\begin{table*}\r
\begin{ruledtabular}\r
\begin{tabular}{l c c c c c c c c c}\r
- & Si$_{\text{i}}$ \hkl<1 1 0> DB & Si$_{\text{i}}$ H & Si$_{\text{i}}$ T & Si \hkl<1 0 0> DB & V & C$_{\text{s}}$ & C$_{\text{i}}$ \hkl<1 0 0> DB & C$_{\text{i}}$ \hkl<1 1 0> DB & C$_{\text{i}}$ BC \\\r
+ & Si$_{\text{i}}$ \hkl<1 1 0> DB & Si$_{\text{i}}$ H & Si$_{\text{i}}$ T & Si$_{\text{i}}$ \hkl<1 0 0> DB & V & C$_{\text{s}}$ & C$_{\text{i}}$ \hkl<1 0 0> DB & C$_{\text{i}}$ \hkl<1 1 0> DB & C$_{\text{i}}$ BC \\\r
\hline\r
Present study & 3.39 & 3.42 & 3.77 & 4.41 & 3.63 & 1.95 & 3.72 & 4.16 & 4.66 \\\r
\multicolumn{10}{c}{Other ab initio studies} \\\r
On the other hand, if elevated temperatures enable migrations with huge activation energies, comparably small differences in configurational energy can be neglected resulting in an almost equal occupation of such configurations.\r
In both cases the configuration yielding a binding energy of \unit[-2.25]{eV} is promising.\r
First of all, it constitutes the second most energetically favorable structure.\r
-Secondly, a migration path with a barrier as low as \unit[?.?]{eV} exists starting from a configuration of largely separated defects exhibiting a low binding energy (\unit[-1.88]{eV}).\r
+Secondly, a migration path with a barrier as low as \unit[0.47]{eV} exists starting from a configuration of largely separated defects exhibiting a low binding energy (\unit[-1.88]{eV}).\r
The migration barrier and correpsonding structures are shown in Fig.~\ref{fig:188-225}.\r
% 188 - 225 transition in progress\r
\begin{figure}\r
\includegraphics[width=\columnwidth]{188-225.ps}\r
-\caption{Migration barrier and structures of the transition of a C$_{\text{i}}$ \hkl[0 -1 0] DB at position 5 (left) into a C$_{\text{i}}$ \hkl[1 0 0] DB at position 1 (right). An activation energy of \unit[?.?]{eV} is observed.}\r
+\caption{Migration barrier and structures of the transition of a C$_{\text{i}}$ \hkl[0 -1 0] DB at position 5 (left) into a C$_{\text{i}}$ \hkl[1 0 0] DB at position 1 (right). An activation energy of \unit[0.47]{eV} is observed.}\r
\label{fig:188-225}\r
\end{figure}\r
Finally, this type of defect pair is represented four times (two times more often than the ground state configuration) within the systematically investigated configuration space.\r
%./visualize_contcar -w 640 -h 480 -d results/c_00-1_c3_csub_B -nll -0.20 -0.4 -0.1 -fur 0.9 0.6 0.9 -c 0.5 -1.5 0.375 -L 0.5 0 0.3 -r 0.6 -A -1 2.465\r
\begin{figure}\r
\includegraphics[width=\columnwidth]{093-095.ps}\r
-\caption{Migration barrier and structures of the transition of the initial C$_{\text{i}}$ \hkl[0 0 -1] DB and C$_{\text{s}}$ at position 3 (left) into a configuration of a twofold coordinated Si$_{\text{i}}$ located inbetween two C$_{\text{s}}$ atoms occupying the lattice sites of the initial DB and position 3 (right). An activation energy of \unit[0.?]{eV} is observed.}\r
+\caption{Migration barrier and structures of the transition of the initial C$_{\text{i}}$ \hkl[0 0 -1] DB and C$_{\text{s}}$ at position 3 (left) into a configuration of a twofold coordinated Si$_{\text{i}}$ located inbetween two C$_{\text{s}}$ atoms occupying the lattice sites of the initial DB and position 3 (right). An activation energy of \unit[0.44]{eV} is observed.}\r
\label{fig:093-095}\r
\end{figure}\r
Configuration A consists of a C$_{\text{i}}$ \hkl[0 0 -1] DB with threefold coordinated Si and C DB atoms slightly disturbed by the C$_{\text{s}}$ at position 3, facing the Si DB atom as a next neighbor.\r
% mattoni: A favored by 0.4 eV - NO, it is indeed B (reinforce Song and Capaz)!\r
%\r
% AB transition\r
-% ...\r
+The migration barrier was identified to be \unit[0.44]{eV}, almost three times higher than the experimental value of \unit[0.16]{eV}\cite{song90_2} estimated for the neutral charge state transition in p- and n-type Si.\r
+Keeping in mind the formidable agreement of the energy difference with experiment, the overestimated activation energy is quite unexpected and disappointing.\r
+Obviously, either the CRT algorithm fails to seize the actual saddle point structure or the influence of dopants has exceptional effect in the experimentally covered diffusion process being responsible for the low migration barrier.\r
+% not satisfactory!\r
\r
% a b\r
\begin{figure}\r
Configurations a, A and B are not affected by spin polarization and show zero magnetization.\r
Mattoni et~al.\cite{mattoni2002}, in contrast, find configuration b less favorable than configuration A by \unit[0.2]{eV}.\r
Next to differences in the XC-functional and plane-wave energy cut-off this discrepancy might be attributed to the missing accounting for spin polarization in their calculations, which -- as has been shown for the C$_{\text{i}}$ BC configuration -- results in an increase of configurational energy.\r
-\r
+Indeed, investigating the migration path from configurations a to b and, in doing so, reusing the wave functions of the previous migration step the final structure, i.e. configuration b, was obtained with zero magnetization and an increase in configurational energy by \unit[0.2]{eV}.\r
+Obviously a different energy minimum of the electronic system is obatined indicating hysteresis behavior.\r
+However, since the total energy is lower for the magnetic result it is believed to constitute the real, i.e. global, minimum with respect to electronic minimization.\r
+%\r
+% a b transition\r
A low activation energy of \unit[0.1]{eV} is observed for the a$\rightarrow$b transition.\r
Thus, configuration a is very unlikely to occur in favor of configuration b.\r
-However, migration barriers yielding\r
-...\r
\r
-% mig a-b\r
+% repulsive along 110\r
+A repulsive interaction is observed for C$_{\text{s}}$ at lattice sites along \hkl[1 1 0], i.e. positions 1 (configuration a) and 5.\r
+This is due to tensile strain originating from both, the C$_{\text{i}}$ DB and the C$_{\text{s}}$ atom residing within the \hkl[1 1 0] bond chain.\r
+This finding agrees well with results by Mattoni et~al.\cite{mattoni2002}.\r
+% all other investigated results: attractive interaction. stress compensation.\r
+In contrast, all other investigated configurations show attractive interactions.\r
+The most favorable configuration is found for C$_{\text{s}}$ at position 3, which corresponds to the lattice site of one of the upper next neighbored Si atoms of the DB structure that is compressively strained along \hkl[1 -1 0] and \hkl[0 0 1] by the C-Si DB.\r
+The substitution with C allows for most effective compensation of strain.\r
+This structure is followed by C$_{\text{s}}$ located at position 2, the next neighbour atom below the two Si atoms bound to the C$_{\text{i}}$ DB atom.\r
+As mentioned earlier these two lower Si atoms indeed experience tensile strain along the \hkl[1 1 0] bond chain, however, additional compressive strain along \hkl[0 0 1] exists.\r
+The latter is partially compensated by the C$_{\text{s}}$ atom.\r
+Yet less of compensation is realized if C$_{\text{s}}$ is located at position 4 due to a larger separation although both bottom Si atoms of the DB structure are indirectly affected, i.e. each of them is connected by another Si atom to the C atom enabling the reduction of strain along \hkl[0 0 1].\r
+\r
+% c agglomeration vs c clustering ... migs to b conf\r
% 2 more migs: 051 -> 128 and 026! forgot why ... probably it's about probability of C clustering\r
+Obviously agglomeration of C$_{\text{i}}$ and C$_{\text{s}}$ is energetically favorable except for seprations along one of the \hkl<1 1 0> directions.\r
+The eneregtically most favorable configuration (configuration b) forms a strong but compressively strained C-C bond with a separation distance of \unit[0.142]{nm} sharing a Si lattice site.\r
+Again, conclusions concerning the probability of formation are drawn by investigating migration paths.\r
+Since C$_{\text{s}}$ is unlikely to exhibit a low activation energy for migration the focus is on C$_{\text{i}}$.\r
+Pathways starting from the two next most favored configurations were investigated, all of them showing activation energies above \unit[2.?-2.?]{eV}.\r
+Although lower than the barriers for obtaining the ground state of two C$_{\text{i}}$ defects the activation energy is yet considered too high.\r
+For the same reasons as in the last subsection, structures other than the ground state configuration are, thus, assumed to arise more likely due to much lower activation energies necessary for their formation and still comparatively low binding energies.\r
\r
\subsection{C$_{\text{i}}$ next to V}\r
\r
+In the last subsection configurations of a C$_{\text{i}}$ DB with C$_{\text{s}}$ occupying a vacant site created by the implantation process have been investigated.\r
+Additionally, configurations might arise in IBS, in which the impinging C atom creates a vacant site near a C$_{\text{i}}$ DB but does not occupy it.\r
+Resulting binding energies of a C$_{\text{i}}$ DB with a nearby vacancy are listed in the second row of Table~\ref{table:dc_c-sv}.\r
+Obviously all investigated structures are prefered compared to isolated largely separated defects of this type.\r
+Even for the largest possible distance (R) achieved in the calculations of the periodic supercell a binding energy as low as \unit[-0.31]{eV} is observed.\r
+The ground state configuration is obtained for a V at position 1.\r
+The C atom of the DB moves towards the vacant site forming a stable C$_{\text{s}}$ configuration.\r
+Figure\r
+\r
+\r
\subsection{C$_{\text{s}}$ next to Si$_{\text{i}}$}\r
\r
Non-zero temperature, entropy, spatial separation of these defects possible, indeed observed in ab initio MD run.\r
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-\r
\end{document}\r
\r
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