X-Git-Url: https://hackdaworld.org/gitweb/?p=lectures%2Flatex.git;a=blobdiff_plain;f=posic%2Fthesis%2Fsic.tex;h=c10fe175ee0412ce4241cd5fca699ced06fa12da;hp=5fe0564e02555ebb07b76603a205e893167c1c4f;hb=8254d4d5d47359044bea0b54ebd73f1fe5366d3e;hpb=deb1c40d072e9bbb20e69d6365233dceeb9f2bb9

diff --git a/posic/thesis/sic.tex b/posic/thesis/sic.tex
index 5fe0564..c10fe17 100644
--- a/posic/thesis/sic.tex
+++ b/posic/thesis/sic.tex
@@ -330,24 +330,53 @@ Due to the absence of dislocations in the implanted region interstitial C is ass
 
 % link to strain engineering
 However, there is great interest to incorporate C onto substitutional lattice sites, which results in a contraction of the Si lattice due to the smaller covalent radius of C compared to Si \cite{baker68}, causing tensile strain, which is applied to the Si lattice.
-Thus, substitutional C enables strain engineering of Si and Si/Si$_{1-x}$Ge$_x$ heterostructures \cite{yagi02,chang05,osten97}, which is used to increase charge carrier mobilities in Si as well as to adjust its band structure \cite{soref91,kasper91}.
+Thus, substitutional C enables strain engineering of Si and Si/Si$_{1-x}$Ge$_x$ heterostructures \cite{yagi02,chang05,kissinger94,osten97}, which is used to increase charge carrier mobilities in Si as well as to adjust its band structure \cite{soref91,kasper91}.
 % increase of C at substitutional sites
 Epitaxial layers with \unit[1.4]{at.\%} of substitutional C have been successfully synthesized in preamorphized Si$_{0.86}$Ge$_{0.14}$ layers, which were grown by CVD on Si substrates, using multiple-energy C implantation followed by solid-physe epitaxial regrowth at \unit[700]{$^{\circ}$C} \cite{strane93}.
 The tensile strain induced by the C atoms is found to compensates the compressive strain present due to the Ge atoms.
 Studies on the thermal stability of Si$_{1-y}$C$_y$/Si heterostructures formed in the same way and equal C concentrations showed a loss of substitutional C accompanied by strain relaxation for temperatures ranging from \unit[810-925]{$^{\circ}$C} and the formation of spherical 3C-SiC precipitates with diameters of \unit[2-4]{nm}, which are incoherent but aligned to the Si host \cite{strane94}.
 During the initial stages of precipitation C-rich clusters are assumed, which maintain coherency with the Si matrix and the associated biaxial strain.
-Using this technique a metastable solubility limit was achieved, which corresponds to a C concentration exceeding the solid solubility limit at the Si melting point by nearly three orders of magnitude and, furthermore, a reduction of the defect denisty near the metastable solubility limit is assumed if the regrowth temperature is increased by a rapid thermal annealing process \cite{strane96}.
-By MBE ... \cite{powell93,osten99}
+Using this technique a metastable solubility limit was achieved, which corresponds to a C concentration exceeding the solid solubility limit at the Si melting point by nearly three orders of magnitude and, furthermore, a reduction of the defect denisty near the metastable solubility limit is assumed if the regrowth temperature is increased by rapid thermal annealing \cite{strane96}.
+Since high temperatures used in the solid-phase epitaxial regrowth method promotes SiC precipitation, other groups realized substitutional C incorporation for strained Si$_{1-y}$C$_y$/Si heterostructures \cite{iyer92,fischer95,powell93,osten96,osten99,laveant2002} or partially to fully strain-compensated (even inversely distorted \cite{osten94_2}) Si$_{1-x-y}$Ge$_x$C${_y}$ layers on Si \cite{eberl92,powell93_2,osten94,dietrich94} by \ac{MBE}.
+Investigations reveal a strong dependence of the growth temperature on the amount of substitutionally incorporated C, which is increased for decreasing temperature accompanied by deterioration of the crystal quality \cite{osten96,osten99}.
+While not being compatible to very-large-scale integration technology, C concentrations of \unit[2]{\%} and more have been realized \cite{laveant2002}.
 
 \section{Assumed silicon carbide conversion mechanisms}
 \label{section:assumed_prec}
 
-Although much progress has been made in 3C-SiC thin film growth in the above-mentioned growth methods during the last decades, there is still potential
-.. compatible to the established and highly developed technology based on silicon.
+Although high-quality films of single-crystalline 3C-SiC can be produced by means of \ac{IBS} the precipitation mechanism in bulk Si is not yet fully understood.
+Indeed, closely investigating the large amount of literature reveals controversial ideas of SiC formation assumed by the respective authors, which are reviewed in more detail in the following.
 
-Although tremendous progress has been achieved in the above-mentioned growth methods during the last decades, available wafer dimensions and crystal qualities are not yet statisfactory.
+\ac{HREM} studies \cite{werner96,werner97,eichhorn99,lindner99_2,koegler03} suggest the formation of C-Si dimers (dumbbells) on regular Si lattice sites, which agglomerate into large clusters indicated by dark contrasts and otherwise undisturbed Si lattice fringes in HREM, as can be seen in Fig.~\ref{fig:hrem:c-si}.
+
+A topotactic transformation into a 3C-SiC precipitate occurs once a critical radius of 2 nm to 4 nm is reached, which is manifested by the disappearance of the dark contrasts in favor of Moir\'e patterns (Fig.~\ref{fig:hrem:sic}) due to the lattice mismatch of \unit[20]{\%} of the 3C-SiC precipitate and c-Si.
+
+The insignificantly lower Si density of SiC ($\approx \unit[4]{\%}$) compared to c-Si results in the emission of only a few excess Si atoms.
+
+In contrast, investigations of strained Si$_{1-y}$C$_y$/Si heterostructures formed by MBE\cite{strane94,guedj98}, which incidentally involve the formation of SiC nanocrystallites, suggest an initial coherent precipitation by agglomeration of substitutional instead of interstitial C.
+
+Coherency is lost once the increasing strain energy of the stretched SiC structure surpasses the interfacial energy of the incoherent 3C-SiC precipitate and the Si substrate.
+
+These two different mechanisms of precipitation might be attributed to the respective method of fabrication.
+
+While in CVD and MBE surface effects need to be taken into account, SiC formation during IBS takes place in the bulk of the Si crystal.
+
+However, in another IBS study Nejim et~al.\cite{nejim95} propose a topotactic transformation that is likewise based on the formation of substitutional C.
+
+The formation of substitutional C, however, is accompanied by Si self-interstitial atoms that previously occupied the lattice sites and a concurrent reduction of volume due to the lower lattice constant of SiC compared to Si.
+
+Both processes are believed to compensate one another.
+
+
+cites:
+
+ibs, c-si agglom: werner96,werner97,eichhorn99,lindner99_2,koegler03
+ibs, c sub: nejim95
+ibs, indicated c sub: martin90 + conclusions reeson8x, eichhorn02
+hetero, coherent sic by sub c: strane94,guedj98
+
+more: taylor93, kitabatake contraction along 110, koegler03
 
-... \cite{lindner99_2} ...
 
 %   -> skorupa 3.2: c sub vs sic prec