+\begin{slide}
+
+ {\large\bf\boldmath
+ Combination of defects
+ }
+
+ \small
+
+ Initial C \hkl<0 0 -1> insterstital at: $\frac{1}{4}\hkl<1 1 1>$
+
+ \begin{tabular}{|l|l|l|l|l|l|}
+ \hline
+ & 2 & 3 & 4 & 5 & 6 \\
+ \hline
+C \hkl<0 0 -1> & 6.23/-0.08 & 5.16/-1.15 & 6.23/-0.08 & 6.35/0.04 & 4.65/-1.66\\
+ \hline
+C \hkl<0 0 1> & 6.64/0.34 & 6.31/0.01 & 4.26/-2.05 & 6.57/0.26 & 4.78/-1.53 \\
+ \hline
+C \hkl<1 0 0> & 4.06/-2.25 & 6.13/-0.17 & 6.21/-0.10 & 6.03/-0.27 & 4.93/-1.38 \\
+ \hline
+C \hkl<-1 0 0> & \hkl<0 -1 0> & 4.41/-1.90 & 4.06/-2.25 & 6.19/-0.12 & 4.43/-1.88 \\
+ \hline
+C \hkl<0 1 0> & \hkl<1 0 0> & 5.95/-0.36 & \hkl<-1 0 0> & \hkl<-1 0 0> & \hkl<1 0 0> \\
+ \hline
+C \hkl<0 -1 0> & 3.92/-2.39 & 4.15/-2.16 & \hkl<1 0 0> & \hkl<1 0 0> & \hkl <-1 0 0> \\
+ \hline
+Vacancy & 1.39/-5.39 ($\rightarrow\text{ C}_{\text{S}}$) & 6.19/-0.59 & 3.65/-3.14 & 6.24/-0.54 & 6.50/-0.50 \\
+ \hline
+ \end{tabular}\\[0.2cm]
+ Energies: $x/y$\\
+ $x$: Defect formation energy of the complex\\
+ $y$:
+ $E_{\text{f}}^{\text{defect combination}}-
+ E_{\text{f}}^{\text{isolated C \hkl<0 0 -1>}}-
+ E_{\text{f}}^{\text{isolated 2nd defect}}
+ $\\
+ That is: If $y<0$ $\rightarrow$ favored compared to far-off isolated defects
+
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf
+ Brainstorming: Point defects in Si (as grown and as implanted)
+ }
+
+ \small
+
+ Supercell size: $2$ -- $2000 \cdot 10^{-21}\text{ cm}^3$
+
+ \underline{After crystal growth}
+ \begin{itemize}
+ \item Si point defects at $450\, ^{\circ}\text{C}$
+ \begin{itemize}
+ \item Interstitials:
+ \item Vacancies:
+ \end{itemize}
+ \item C impurities: $10^{17}\text{ cm}^{-3}$\\
+ $\Rightarrow$ $10^{-4}$ -- $10^{-1}$ per sc
+ $\rightarrow$ neglected in simulations
+ \end{itemize}
+
+ \underline{After/during implantation}
+ \begin{itemize}
+ \item Si point defects\\
+ $E_{\text{d}}^{\text{av}}=35\text{ eV}$,
+ $D_{\text{imp}}=1\text{ -- }4 \cdot 10^{17}\text{ cm }^{-2}$,
+ $d_{\text{sc}}=3\text{ -- }30\cdot 4.38\text { \AA}$,
+ $A=(3\text{ -- }30\text{ \AA})^2$,\\
+ Amount of collisions with $\Delta E > E_{\text{d}}$
+ in depth region $[h,h+d_{\text{sc}}]$: $n=$ .. (SRIM)\\
+ $\Rightarrow N_{\text{FP}}=nAD$
+ \item C point defects
+ \begin{itemize}
+ \item Substitutional C: ...
+ \item Intesrtitial C: ...
+ \end{itemize}
+ \end{itemize}
+
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf
+ Reminder (just for me to keep in mind ...)
+ }
+
+ \small
+
+ \underline{Volume of the MD cell}
+ \begin{itemize}
+ \item $T=450, 900, 1400\text{ K}$ - (no melting, N\underline{V}T!)
+ \item $\alpha=2.0 \cdot 10^{-6}\text{ K}^{-1}$
+ \item $a = a_0(1+\alpha \Delta T)$
+ \item Plain Si$(T=0)$: $a_0=5.4575\text{ \AA}$
+ $\rightarrow a(900\text{ K})=5.4674\text{ \AA}$
+ \item C \hkl<1 0 0> in Si$(T=0)$: $a_0^{\text{avg}}=
+ \frac{1}{3}(a_0^x+a_0^y+a_0^z)=5.4605\text{ \AA}$
+ $\rightarrow a(900\text{ K})=5.4704{ \AA}$
+ \end{itemize}
+ Used in first 900 K simulations: 5.4705 \AA\\
+ BUT: Better use plain Si lattice constant! (only local distortions)\\
+ $\Rightarrow a(1400\text{ K})=5.4728\text{ \AA}$
+
+ \underline{Zero total momentum simulations}
+ \begin{itemize}
+ \item If C is randomly inserted there is a net total momentum
+ \item No correction in the temperature control routine of VASP?
+ \item Relax a Si:C configuration first
+ (at T=0, no volume relaxation, scaled volume)
+ \item Use this configuration as the MD initial configuration
+ \end{itemize}
+
+\end{slide}
+