\newpage
\section{Results}
+Figure \ref{4} shows a comparison of a simulation result and a cross-sectional TEM snapshot of $180 \, keV$ implanted carbon in silicon at $150 \,^{\circ} \mathrm{C}$ with $4.3 \times 10^{17} cm^{-2}$. The depth the lamella structure is starting in ($300 \, nm$) and also the average length of these precipitates complies to that one of the experimental data. The arrays are ordered in uniform intervals. It can be seen that lamella selforganized structures can be reproduced by the simulation.
+Furthermore conditions for observing lamella structures can be specified. Figure \ref{5} shows two identical simulation cycles with diffusion in $z$-direction switched off and on. The lamella structures only appear when diffusion in $z$-direction \ldots
+
+TODO:\\
+- diffusion rate -> depth of lamella structures\\
+- complementary arrays of c/a precipitates for z and z+1\\
+- evt FFT bilder\\
+- summary\\
+
+\newpage
\section{Conclusion}
\end{center}
\end{figure}
+\begin{figure}[!h]
+\begin{center}
+\includegraphics[width=15cm]{if_cmp2_e.eps}
+\caption[Comparison of a simulation result and a cross-sectional TEM snapshot of $180 \, keV$ implanted carbon in silicon at $150 \,^{\circ} \mathrm{C}$ with $4.3 \times 10^{17} cm^{-2}$]{} \label{4}
+\end{center}
+\end{figure}
+
+\begin{figure}[!h]
+\begin{center}
+\includegraphics[width=15cm]{mit_ohne_diff.eps}
+\caption[Identical simulation cycles, with diffusion switched off (left) and on (right)]{} \label{5}
+\end{center}
+\end{figure}
+
\end{document}