short vers ...
authorhackbard <hackbard@sage.physik.uni-augsburg.de>
Mon, 27 Jun 2011 13:44:55 +0000 (15:44 +0200)
committerhackbard <hackbard@sage.physik.uni-augsburg.de>
Mon, 27 Jun 2011 13:44:55 +0000 (15:44 +0200)
bibdb/bibdb.bib

index 5fe3369..b9c9742 100644 (file)
   title =        "Effect of Carbon on the Lattice Parameter of Silicon",
   publisher =    "AIP",
   year =         "1968",
   title =        "Effect of Carbon on the Lattice Parameter of Silicon",
   publisher =    "AIP",
   year =         "1968",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "39",
   number =       "9",
   pages =        "4365--4368",
   volume =       "39",
   number =       "9",
   pages =        "4365--4368",
                  silicon",
   publisher =    "AIP",
   year =         "1993",
                  silicon",
   publisher =    "AIP",
   year =         "1993",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "74",
   number =       "6",
   pages =        "3815--3820",
   volume =       "74",
   number =       "6",
   pages =        "3815--3820",
                  silicon",
   publisher =    "AIP",
   year =         "1984",
                  silicon",
   publisher =    "AIP",
   year =         "1984",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "45",
   number =       "3",
   pages =        "268--269",
   volume =       "45",
   number =       "3",
   pages =        "268--269",
                  Ge[sup + ] and {C}[sup + ] implantation",
   publisher =    "AIP",
   year =         "1990",
                  Ge[sup + ] and {C}[sup + ] implantation",
   publisher =    "AIP",
   year =         "1990",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "57",
   number =       "22",
   pages =        "2345--2347",
   volume =       "57",
   number =       "22",
   pages =        "2345--2347",
   title =        "Metastable SiGe{C} formation by solid phase epitaxy",
   publisher =    "AIP",
   year =         "1993",
   title =        "Metastable SiGe{C} formation by solid phase epitaxy",
   publisher =    "AIP",
   year =         "1993",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "63",
   number =       "20",
   pages =        "2786--2788",
   volume =       "63",
   number =       "20",
   pages =        "2786--2788",
                  strained layer superlattices",
   publisher =    "AIP",
   year =         "1992",
                  strained layer superlattices",
   publisher =    "AIP",
   year =         "1992",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "60",
   number =       "22",
   pages =        "2758--2760",
   volume =       "60",
   number =       "22",
   pages =        "2758--2760",
                  off-axis Si substrates",
   publisher =    "AIP",
   year =         "1987",
                  off-axis Si substrates",
   publisher =    "AIP",
   year =         "1987",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "51",
   number =       "11",
   pages =        "823--825",
   volume =       "51",
   number =       "11",
   pages =        "823--825",
                  vicinal (0001) 6{H}-Si{C} wafers",
   publisher =    "AIP",
   year =         "1990",
                  vicinal (0001) 6{H}-Si{C} wafers",
   publisher =    "AIP",
   year =         "1990",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "56",
   number =       "15",
   pages =        "1442--1444",
   volume =       "56",
   number =       "15",
   pages =        "1442--1444",
                  substrates",
   publisher =    "AIP",
   year =         "1988",
                  substrates",
   publisher =    "AIP",
   year =         "1988",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "64",
   number =       "5",
   pages =        "2672--2679",
   volume =       "64",
   number =       "5",
   pages =        "2672--2679",
                  substrates",
   publisher =    "AIP",
   year =         "1988",
                  substrates",
   publisher =    "AIP",
   year =         "1988",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "63",
   number =       "8",
   pages =        "2645--2650",
   volume =       "63",
   number =       "8",
   pages =        "2645--2650",
                  on low-tilt-angle vicinal (0001) 6{H}-Si{C} wafers",
   publisher =    "AIP",
   year =         "1991",
                  on low-tilt-angle vicinal (0001) 6{H}-Si{C} wafers",
   publisher =    "AIP",
   year =         "1991",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "59",
   number =       "3",
   pages =        "333--335",
   volume =       "59",
   number =       "3",
   pages =        "333--335",
                  level using surface superstructures",
   publisher =    "AIP",
   year =         "1996",
                  level using surface superstructures",
   publisher =    "AIP",
   year =         "1996",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "68",
   number =       "9",
   pages =        "1204--1206",
   volume =       "68",
   number =       "9",
   pages =        "1204--1206",
   title =        "High-temperature ion beam synthesis of cubic Si{C}",
   publisher =    "AIP",
   year =         "1990",
   title =        "High-temperature ion beam synthesis of cubic Si{C}",
   publisher =    "AIP",
   year =         "1990",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "67",
   number =       "6",
   pages =        "2908--2912",
   volume =       "67",
   number =       "6",
   pages =        "2908--2912",
                  implanted boron into silicon",
   publisher =    "AIP",
   year =         "1987",
                  implanted boron into silicon",
   publisher =    "AIP",
   year =         "1987",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "50",
   number =       "7",
   pages =        "416--418",
   volume =       "50",
   number =       "7",
   pages =        "416--418",
                  profiles",
   publisher =    "AIP",
   year =         "1990",
                  profiles",
   publisher =    "AIP",
   year =         "1990",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "68",
   number =       "12",
   pages =        "6191--6198",
   volume =       "68",
   number =       "12",
   pages =        "6191--6198",
                  Si[sub 1 - x - y]Ge[sub x]{C}[sub y] alloy system",
   publisher =    "AIP",
   year =         "1992",
                  Si[sub 1 - x - y]Ge[sub x]{C}[sub y] alloy system",
   publisher =    "AIP",
   year =         "1992",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "60",
   number =       "24",
   pages =        "3033--3035",
   volume =       "60",
   number =       "24",
   pages =        "3033--3035",
                  on Si(001) by adding small amounts of carbon",
   publisher =    "AIP",
   year =         "1994",
                  on Si(001) by adding small amounts of carbon",
   publisher =    "AIP",
   year =         "1994",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "64",
   number =       "25",
   pages =        "3440--3442",
   volume =       "64",
   number =       "25",
   pages =        "3440--3442",
                  molecular beam epitaxy",
   publisher =    "AIP",
   year =         "1992",
                  molecular beam epitaxy",
   publisher =    "AIP",
   year =         "1992",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "60",
   number =       "3",
   pages =        "356--358",
   volume =       "60",
   number =       "3",
   pages =        "356--358",
                  by Low-Temperature Chemical Vapor Deposition",
   author =       "Shuhei Yagi and Katsuya Abe and Takashi Okabayashi and
                  Yuichi Yoneyama and Akira Yamada and Makoto Konagai",
                  by Low-Temperature Chemical Vapor Deposition",
   author =       "Shuhei Yagi and Katsuya Abe and Takashi Okabayashi and
                  Yuichi Yoneyama and Akira Yamada and Makoto Konagai",
-  journal =      "Japanese Journal of Applied Physics",
+  journal =      "Japanese J. Appl. Phys.",
   volume =       "41",
   number =       "Part 1, No. 4B",
   pages =        "2472--2475",
   volume =       "41",
   number =       "Part 1, No. 4B",
   pages =        "2472--2475",
                  y] layers on Si(001)",
   publisher =    "AIP",
   year =         "1994",
                  y] layers on Si(001)",
   publisher =    "AIP",
   year =         "1994",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "65",
   number =       "26",
   pages =        "3356--3358",
   volume =       "65",
   number =       "26",
   pages =        "3356--3358",
                  y]{C}[sub y] on Si(001)",
   publisher =    "AIP",
   year =         "1996",
                  y]{C}[sub y] on Si(001)",
   publisher =    "AIP",
   year =         "1996",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "80",
   number =       "12",
   pages =        "6711--6715",
   volume =       "80",
   number =       "12",
   pages =        "6711--6715",
   title =        "Growth and Properties of beta-Si{C} Single Crystals",
   publisher =    "AIP",
   year =         "1966",
   title =        "Growth and Properties of beta-Si{C} Single Crystals",
   publisher =    "AIP",
   year =         "1966",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "37",
   number =       "1",
   pages =        "333--336",
   volume =       "37",
   number =       "1",
   pages =        "333--336",
                  improved external quantum efficiency",
   publisher =    "AIP",
   year =         "1982",
                  improved external quantum efficiency",
   publisher =    "AIP",
   year =         "1982",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "53",
   number =       "10",
   pages =        "6962--6967",
   volume =       "53",
   number =       "10",
   pages =        "6962--6967",
                  single crystals by physical vapor transport",
   publisher =    "AIP",
   year =         "1998",
                  single crystals by physical vapor transport",
   publisher =    "AIP",
   year =         "1998",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "72",
   number =       "13",
   pages =        "1632--1634",
   volume =       "72",
   number =       "13",
   pages =        "1632--1634",
   title =        "Antiphase boundaries in epitaxially grown beta-Si{C}",
   publisher =    "AIP",
   year =         "1987",
   title =        "Antiphase boundaries in epitaxially grown beta-Si{C}",
   publisher =    "AIP",
   year =         "1987",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "50",
   number =       "4",
   pages =        "221--223",
   volume =       "50",
   number =       "4",
   pages =        "221--223",
   title =        "Step-flow epitaxial growth on two-domain surfaces",
   publisher =    "AIP",
   year =         "1996",
   title =        "Step-flow epitaxial growth on two-domain surfaces",
   publisher =    "AIP",
   year =         "1996",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "79",
   number =       "3",
   pages =        "1423--1434",
   volume =       "79",
   number =       "3",
   pages =        "1423--1434",
                  carbonization of silicon",
   publisher =    "AIP",
   year =         "1995",
                  carbonization of silicon",
   publisher =    "AIP",
   year =         "1995",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "78",
   number =       "3",
   pages =        "2070--2073",
   volume =       "78",
   number =       "3",
   pages =        "2070--2073",
                  molecular beam epitaxy",
   publisher =    "AIP",
   year =         "1992",
                  molecular beam epitaxy",
   publisher =    "AIP",
   year =         "1992",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "60",
   number =       "7",
   pages =        "824--826",
   volume =       "60",
   number =       "7",
   pages =        "824--826",
                  molecular beam epitaxy",
   publisher =    "AIP",
   year =         "1994",
                  molecular beam epitaxy",
   publisher =    "AIP",
   year =         "1994",
-  journal =      "Applied Physics Letters",
+  journal =      "Appl. Phys. Lett.",
   volume =       "65",
   number =       "22",
   pages =        "2851--2853",
   volume =       "65",
   number =       "22",
   pages =        "2851--2853",
   title =        "Effect of {H} on Si molecular-beam epitaxy",
   publisher =    "AIP",
   year =         "1993",
   title =        "Effect of {H} on Si molecular-beam epitaxy",
   publisher =    "AIP",
   year =         "1993",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "74",
   number =       "11",
   pages =        "6615--6618",
   volume =       "74",
   number =       "11",
   pages =        "6615--6618",
   title =        "Defects in Carbon-Implanted Silicon",
   author =       "Bulat N. Mukashev and Alexey V. Spitsyn and Noboru
                  Fukuoka and Haruo Saito",
   title =        "Defects in Carbon-Implanted Silicon",
   author =       "Bulat N. Mukashev and Alexey V. Spitsyn and Noboru
                  Fukuoka and Haruo Saito",
-  journal =      "Japanese Journal of Applied Physics",
+  journal =      "Japanese J. Appl. Phys.",
   volume =       "21",
   number =       "Part 1, No. 2",
   pages =        "399--400",
   volume =       "21",
   number =       "Part 1, No. 2",
   pages =        "399--400",
                  high-dose carbon ion implantation in silicon",
   publisher =    "AIP",
   year =         "1995",
                  high-dose carbon ion implantation in silicon",
   publisher =    "AIP",
   year =         "1995",
-  journal =      "Journal of Applied Physics",
+  journal =      "J. Appl. Phys.",
   volume =       "77",
   number =       "7",
   pages =        "2978--2984",
   volume =       "77",
   number =       "7",
   pages =        "2978--2984",