+\begin{slide}
+
+ {\large\bf\boldmath
+ Carbon point defects in silicon
+ }
+
+ \begin{minipage}{3.2cm}
+ \underline{C bond centered}
+ \begin{itemize}
+ \item $E_{\text{f}}=4.10\text{ eV}$
+ \end{itemize}
+ \includegraphics[width=3cm]{c_pd_vasp/bc_2333.eps}
+ \underline{\hkl<1 1 0> interstitial}
+ \begin{itemize}
+ \item $E_{\text{f}}=3.60\text{ eV}$
+ \end{itemize}
+ \includegraphics[width=3cm]{c_pd_vasp/110_2333.eps}
+ \end{minipage}
+ \begin{minipage}{4.5cm}
+ \begin{center}
+ \includegraphics[height=8cm]{c_pd_vasp/110_2333_ksl.ps}
+ {\scriptsize \hkl<1 1 0> interstitial}
+ \end{center}
+ \end{minipage}
+ \begin{minipage}{4.5cm}
+ \begin{center}
+ \includegraphics[height=8cm]{c_pd_vasp/bc_2333_ksl.ps}
+ {\scriptsize C bond centered}
+ \end{center}
+ \end{minipage}
+
+\end{slide}
+
+\begin{slide}
+
+ {\large\bf\boldmath
+ Carbon point defects in silicon
+ }
+
+ The hexagonal and tetrahedral C configurations both relax into the
+ \hkl<0 0 1> interstitial configuration!
+
+\end{slide}
+