\usepackage{pstricks}
\usepackage{pst-node}
+\usepackage{pst-grad}
%\usepackage{epic}
%\usepackage{eepic}
\usepackage{upgreek}
+\newcommand{\headdiplom}{
+\begin{pspicture}(0,0)(0,0)
+\rput(6.0,0.2){\psframebox[fillstyle=gradient,gradbegin=red,gradend=white,gradlines=1000,gradmidpoint=1,linestyle=none]{
+\begin{minipage}{14cm}
+\hfill
+\vspace{0.7cm}
+\end{minipage}
+}}
+\end{pspicture}
+}
+
+\newcommand{\headphd}{
+\begin{pspicture}(0,0)(0,0)
+\rput(6.0,0.2){\psframebox[fillstyle=gradient,gradbegin=blue,gradend=white,gradlines=1000,gradmidpoint=1,linestyle=none]{
+\begin{minipage}{14cm}
+\hfill
+\vspace{0.7cm}
+\end{minipage}
+}}
+\end{pspicture}
+}
+
\begin{document}
\extraslideheight{10in}
\begin{slide}
+\vspace*{1.8cm}
+
\small
\begin{pspicture}(0,0)(13.5,5)
\end{center}
\begin{pspicture}(0,0)(0,0)
-\rput(6.0,7.0){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=white]{
+\rput(6.0,7.0){\rnode{init}{\psframebox[fillstyle=gradient,gradbegin=red,gradend=white,gradlines=1000,gradmidpoint=1.0,linestyle=none]{
\begin{minipage}{11cm}
-{\color{red}Diploma thesis}\\
+{\color{black}Diploma thesis}\\
\underline{Monte Carlo} simulation modeling the selforganization process\\
leading to periodic arrays of nanometric amorphous SiC precipitates
\end{minipage}
}}}
\end{pspicture}
\begin{pspicture}(0,0)(0,0)
-\rput(6.0,-0.5){\rnode{init}{\psframebox[fillstyle=solid,fillcolor=white]{
+\rput(6.0,-0.5){\rnode{init}{\psframebox[fillstyle=gradient,gradbegin=blue,gradend=white,gradmidpoint=1.0,gradlines=1000,linestyle=none]{
\begin{minipage}{11cm}
-{\color{blue}Doctoral studies}\\
+{\color{black}Doctoral studies}\\
Classical potential \underline{molecular dynamics} simulations \ldots\\
\underline{Density functional theory} calculations \ldots\\[0.2cm]
\ldots on defect formation and SiC precipitation in Si
\begin{slide}
+\headdiplom
{\large\bf
Selforganization of nanometric amorphous SiC lamellae
}
\begin{minipage}{12cm}
\includegraphics[width=9cm]{../../nlsop/img/k393abild1_e_l.eps}\\
{\scriptsize
-XTEM bright-field, \unit[180]{keV} C$^+ \rightarrow$ Si, \degc{150},
+XTEM bright-field, \unit[180]{keV} C$^+ \rightarrow$ Si,
+{\color{red}\underline{\degc{150}}},
Dose: \unit[4.3 $\times 10^{17}$]{cm$^{-2}$}
}
\end{minipage}
\end{slide}
-% continue here
-\fi
-
\begin{slide}
+\headdiplom
{\large\bf
Model displaying the formation of ordered lamellae
}
+\vspace{0.1cm}
+
+\begin{center}
+ \includegraphics[width=8.0cm]{../../nlsop/img/modell_ng_e.eps}
+\end{center}
+
+\footnotesize
+
+\begin{itemize}
+\item Supersaturation of C in c-Si\\
+ $\rightarrow$ {\bf Carbon induced} nucleation of spherical
+ SiC$_x$-precipitates
+\item High interfacial energy between 3C-SiC and c-Si\\
+ $\rightarrow$ {\bf Amorphous} precipitates
+\item \unit[20-- 30]{\%} lower silicon density of a-SiC$_x$ compared to c-Si\\
+ $\rightarrow$ {\bf Lateral strain} (black arrows)
+\item Implantation range near surface\\
+ $\rightarrow$ {\bf Relaxation} of {\bf vertical strain component}
+\item Reduction of the carbon supersaturation in c-Si\\
+ $\rightarrow$ {\bf Carbon diffusion} into amorphous volumina
+ (white arrows)
+\item Remaining lateral strain\\
+ $\rightarrow$ {\bf Strain enhanced} lateral amorphisation
+\item Absence of crystalline neighbours (structural information)\\
+ $\rightarrow$ {\bf Stabilization} of amorphous inclusions
+ {\bf against recrystallization}
+\end{itemize}
+
\end{slide}
-\end{document}
-\ifnum1=0
+\begin{slide}
+
+\headdiplom
+{\large\bf
+ Implementation of the Monte Carlo code
+}
+
+\small
+
+\begin{enumerate}
+ \item \underline{Amorphization / Recrystallization}\\
+ Ion collision in discretized target determined by random numbers
+ distributed according to nuclear energy loss.
+ Amorphization/recrystallization probability:
+\[
+p_{c \rightarrow a}(\vec{r}) = {\color{green} p_b} + {\color{blue} p_c c_C(\vec{r})} + {\color{red} \sum_{\textrm{amorphous neighbours}} \frac{p_s c_C(\vec{r'})}{(r-r')^2}}
+\]
+\begin{itemize}
+ \item {\color{green} $p_b$} normal `ballistic' amorphization
+ \item {\color{blue} $p_c$} carbon induced amorphization
+ \item {\color{red} $p_s$} stress enhanced amorphization
+\end{itemize}
+\[
+p_{a \rightarrow c}(\vec r) = (1 - p_{c \rightarrow a}(\vec r)) \Big(1 - \frac{\sum_{direct \, neighbours} \delta (\vec{r'})}{6} \Big) \, \textrm{,}
+\]
+\[
+\delta (\vec r) = \left\{
+\begin{array}{ll}
+ 1 & \textrm{if volume at position $\vec r$ is amorphous} \\
+ 0 & \textrm{otherwise} \\
+\end{array}
+\right.
+\]
+ \item \underline{Carbon incorporation}\\
+ Incorporation volume determined according to implantation profile
+ \item \underline{Diffusion / Sputtering}
+ \begin{itemize}
+ \item Transfer fraction of C atoms
+ of crystalline into neighbored amorphous volumes
+ \item Remove surface layer
+ \end{itemize}
+\end{enumerate}
+
+\end{slide}
\begin{slide}
+\begin{minipage}{3.7cm}
+\begin{pspicture}(0,0)(0,0)
+\rput(1.7,0.2){\psframebox[fillstyle=gradient,gradbegin=red,gradend=white,gradlines=1000,gradangle=10,gradmidpoint=1,linestyle=none]{
+\begin{minipage}{3.7cm}
+\hfill
+\vspace{0.7cm}
+\end{minipage}
+}}
+\end{pspicture}
{\large\bf
- Model displaying the formation of ordered lamellae
+ Results
+}
+
+\footnotesize
+
+\vspace{1.2cm}
+
+Evolution of the \ldots
+\begin{itemize}
+ \item continuous\\
+ amorphous layer
+ \item a/c interface
+ \item lamellar precipitates
+\end{itemize}
+\ldots reproduced!\\[1.4cm]
+
+{\color{blue}
+\begin{center}
+Experiment \& simulation\\
+in good agreement\\[1.0cm]
+
+Simulation is able to model the whole depth region\\[1.2cm]
+\end{center}
+}
+
+\end{minipage}
+\begin{minipage}{0.5cm}
+\vfill
+\end{minipage}
+\begin{minipage}{8.0cm}
+ \vspace{-0.3cm}
+ \includegraphics[width=9cm]{../../nlsop/img/dosis_entwicklung_ng_e_1-2.eps}\\
+ \includegraphics[width=9cm]{../../nlsop/img/dosis_entwicklung_ng_e2_2-2.eps}
+\end{minipage}
+
+\end{slide}
+
+\begin{slide}
+
+\headdiplom
+{\large\bf
+ Structural \& compositional details
}
+\begin{minipage}[t]{7.5cm}
+\includegraphics[height=6.5cm]{../../nlsop/img/ac_cconc_ver2_e.eps}\\
+\end{minipage}
+\begin{minipage}[t]{5.0cm}
+\includegraphics[height=6.5cm]{../../nlsop/img/97_98_e.eps}
+\end{minipage}
+
+\footnotesize
+
+\vspace{-0.1cm}
+
+\begin{itemize}
+ \item Fluctuation of C concentration in lamellae region
+ \item \unit[8--10]{at.\%} C saturation limit
+ within the respective conditions
+ \item Complementarily arranged and alternating sequence of layers\\
+ with a high and low amount of amorphous regions
+ \item C accumulation in the amorphous phase / Origin of stress
+\end{itemize}
+
+\begin{picture}(0,0)(-260,-50)
\framebox{
- \begin{minipage}{6.3cm}
+\begin{minipage}{3cm}
+\begin{center}
+{\color{blue}
+Precipitation process\\
+gets traceable\\
+by simulation!
+}
+\end{center}
+\end{minipage}
+}
+\end{picture}
+
+\end{slide}
+
+\fi
+
+\begin{slide}
+
+\headphd
+{\large\bf
+ Formation of epitaxial single crystalline 3C-SiC
+}
+
+\footnotesize
+
+\vspace{0.2cm}
+
+\begin{center}
+\begin{itemize}
+ \item \underline{Implantation step 1}\\[0.1cm]
+ Almost stoichiometric dose | \unit[180]{keV} | \degc{500}\\
+ $\Rightarrow$ Epitaxial {\color{blue}3C-SiC} layer \&
+ {\color{blue}precipitates}
+ \item \underline{Implantation step 2}\\[0.1cm]
+ Little remaining dose | \unit[180]{keV} | \degc{250}\\
+ $\Rightarrow$
+ Destruction/Amorphization of precipitates at layer interface
+ \item \underline{Annealing}\\[0.1cm]
+ \unit[10]{h} at \degc{1250}\\
+ $\Rightarrow$ Homogeneous 3C-SiC layer with sharp interfaces
+\end{itemize}
+\end{center}
+
+\begin{minipage}{7cm}
+\includegraphics[width=7cm]{ibs_3c-sic.eps}
+\end{minipage}
+\begin{minipage}{5cm}
+\begin{pspicture}(0,0)(0,0)
+\rnode{box}{
+\psframebox[fillstyle=solid,fillcolor=white,linecolor=blue,linestyle=solid]{
+\begin{minipage}{5.3cm}
\begin{center}
{\color{blue}
- Precipitation mechanism not yet fully understood!
+ 3C-SiC precipitation\\
+ not yet fully understood
}
+ \end{center}
+ \vspace*{0.1cm}
\renewcommand\labelitemi{$\Rightarrow$}
- \small
- \underline{Understanding the SiC precipitation}
+ Details of the SiC precipitation
\begin{itemize}
- \item significant technological progress in SiC thin film formation
- \item perspectives for processes relying upon prevention of SiC precipitation
+ \item significant technological progress\\
+ in SiC thin film formation
+ \item perspectives for processes relying\\
+ upon prevention of SiC precipitation
\end{itemize}
- \end{center}
- \end{minipage}
+\end{minipage}
+}}
+\rput(-6.8,5.4){\pnode{h0}}
+\rput(-3.0,5.4){\pnode{h1}}
+\ncline[linecolor=blue]{-}{h0}{h1}
+\ncline[linecolor=blue]{->}{h1}{box}
+\end{pspicture}
+\end{minipage}
+
+\end{slide}
+
+
+\end{document}
+
+\ifnum1=0
+
+% continue here
+%\fi
+
+\begin{slide}
+
+{\large\bf
+ Model displaying the formation of ordered lamellae
}
+
\end{slide}
\begin{slide}
projects / lectures / latex.git / blobdiff