refs

diff --git a/posic/thesis/sic.tex b/posic/thesis/sic.tex
index 677539a2f9b6e812d1345050392c8cbba7f80fbe..dd18103cda2349e07577e270ccfaf86423f0a892 100644 (file)
--- a/posic/thesis/sic.tex
+++ b/posic/thesis/sic.tex
@@ -166,11 +166,12 @@ Thus, in most of the applied CVD and MBE processes, the SiC layer formation proc
 Cleaning of the substrate surface with HCl is required prior to carbonization.
 During carbonization the Si surface is chemically converted into a SiC film with a thickness of a few nm by exposing it to a flux of C atoms and concurrent heating up to temperatures about \unit[1400]{$^{\circ}$C}.
 In a next step, the epitaxial deposition of SiC is realized by an additional supply of Si atoms at similar temperatures.
-Low defect densities in the buffer layer are a prerequisite for obtaining good quality SiC layers during growth, although defect densities decrease with increasing distance of the SiC/Si interface \cite{}.
-Next to surface morphology defects such as pits and islands, the main defects in 3C-SiC heteroepitaxial layers are twins, stacking faults (SF) and antiphase boundaries (APB) \cite{}.
+Low defect densities in the buffer layer are a prerequisite for obtaining good quality SiC layers during growth, although defect densities decrease with increasing distance of the SiC/Si interface \cite{shibahara86}.
+Next to surface morphology defects such as pits and islands, the main defects in 3C-SiC heteroepitaxial layers are twins, stacking faults (SF) and antiphase boundaries (APB) \cite{shibahara86,pirouz87}.
 
 
-off-axis?
+off-axis \cite{shibahara86,powell87_2} ...
+resulting in carb and growth \cite{kitabatake97} ...
 
 lower temps ... to limit thermal stress due to differing expansion coefficients ...