+ Smearing method for the partial occupancies $f(\{\epsilon_{n{\bf k}}\})$
+ and $k$-point mesh
+
+ \begin{minipage}{4.4cm}
+ \includegraphics[width=4.4cm]{sic_smear_k.ps}
+ \end{minipage}
+ \begin{minipage}{4.4cm}
+ \includegraphics[width=4.4cm]{c_smear_k.ps}
+ \end{minipage}
+ \begin{minipage}{4.3cm}
+ \includegraphics[width=4.4cm]{si_smear_k.ps}
+ \end{minipage}\\[0.3cm]
+ \begin{itemize}
+ \item Convergence reached at $6\times 6\times 6$ k-point mesh
+ \item No difference between Gauss ($\sigma=0.05$)
+ and tetrahedron smearing method!
+ \end{itemize}
+ \begin{center}
+ $\Downarrow$\\
+ {\color{blue}\bf
+ Gauss ($\sigma=0.05$) smearing
+ and $6\times 6\times 6$ Monkhorst $k$-point mesh used
+ }
+ \end{center}
+
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf
+ Review (so far) ...\\
+ }
+
+ \underline{Symmetry (in defect simulations)}
+
+ \begin{center}
+ {\color{red}No}
+ difference in $1\times 1\times 1$ Type 2 defect calculations\\
+ $\Downarrow$\\
+ Symmetry precission (SYMPREC) small enough\\
+ $\Downarrow$\\
+ {\bf\color{blue}Symmetry switched on}\\
+ \end{center}
+
+ \underline{Real space projection}
+
+ \begin{center}
+ Error in lattice constant of plain Si ($1\times 1\times 1$ Type 2):
+ $0.025\,\%$\\
+ Error in position of the 110 interstitital in Si ($1\times 1\times 1$ Type 2):
+ $0.026\,\%$\\
+ $\Downarrow$\\
+ {\bf\color{blue}
+ Real space projection used for 'large supercell' simulations}
+ \end{center}
+
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf
+ Review (so far) ...
+ }
+
+ Energy cut-off\\
+
+ \begin{center}
+
+ {\small
+ 3C-SiC equilibrium lattice constant and free energy\\
+ \includegraphics[width=7cm]{plain_sic_lc.ps}\\
+ $\rightarrow$ Convergence reached at 650 eV\\[0.2cm]
+ }
+
+ $\Downarrow$\\
+
+ {\bf\color{blue}
+ 650 eV used as energy cut-off
+ }
+
+ \end{center}
+
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf
+ Not answered (so far) ...\\
+ }
+
+\vspace{1.5cm}
+
+ \LARGE
+ \bf
+ \color{blue}
+
+ \begin{center}
+ Continue\\
+ with\\
+ US LDA?
+ \end{center}
+
+\vspace{1.5cm}
+
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf
+ Final parameter choice
+ }
+
+ \footnotesize
+
+ \underline{Param 1}\\
+ My first choice. Used for more accurate calculations.
+ \begin{itemize}
+ \item $6\times 6 \times 6$ Monkhorst k-point mesh
+ \item $E_{\text{cut-off}}=650\text{ eV}$
+ \item Gaussian smearing ($\sigma=0.05$)
+ \item Use symmetry
+ \end{itemize}
+ \vspace*{0.2cm}
+ \underline{Param 2}\\
+ After talking to the pros! Used for 'large' simulations.
+ \begin{itemize}
+ \item $\Gamma$-point only
+ \item $E_{\text{cut-off}}=xyz\text{ eV}$
+ \item Gaussian smearing ($\sigma=0.05$)
+ \item Use symmetry
+ \item Real space projection (Auto, Medium)
+ \end{itemize}
+ \vspace*{0.2cm}
+ {\color{blue}
+ In both parameter sets the ultra soft pseudo potential method
+ as well as the projector augmented wave method is used!
+ }
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf
+ Properties of Si, C and SiC using the new parameters\\
+ }
+
+ $2\times 2\times 2$ Type 2 supercell, Param 1\\[0.2cm]
+ \begin{tabular}{|l|l|l|l|}
+ \hline
+ & c-Si & c-C (diamond) & 3C-SiC \\
+ \hline
+ Lattice constant [\AA] & 5.389 & 3.527 & \\
+ Expt. [\AA] & 5.429 & 3.567 & \\
+ Error [\%] & {\color{green}0.7} & 1.1 & \\
+ \hline
+ Cohesive energy [eV] & -4.674 & -8.812 & \\
+ Expt. [eV] & -4.63 & -7.374 & \\
+ Error [\%] & {\color{green}1.0} & {\color{red}19.5} & \\
+ \hline
+ \end{tabular}\\
+
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf
+ C interstitial in c-Si
+ }
+