doi = "10.1063/1.102512",
}
+@Article{yuan95,
+ author = "C. Yuan and A. J. Steckl and J. Chaudhuri and R.
+ Thokala and M. J. Loboda",
+ collaboration = "",
+ title = "Reduced temperature growth of crystalline 3{C}-Si{C}
+ films on 6{H}-Si{C} by chemical vapor deposition from
+ silacyclobutane",
+ publisher = "AIP",
+ year = "1995",
+ journal = "Journal of Applied Physics",
+ volume = "78",
+ number = "2",
+ pages = "1271--1273",
+ keywords = "SILICON CARBIDES; THIN FILMS; CVD; EPITAXY; ABSORPTION
+ EDGE; CRYSTAL STRUCTURE; STRAINS; DISLOCATIONS; XRD;
+ SPECTROPHOTOMETRY",
+ URL = "http://link.aip.org/link/?JAP/78/1271/1",
+ doi = "10.1063/1.360368",
+ notes = "3c-sic on 6h-sic, cvd, reduced temperature",
+}
+
@Article{fissel95,
title = "Epitaxial growth of Si{C} thin films on Si-stabilized
[alpha]-Si{C}(0001) at low temperatures by solid-source
notes = "charge transport in strained si",
}
-@Article{PhysRevB.69.155214,
+@Article{kapur04,
title = "Carbon-mediated aggregation of self-interstitials in
silicon: {A} large-scale molecular dynamics study",
author = "Sumeet S. Kapur and Manish Prasad and Talid Sinno",
Conchon and M. Soueidan and G. Ferro and A. Mantzari
and A. Andreadou and E. K. Polychroniadis and C.
Balloud and S. Juillaguet and J. Camassel and M. Pons",
- notes = "3c-sic crystal growth, sic fabrication + links, metastable",
+ notes = "3c-sic crystal growth, sic fabrication + links,
+ metastable",
}