+ notes = "blue led, sublimation process",
+}
+
+@Article{neudeck95,
+ author = "Philip Neudeck",
+ affiliation = "NASA Lewis Research Center M.S. 77-1, 21000 Brookpark
+ Road 44135 Cleveland OH",
+ title = "Progress in silicon carbide semiconductor electronics
+ technology",
+ journal = "J. Electron. Mater.",
+ publisher = "Springer Boston",
+ ISSN = "0361-5235",
+ keyword = "Chemistry and Materials Science",
+ pages = "283--288",
+ volume = "24",
+ issue = "4",
+ URL = "http://dx.doi.org/10.1007/BF02659688",
+ note = "10.1007/BF02659688",
+ year = "1995",
+ notes = "sic data, advantages of 3c sic",
+}
+
+@InProceedings{pribble02,
+ author = "W. L. Pribble and J. W. Palmour and S. T. Sheppard and
+ R. P. Smith and S. T. Allen and T. J. Smith and Z. Ring
+ and J. J. Sumakeris and A. W. Saxler and J. W.
+ Milligan",
+ booktitle = "2002 IEEE MTT-S International Microwave Symposium
+ Digest",
+ title = "Applications of Si{C} {MESFET}s and Ga{N} {HEMT}s in
+ power amplifier design",
+ year = "2002",
+ month = "",
+ volume = "",
+ number = "",
+ pages = "1819--1822",
+ doi = "10.1109/MWSYM.2002.1012216",
+ ISSN = "",
+ notes = "hdtv",
+}
+
+@InProceedings{temcamani01,
+ author = "F. Temcamani and P. Pouvil and O. Noblanc and C.
+ Brylinski and P. Bannelier and B. Darges and J. P.
+ Prigent",
+ booktitle = "2001 IEEE MTT-S International Microwave Symposium
+ Digest",
+ title = "Silicon carbide {MESFET}s performances and application
+ in broadcast power amplifiers",
+ year = "2001",
+ month = "",
+ volume = "",
+ number = "",
+ pages = "641--644",
+ doi = "10.1109/MWSYM.2001.966976",
+ ISSN = "",
+ notes = "hdtv",
+}
+
+@Article{pensl00,
+ author = "Gerhard Pensl and Michael Bassler and Florin Ciobanu
+ and Valeri Afanas'ev and Hiroshi Yano and Tsunenobu
+ Kimoto and Hiroyuki Matsunami",
+ title = "Traps at the Si{C}/Si{O2}-Interface",
+ journal = "MRS Proc.",
+ volume = "640",
+ number = "",
+ pages = "",
+ year = "2000",
+ doi = "10.1557/PROC-640-H3.2",
+ URL = "http://dx.doi.org/10.1557/PROC-640-H3.2",
+}
+
+@Article{bhatnagar93,
+ author = "M. Bhatnagar and B. J. Baliga",
+ journal = "IEEE Trans. Electron Devices",
+ title = "Comparison of 6{H}-Si{C}, 3{C}-Si{C}, and Si for power
+ devices",
+ year = "1993",
+ month = mar,
+ volume = "40",
+ number = "3",
+ pages = "645--655",
+ keywords = "3C-SiC;50 to 5000 V;6H-SiC;Schottky
+ rectifiers;Si;SiC;breakdown voltages;drift region
+ properties;output characteristics;power MOSFETs;power
+ semiconductor devices;switching characteristics;thermal
+ analysis;Schottky-barrier diodes;electric breakdown of
+ solids;insulated gate field effect transistors;power
+ transistors;semiconductor materials;silicon;silicon
+ compounds;solid-state rectifiers;thermal analysis;",
+ doi = "10.1109/16.199372",
+ ISSN = "0018-9383",
+ notes = "comparison 3c 6h sic and si devices",
+}
+
+@Article{ryu01,
+ author = "Sei-Hyung Ryu and A. K. Agarwal and R. Singh and J. W.
+ Palmour",
+ journal = "IEEE Electron Device Lett.",
+ title = "1800 {V} {NPN} bipolar junction transistors in
+ 4{H}-Si{C}",
+ year = "2001",
+ month = mar,
+ volume = "22",
+ number = "3",
+ pages = "124--126",
+ keywords = "1800 V;4H-SiC high-voltage n-p-n bipolar junction
+ transistor;SiC;blocking voltage;current gain;deep level
+ acceptor;minority carrier lifetime;on-resistance;power
+ switching device;temperature coefficient;carrier
+ lifetime;deep levels;minority carriers;power bipolar
+ transistors;silicon compounds;wide band gap
+ semiconductors;",
+ doi = "10.1109/55.910617",
+ ISSN = "0741-3106",
+}
+
+@Article{baliga96,
+ author = "B. J. Baliga",
+ journal = "IEEE Trans. Electron Devices",
+ title = "Trends in power semiconductor devices",
+ year = "1996",
+ month = oct,
+ volume = "43",
+ number = "10",
+ pages = "1717--1731",
+ keywords = "DMOS technology;GTO;GaAs;IGBT;MOS-gated
+ devices;MOS-gated thyristors;MPS rectifier;PIN
+ rectifier;Schottky rectifier;Si;SiC;SiC based
+ switches;TMBS rectifier;UMOS technology;VMOS
+ technology;bipolar power transistor;high voltage power
+ rectifiers;low voltage power rectifiers;power
+ MOSFET;power losses;power semiconductor devices;power
+ switch technology;review;semiconductor device
+ technology;MOS-controlled thyristors;bipolar transistor
+ switches;field effect transistor switches;gallium
+ arsenide;insulated gate bipolar transistors;p-i-n
+ diodes;power bipolar transistors;power field effect
+ transistors;power semiconductor devices;power
+ semiconductor diodes;power semiconductor
+ switches;reviews;silicon;silicon compounds;solid-state
+ rectifiers;thyristors;",
+ doi = "10.1109/16.536818",
+ ISSN = "0018-9383",
+}
+
+@Article{bhatnagar92,
+ author = "M. Bhatnagar and P. K. McLarty and B. J. Baliga",
+ journal = "IEEE Electron Device Lett.",
+ title = "Silicon-carbide high-voltage (400 {V}) Schottky
+ barrier diodes",
+ year = "1992",
+ month = oct,
+ volume = "13",
+ number = "10",
+ pages = "501--503",
+ keywords = "1.1 V;25 to 200 C;400 V;6H-SiC;Pt-SiC;Schottky barrier
+ diodes;breakdown
+ voltages;characteristics;fabrication;forward I-V
+ characteristics;forward voltage drop;on-state current
+ density;rectifiers;reverse I-V characteristics;reverse
+ recovery characteristics;sharp breakdown;temperature
+ range;Schottky-barrier diodes;platinum;power
+ electronics;semiconductor materials;silicon
+ compounds;solid-state rectifiers;",
+ doi = "10.1109/55.192814",
+ ISSN = "0741-3106",
+}
+
+@Article{neudeck94,
+ author = "P. G. Neudeck and D. J. Larkin and J. E. Starr and J.
+ A. Powell and C. S. Salupo and L. G. Matus",
+ journal = "IEEE Trans. Electron Devices",
+ title = "Electrical properties of epitaxial 3{C}- and
+ 6{H}-Si{C} p-n junction diodes produced side-by-side on
+ 6{H}-Si{C} substrates",
+ year = "1994",
+ month = may,
+ volume = "41",
+ number = "5",
+ pages = "826--835",
+ keywords = "20 nA;200 micron;300 to 1100 V;3C-SiC layers;400
+ C;6H-SiC layers;6H-SiC substrates;CVD
+ process;SiC;chemical vapor deposition;doping;electrical
+ properties;epitaxial layers;light
+ emission;low-tilt-angle 6H-SiC substrates;p-n junction
+ diodes;polytype;rectification characteristics;reverse
+ leakage current;reverse voltages;temperature;leakage
+ currents;power electronics;semiconductor
+ diodes;semiconductor epitaxial layers;semiconductor
+ growth;semiconductor materials;silicon
+ compounds;solid-state rectifiers;substrates;vapour
+ phase epitaxial growth;",
+ doi = "10.1109/16.285038",
+ ISSN = "0018-9383",
+ notes = "comparison 6h 3c sic, cvd of 3c and 6h on single 6h
+ substrate",
+}
+
+@Article{weitzel96,
+ author = "C. E. Weitzel and J. W. Palmour and Jr. {Carter, C.H.}
+ and K. Moore and K. K. Nordquist and S. Allen and C.
+ Thero and M. Bhatnagar",
+ journal = "IEEE Trans. Electron Devices",
+ title = "Silicon carbide high-power devices",
+ year = "1996",
+ month = oct,
+ volume = "43",
+ number = "10",
+ pages = "1732--1741",
+ keywords = "1200 V;1400 V;4H-SiC;500 MHz to 32 GHz;57 W;Schottky
+ barrier diodes;SiC;SiC devices;UMOSFET;current
+ density;high electric breakdown field;high saturated
+ electron drift velocity;high thermal
+ conductivity;high-power devices;packaged SIT;submicron
+ gate length MESFET;Schottky diodes;current
+ density;electric breakdown;power MESFET;power
+ MOSFET;power semiconductor devices;power semiconductor
+ diodes;reviews;silicon compounds;static induction
+ transistors;wide band gap semiconductors;",
+ doi = "10.1109/16.536819",
+ ISSN = "0018-9383",
+ notes = "high power devices",
+}
+
+@Article{zhu08,
+ author = "Lin Zhu and T. P. Chow",
+ journal = "IEEE Trans. Electron Devices",
+ title = "Advanced High-Voltage 4{H}-Si{C} Schottky Rectifiers",
+ year = "2008",
+ month = aug,
+ volume = "55",
+ number = "8",
+ pages = "1871--1874",
+ keywords = "H-SiC;OFF-state characteristics;ON-state
+ characteristics;blocking capability;high-voltage
+ Schottky rectifier;junction barrier Schottky
+ rectifier;lateral channel JBS rectifier;leakage
+ current;pinlike reverse characteristics;Schottky
+ barriers;Schottky diodes;leakage currents;rectifying
+ circuits;",
+ doi = "10.1109/TED.2008.926642",
+ ISSN = "0018-9383",
+}
+
+@Article{brown93,
+ author = "D. M. Brown and E. T. Downey and M. Ghezzo and J. W.
+ Kretchmer and R. J. Saia and Y. S. Liu and J. A. Edmond
+ and G. Gati and J. M. Pimbley and W. E. Schneider",
+ journal = "IEEE Trans. Electron Devices",
+ title = "Silicon carbide {UV} photodiodes",
+ year = "1993",
+ month = feb,
+ volume = "40",
+ number = "2",
+ pages = "325--333",
+ keywords = "200 to 400 nm;6H epitaxial layers;SiC photodiodes;UV
+ responsivity characteristics;low dark current;low light
+ level UV detection;quantum
+ efficiency;reproducibility;reverse current
+ leakage;short circuit output current;leakage
+ currents;photodiodes;semiconductor
+ materials;short-circuit currents;silicon
+ compounds;ultraviolet detectors;",
+ doi = "10.1109/16.182509",
+ ISSN = "0018-9383",
+ notes = "sic photo diodes, uv detector",
+}
+
+@Article{yan04,
+ author = "Feng Yan and Xiaobin Xin and S. Aslam and Yuegang Zhao
+ and D. Franz and J. H. Zhao and M. Weiner",
+ journal = "IEEE J. Quantum Electron.",
+ title = "4{H}-Si{C} {UV} photo detectors with large area and
+ very high specific detectivity",
+ year = "2004",
+ month = sep,
+ volume = "40",
+ number = "9",
+ pages = "1315--1320",
+ keywords = "-1 V; 1.2E-14 A; 210 to 350 nm; 4H-SiC UV
+ photodetectors; 5 mm; Pt/4H-SiC Schottky photodiodes;
+ SiC-Pt; leakage current; photoresponse spectra; quantum
+ efficiency; specific detectivity; Schottky diodes;
+ photodetectors; platinum; silicon compounds; wide band
+ gap semiconductors;",
+ doi = "10.1109/JQE.2004.833196",
+ ISSN = "0018-9197",
+ notes = "uv detector",
+}
+
+@Article{schulze98,
+ author = "N. Schulze and D. L. Barrett and G. Pensl",
+ collaboration = "",
+ title = "Near-equilibrium growth of micropipe-free 6{H}-Si{C}
+ single crystals by physical vapor transport",
+ publisher = "AIP",
+ year = "1998",
+ journal = "Appl. Phys. Lett.",
+ volume = "72",
+ number = "13",
+ pages = "1632--1634",
+ keywords = "silicon compounds; semiconductor materials;
+ semiconductor growth; crystal growth from vapour;
+ photoluminescence; Hall mobility",
+ URL = "http://link.aip.org/link/?APL/72/1632/1",
+ doi = "10.1063/1.121136",
+ notes = "micropipe free 6h-sic pvt growth",
+}
+
+@Article{frank51,
+ author = "F. C. Frank",
+ title = "Capillary equilibria of dislocated crystals",
+ journal = "Acta Crystallogr.",
+ year = "1951",
+ volume = "4",
+ number = "6",
+ pages = "497--501",
+ month = nov,
+ doi = "10.1107/S0365110X51001690",
+ URL = "http://dx.doi.org/10.1107/S0365110X51001690",
+ notes = "micropipe",
+}
+
+@Article{heindl97,
+ author = "J. Heindl and H. P. Strunk and V. D. Heydemann and G.
+ Pensl",
+ title = "Micropipes: Hollow Tubes in Silicon Carbide",
+ journal = "phys. status solidi (a)",
+ volume = "162",
+ number = "1",
+ publisher = "WILEY-VCH Verlag",
+ ISSN = "1521-396X",
+ URL = "http://dx.doi.org/10.1002/1521-396X(199707)162:1<251::AID-PSSA251>3.0.CO;2-7",
+ doi = "10.1002/1521-396X(199707)162:1<251::AID-PSSA251>3.0.CO;2-7",
+ pages = "251--262",
+ year = "1997",
+ notes = "micropipe",
+}
+
+@Article{neudeck94_2,
+ author = "P. G. Neudeck and J. A. Powell",
+ journal = "IEEE Electron Device Lett.",
+ title = "Performance limiting micropipe defects in silicon
+ carbide wafers",
+ year = "1994",
+ month = feb,
+ volume = "15",
+ number = "2",
+ pages = "63--65",
+ keywords = "SiC;defect density;device ratings;epitaxially-grown pn
+ junction devices;micropipe defects;power devices;power
+ semiconductors;pre-avalanche reverse-bias point
+ failures;p-n homojunctions;power
+ electronics;semiconductor materials;silicon
+ compounds;",
+ doi = "10.1109/55.285372",
+ ISSN = "0741-3106",
+}
+
+@Article{pirouz87,
+ author = "P. Pirouz and C. M. Chorey and J. A. Powell",
+ collaboration = "",
+ title = "Antiphase boundaries in epitaxially grown beta-Si{C}",
+ publisher = "AIP",
+ year = "1987",
+ journal = "Appl. Phys. Lett.",
+ volume = "50",
+ number = "4",
+ pages = "221--223",
+ keywords = "SILICON CARBIDES; DOMAIN STRUCTURE; SCANNING ELECTRON
+ MICROSCOPY; NUCLEATION; EPITAXIAL LAYERS; CHEMICAL
+ VAPOR DEPOSITION; ETCHING; ETCH PITS; TRANSMISSION
+ ELECTRON MICROSCOPY; ELECTRON MICROSCOPY; ANTIPHASE
+ BOUNDARIES",
+ URL = "http://link.aip.org/link/?APL/50/221/1",
+ doi = "10.1063/1.97667",
+ notes = "apb 3c-sic heteroepitaxy on si",
+}
+
+@Article{shibahara86,
+ title = "Surface morphology of cubic Si{C}(100) grown on
+ Si(100) by chemical vapor deposition",
+ journal = "J. Cryst. Growth",
+ volume = "78",
+ number = "3",
+ pages = "538--544",
+ year = "1986",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(86)90158-2",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46D26F7-1R/2/cfdbc7607352f3bc99d321303e3934e9",
+ author = "Kentaro Shibahara and Shigehiro Nishino and Hiroyuki
+ Matsunami",
+ notes = "defects in 3c-sis cvd on si, anti phase boundaries",
+}
+
+@Article{desjardins96,
+ author = "P. Desjardins and J. E. Greene",
+ collaboration = "",
+ title = "Step-flow epitaxial growth on two-domain surfaces",
+ publisher = "AIP",
+ year = "1996",
+ journal = "J. Appl. Phys.",
+ volume = "79",
+ number = "3",
+ pages = "1423--1434",
+ keywords = "ADATOMS; COMPUTERIZED SIMULATION; DIFFUSION; EPITAXY;
+ FILM GROWTH; SURFACE STRUCTURE",
+ URL = "http://link.aip.org/link/?JAP/79/1423/1",
+ doi = "10.1063/1.360980",
+ notes = "apb model",
+}
+
+@Article{henke95,
+ author = "S. Henke and B. Stritzker and B. Rauschenbach",
+ collaboration = "",
+ title = "Synthesis of epitaxial beta-Si{C} by {C}[sub 60]
+ carbonization of silicon",
+ publisher = "AIP",
+ year = "1995",
+ journal = "J. Appl. Phys.",
+ volume = "78",
+ number = "3",
+ pages = "2070--2073",
+ keywords = "SILICON CARBIDES; THIN FILMS; EPITAXY; CARBONIZATION;
+ FULLERENES; ANNEALING; XRD; RBS; TWINNING; CRYSTAL
+ STRUCTURE",
+ URL = "http://link.aip.org/link/?JAP/78/2070/1",
+ doi = "10.1063/1.360184",
+ notes = "ssmbe of sic on si, lower temperatures",
+}
+
+@Article{fuyuki89,
+ title = "Atomic layer epitaxy of cubic Si{C} by gas source
+ {MBE} using surface superstructure",
+ journal = "J. Cryst. Growth",
+ volume = "95",
+ number = "1-4",
+ pages = "461--463",
+ year = "1989",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(89)90442-9",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46DFS6F-GF/2/a8e0abaef892c6d96992ff4751fdeda2",
+ author = "Takashi Fuyuki and Michiaki Nakayama and Tatsuo
+ Yoshinobu and Hiromu Shiomi and Hiroyuki Matsunami",
+ notes = "gas source mbe of 3c-sic on 6h-sic",
+}
+
+@Article{yoshinobu92,
+ author = "Tatsuo Yoshinobu and Hideaki Mitsui and Iwao Izumikawa
+ and Takashi Fuyuki and Hiroyuki Matsunami",
+ collaboration = "",
+ title = "Lattice-matched epitaxial growth of single crystalline
+ 3{C}-Si{C} on 6{H}-Si{C} substrates by gas source
+ molecular beam epitaxy",
+ publisher = "AIP",
+ year = "1992",
+ journal = "Appl. Phys. Lett.",
+ volume = "60",
+ number = "7",
+ pages = "824--826",
+ keywords = "SILICON CARBIDES; HOMOJUNCTIONS; MOLECULAR BEAM
+ EPITAXY; TWINNING; RHEED; TEMPERATURE EFFECTS;
+ INTERFACE STRUCTURE",
+ URL = "http://link.aip.org/link/?APL/60/824/1",
+ doi = "10.1063/1.107430",
+ notes = "gas source mbe of 3c-sic on 6h-sic",
+}
+
+@Article{yoshinobu90,
+ title = "Atomic level control in gas source {MBE} growth of
+ cubic Si{C}",
+ journal = "J. Cryst. Growth",
+ volume = "99",
+ number = "1-4",
+ pages = "520--524",
+ year = "1990",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(90)90575-6",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-46YKT9W-HY/2/04dd57af2f42ee620895844e480a2736",
+ author = "Tatsuo Yoshinobu and Michiaki Nakayama and Hiromu
+ Shiomi and Takashi Fuyuki and Hiroyuki Matsunami",
+ notes = "gas source mbe of 3c-sic on 3c-sic",
+}
+
+@Article{fuyuki93,
+ title = "Atomic layer epitaxy controlled by surface
+ superstructures in Si{C}",
+ journal = "Thin Solid Films",
+ volume = "225",
+ number = "1-2",
+ pages = "225--229",
+ year = "1993",
+ note = "",
+ ISSN = "0040-6090",
+ doi = "DOI: 10.1016/0040-6090(93)90159-M",
+ URL = "http://www.sciencedirect.com/science/article/B6TW0-46NY79X-40/2/c9675e1d8c4bcebc7ce7d06e44e14f1f",
+ author = "Takashi Fuyuki and Tatsuo Yoshinobu and Hiroyuki
+ Matsunami",
+ notes = "gas source mbe of 3c-sic on 3c-sic, atomic layer
+ epitaxy, ale",
+}
+
+@Article{hara93,
+ title = "Microscopic mechanisms of accurate layer-by-layer
+ growth of [beta]-Si{C}",
+ journal = "Thin Solid Films",
+ volume = "225",
+ number = "1-2",
+ pages = "240--243",
+ year = "1993",
+ note = "",
+ ISSN = "0040-6090",
+ doi = "DOI: 10.1016/0040-6090(93)90162-I",
+ URL = "http://www.sciencedirect.com/science/article/B6TW0-46NY79X-43/2/18694bfe0e75b1f29a3cf5f90d19987c",
+ author = "Shiro Hara and T. Meguro and Y. Aoyagi and M. Kawai
+ and S. Misawa and E. Sakuma and S. Yoshida",
+ notes = "gas source mbe of 3c-sic on 3c-sic, atomic layer
+ epitaxy, ale",
+}
+
+@Article{tanaka94,
+ author = "Satoru Tanaka and R. Scott Kern and Robert F. Davis",
+ collaboration = "",
+ title = "Effects of gas flow ratio on silicon carbide thin film
+ growth mode and polytype formation during gas-source
+ molecular beam epitaxy",
+ publisher = "AIP",
+ year = "1994",
+ journal = "Appl. Phys. Lett.",
+ volume = "65",
+ number = "22",
+ pages = "2851--2853",
+ keywords = "SILICON CARBIDES; MOLECULAR BEAM EPITAXY; RHEED;
+ TRANSMISSION ELECTRON MICROSCOPY; MORPHOLOGY;
+ NUCLEATION; COALESCENCE; SURFACE RECONSTRUCTION; GAS
+ FLOW; FLOW RATE",
+ URL = "http://link.aip.org/link/?APL/65/2851/1",
+ doi = "10.1063/1.112513",
+ notes = "gas source mbe of 6h-sic on 6h-sic",
+}
+
+@Article{fuyuki97,
+ author = "T. Fuyuki and T. Hatayama and H. Matsunami",
+ title = "Heterointerface Control and Epitaxial Growth of
+ 3{C}-Si{C} on Si by Gas Source Molecular Beam Epitaxy",
+ publisher = "WILEY-VCH Verlag",
+ year = "1997",
+ journal = "phys. status solidi (b)",
+ volume = "202",
+ pages = "359--378",
+ notes = "3c-sic heteroepitaxial growth on si by gsmbe, lower
+ temperatures 750",
+}
+
+@Article{takaoka98,
+ title = "Initial stage of Si{C} growth on Si(1 0 0) surface",
+ journal = "J. Cryst. Growth",
+ volume = "183",
+ number = "1-2",
+ pages = "175--182",
+ year = "1998",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/S0022-0248(97)00391-6",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-3W8STD4-V/2/8de695de037d5e20b8326c4107547918",
+ author = "T. Takaoka and H. Saito and Y. Igari and I. Kusunoki",
+ keywords = "Reflection high-energy electron diffraction (RHEED)",
+ keywords = "Scanning electron microscopy (SEM)",
+ keywords = "Silicon carbide",
+ keywords = "Silicon",
+ keywords = "Island growth",
+ notes = "lower temperature, 550-700",
+}
+
+@Article{hatayama95,
+ title = "Low-temperature heteroepitaxial growth of cubic Si{C}
+ on Si using hydrocarbon radicals by gas source
+ molecular beam epitaxy",
+ journal = "J. Cryst. Growth",
+ volume = "150",
+ number = "Part 2",
+ pages = "934--938",
+ year = "1995",
+ note = "",
+ ISSN = "0022-0248",
+ doi = "DOI: 10.1016/0022-0248(95)80077-P",
+ URL = "http://www.sciencedirect.com/science/article/B6TJ6-47RY2F6-1P/2/49acd5c4545dd9fd3486f70a6c25586e",
+ author = "Tomoaki Hatayama and Yoichiro Tarui and Takashi Fuyuki
+ and Hiroyuki Matsunami",