+Precipitates, as a result of high-dose ion implantation into solids, are usually statistically arranged and have a broad size distribution.
+However, the formation of ordered, lamellar inclusions has been observed for a number of ion/target combinations at certain implantation conditions \cite{ommen,specht,ishimaru}.
+An inevitable condition for the material to observe this special self-organized arrangement is a largely reduced density of host atoms in the amorphous phase compared to the crystalline host lattice.
+As a consequence stress is exerted by the amorphous inclusions which is responsible for the ordering process.
+A model to describe the process is introduced.
+The implementation of a simulation code based on that model is discussed.
+Simulation results are compared to experimental data, focussing on high-dose carbon implantation into silicon.
+Finally a guideline for fabrication of broad ditributions of lamellar ordered structures is suggested.
+
+\section{Model}
+High-dose carbon implantations at $150 \, ^{\circ} \mathrm{C}$ with an energy of $180 \, keV$ result