author = "W. Wesch",
}
+@Article{davis91,
+ author = "R. F. Davis and G. Kelner and M. Shur and J. W.
+ Palmour and J. A. Edmond",
+ journal = "Proceedings of the IEEE",
+ title = "Thin film deposition and microelectronic and
+ optoelectronic device fabrication and characterization
+ in monocrystalline alpha and beta silicon carbide",
+ year = "1991",
+ month = may,
+ volume = "79",
+ number = "5",
+ pages = "677--701",
+ keywords = "HBT;LED;MESFET;MOSFET;Schottky contacts;Schottky
+ diode;SiC;dry etching;electrical
+ contacts;etching;impurity incorporation;optoelectronic
+ device fabrication;solid-state devices;surface
+ chemistry;Schottky effect;Schottky gate field effect
+ transistors;Schottky-barrier
+ diodes;etching;heterojunction bipolar
+ transistors;insulated gate field effect
+ transistors;light emitting diodes;semiconductor
+ materials;semiconductor thin films;silicon compounds;",
+ doi = "10.1109/5.90132",
+ ISSN = "0018-9219",
+ notes = "sic growth methods",
+}
+
@Article{morkoc94,
author = "H. Morko\c{c} and S. Strite and G. B. Gao and M. E.
Lin and B. Sverdlov and M. Burns",
notes = "3c-sic metastable, 3c-sic preferred growth, sic
polytype dft calculation refs",
}
+
+@Article{allendorf91,
+ title = "The adsorption of {H}-atoms on polycrystalline
+ [beta]-silicon carbide",
+ journal = "Surface Science",
+ volume = "258",
+ number = "1-3",
+ pages = "177--189",
+ year = "1991",
+ note = "",
+ ISSN = "0039-6028",
+ doi = "DOI: 10.1016/0039-6028(91)90912-C",
+ URL = "http://www.sciencedirect.com/science/article/B6TVX-46T3BSB-24V/2/534f1f4786088ceb88b6d31eccb096b3",
+ author = "Mark D. Allendorf and Duane A. Outka",
+ notes = "h adsorption on 3c-sic",
+}
+
+@Article{eaglesham93,
+ author = "D. J. Eaglesham and F. C. Unterwald and H. Luftman and
+ D. P. Adams and S. M. Yalisove",
+ collaboration = "",
+ title = "Effect of {H} on Si molecular-beam epitaxy",
+ publisher = "AIP",
+ year = "1993",
+ journal = "Journal of Applied Physics",
+ volume = "74",
+ number = "11",
+ pages = "6615--6618",
+ keywords = "SILICON; MOLECULAR BEAM EPITAXY; HYDROGEN; SURFACE
+ CONTAMINATION; SIMS; SEGREGATION; IMPURITIES;
+ DIFFUSION; ADSORPTION",
+ URL = "http://link.aip.org/link/?JAP/74/6615/1",
+ doi = "10.1063/1.355101",
+ notes = "h incorporation on si surface, lower surface
+ mobility",
+}