From 74eed718613ff04a1e09a6a5663ac4d38f733e61 Mon Sep 17 00:00:00 2001 From: hackbard Date: Mon, 26 Sep 2011 09:39:27 +0200 Subject: [PATCH] corrected therefor/e + x-ray in small letters --- posic/thesis/basics.tex | 2 +- posic/thesis/defects.tex | 2 +- posic/thesis/sic.tex | 6 +++--- posic/thesis/simulation.tex | 2 +- posic/thesis/summary_outlook.tex | 2 +- 5 files changed, 7 insertions(+), 7 deletions(-) diff --git a/posic/thesis/basics.tex b/posic/thesis/basics.tex index 24b272d..40dfdf1 100644 --- a/posic/thesis/basics.tex +++ b/posic/thesis/basics.tex @@ -619,7 +619,7 @@ The interaction strength, i.e.\ the absolute value of the binding energy, approa Thus, $E_{\text{b}}$ indeed can be best thought of a binding energy, which is required to bring the defects to infinite separation. The methods presented in the last two chapters can be used to investigate defect structures and energetics. -Therefore, a supercell containing the perfect crystal is generated in an initial process. +Therefor, a supercell containing the perfect crystal is generated in an initial process. If not by construction, the system should be fully relaxed. The substitutional or vacancy defect is realized by replacing or removing one atom contained in the supercell. Interstitial defects are created by adding an atom at positions located in the space between regular lattice sites. diff --git a/posic/thesis/defects.tex b/posic/thesis/defects.tex index e515b62..24fa919 100644 --- a/posic/thesis/defects.tex +++ b/posic/thesis/defects.tex @@ -974,7 +974,7 @@ As observed before, a typical C-C distance of \unit[2.79]{\AA} is, thus, observe In both configurations, the far-off atom of the second DB resides in threefold coordination. The interaction of \ci{} \hkl<1 0 0> DBs is investigated along the \hkl[1 1 0] bond chain assuming a possible reorientation of the DB atom at each position to minimize its configurational energy. -Therefore, the binding energies of the energetically most favorable configurations with the second DB located along the \hkl[1 1 0] direction and resulting C-C distances of the relaxed structures are summarized in Table~\ref{tab:defects:comb_db110}. +Therefor, the binding energies of the energetically most favorable configurations with the second DB located along the \hkl[1 1 0] direction and resulting C-C distances of the relaxed structures are summarized in Table~\ref{tab:defects:comb_db110}. \begin{table}[tp] \begin{center} \begin{tabular}{l c c c c c c} diff --git a/posic/thesis/sic.tex b/posic/thesis/sic.tex index e933b3f..c9f2823 100644 --- a/posic/thesis/sic.tex +++ b/posic/thesis/sic.tex @@ -85,14 +85,14 @@ The focus of SiC based applications, however, is in the area of solid state elec These devices include ultraviolet (UV) detectors~\cite{brown93,yan04}, high power radio frequency (RF) amplifiers, rectifiers and switching transistors~\cite{pribble02,baliga96,weitzel96,zhu08,bhatnagar92,bhatnagar93,ryu01} as well as microelectromechanical system (MEMS) applications~\cite{sarro00}. For UV detectors the wide band gap is useful for realizing low photodiode dark currents as well as sensors that are blind to undesired near-infrared wavelengths produced by heat and solar radiation. These photodiodes serve as excellent sensors applicable in the monitoring and control of turbine engine combustion. -The low dark currents enable the use in X-ray, heavy ion and neutron detection in nuclear reactor monitoring and enhanced scientific studies of high-energy particle collisions as well as cosmic radiation. +The low dark currents enable the use in x-ray, heavy ion and neutron detection in nuclear reactor monitoring and enhanced scientific studies of high-energy particle collisions as well as cosmic radiation. The low neutron capture cross section and radiation hardness favors its use in detector applications. The high breakdown field and carrier saturation velocity coupled with the high thermal conductivity allow SiC RF transistors to handle much higher power densities and frequencies in stable operation at high temperatures. Smaller transistor sizes and less cooling requirements lead to a reduced overall size and cost of these systems. For instance, SiC based solid state transmitters hold great promise for High Definition Television (HDTV) broadcast stations~\cite{temcamani01,pribble02} abandoning the reliance on tube-based technology for high-power transmitters significantly reducing the size of such transmitters and long-term maintenance costs. The high breakdown field of SiC compared to Si allows the blocking voltage region of a device to be designed roughly 10 times thinner and 10 times heavier doped, resulting in a decrease of the blocking region resistance by a factor of 100 and a much faster switching behavior. Thus, rectifier diodes and switching transistors with higher switching frequencies and much greater efficiencies can be realized and exploited in highly efficient power converters. -Therefor, SiC constitutes a promising candidate to become the key technology towards an extensive development and use of regenerative energies and electromobility. +Therefore, SiC constitutes a promising candidate to become the key technology towards an extensive development and use of regenerative energies and electromobility. Beside the mentioned electrical capabilities the mechanical stability, which is almost as hard as diamond, and chemical inertness almost suggest SiC to be used in MEMS designs. Among the different polytypes of SiC, the cubic phase shows a high electron mobility and the highest break down field as well as saturation drift velocity~\cite{neudeck95,wesch96}. @@ -280,7 +280,7 @@ Instead, defect annihilation is observed and the C-rich surface layer of the roo Based on these findings% % and extensive TEM investigations , a recipe was developed to form buried layers of single-crystalline SiC featuring an improved interface and crystallinity~\cite{lindner99,lindner01,lindner02}. -Therefore, the dose must not exceed the stoichiometry dose, i.e.\ the dose corresponding to \unit[50]{at.\%} C concentration at the implantation peak. +Therefor, the dose must not exceed the stoichiometry dose, i.e.\ the dose corresponding to \unit[50]{at.\%} C concentration at the implantation peak. Otherwise clusters of C are formed, which cannot be dissolved during post-implantation annealing at moderate temperatures below the Si melting point~\cite{lindner96,calcagno96}. Annealing should be performed for \unit[5--10]{h} at \unit[1250]{$^{\circ}$C} to enable the redistribution from the as-implanted Gaussian into a box-like C depth profile~\cite{lindner95}. The implantation temperature constitutes the most critical parameter, which is responsible for the structure after implantation and, thus, the starting point for subsequent annealing steps. diff --git a/posic/thesis/simulation.tex b/posic/thesis/simulation.tex index 1c9de40..cb04ce7 100644 --- a/posic/thesis/simulation.tex +++ b/posic/thesis/simulation.tex @@ -188,7 +188,7 @@ Nevertheless, a further and rather uncommon test is carried out to roughly estim \subsection{Time step} The quality of the integration algorithm and the occupied time step is determined by the ability to conserve the total energy. -Therefore, simulations of a $9\times9\times9$ 3C-SiC unit cell containing 5832 atoms in total are carried out in the $NVE$ ensemble. +Therefor, simulations of a $9\times9\times9$ 3C-SiC unit cell containing 5832 atoms in total are carried out in the $NVE$ ensemble. The calculations are performed for \unit[100]{ps} corresponding to $10^5$ integration steps and two different initial temperatures are considered, i.e.\ \unit[0]{$^{\circ}$C} and \unit[1000]{$^{\circ}$C}. \begin{figure}[t] \begin{center} diff --git a/posic/thesis/summary_outlook.tex b/posic/thesis/summary_outlook.tex index 8d5b28e..f5dc9aa 100644 --- a/posic/thesis/summary_outlook.tex +++ b/posic/thesis/summary_outlook.tex @@ -96,7 +96,7 @@ Thus, elevated temperatures might lead to configurations of C$_{\text{s}}$ and a % maybe preliminary conclusions here ... Classical potential MD calculations targeting the direct simulation of SiC precipitation in Si are adopted. -Therefore, the necessary amount of C is gradually incorporated into a large c-Si host. +Therefor, the necessary amount of C is gradually incorporated into a large c-Si host. Simulations at temperatures used in IBS result in structures dominated by the C$_{\text{i}}$ \hkl<1 0 0> DB and its combinations if C is inserted into the total volume. Incorporation into volumes $V_2$ and $V_3$, which correspond to the volume of the expected precipitate and the volume containing the necessary amount of Si, lead to an amorphous SiC-like structure within the respective volume. Both results are not expected with respect to the outcome of the IBS experiments. -- 2.20.1