlsop/img/dosis_entwicklung_ng_e2_2-2.eps} \end{minipage} @@ -609,6 +630,7 @@ Simulation is able to model the whole depth region\\[1.0cm] \begin{slide} +\headdiplom {\large\bf Structural \& compositional details } @@ -633,7 +655,7 @@ Simulation is able to model the whole depth region\\[1.0cm] \item C accumulation in the amorphous phase / Origin of stress \end{itemize} -\begin{picture}(0,0)(-265,-30) +\begin{picture}(0,0)(-260,-50) \framebox{ \begin{minipage}{3cm} \begin{center} @@ -649,82 +671,130 @@ by simulation! \end{slide} - -\end{document} - -% continue here -\fi - -\ifnum1=0 - \begin{slide} +\headphd {\large\bf - Model displaying the formation of ordered lamellae + Formation of epitaxial single crystalline 3C-SiC } -\framebox{ - \begin{minipage}{6.3cm} +\footnotesize + +\vspace{0.2cm} + +\begin{center} +\begin{itemize} + \item \underline{Implantation step 1}\\[0.1cm] + Almost stoichiometric dose | \unit[180]{keV} | \degc{500}\\ + $\Rightarrow$ Epitaxial {\color{blue}3C-SiC} layer \& + {\color{blue}precipitates} + \item \underline{Implantation step 2}\\[0.1cm] + Little remaining dose | \unit[180]{keV} | \degc{250}\\ + $\Rightarrow$ + Destruction/Amorphization of precipitates at layer interface + \item \underline{Annealing}\\[0.1cm] + \unit[10]{h} at \degc{1250}\\ + $\Rightarrow$ Homogeneous 3C-SiC layer with sharp interfaces +\end{itemize} +\end{center} + +\begin{minipage}{7cm} +\includegraphics[width=7cm]{ibs_3c-sic.eps} +\end{minipage} +\begin{minipage}{5cm} +\begin{pspicture}(0,0)(0,0) +\rnode{box}{ +\psframebox[fillstyle=solid,fillcolor=white,linecolor=blue,linestyle=solid]{ +\begin{minipage}{5.3cm} \begin{center} {\color{blue} - Precipitation mechanism not yet fully understood! + 3C-SiC precipitation\\ + not yet fully understood } + \end{center} + \vspace*{0.1cm} \renewcommand\labelitemi{$\Rightarrow$} - \small - \underline{Understanding the SiC precipitation} + Details of the SiC precipitation \begin{itemize} - \item significant technological progress in SiC thin film formation - \item perspectives for processes relying upon prevention of SiC precipitation + \item significant technological progress\\ + in SiC thin film formation + \item perspectives for processes relying\\ + upon prevention of SiC precipitation \end{itemize} - \end{center} - \end{minipage} -} +\end{minipage} +}} +\rput(-6.8,5.4){\pnode{h0}} +\rput(-3.0,5.4){\pnode{h1}} +\ncline[linecolor=blue]{-}{h0}{h1} +\ncline[linecolor=blue]{->}{h1}{box} +\end{pspicture} +\end{minipage} \end{slide} \begin{slide} - {\large\bf +\headphd +{\large\bf Supposed precipitation mechanism of SiC in Si - } +} \scriptsize \vspace{0.1cm} - \begin{minipage}{3.8cm} - Si \& SiC lattice structure\\[0.2cm] - \includegraphics[width=3.5cm]{sic_unit_cell.eps}\\[-0.3cm] - \hrule + \framebox{ + \begin{minipage}{3.6cm} + \begin{center} + Si \& SiC lattice structure\\[0.1cm] + \includegraphics[width=2.3cm]{sic_unit_cell.eps} + \end{center} +{\tiny + \begin{minipage}{1.7cm} +\underline{Silicon}\\ +{\color{yellow}$\bullet$} Si | {\color{gray}$\bullet$} Si\\ +$a=\unit[5.429]{\\A}$\\ +$\rho^*_{\text{Si}}=\unit[100]{\%}$ + \end{minipage} + \begin{minipage}{1.7cm} +\underline{Silicon carbide}\\ +{\color{yellow}$\bullet$} Si | {\color{gray}$\bullet$} C\\ +$a=\unit[4.359]{\\A}$\\ +$\rho^*_{\text{Si}}=\unit[97]{\%}$ + \end{minipage} +} \end{minipage} - \hspace{0.6cm} - \begin{minipage}{3.8cm} + } + \hspace{0.1cm} + \begin{minipage}{4.1cm} \begin{center} \includegraphics[width=3.3cm]{tem_c-si-db.eps} \end{center} \end{minipage} - \hspace{0.6cm} - \begin{minipage}{3.8cm} + \hspace{0.1cm} + \begin{minipage}{4.0cm} \begin{center} \includegraphics[width=3.3cm]{tem_3c-sic.eps} \end{center} \end{minipage} - \begin{minipage}{4cm} + \vspace{0.1cm} + + \begin{minipage}{4.0cm} \begin{center} C-Si dimers (dumbbells)\\[-0.1cm] on Si interstitial sites \end{center} \end{minipage} - \hspace{0.2cm} - \begin{minipage}{4.2cm} + \hspace{0.1cm} + \begin{minipage}{4.1cm} \begin{center} Agglomeration of C-Si dumbbells\\[-0.1cm] $\Rightarrow$ dark contrasts \end{center} \end{minipage} - \hspace{0.2cm} - \begin{minipage}{4cm} + \hspace{0.1cm} + \begin{minipage}{4.0cm} \begin{center} Precipitation of 3C-SiC in Si\\[-0.1cm] $\Rightarrow$ Moir\'e fringes\\[-0.1cm] @@ -732,37 +802,39 @@ by simulation! \end{center} \end{minipage} - \begin{minipage}{3.8cm} + \vspace{0.1cm} + + \begin{minipage}{4.0cm} \begin{center} \includegraphics[width=3.3cm]{sic_prec_seq_01.eps} \end{center} \end{minipage} - \hspace{0.6cm} - \begin{minipage}{3.8cm} + \hspace{0.1cm} + \begin{minipage}{4.1cm} \begin{center} \includegraphics[width=3.3cm]{sic_prec_seq_02.eps} \end{center} \end{minipage} - \hspace{0.6cm} - \begin{minipage}{3.8cm} + \hspace{0.1cm} + \begin{minipage}{4.0cm} \begin{center} \includegraphics[width=3.3cm]{sic_prec_seq_03.eps} \end{center} \end{minipage} \begin{pspicture}(0,0)(0,0) -\psline[linewidth=4pt]{->}(8.5,2)(9.0,2) -\psellipse[linecolor=blue](11.5,5.8)(0.3,0.5) -\rput{-20}{\psellipse[linecolor=blue](3.3,8.1)(0.3,0.5)} -\psline[linewidth=4pt]{->}(4.0,2)(4.5,2) -\rput(12.7,0.3){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ +\psline[linewidth=2pt]{->}(8.3,2)(8.8,2) +\psellipse[linecolor=blue](11.1,6.0)(0.3,0.5) +\rput{-20}{\psellipse[linecolor=blue](3.1,8.2)(0.3,0.5)} +\psline[linewidth=2pt]{->}(3.9,2)(4.4,2) +\rput(11.8,0.3){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ $4a_{\text{Si}}=5a_{\text{SiC}}$ }}} -\rput(12.2,8){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ +\rput(11.5,8){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ \hkl(h k l) planes match }}} -\rput(9.7,6.2){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ -r = 2 - 4 nm +\rput(8.5,6.2){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ +r = \unit[2--4]{nm} }}} \end{pspicture} @@ -770,47 +842,67 @@ r = 2 - 4 nm \begin{slide} - {\large\bf - Supposed precipitation mechanism of SiC in Si - } +\headphd +{\large\bf + Supposed precipitation mechanism of SiC in Si +} \scriptsize \vspace{0.1cm} - \begin{minipage}{3.8cm} - Si \& SiC lattice structure\\[0.2cm] - \includegraphics[width=3.5cm]{sic_unit_cell.eps}\\[-0.3cm] - \hrule + \framebox{ + \begin{minipage}{3.6cm} + \begin{center} + Si \& SiC lattice structure\\[0.1cm] + \includegraphics[width=2.3cm]{sic_unit_cell.eps} + \end{center} +{\tiny + \begin{minipage}{1.7cm} +\underline{Silicon}\\ +{\color{yellow}$\bullet$} Si | {\color{gray}$\bullet$} Si\\ +$a=\unit[5.429]{\\A}$\\ +$\rho^*_{\text{Si}}=\unit[100]{\%}$ \end{minipage} - \hspace{0.6cm} - \begin{minipage}{3.8cm} + \begin{minipage}{1.7cm} +\underline{Silicon carbide}\\ +{\color{yellow}$\bullet$} Si | {\color{gray}$\bullet$} C\\ +$a=\unit[4.359]{\\A}$\\ +$\rho^*_{\text{Si}}=\unit[97]{\%}$ + \end{minipage} +} + \end{minipage} + } + \hspace{0.1cm} + \begin{minipage}{4.1cm} \begin{center} \includegraphics[width=3.3cm]{tem_c-si-db.eps} \end{center} \end{minipage} - \hspace{0.6cm} - \begin{minipage}{3.8cm} + \hspace{0.1cm} + \begin{minipage}{4.0cm} \begin{center} \includegraphics[width=3.3cm]{tem_3c-sic.eps} \end{center} \end{minipage} - \begin{minipage}{4cm} + \vspace{0.1cm} + + \begin{minipage}{4.0cm} \begin{center} C-Si dimers (dumbbells)\\[-0.1cm] on Si interstitial sites \end{center} \end{minipage} - \hspace{0.2cm} - \begin{minipage}{4.2cm} + \hspace{0.1cm} + \begin{minipage}{4.1cm} \begin{center} Agglomeration of C-Si dumbbells\\[-0.1cm] $\Rightarrow$ dark contrasts \end{center} \end{minipage} - \hspace{0.2cm} - \begin{minipage}{4cm} + \hspace{0.1cm} + \begin{minipage}{4.0cm} \begin{center} Precipitation of 3C-SiC in Si\\[-0.1cm] $\Rightarrow$ Moir\'e fringes\\[-0.1cm] @@ -818,60 +910,81 @@ r = 2 - 4 nm \end{center} \end{minipage} - \begin{minipage}{3.8cm} + \vspace{0.1cm} + + \begin{minipage}{4.0cm} \begin{center} \includegraphics[width=3.3cm]{sic_prec_seq_01.eps} \end{center} \end{minipage} - \hspace{0.6cm} - \begin{minipage}{3.8cm} + \hspace{0.1cm} + \begin{minipage}{4.1cm} \begin{center} \includegraphics[width=3.3cm]{sic_prec_seq_02.eps} \end{center} \end{minipage} - \hspace{0.6cm} - \begin{minipage}{3.8cm} + \hspace{0.1cm} + \begin{minipage}{4.0cm} \begin{center} \includegraphics[width=3.3cm]{sic_prec_seq_03.eps} \end{center} \end{minipage} \begin{pspicture}(0,0)(0,0) -\psline[linewidth=4pt]{->}(8.5,2)(9.0,2) -\psellipse[linecolor=blue](11.5,5.8)(0.3,0.5) -\rput{-20}{\psellipse[linecolor=blue](3.3,8.1)(0.3,0.5)} -\psline[linewidth=4pt]{->}(4.0,2)(4.5,2) -\rput(12.7,0.3){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ +\psline[linewidth=2pt]{->}(8.3,2)(8.8,2) +\psellipse[linecolor=blue](11.1,6.0)(0.3,0.5) +\rput{-20}{\psellipse[linecolor=blue](3.1,8.2)(0.3,0.5)} +\psline[linewidth=2pt]{->}(3.9,2)(4.4,2) +\rput(11.8,0.3){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ $4a_{\text{Si}}=5a_{\text{SiC}}$ }}} -\rput(12.2,8){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ +\rput(11.5,8){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ \hkl(h k l) planes match }}} -\rput(9.7,6.2){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ -r = 2 - 4 nm +\rput(8.5,6.2){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ +r = \unit[2--4]{nm} }}} -\rput(6.7,5.2){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=white]{ +% controversial view! +\rput(6.5,5.0){\psframebox[fillstyle=solid,opacity=0.5,fillcolor=black]{ +\begin{minipage}{14cm} +\hfill +\vspace{12cm} +\end{minipage} +}} +\rput(6.5,5.3){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=white,linewidth=0.1cm]{ \begin{minipage}{10cm} \small -{\color{red}\bf Controversial views} +\vspace*{0.2cm} +\begin{center} +{\color{gray}\bf Controversial findings} +\end{center} \begin{itemize} -\item Implantations at high T (Nejim et al.) +\item High-temperature implantation {\tiny\color{gray}/Nejim~et~al./} \begin{itemize} - \item Topotactic transformation based on \cs - \item \si{} as supply reacting with further C in cleared volume + \item C incorporated {\color{blue}substitutionally} on regular Si lattice sites + \item \si{} reacting with further C in cleared volume \end{itemize} -\item Annealing behavior (Serre et al.) +\item Annealing behavior {\tiny\color{gray}/Serre~et~al./} \begin{itemize} - \item Room temperature implants $\rightarrow$ highly mobile C - \item Elevated T implants $\rightarrow$ no/low C redistribution/migration\\ - (indicate stable \cs{} configurations) + \item Room temperature implantation $\rightarrow$ high C diffusion + \item Elevated temperature implantation $\rightarrow$ no C redistribution \end{itemize} + $\Rightarrow$ mobile {\color{red}\ci} opposed to + stable {\color{blue}\cs{}} configurations \item Strained silicon \& Si/SiC heterostructures + {\tiny\color{gray}/Strane~et~al./Guedj~et~al./} \begin{itemize} - \item Coherent SiC precipitates (tensile strain) + \item {\color{blue}Coherent} SiC precipitates (tensile strain) \item Incoherent SiC (strain relaxation) \end{itemize} \end{itemize} +\vspace{0.1cm} +\begin{center} +{\Huge${\lightning}$} \hspace{0.3cm} +{\color{blue}\cs{}} --- vs --- {\color{red}\ci} \hspace{0.3cm} +{\Huge${\lightning}$} +\end{center} +\vspace{0.2cm} \end{minipage} }}} \end{pspicture} @@ -880,160 +993,110 @@ r = 2 - 4 nm \begin{slide} - {\large\bf - Molecular dynamics (MD) simulations - } - - \vspace{12pt} +\headphd +{\large\bf + Utilized computational methods +} - \small +\vspace{0.3cm} - {\bf MD basics:} - \begin{itemize} - \item Microscopic description of N particle system - \item Analytical interaction potential - \item Numerical integration using Newtons equation of motion\\ - as a propagation rule in 6N-dimensional phase space - \item Observables obtained by time and/or ensemble averages - \end{itemize} - {\bf Details of the simulation:} - \begin{itemize} - \item Integration: Velocity Verlet, timestep: $1\text{ fs}$ - \item Ensemble: NpT (isothermal-isobaric) - \begin{itemize} - \item Berendsen thermostat: - $\tau_{\text{T}}=100\text{ fs}$ - \item Berendsen barostat:\\ - $\tau_{\text{P}}=100\text{ fs}$, - $\beta^{-1}=100\text{ GPa}$ - \end{itemize} - \item Erhart/Albe potential: Tersoff-like bond order potential - \vspace*{12pt} - \[ - E = \frac{1}{2} \sum_{i \neq j} \pot_{ij}, \quad - \pot_{ij} = {\color{red}f_C(r_{ij})} - \left[ f_R(r_{ij}) + {\color{blue}b_{ij}} f_A(r_{ij}) \right] - \] - \end{itemize} +\small - \begin{picture}(0,0)(-230,-30) - \includegraphics[width=5cm]{tersoff_angle.eps} - \end{picture} - -\end{slide} +{\bf Molecular dynamics (MD)}\\[0.1cm] +\scriptsize +\begin{tabular}{| p{4.5cm} | p{7.5cm} |} +\hline +System of $N$ particles & +$N=5832\pm 1$ (Defects), $N=238328+6000$ (Precipitation)\\ +Phase space propagation & +Velocity Verlet | timestep: \unit[1]{fs} \\ +Analytical interaction potential & +Tersoff-like {\color{red}short-range}, {\color{blue}bond order} potential +(Erhart/Albe) +$\displaystyle +E = \frac{1}{2} \sum_{i \neq j} \pot_{ij}, \quad + \pot_{ij} = {\color{red}f_C(r_{ij})} + \left[ f_R(r_{ij}) + {\color{blue}b_{ij}} f_A(r_{ij}) \right] +$\\ +Observables: time/ensemble averages & +NpT (isothermal-isobaric) | Berendsen thermostat/barostat\\ +\hline +\end{tabular} -\begin{slide} +\small - {\large\bf - Density functional theory (DFT) calculations - } +\vspace{0.3cm} - \small +{\bf Density functional theory (DFT)} - Basic ingredients necessary for DFT +\scriptsize - \begin{itemize} - \item \underline{Hohenberg-Kohn theorem} - ground state density $n_0(r)$ ... - \begin{itemize} - \item ... uniquely determines the ground state potential - / wavefunctions - \item ... minimizes the systems total energy - \end{itemize} - \item \underline{Born-Oppenheimer} - - $N$ moving electrons in an external potential of static nuclei -\[ -H\Psi = \left[-\sum_i^N \frac{\hbar^2}{2m}\nabla_i^2 - +\sum_i^N V_{\text{ext}}(r_i) - +\sum_{i}(3.5,-2.0){2.5}{130}{15} +\psarcn[linewidth=0.07cm,linestyle=dashed]{->}(3.5,-2.0){2.5}{230}{165} +\psarcn[linewidth=0.07cm,linestyle=dashed]{->}(3.5,-2.0){2.5}{345}{310} -\begin{pspicture}(0,0)(0,0) -\psellipse[linecolor=blue](1.5,6.75)(0.5,0.3) \end{pspicture} +\end{minipage} \end{slide} \begin{slide} +\headphd {\large\bf - C and Si self-interstitial point defects in silicon + Point defects \& defect migration } \small - \vspace*{0.3cm} + \vspace{0.2cm} -\begin{minipage}{8cm} -Procedure:\\[0.3cm] - \begin{pspicture}(0,0)(7,5) - \rput(3.5,4){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ +\begin{minipage}[b]{7.5cm} +{\bf Defect structure}\\ + \begin{pspicture}(0,0)(7,4.4) + \rput(3.5,3.2){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=hb]{ \parbox{7cm}{ \begin{itemize} \item Creation of c-Si simulation volume @@ -1041,13 +1104,13 @@ Procedure:\\[0.3cm] \item $T=0\text{ K}$, $p=0\text{ bar}$ \end{itemize} }}}} -\rput(3.5,2.1){\rnode{insert}{\psframebox{ +\rput(3.5,1.3){\rnode{insert}{\psframebox{ \parbox{7cm}{ \begin{center} Insertion of interstitial C/Si atoms \end{center} }}}} - \rput(3.5,1){\rnode{cool}{\psframebox[fillstyle=solid,fillcolor=lbb]{ + \rput(3.5,0.2){\rnode{cool}{\psframebox[fillstyle=solid,fillcolor=lbb]{ \parbox{7cm}{ \begin{center} Relaxation / structural energy minimization @@ -1057,49 +1120,83 @@ Procedure:\\[0.3cm] \ncline[]{->}{insert}{cool} \end{pspicture} \end{minipage} -\begin{minipage}{5cm} - \includegraphics[width=5cm]{unit_cell_e.eps}\\ +\begin{minipage}[b]{4.5cm} +\begin{center} +\includegraphics[width=3.8cm]{unit_cell_e.eps}\\ +\end{center} +\begin{minipage}{2.21cm} +{\scriptsize +{\color{red}$\bullet$} Tetrahedral\\[-0.1cm] +{\color{green}$\bullet$} Hexagonal\\[-0.1cm] +{\color{yellow}$\bullet$} \hkl<1 0 0> DB +} +\end{minipage} +\begin{minipage}{2.21cm} +{\scriptsize +{\color{magenta}$\bullet$} \hkl<1 1 0> DB\\[-0.1cm] +{\color{cyan}$\bullet$} Bond-centered\\[-0.1cm] +{\color{black}$\bullet$} Vac. / Sub. +} +\end{minipage} \end{minipage} -\begin{minipage}{9cm} - \begin{tabular}{l c c} - \hline - & size [unit cells] & \# atoms\\ -\hline -VASP & $3\times 3\times 3$ & $216\pm 1$ \\ -Erhart/Albe & $9\times 9\times 9$ & $5832\pm 1$\\ -\hline - \end{tabular} +\vspace{0.2cm} + +\begin{minipage}[b]{6cm} +{\bf Defect formation energy}\\ +\framebox{ +$E_{\text{f}}=E-\sum_i N_i\mu_i$}\\[0.1cm] +Particle reservoir: Si \& SiC\\[0.2cm] +{\bf Binding energy}\\ +\framebox{ +$ +E_{\text{b}}= +E_{\text{f}}^{\text{comb}}- +E_{\text{f}}^{1^{\text{st}}}- +E_{\text{f}}^{2^{\text{nd}}} +$ +}\\[0.1cm] +\footnotesize +$E_{\text{b}}<0$: energetically favorable configuration\\ +$E_{\text{b}}\rightarrow 0$: non-interacting, isolated defects\\ \end{minipage} -\begin{minipage}{4cm} -{\color{red}$\bullet$} Tetrahedral\\ -{\color{green}$\bullet$} Hexagonal\\ -{\color{yellow}$\bullet$} \hkl<1 0 0> dumbbell\\ -{\color{magenta}$\bullet$} \hkl<1 1 0> dumbbell\\ -{\color{cyan}$\bullet$} Bond-centered\\ -{\color{black}$\bullet$} Vacancy / Substitutional +\begin{minipage}[b]{6cm} +{\bf Migration barrier} +\footnotesize +\begin{itemize} + \item Displace diffusing atom + \item Constrain relaxation of (diffusing) atoms + \item Record configurational energy +\end{itemize} +\begin{picture}(0,0)(-60,-33) +\includegraphics[width=4.5cm]{crt_mod.eps} +\end{picture} \end{minipage} \end{slide} +% continue here +\fi + \begin{slide} \footnotesize \begin{minipage}{9.5cm} +\headphd {\large\bf - Si self-interstitial point defects in silicon\\ + Si self-interstitial point defects in silicon\\[0.1cm] } \begin{tabular}{l c c c c c} \hline $E_{\text{f}}$ [eV] & \hkl<1 1 0> DB & H & T & \hkl<1 0 0> DB & V \\ \hline - VASP & \underline{3.39} & 3.42 & 3.77 & 4.41 & 3.63 \\ + \textsc{vasp} & \underline{3.39} & 3.42 & 3.77 & 4.41 & 3.63 \\ Erhart/Albe & 4.39 & 4.48$^*$ & \underline{3.40} & 5.42 & 3.13 \\ \hline -\end{tabular}\\[0.2cm] +\end{tabular}\\[0.3cm] \begin{minipage}{4.7cm} \includegraphics[width=4.7cm]{e_kin_si_hex.ps} @@ -1109,7 +1206,7 @@ Erhart/Albe & $9\times 9\times 9$ & $5832\pm 1$\\ {\tiny nearly T $\rightarrow$ T}\\ \end{center} \includegraphics[width=4.7cm]{nhex_tet.ps} -\end{minipage}\\ +\end{minipage}\\[0.1cm] \underline{Hexagonal} \hspace{2pt} \href{../video/si_self_int_hexa.avi}{$\rhd$}\\[0.1cm] @@ -1136,9 +1233,10 @@ $E_{\text{f}}=3.96\text{ eV}$\\ \end{minipage} \end{minipage} -\begin{minipage}{3.5cm} +\begin{minipage}{2.5cm} \begin{flushright} +\vspace*{0.2cm} \underline{\hkl<1 1 0> dumbbell}\\ \includegraphics[width=3.0cm]{si_pd_albe/110.eps}\\ \underline{Tetrahedral}\\ @@ -1155,18 +1253,21 @@ $E_{\text{f}}=3.96\text{ eV}$\\ \footnotesize +\headphd {\large\bf C interstitial point defects in silicon\\[-0.1cm] } +{\scriptsize \begin{tabular}{l c c c c c c r} \hline $E_{\text{f}}$ & T & H & \hkl<1 0 0> DB & \hkl<1 1 0> DB & S & B & \cs{} \& \si\\ \hline - VASP & unstable & unstable & \underline{3.72} & 4.16 & 1.95 & 4.66 & {\color{green}4.17}\\ + \textsc{vasp} & unstable & unstable & \underline{3.72} & 4.16 & 1.95 & 4.66 & {\color{green}4.17}\\ Erhart/Albe MD & 6.09 & 9.05$^*$ & \underline{3.88} & 5.18 & {\color{red}0.75} & 5.59$^*$ & {\color{green}4.43} \\ \hline -\end{tabular}\\[0.1cm] +\end{tabular} +}\\[0.1cm] \framebox{ \begin{minipage}{2.7cm} @@ -1225,6 +1326,9 @@ $E_{\text{f}}=5.18\text{ eV}$\\ \end{slide} +\end{document} +\ifnum1=0 + \begin{slide} \footnotesize @@ -1458,25 +1562,6 @@ $\rightarrow$ \end{minipage} \end{minipage} \end{minipage} -\framebox{ -\begin{minipage}{4.2cm} - {\small Constrained relaxation\\ - technique (CRT) method}\\ -\includegraphics[width=4cm]{crt_orig.eps} -\begin{itemize} - \item Constrain diffusing atom - \item Static constraints -\end{itemize} -\vspace*{0.3cm} - {\small Modifications}\\ -\includegraphics[width=4cm]{crt_mod.eps} -\begin{itemize} - \item Constrain all atoms - \item Update individual\\ - constraints -\end{itemize} -\end{minipage} -} \end{slide}