{\bf Creation:}
\begin{itemize}
\item multiple energy ($180$-$10 \, keV$) $C^+$ $\rightarrow$
$Si$ implantation
\item $T=500 \, ^{\circ} \mathrm{C}$, to prevent amorphisation
\end{itemize}
{\bf Creation:}
\begin{itemize}
\item multiple energy ($180$-$10 \, keV$) $C^+$ $\rightarrow$
$Si$ implantation
\item $T=500 \, ^{\circ} \mathrm{C}$, to prevent amorphisation
\end{itemize}