\chapter{Point defects in silicon}
\label{chapter:defects}
-Regarding the supposed conversion mechanisms of SiC in c-Si as introduced in section~\ref{section:assumed_prec} the understanding of C and Si interstitial point defects in c-Si is of fundamental interest.
+Regarding the supposed conversion mechanisms of SiC in c-Si as introduced in section~\ref{section:assumed_prec}, the understanding of C and Si interstitial point defects in c-Si is of fundamental interest.
During implantation, defects such as vacancies (V), substitutional C (C$_{\text{s}}$), interstitial C (C$_{\text{i}}$) and Si self-interstitials (Si$_{\text{i}}$) are created, which are believed to play a decisive role in the precipitation process.
-In the following, these defects are systematically examined by computationally efficient, classical potential as well as highly accurate DFT calculations with the parameters and simulation conditions that are defined in chapter~\ref{chapter:simulation}.
+In the following, these defects are systematically examined by computationally efficient classical potential as well as highly accurate DFT calculations with the parameters and simulation conditions that are defined in chapter~\ref{chapter:simulation}.
Both methods are used to investigate selected diffusion processes of some of the defect configurations.
While the quantum-mechanical description yields results that excellently compare to experimental findings, shortcomings of the classical potential approach are identified.
These shortcomings are further investigated and the basis for a workaround, as proposed later on in the classical MD simulation chapter, is discussed.
However, the implantation of highly energetic C atoms results in a multiplicity of possible defect configurations.
Next to individual Si$_{\text{i}}$, C$_{\text{i}}$, V and C$_{\text{s}}$ defects, combinations of these defects and their interaction are considered important for the problem under study.
-Thus, the study proceeds examining pairs of most probable defect configurations and related diffusion processes exclusively by first-principles methods.
+Thus, investigations proceed examining pairs of most probable defect configurations and related diffusion processes exclusively by first-principles methods.
These systems can still be described by the highly accurate but computationally costly method.
Respective results allow to draw conclusions concerning the SiC precipitation in Si.
\section{Silicon self-interstitials}
-For investigating the \si{} structures a Si atom is inserted or removed according to Fig.~\ref{fig:basics:ins_pos} of section~\ref{section:basics:defects}.
+For investigating the \si{} structures, a Si atom is inserted or removed according to Fig.~\ref{fig:basics:ins_pos} of section~\ref{section:basics:defects}.
The formation energies of \si{} configurations are listed in Table~\ref{tab:defects:si_self} for both methods used in this work as well as results obtained by other {\em ab initio} studies~\cite{al-mushadani03,leung99}.
-\bibpunct{}{}{,}{n}{}{}
-\begin{table}[tp]
-\begin{center}
-\begin{tabular}{l c c c c c}
-\hline
-\hline
- & \hkl<1 1 0> DB & H & T & \hkl<1 0 0> DB & V \\
-\hline
-\multicolumn{6}{c}{Present study} \\
-\textsc{vasp} & 3.39 & 3.42 & 3.77 & 4.41 & 3.63 \\
-\textsc{posic} & 4.39 & 4.48$^*$ & 3.40 & 5.42 & 3.13 \\
-\multicolumn{6}{c}{Other {\em ab initio} studies} \\
-Ref.~\cite{al-mushadani03} & 3.40 & 3.45 & - & - & 3.53 \\
-Ref.~\cite{leung99} & 3.31 & 3.31 & 3.43 & - & - \\
-\hline
-\hline
-\end{tabular}
-\end{center}
-\caption[Formation energies of Si self-interstitials in crystalline Si determined by classical potential MD and DFT calculations.]{Formation energies of Si self-interstitials in crystalline Si determined by classical potential MD and DFT calculations. The formation energies are given in eV. T denotes the tetrahedral and H the hexagonal interstitial configuration. V corresponds to the vacancy configuration. Dumbbell configurations are abbreviated by DB. Formation energies for unstable configurations are marked by an asterisk and determined by using the low kinetic energy configuration shortly before the relaxation into the more favorable configuration starts.}
-\label{tab:defects:si_self}
-\end{table}
-\bibpunct{[}{]}{,}{n}{}{}
-\begin{figure}[tp]
-\begin{center}
-\begin{flushleft}
-\begin{minipage}{5cm}
-\underline{Tetrahedral}\\
-$E_{\text{f}}=3.40\,\text{eV}$\\
-\includegraphics[width=4.0cm]{si_pd_albe/tet_bonds.eps}
-\end{minipage}
-\begin{minipage}{10cm}
-\underline{Hexagonal}\\[0.1cm]
-\begin{minipage}{4cm}
-$E_{\text{f}}^*=4.48\,\text{eV}$\\
-\includegraphics[width=4.0cm]{si_pd_albe/hex_a_bonds.eps}
-\end{minipage}
-\begin{minipage}{0.8cm}
-\begin{center}
-$\Rightarrow$
-\end{center}
-\end{minipage}
-\begin{minipage}{4cm}
-$E_{\text{f}}=3.96\,\text{eV}$\\
-\includegraphics[width=4.0cm]{si_pd_albe/hex_bonds.eps}
-\end{minipage}
-\end{minipage}\\[0.2cm]
-\begin{minipage}{5cm}
-\underline{\hkl<1 0 0> dumbbell}\\
-$E_{\text{f}}=5.42\,\text{eV}$\\
-\includegraphics[width=4.0cm]{si_pd_albe/100_bonds.eps}
-\end{minipage}
-\begin{minipage}{5cm}
-\underline{\hkl<1 1 0> dumbbell}\\
-$E_{\text{f}}=4.39\,\text{eV}$\\
-\includegraphics[width=4.0cm]{si_pd_albe/110_bonds.eps}
-\end{minipage}
-\begin{minipage}{5cm}
-\underline{Vacancy}\\
-$E_{\text{f}}=3.13\,\text{eV}$\\
-\includegraphics[width=4.0cm]{si_pd_albe/vac.eps}
-\end{minipage}
-\end{flushleft}
-%\hrule
-\end{center}
-\caption[Relaxed Si self-interstitial defect configurations obtained by classical potential calculations.]{Relaxed Si self-interstitial defect configurations obtained by classical potential calculations. Si atoms and bonds are illustrated by yellow spheres and blue lines. Bonds of the defect atoms are drawn in red color.}
-\label{fig:defects:conf}
-\end{figure}
+\bibpunct{}{}{,}{n}{}{}%
+\begin{table}[tp]%
+\begin{center}%
+\begin{tabular}{l c c c c c}%
+\hline%
+\hline%
+ & \hkl<1 1 0> DB & H & T & \hkl<1 0 0> DB & V \\%
+\hline%
+\multicolumn{6}{c}{Present study} \\%
+\textsc{vasp} & 3.39 & 3.42 & 3.77 & 4.41 & 3.63 \\%
+\textsc{posic} & 4.39 & 4.48$^*$ & 3.40 & 5.42 & 3.13 \\%
+\multicolumn{6}{c}{Other {\em ab initio} studies} \\%
+Ref.~\cite{al-mushadani03} & 3.40 & 3.45 & - & - & 3.53 \\%
+Ref.~\cite{leung99} & 3.31 & 3.31 & 3.43 & - & - \\%
+\hline%
+\hline%
+\end{tabular}%
+\end{center}%
+\caption[Formation energies of Si self-interstitials in crystalline Si determined by classical potential MD and DFT calculations.]{Formation energies of Si self-interstitials in crystalline Si determined by classical potential MD and DFT calculations. The formation energies are given in eV. T denotes the tetrahedral and H the hexagonal interstitial configuration. V corresponds to the vacancy configuration. Dumbbell configurations are abbreviated by DB. Formation energies for unstable configurations are marked by an asterisk and determined by using the low kinetic energy configuration shortly before the relaxation into the more favorable configuration starts.}%
+\label{tab:defects:si_self}%
+\end{table}%
+\bibpunct{[}{]}{,}{n}{}{}%
+\begin{figure}[tp]%
+\begin{center}%
+\begin{flushleft}%
+\begin{minipage}{5cm}%
+\underline{Tetrahedral}\\%
+$E_{\text{f}}=3.40\,\text{eV}$\\%
+\includegraphics[width=4.0cm]{si_pd_albe/tet_bonds.eps}%
+\end{minipage}%
+\begin{minipage}{10cm}%
+\underline{Hexagonal}\\[0.1cm]%
+\begin{minipage}{4cm}%
+$E_{\text{f}}^*=4.48\,\text{eV}$\\%
+\includegraphics[width=4.0cm]{si_pd_albe/hex_a_bonds.eps}%
+\end{minipage}%
+\begin{minipage}{0.8cm}%
+\begin{center}%
+$\Rightarrow$%
+\end{center}%
+\end{minipage}%
+\begin{minipage}{4cm}%
+$E_{\text{f}}=3.96\,\text{eV}$\\%
+\includegraphics[width=4.0cm]{si_pd_albe/hex_bonds.eps}%
+\end{minipage}%
+\end{minipage}\\[0.2cm]%
+\begin{minipage}{5cm}%
+\underline{\hkl<1 0 0> dumbbell}\\%
+$E_{\text{f}}=5.42\,\text{eV}$\\%
+\includegraphics[width=4.0cm]{si_pd_albe/100_bonds.eps}%
+\end{minipage}%
+\begin{minipage}{5cm}%
+\underline{\hkl<1 1 0> dumbbell}\\%
+$E_{\text{f}}=4.39\,\text{eV}$\\%
+\includegraphics[width=4.0cm]{si_pd_albe/110_bonds.eps}%
+\end{minipage}%
+\begin{minipage}{5cm}%
+\underline{Vacancy}\\%
+$E_{\text{f}}=3.13\,\text{eV}$\\%
+\includegraphics[width=4.0cm]{si_pd_albe/vac.eps}%
+\end{minipage}%
+\end{flushleft}%
+%\hrule%
+\end{center}%
+\caption[Relaxed Si self-interstitial defect configurations obtained by classical potential calculations.]{Relaxed Si self-interstitial defect configurations obtained by classical potential calculations. Si atoms and bonds are illustrated by yellow spheres and blue lines. Bonds of the defect atoms are drawn in red color.}%
+\label{fig:defects:conf}%
+\end{figure}%
The final configurations obtained after relaxation are presented in Fig.~\ref{fig:defects:conf}.
The displayed structures are the results of the classical potential simulations.
It has turned out to be very difficult to capture the results of quantum-mechanical calculations in analytical potential models.
Among the established analytical potentials only the environment-dependent interatomic potential (EDIP)~\cite{bazant97,justo98} and Stillinger-Weber~\cite{stillinger85} potential reproduce the correct order in energy of the defects.
However, these potentials show shortcomings concerning the description of other physical properties and are unable to describe the C-C and C-Si interaction.
-In fact the EA potential calculations favor the tetrahedral defect configuration.
+In fact, the EA potential calculations favor the tetrahedral defect configuration.
This limitation is assumed to arise due to the cut-off.
In the tetrahedral configuration the second neighbors are only slightly more distant than the first neighbors, which creates the particular problem.
Indeed, an increase of the cut-off results in increased values of the formation energies~\cite{albe_sic_pot}, which is most significant for the tetrahedral configuration.
\caption{Kinetic energy plot of the relaxation process of the hexagonal silicon self-interstitial defect simulation using the EA potential.}
\label{fig:defects:kin_si_hex}
\end{figure}
-To exclude failures in the implementation of the potential or the MD code itself the hexagonal defect structure was double-checked with the \textsc{parcas} MD code~\cite{parcas_md}.
+To exclude failures in the implementation of the potential or the MD code itself, the hexagonal defect structure was double-checked with the \textsc{parcas} MD code~\cite{parcas_md}.
The respective relaxation energetics are likewise plotted and look similar to the energetics obtained by \textsc{posic}.
In fact, the same type of interstitial arises using random insertions.
-In addition, variations exist, in which the displacement is only along two \hkl<1 0 0> axes ($E_\text{f}=3.8\,\text{eV}$) or along a single \hkl<1 0 0> axes ($E_\text{f}=3.6\,\text{eV}$) successively approximating the tetrahedral configuration and formation energy.
+In addition, variations exist, in which the displacement is only along two \hkl<1 0 0> axes ($E_\text{f}=3.8\,\text{eV}$) or along a single \hkl<1 0 0> axis ($E_\text{f}=3.6\,\text{eV}$) successively approximating the tetrahedral configuration and formation energy.
The existence of these local minima located near the tetrahedral configuration seems to be an artifact of the analytical potential without physical authenticity revealing fundamental problems of analytical potential models for describing defect structures.
However, the energy barrier required for a transition into the tetrahedral configuration is small.
\begin{figure}[tp]
The \si{} \hkl<1 0 0> DB constitutes the most unfavorable configuration for both, the EA and \textsc{vasp} calculations.
The quantum-mechanical treatment of the \si{} \hkl<1 0 0> DB demands for spin polarized calculations.
The same applies for the vacancy.
-In the \si{} \hkl<1 0 0> DB configuration the net spin up density is localized in two caps at each of the two DB atoms perpendicularly aligned to the bonds to the other two Si atoms respectively.
-For the vacancy the net spin up electron density is localized in caps at the four surrounding Si atoms directed towards the vacant site.
+In the \si{} \hkl<1 0 0> DB configuration, the net spin up density is localized in two caps at each of the two DB atoms perpendicularly aligned to the bonds to the other two Si atoms respectively.
+For the vacancy, the net spin up electron density is localized in caps at the four surrounding Si atoms directed towards the vacant site.
No other intrinsic defect configuration, within the ones that are mentioned, is affected by spin polarization.
-In the case of the classical potential simulations bonds between atoms are displayed if there is an interaction according to the potential model, i.e.\ if the distance of two atoms is within the cut-off radius $S_{ij}$ introduced in equation \eqref{eq:basics:fc}.
+In the case of the classical potential simulations, bonds between atoms are displayed if there is an interaction according to the potential model, i.e.\ if the distance of two atoms is within the cut-off radius $S_{ij}$ introduced in equation \eqref{eq:basics:fc}.
For the tetrahedral and the slightly displaced configurations four bonds to the atoms located in the center of the planes of the unit cell exist in addition to the four tetrahedral bonds.
-The length of these bonds are, however, close to the cut-off range and thus are weak interactions not constituting actual chemical bonds.
+The length of these bonds are, however, close to the cut-off range and, thus, are weak interactions not constituting actual chemical bonds.
The same applies to the bonds between the interstitial and the upper two atoms in the \si{} \hkl<1 1 0> DB configuration.
A more detailed description of the chemical bonding is achieved through quantum-mechanical calculations by investigating the accumulation of negative charge between the nuclei.
\subsection{Defect structures in a nutshell}
-For investigating the \ci{} structures a C atom is inserted or removed according to Fig.~\ref{fig:basics:ins_pos} of section~\ref{section:basics:defects}.
+For investigating the \ci{} structures, a C atom is inserted or removed according to Fig.~\ref{fig:basics:ins_pos} of section~\ref{section:basics:defects}.
Formation energies of the most common C point defects in crystalline Si are summarized in Table~\ref{tab:defects:c_ints}.
The relaxed configurations are visualized in Fig.~\ref{fig:defects:c_conf}.
Again, the displayed structures are the results obtained by the classical potential calculations.
An experimental value of the formation energy of \cs{} was determined by a fit to solubility data yielding a concentration of $3.5 \times 10^{24} \exp{(-2.3\,\text{eV}/k_{\text{B}}T)} \text{ cm}^{-3}$~\cite{bean71}.
However, there is no particular reason for treating the prefactor as a free parameter in the fit to the experimental data.
It is simply given by the atomic density of pure silicon, which is $5\times 10^{22}\text{ cm}^{-3}$.
-Tersoff~\cite{tersoff90} and Dal Pino et al.~\cite{dal_pino93} pointed out that by combining this prefactor with the calculated values for the energy of formation ranging from \unit[1.6--1.89]{eV} an excellent agreement with the experimental solubility data within the entire temperature range of the experiment is obtained.
-This reinterpretation of the solubility data, first proposed by Tersoff and later on reinforced by Dal~Pino~et~al. is in good agreement with the results of the quantum-mechanical calculations performed in this work.
-Unfortunately the EA potential undervalues the formation energy roughly by a factor of two, which is a definite drawback of the potential.
+Tersoff~\cite{tersoff90} and Dal~Pino~et~al.~\cite{dal_pino93} pointed out that by combining this prefactor with the calculated values for the energy of formation ranging from \unit[1.6--1.89]{eV}, an excellent agreement with the experimental solubility data within the entire temperature range of the experiment is obtained.
+This reinterpretation of the solubility data, first proposed by Tersoff and later on reinforced by Dal~Pino~et~al.\ is in good agreement with the results of the quantum-mechanical calculations performed in this work.
+Unfortunately, the EA potential undervalues the formation energy roughly by a factor of two, which is a definite drawback of the potential.
Except for Tersoff's results for the tetrahedral configuration, the \ci{} \hkl<1 0 0> DB is the energetically most favorable interstitial configuration.
As mentioned above, the low energy of formation for the tetrahedral interstitial in the case of the Tersoff potential is believed to be an artifact of the abrupt cut-off set to \unit[2.5]{\AA} (see Ref. 11 and 13 in~\cite{tersoff90}) and the real formation energy is, thus, supposed to be located between \unit[3--10]{eV}.
The highest energy is observed for the hexagonal interstitial configuration using classical potentials.
Quantum-mechanical calculations reveal this configuration to be unstable, which is also reproduced by the EA potential.
-In both cases a relaxation towards the \ci{} \hkl<1 0 0> DB configuration is observed.
+In both cases, a relaxation towards the \ci{} \hkl<1 0 0> DB configuration is observed.
Opposed to results of the first-principles calculations, Tersoff finds this configuration to be stable~\cite{tersoff90}.
In fact, the stability of the hexagonal interstitial could not be reproduced in simulations performed in this work using the unmodified Tersoff potential parameters.
Unfortunately, apart from the modified parameters, no more conditions specifying the relaxation process are given in Tersoff's study on C point defects in Si.
The fact that the tetrahedral and hexagonal configurations are the two most unstable configurations in classical potential calculations and, thus, are less likely to arise in MD simulations, acts in concert with the fact that these configurations are found to be unstable in the more accurate quantum-mechanical description.
Just as for \si{}, a \ci{} \hkl<1 1 0> DB configuration exists.
-It constitutes the second most favorable configuration, reproduced by both methods.
+It constitutes the second most favorable configuration, which is reproduced by both methods.
Similar structures arise in both types of simulations.
The Si and C atom share a regular Si lattice site aligned along the \hkl<1 1 0> direction.
The C atom is slightly displaced towards the next nearest Si atom located in the opposite direction with respect to the site-sharing Si atom and even forms a bond with this atom.
The \ci{} \hkl<1 1 0> DB structure is energetically followed by the BC configuration.
-However, even though EA based results yield the same difference in energy with respect to the \hkl<1 1 0> defect as DFT does, the BC configuration is found to be a unstable within the EA description.
+However, even though EA based results yield the same difference in energy with respect to the \hkl<1 1 0> defect as DFT does, the BC configuration is found to be unstable within the EA description.
The BC configuration descends into the \ci{} \hkl<1 1 0> DB configuration.
Due to the high formation energy of the BC defect resulting in a low probability of occurrence of this defect, the wrong description is not posing a serious limitation of the EA potential.
Tersoff indeed predicts a metastable BC configuration.
This is discussed in more detail in section~\ref{subsection:100mig}.
To conclude, discrepancies between the results from classical potential calculations and those obtained from first principles are observed.
-Within the classical potentials EA outperforms Tersoff and is, therefore, used for further studies.
+Within the classical potentials, EA outperforms Tersoff and is, therefore, used for further studies.
Both methods (EA and DFT) predict the \ci{} \hkl<1 0 0> DB configuration to be most stable.
Also the remaining defects and their energetic order are described fairly well.
It is thus concluded that, so far, modeling of the SiC precipitation by the EA potential might lead to trustable results.
\subsection[C \hkl<1 0 0> dumbbell interstitial configuration]{\boldmath C \hkl<1 0 0> dumbbell interstitial configuration}
\label{subsection:100db}
-As the \ci{} \hkl<1 0 0> DB constitutes the ground-state configuration of a C atom incorporated into otherwise perfect c-Si it is the most probable and, hence, one of the most important interstitial configurations of C in Si.
+As the \ci{} \hkl<1 0 0> DB constitutes the ground-state configuration of a C atom incorporated into otherwise perfect c-Si, it is the most probable and, hence, one of the most important interstitial configurations of C in Si.
The structure was initially suspected by IR local vibrational mode absorption~\cite{bean70} and finally verified by electron paramagnetic resonance (EPR)~\cite{watkins76} studies on irradiated Si substrates at low temperatures.
Fig.~\ref{fig:defects:100db_cmp} schematically shows the \ci{} \hkl<1 0 0> DB structure and Table~\ref{tab:defects:100db_cmp} lists the details of the atomic displacements, distances and bond angles obtained by classical potential and quantum-mechanical calculations.
This is supported by the image of the charge density isosurface in Fig.~\ref{img:defects:charge_den_and_ksl}.
The two lower Si atoms are $sp^3$ hybridized and form $\sigma$ bonds to the Si DB atom.
The same is true for the upper two Si atoms and the C DB atom.
-In addition the DB atoms form $\pi$ bonds.
-However, due to the increased electronegativity of the C atom the electron density is attracted by and, thus, localized around the C atom.
+In addition, the DB atoms form $\pi$ bonds.
+However, due to the increased electronegativity of the C atom, the electron density is attracted by and, thus, localized around the C atom.
In the same figure the Kohn-Sham levels are shown.
There is no magnetization density.
An acceptor level arises at approximately $E_v+0.35\,\text{eV}$ while a band gap of about \unit[0.75]{eV} can be estimated from the Kohn-Sham level diagram for plain Si.
However, this fact could not be reproduced by spin polarized \textsc{vasp} calculations performed in this work.
Present results suggest this configuration to correspond to a real local minimum.
In fact, an additional barrier has to be passed to reach this configuration starting from the \ci{} \hkl<1 0 0> interstitial configuration, which is investigated in section~\ref{subsection:100mig}.
-After slightly displacing the C atom along the \hkl[1 0 0] (equivalent to a displacement along \hkl[0 1 0]), \hkl[0 0 1], \hkl[0 0 -1] and \hkl[1 -1 0] direction the distorted structures relax back into the BC configuration.
-As will be shown in subsequent migration simulations the same would happen to structures where the C atom is displaced along the migration direction, which approximately is the \hkl[1 1 0] direction.
+After slightly displacing the C atom along the \hkl[1 0 0] (equivalent to a displacement along \hkl[0 1 0]), \hkl[0 0 1], \hkl[0 0 -1] and \hkl[1 -1 0] direction, the distorted structures relax back into the BC configuration.
+As will be shown in subsequent migration simulations, the same would happen to structures where the C atom is displaced along the migration direction, which approximately is the \hkl[1 1 0] direction.
These relaxations indicate that the BC configuration is a real local minimum instead of an assumed saddle point configuration.
Fig.~\ref{img:defects:bc_conf} shows the structure, charge density isosurface and Kohn-Sham levels of the BC configuration.
In fact, the net magnetization of two electrons is already suggested by simple molecular orbital theory considerations with respect to the bonding of the C atom.
%
\begin{minipage}{15cm}
\centering
-\framebox{\hkl<0 0 -1> $\rightarrow$ \hkl<0 0 1>}\\
+\framebox{\hkl[0 0 -1] $\rightarrow$ \hkl[0 0 1]}\\
\begin{minipage}{4.5cm}
\includegraphics[width=4.5cm]{c_pd_vasp/100_2333.eps}
\end{minipage}
%
\begin{minipage}{15cm}
\centering
-\framebox{\hkl<0 0 -1> $\rightarrow$ \hkl<0 -1 0>}\\
+\framebox{\hkl[0 0 -1] $\rightarrow$ \hkl[0 -1 0]}\\
\begin{minipage}{4.5cm}
\includegraphics[width=4.5cm]{c_pd_vasp/100_2333.eps}
\end{minipage}
%
\begin{minipage}{15cm}
\centering
-\framebox{\hkl<0 0 -1> $\rightarrow$ \hkl<0 -1 0> (in place)}\\
+\framebox{\hkl[0 0 -1] $\rightarrow$ \hkl[0 -1 0] (in place)}\\
\begin{minipage}{4.5cm}
\includegraphics[width=4.5cm]{c_pd_vasp/100_2333.eps}
\end{minipage}
\label{img:defects:c_mig_path}
\end{figure}
Three different migration paths are accounted in this work, which are displayed in Fig.~\ref{img:defects:c_mig_path}.
-The first migration investigated is a transition of a \hkl<0 0 -1> into a \hkl<0 0 1> DB interstitial configuration.
+The first investigated migration is a transition of a \hkl[0 0 -1] into a \hkl[0 0 1] DB interstitial configuration.
During this migration the C atom is changing its Si DB partner.
-The new partner is the one located at $a_{\text{Si}}/4 \hkl<1 1 -1>$ relative to the initial one, where $a_{\text{Si}}$ is the Si lattice constant.
+The new partner is the one located at $a_{\text{Si}}/4 \hkl[1 1 -1]$ relative to the initial one, where $a_{\text{Si}}$ is the Si lattice constant.
Two of the three bonds to the next neighbored Si atoms are preserved while the breaking of the third bond and the accompanying formation of a new bond is observed.
-The C atom resides in the \hkl(1 1 0) plane.
+The C atom resides in the \hkl(-1 1 0) plane.
This transition involves the intermediate BC configuration.
However, results discussed in the previous section indicate that the BC configuration is a real local minimum.
-Thus, the \hkl<0 0 -1> to \hkl<0 0 1> migration can be thought of a two-step mechanism in which the intermediate BC configuration constitutes a metastable configuration.
-Due to symmetry it is enough to consider the transition from the BC to the \hkl<1 0 0> configuration or vice versa.
+Thus, the \hkl[0 0 -1] to \hkl[0 0 1] migration can be thought of a two-step mechanism, in which the intermediate BC configuration constitutes a metastable configuration.
+Due to symmetry, it is enough to consider the transition from the BC to a \hkl<1 0 0> configuration or vice versa.
In the second path, the C atom is changing its Si partner atom as in path one.
-However, the trajectory of the C atom is no longer proceeding in the \hkl(1 1 0) plane.
-The orientation of the new DB configuration is transformed from \hkl<0 0 -1> to \hkl<0 -1 0>.
+However, the trajectory of the C atom is no longer proceeding in the \hkl(-1 1 0) plane.
+The orientation of the new DB configuration is transformed from \hkl[0 0 -1] to \hkl[0 -1 0].
Again, one bond is broken while another one is formed.
As a last migration path, the defect is only changing its orientation.
Thus, this path is not responsible for long-range migration.
\begin{center}
\includegraphics[width=0.7\textwidth]{im_00-1_nosym_sp_fullct_thesis_vasp_s.ps}
\end{center}
-\caption[Migration barrier and structures of the {\hkl[0 0 -1]} DB to BC transition.]{Migration barrier and structures of the \hkl<0 0 -1> DB (left) to BC (right) transition. Bonds of the C atom are illustrated by blue lines.}
+\caption[Migration barrier and structures of the {\hkl[0 0 -1]} DB to BC transition.]{Migration barrier and structures of the \hkl[0 0 -1] DB (left) to BC (right) transition. Bonds of the C atom are illustrated by blue lines.}
\label{fig:defects:00-1_001_mig}
\end{figure}
-In Fig.~\ref{fig:defects:00-1_001_mig} results of the \hkl<0 0 -1> to \hkl<0 0 1> migration fully described by the migration of the \hkl<0 0 -1> to the BC configuration is displayed.
-To reach the BC configuration, which is \unit[0.94]{eV} higher in energy than the \hkl<0 0 -1> DB configuration, an energy barrier of approximately \unit[1.2]{eV} given by the saddle point structure at a displacement of \unit[60]{\%} has to be passed.
+In Fig.~\ref{fig:defects:00-1_001_mig} results of the \hkl[0 0 -1] to \hkl[0 0 1] migration fully described by the migration of the \hkl[0 0 -1] to the BC configuration is displayed.
+To reach the BC configuration, which is \unit[0.94]{eV} higher in energy than the \hkl[0 0 -1] DB configuration, an energy barrier of approximately \unit[1.2]{eV} given by the saddle point structure at a displacement of \unit[60]{\%} has to be passed.
This amount of energy is needed to break the bond of the C atom to the Si atom at the bottom left.
In a second process \unit[0.25]{eV} of energy are needed for the system to revert into a \hkl<1 0 0> configuration.
\caption[Migration barrier and structures of the {\hkl[0 0 -1]} DB to the {\hkl[0 -1 0]} DB transition.]{Migration barrier and structures of the \hkl[0 0 -1] DB (left) to the \hkl[0 -1 0] DB (right) transition. Bonds of the C atom are illustrated by blue lines.}
\label{fig:defects:00-1_0-10_mig}
\end{figure}
-Fig.~\ref{fig:defects:00-1_0-10_mig} shows the migration barrier and structures of the \ci{} \hkl<0 0 -1> to \hkl<0 -1 0> DB transition.
+Fig.~\ref{fig:defects:00-1_0-10_mig} shows the migration barrier and structures of the \ci{} \hkl[0 0 -1] to \hkl[0 -1 0] DB transition.
The resulting migration barrier of approximately \unit[0.9]{eV} is very close to the experimentally obtained values of \unit[0.70]{eV}~\cite{lindner06}, \unit[0.73]{eV}~\cite{song90} and \unit[0.87]{eV}~\cite{tipping87}.
\begin{figure}[tp]
Further migration pathways, in particular those occupying other defect configurations than the \hkl<1 0 0>-type either as a transition state or a final or starting configuration, are totally conceivable.
This is investigated in the following in order to find possible migration pathways that have an activation energy lower than the ones found up to now.
The next energetically favorable defect configuration is the \hkl<1 1 0> C-Si DB interstitial.
-Fig.~\ref{fig:defects:110_mig_vasp} shows the migration barrier of the \hkl<1 1 0> C-Si DB to the BC, \hkl<0 0 -1> and \hkl<0 -1 0> (in place) transition.
-Indeed less than \unit[0.7]{eV} are necessary to turn a \hkl<0 -1 0>- to a \hkl<1 1 0>-type C-Si DB interstitial.
+Fig.~\ref{fig:defects:110_mig_vasp} shows the migration barrier of the \hkl[1 1 0] C-Si DB to the BC, \hkl[0 0 -1] and \hkl[0 -1 0] (in place) transition.
+Indeed less than \unit[0.7]{eV} are necessary to turn the \hkl[0 -1 0] to the \hkl[1 1 0] C-Si DB interstitial.
This transition is carried out in place, i.e.\ the Si DB pair is not changed and both, the Si and C atom share the initial lattice site.
Thus, this transition does not contribute to long-range diffusion.
-Once the C atom resides in the \hkl<1 1 0> DB interstitial configuration it can migrate into the BC configuration requiring approximately \unit[0.95]{eV} of activation energy, which is only slightly higher than the activation energy needed for the \hkl<0 0 -1> to \hkl<0 -1 0> pathway as shown in Fig.~\ref{fig:defects:00-1_0-10_mig}.
-As already known from the migration of the \hkl<0 0 -1> to the BC configuration discussed in Fig.~\ref{fig:defects:00-1_001_mig}, another \unit[0.25]{eV} are needed to turn back from the BC to a \hkl<1 0 0>-type interstitial.
+Once the C atom resides in the \hkl[1 1 0] DB interstitial configuration, it can migrate into the BC configuration requiring approximately \unit[0.95]{eV} of activation energy, which is only slightly higher than the activation energy needed for the \hkl[0 0 -1] to \hkl[0 -1 0] pathway as shown in Fig.~\ref{fig:defects:00-1_0-10_mig}.
+As already known from the migration of the \hkl[0 0 -1] to the BC configuration discussed in Fig.~\ref{fig:defects:00-1_001_mig}, another \unit[0.25]{eV} are needed to turn back from the BC to a \hkl<1 0 0>-type interstitial.
However, due to the fact that this migration consists of three single transitions with the second one having an activation energy slightly higher than observed for the direct transition, this sequence of paths is considered very unlikely to occur.
-The migration barrier of the \hkl<1 1 0> to \hkl<0 0 -1> transition, in which the C atom is changing its Si partner and, thus, moving to the neighbored lattice site, corresponds to approximately \unit[1.35]{eV}.
-During this transition the C atom is escaping the \hkl(1 1 0) plane approaching the final configuration on a curved path.
+The migration barrier of the \hkl[1 1 0] to \hkl[0 0 -1] transition, in which the C atom is changing its Si partner and, thus, moving to the neighbored lattice site, corresponds to approximately \unit[1.35]{eV}.
+During this transition the C atom is escaping the \hkl(-1 1 0) plane approaching the final configuration on a curved path.
This barrier is much higher than the ones found previously, which again make this transition very unlikely to occur.
For this reason, the assumption that C diffusion and reorientation is achieved by transitions of the type presented in Fig.~\ref{fig:defects:00-1_0-10_mig} is reinforced.
Fig.~\ref{fig:defects:cp_bc_00-1_mig} shows the evolution of structure and energy along the \ci{} BC to \hkl[0 0 -1] DB transition.
Since the \ci{} BC configuration is unstable relaxing into the \hkl[1 1 0] DB configuration within this potential, the low kinetic energy state is used as a starting configuration.
Two different pathways are obtained for different time constants of the Berendsen thermostat.
-With a time constant of \unit[1]{fs} the C atom resides in the \hkl(1 1 0) plane
+With a time constant of \unit[1]{fs}, the C atom resides in the \hkl(-1 1 0) plane
resulting in a migration barrier of \unit[2.4]{eV}.
-However, weaker coupling to the heat bath realized by an increase of the time constant to \unit[100]{fs} enables the C atom to move out of the \hkl(1 1 0) plane already at the beginning, which is accompanied by a reduction in energy, approaching the final configuration on a curved path.
-The energy barrier of this path is \unit[0.2]{eV} lower in energy than the direct migration within the \hkl(1 1 0) plane.
+However, weaker coupling to the heat bath realized by an increase of the time constant to \unit[100]{fs} enables the C atom to move out of the \hkl(-1 1 0) plane already at the beginning, which is accompanied by a reduction in energy, approaching the final configuration on a curved path.
+The energy barrier of this path is \unit[0.2]{eV} lower in energy than the direct migration within the \hkl(-1 1 0) plane.
However, the investigated pathways cover an activation energy approximately twice as high as the one obtained by quantum-mechanical calculations.
If the entire transition of the \hkl[0 0 -1] into the \hkl[0 0 1] configuration is considered a two step process passing the intermediate BC configuration, an additional activation energy of \unit[0.5]{eV} is necessary to escape the BC towards the \hkl[0 0 1] configuration.
Assuming equal preexponential factors for both diffusion steps, the total probability of diffusion is given by $\exp\left((2.2\,\text{eV}+0.5\,\text{eV})/k_{\text{B}}T\right)$.
Figures~\ref{fig:defects:cp_00-1_0-10_mig} and~\ref{fig:defects:cp_00-1_ip0-10_mig} show the migration barriers of the \ci{} \hkl[0 0 -1] to \hkl[0 -1 0] DB transition.
In the first case, the transition involves a change in the lattice site of the C atom whereas in the second case, a reorientation at the same lattice site takes place.
In the first case, the pathways for the two different time constants look similar.
-A local minimum exists in between two peaks of the graph.
+A local minimum exists in between the two peaks of the graph.
The corresponding configuration, which is illustrated for the results obtained for a time constant of \unit[1]{fs}, looks similar to the \ci{} \hkl[1 1 0] configuration.
-Indeed, this configuration is obtained by relaxation simulations without constraints of configurations near the minimum.
+Indeed, this configuration is obtained by relaxation simulations without constraints of configurations near this local minimum.
Activation energies of roughly \unit[2.8]{eV} and \unit[2.7]{eV} are needed for migration.
The \ci{} \hkl[1 1 0] configuration seems to play a decisive role in all migration pathways in the classical potential calculations.
\label{fig:defects:110_mig}
\end{figure}
Fig.~\ref{fig:defects:110_mig} shows migration barriers of the \ci{} \hkl[1 1 0] DB to \hkl[0 0 -1], \hkl[0 -1 0] (in place) and BC configuration.
-As expected there is no maximum for the transition into the BC configuration.
+As expected, there is no maximum for the transition into the BC configuration.
As mentioned earlier, the BC configuration itself constitutes a saddle point configuration relaxing into the energetically more favorable \hkl[1 1 0] DB configuration.
An activation energy of \unit[2.2]{eV} is necessary to reorientate the \hkl[0 0 -1] into the \hkl[1 1 0] DB configuration, which is \unit[1.3]{eV} higher in energy.
-Residing in this state another \unit[0.90]{eV} is enough to make the C atom form a \hkl[0 0 -1] DB configuration with the Si atom of the neighbored lattice site.
-In contrast to quantum-mechanical calculations, in which the direct transition is the energetically most favorable transition and the transition composed of the intermediate migration steps is very unlikely to occur, the just presented pathway is much more conceivable in classical potential simulations, since the energetically most favorable transition found so far is likewise composed of two migration steps with activation energies of \unit[2.2]{eV} and \unit[0.5]{eV}, for which the intermediate state is the BC configuration, which is unstable.
-Thus the just proposed migration path, which involves the \hkl[1 1 0] interstitial configuration, becomes even more probable than the initially proposed path, which involves the BC configuration that is, in fact, unstable.
+Residing in this state, another \unit[0.90]{eV} is enough to make the C atom form a \hkl[0 0 -1] DB configuration with the Si atom of the neighbored lattice site.
+In contrast to quantum-mechanical calculations, in which the direct transition is the energetically most favorable transition and the transition composed of the intermediate migration steps is very unlikely to occur, the just presented pathway is much more conceivable in classical potential simulations since the energetically most favorable transition found so far is likewise composed of two migration steps with activation energies of \unit[2.2]{eV} and \unit[0.5]{eV}, for which the intermediate state is the BC configuration, which is unstable.
+Thus, the just proposed migration path, which involves the \hkl[1 1 0] interstitial configuration, becomes even more probable than the initially proposed path involving the BC configuration.
Due to these findings, the respective path is proposed to constitute the diffusion-describing path.
The evolution of structure and configurational energy is displayed again in Fig.~\ref{fig:defects:involve110}.
\begin{figure}[tp]
Approximately \unit[2.2]{eV} are needed to turn the \ci{} \hkl[0 0 -1] into the \hkl[1 1 0] DB located at the neighbored lattice site in \hkl[1 1 -1] direction.
Another barrier of \unit[0.90]{eV} exists for the rotation into the \ci{} \hkl[0 -1 0] DB configuration for the path obtained with a time constant of \unit[100]{fs} for the Berendsen thermostat.
Roughly the same amount would be necessary to excite the C$_{\text{i}}$ \hkl[1 1 0] DB to the BC configuration (\unit[0.40]{eV}) and a successive migration into the \hkl[0 0 1] DB configuration (\unit[0.50]{eV}) as displayed in Fig.~\ref{fig:defects:110_mig} and Fig.~\ref{fig:defects:cp_bc_00-1_mig}.
-The former diffusion process, however, would more nicely agree with the {\em ab initio} path, since the migration is accompanied by a rotation of the DB orientation.
+The former diffusion process, however, would more nicely agree with the {\em ab initio} path since the migration is accompanied by a rotation of the DB orientation.
By considering a two step process and assuming equal preexponential factors for both diffusion steps, the probability of the total diffusion event is given by $\exp(\frac{\unit[2.24]{eV}+\unit[0.90]{eV}}{k_{\text{B}}T})$, which corresponds to a single diffusion barrier that is 3.5 times higher than the barrier obtained by {\em ab initio} calculations.
\subsection{Conclusions}
\label{tab:defects:e_of_comb}
\end{table}
Table~\ref{tab:defects:e_of_comb} summarizes resulting binding energies for the combination with a second \ci{} \hkl<1 0 0> DB obtained for different orientations at positions 1 to 5 after structural relaxation.
-Most of the obtained configurations result in binding energies well below zero indicating a preferable agglomeration of this type of the defects.
-For increasing distances of the defect pair, the binding energy approaches to zero as it is expected for non-interacting isolated defects.
+Most of the obtained configurations result in binding energies well below zero indicating a preferable agglomeration of this type of defects.
+For increasing distances of the defect pair, the binding energy approaches to zero as it is expected for non-interacting, isolated defects.
%
In fact, a \ci{} \hkl[0 0 -1] DB interstitial created at position R separated by a distance of $\frac{a_{\text{Si}}}{2}\hkl<3 2 3>$ ($\approx$\unit[12.8]{\AA}) from the initial one results in an energy as low as \unit[-0.19]{eV}.
There is still a low interaction remaining, which is due to the equal orientation of the defects.
-By changing the orientation of the second DB interstitial to the \hkl<0 -1 0>-type, the interaction is even more reduced resulting in an energy of \unit[-0.05]{eV} for a distance, which is the maximum that can be realized due to periodic boundary conditions.
+By changing the orientation of the second DB interstitial to the \hkl[0 -1 0]-type, the interaction is even more reduced resulting in an energy of \unit[-0.05]{eV} for a distance, which is the maximum that can be realized due to periodic boundary conditions.
Energetically favorable and unfavorable configurations can be explained by stress compensation and increase respectively based on the resulting net strain of the respective configuration of the defect combination.
Antiparallel orientations of the second defect, i.e.\ \hkl[0 0 1] for positions located below the \hkl(0 0 1) plane with respect to the initial one (positions 1, 2 and 4) form the energetically most unfavorable configurations.
In contrast, the parallel and particularly the twisted orientations constitute energetically favorable configurations, in which a vast reduction of strain is enabled by combination of these defects.
\caption[Relaxed structures of defect combinations obtained by creating {\hkl[1 0 0]} and {\hkl[0 -1 0]} DBs at position 1.]{Relaxed structures of defect combinations obtained by creating \hkl[1 0 0] (a) and \hkl[0 -1 0] (b) DBs at position 1.}
\label{fig:defects:comb_db_01}
\end{figure}
-Mattoni~et~al.~\cite{mattoni2002} predict the ground-state configuration of \ci{} \hkl<1 0 0>-type defect pairs for a \hkl[1 0 0] or equivalently a \hkl[0 1 0] defect created at position 1 with both defects basically maintaining the as-isolated DB structure, resulting in a binding energy of \unit[-2.1]{eV}.
+Mattoni~et~al.~\cite{mattoni2002} predict the ground-state configuration of \ci{} \hkl<1 0 0>-type defect pairs for a \hkl[1 0 0] or equivalently a \hkl[0 1 0] defect created at position 1 with both defects basically maintaining the as-isolated DB structure resulting in a binding energy of \unit[-2.1]{eV}.
In the present study, a further relaxation of this defect structure is observed.
The C atom of the second and the Si atom of the initial DB move towards each other forming a bond, which results in a somewhat lower binding energy of \unit[-2.25]{eV}.
The corresponding defect structure is displayed in Fig.~\ref{fig:defects:225}.
\caption[Relaxed structures of defect combinations obtained by creating {\hkl[1 0 0]} and {\hkl[0 1 0]} DBs at position 2 and a {\hkl[0 0 1]} DB at position 3.]{Relaxed structures of defect combinations obtained by creating \hkl[1 0 0] (a) and \hkl[0 1 0] (b) DBs at position 2 and a \hkl[0 0 1] (c) DB at position 3.}
\label{fig:defects:comb_db_02}
\end{figure}
-Fig.~\ref{fig:defects:comb_db_02} shows the next three energetically favorable configurations.
+Fig.~\ref{fig:defects:comb_db_02} shows the three next energetically favorable configurations.
The relaxed configuration obtained by creating a \hkl[1 0 0] DB at position 2 is shown in Fig.~\ref{fig:defects:216}.
A binding energy of \unit[-2.16]{eV} is observed.
After relaxation, the second DB is aligned along \hkl[1 1 0].
Relaxed structures of these combinations are displayed in Fig.~\ref{fig:defects:comb_db_03}.
Fig.~\ref{fig:defects:153} and~\ref{fig:defects:166} show the relaxed structures of \hkl[0 0 1] and \hkl[0 0 -1] DBs.
The upper DB atoms are pushed towards each other forming fourfold coordinated bonds.
-While the displacements of the Si atoms in case (b) are symmetric to the \hkl(1 1 0) plane, in case (a) the Si atom of the initial DB is pushed a little further in the direction of the C atom of the second DB than the C atom is pushed towards the Si atom.
+While the displacements of the Si atoms in case (b) are symmetric to the \hkl(1 1 0) plane, in case (a), the Si atom of the initial DB is pushed a little further in the direction of the C atom of the second DB than the C atom is pushed towards the Si atom.
The bottom atoms of the DBs remain in threefold coordination.
The symmetric configuration is energetically more favorable ($E_{\text{b}}=-1.66\,\text{eV}$) since the displacements of the atoms is less than in the antiparallel case ($E_{\text{b}}=-1.53\,\text{eV}$).
In Fig.~\ref{fig:defects:188} and~\ref{fig:defects:138} the non-parallel orientations, namely the \hkl[0 -1 0] and \hkl[1 0 0] DBs, are shown.
Binding energies of \unit[-1.88]{eV} and \unit[-1.38]{eV} are obtained for the relaxed structures.
-In both cases the Si atom of the initial interstitial is pulled towards the near by atom of the second DB.
+In both cases, the Si atom of the initial interstitial is pulled towards the near by atom of the second DB.
Both atoms form fourfold coordinated bonds to their neighbors.
-In case (c) it is the C and in case (d) the Si atom of the second interstitial, which forms the additional bond with the Si atom of the initial interstitial.
+In case (c), it is the C and in case (d) the Si atom of the second interstitial, which forms the additional bond with the Si atom of the initial interstitial.
The respective atom of the second DB, the \ci{} atom of the initial DB and the two interconnecting Si atoms again reside in a plane.
As observed before, a typical C-C distance of \unit[2.79]{\AA} is, thus, observed for case (c).
In both configurations, the far-off atom of the second DB resides in threefold coordination.
The interaction of \ci{} \hkl<1 0 0> DBs is investigated along the \hkl[1 1 0] bond chain assuming a possible reorientation of the DB atom at each position to minimize its configurational energy.
-Therefore, the binding energies of the energetically most favorable configurations with the second DB located along the \hkl[1 1 0] direction and resulting C-C distances of the relaxed structures are summarized in Table~\ref{tab:defects:comb_db110}.
-\begin{table}[tp]
-\begin{center}
-\begin{tabular}{l c c c c c c}
-\hline
-\hline
- & 1 & 2 & 3 & 4 & 5 & 6\\
-\hline
-$E_{\text{b}}$ [eV] & -2.39 & -1.88 & -0.59 & -0.31 & -0.24 & -0.21 \\
-C-C distance [\AA] & 1.4 & 4.6 & 6.5 & 8.6 & 10.5 & 10.8 \\
-Type & \hkl[-1 0 0] & \hkl[1 0 0] & \hkl[1 0 0] & \hkl[1 0 0] & \hkl[1 0 0] & \hkl[1 0 0], \hkl[0 -1 0]\\
-\hline
-\hline
-\end{tabular}
-\end{center}
-\caption{Binding energies $E_{\text{b}}$, C-C distance and types of energetically most favorable \ci{} \hkl<1 0 0>-type defect pairs separated along the \hkl[1 1 0] bond chain.}
-\label{tab:defects:comb_db110}
-\end{table}
-%
-\begin{figure}[tp]
-\begin{center}
-\includegraphics[width=0.7\textwidth]{db_along_110_cc_n.ps}
-\end{center}
-\caption[Minimum binding energy of DB combinations separated along {\hkl[1 1 0]} with respect to the C-C distance.]{Minimum binding energy of dumbbell combinations separated along \hkl[1 1 0] with respect to the C-C distance. The blue line is a guide for the eye and the green curve corresponds to the most suitable fit function consisting of all but the first data point.}
-\label{fig:defects:comb_db110}
-\end{figure}
+Therefor, the binding energies of the energetically most favorable configurations with the second DB located along the \hkl[1 1 0] direction and resulting C-C distances of the relaxed structures are summarized in Table~\ref{tab:defects:comb_db110}.
+\begin{table}[tp]%
+\begin{center}%
+\begin{tabular}{l c c c c c c}%
+\hline%
+\hline%
+ & 1 & 2 & 3 & 4 & 5 & 6\\%
+\hline%
+$E_{\text{b}}$ [eV] & -2.39 & -1.88 & -0.59 & -0.31 & -0.24 & -0.21 \\%
+C-C distance [\AA] & 1.4 & 4.6 & 6.5 & 8.6 & 10.5 & 10.8 \\%
+Type & \hkl[-1 0 0] & \hkl[1 0 0] & \hkl[1 0 0] & \hkl[1 0 0] & \hkl[1 0 0] & \hkl[1 0 0], \hkl[0 -1 0]\\%
+\hline%
+\hline%
+\end{tabular}%
+\end{center}%
+\caption{Binding energies $E_{\text{b}}$, C-C distance and types of energetically most favorable \ci{} \hkl<1 0 0>-type defect pairs separated along the \hkl[1 1 0] bond chain.}%
+\label{tab:defects:comb_db110}%
+\end{table}%
+\begin{figure}[tp]%
+\begin{center}%
+\includegraphics[width=0.7\textwidth]{db_along_110_cc_n.ps}%
+\end{center}%
+\caption[Minimum binding energy of DB combinations separated along {\hkl[1 1 0]} with respect to the C-C distance.]{Minimum binding energy of dumbbell combinations separated along \hkl[1 1 0] with respect to the C-C distance. The blue line is a guide for the eye and the green curve corresponds to the most suitable fit function consisting of all but the first data point.}%
+\label{fig:defects:comb_db110}%
+\end{figure}%
The binding energy of these configurations with respect to the C-C distance is plotted in Fig.~\ref{fig:defects:comb_db110}.
The interaction is found to be proportional to the reciprocal cube of the C-C distance for extended separations of the \ci{} DBs and saturates for the smallest possible separation, i.e.\ the ground-state configuration.
The ground-state configuration was ignored in the fitting process.
%\subsection{Diffusion processes among configurations of \ci{} pairs}
To draw further conclusions on the probability of C clustering, transitions into the ground-state configuration are investigated.
-Based on the lowest energy migration path of a single \ci{} \hkl<1 0 0> DB, the configuration, in which the second \ci{} DB is oriented along \hkl[0 1 0] at position 2 is assumed to constitute an ideal starting point for a transition into the ground state.
+Based on the lowest energy migration path of a single \ci{} \hkl<1 0 0> DB, the configuration, in which the second \ci{} DB is oriented along \hkl[0 1 0] at position 2, is assumed to constitute an ideal starting point for a transition into the ground state.
In addition, the starting configuration exhibits a low binding energy (\unit[-1.90]{eV}) and is, thus, very likely to occur.
However, a smooth transition path is not found.
Intermediate configurations within the investigated turbulent pathway identify barrier heights of more than \unit[4]{eV} resulting in a low probability for the transition.
The high activation energy is attributed to the stability of such a low energy configuration, in which the C atom of the second DB is located close to the initial DB.
Due to an effective stress compensation realized in the respective low energy configuration, which will necessarily be lost during migration, a high energy configuration needs to get passed, which is responsible for the high barrier.
-Low barriers are only identified for transitions starting from energetically less favorable configurations, e.g. the configuration of a \hkl[-1 0 0] DB located at position 2 (\unit[-0.36]{eV}).
+Low barriers are only identified for transitions starting from energetically less favorable configurations, e.g.\ the configuration of a \hkl[-1 0 0] DB located at position 2 (\unit[-0.36]{eV}).
Starting from this configuration, an activation energy of only \unit[1.2]{eV} is necessary for the transition into the ground state configuration.
The corresponding migration energies and atomic configurations are displayed in Fig.~\ref{fig:036-239}.
\begin{figure}[tp]
However, if the increase of separation is accompanied by an increase in binding energy, this difference is needed in addition to the activation energy for the respective migration process.
Configurations, which exhibit both, a low binding energy as well as afferent transitions with low activation energies are, thus, most probable C$_{\text{i}}$ complex structures.
On the other hand, if elevated temperatures enable migrations with huge activation energies, comparably small differences in configurational energy can be neglected resulting in an almost equal occupation of such configurations.
-In both cases the configuration yielding a binding energy of \unit[-2.25]{eV} is promising.
+In both cases, the configuration yielding a binding energy of \unit[-2.25]{eV} is promising.
First of all, it constitutes the second most energetically favorable structure.
Secondly, a migration path with a barrier as low as \unit[0.47]{eV} exists starting from a configuration of largely separated defects exhibiting a low binding energy (\unit[-1.88]{eV}).
The migration barrier and corresponding structures are shown in Fig.~\ref{fig:188-225}.
Configuration $\alpha$ is similar to configuration A, except that the C$_{\text{s}}$ atom at position 1 is facing the C DB atom as a neighbor resulting in the formation of a strong C-C bond and a much more noticeable perturbation of the DB structure.
Nevertheless, the C and Si DB atoms remain threefold coordinated.
Although the C-C bond exhibiting a distance of \unit[0.15]{nm} close to the distance expected in diamond or graphite should lead to a huge gain in energy, a repulsive interaction with a binding energy of \unit[0.26]{eV} is observed due to compressive strain of the Si DB atom and its top neighbors (\unit[0.230]{nm}/\unit[0.236]{nm}) along with additional tensile strain of the C$_{\text{s}}$ and its three neighboring Si atoms (\unit[0.198--0.209]{nm}/\unit[0.189]{nm}).
-Again a single bond switch, i.e.\ the breaking of the bond of the Si atom bound to the fourfold coordinated C$_{\text{s}}$ atom and the formation of a double bond between the two C atoms, results in configuration b.
+Again, a single bond switch, i.e.\ the breaking of the bond of the Si atom bound to the fourfold coordinated C$_{\text{s}}$ atom and the formation of a double bond between the two C atoms, results in configuration b.
The two C atoms form a \hkl[1 0 0] DB sharing the initial C$_{\text{s}}$ lattice site while the initial Si DB atom occupies its previously regular lattice site.
-The transition is accompanied by a large gain in energy as can be seen in Fig.~\ref{fig:026-128}, making it the ground-state configuration of a C$_{\text{s}}$ and C$_{\text{i}}$ DB in Si yet \unit[0.33]{eV} lower in energy than configuration B.
+The transition is accompanied by a large gain in energy as can be seen in Fig.~\ref{fig:026-128} making it the ground-state configuration of a C$_{\text{s}}$ and C$_{\text{i}}$ DB in Si yet \unit[0.33]{eV} lower in energy than configuration B.
This finding is in good agreement with a combined {\em ab initio} and experimental study of Liu et~al.~\cite{liu02}, who first proposed this structure as the ground state identifying an energy difference compared to configuration B of \unit[0.2]{eV}.
% mattoni: A favored by 0.2 eV - NO! (again, missing spin polarization?)
A net magnetization of two spin up electrons, which are equally localized as in the Si$_{\text{i}}$ \hkl<1 0 0> DB structure is observed.
Configurations $\alpha$, A and B are not affected by spin polarization and show zero magnetization.
Mattoni et~al.~\cite{mattoni2002}, in contrast, find configuration $\beta$ less favorable than configuration A by \unit[0.2]{eV}.
Next to differences in the XC functional and plane-wave energy cut-off, this discrepancy might be attributed to the neglect of spin polarization in their calculations, which -- as has been shown for the C$_{\text{i}}$ BC configuration -- results in an increase of configurational energy.
-Indeed, investigating the migration path from configurations $\alpha$ to $\beta$ and, in doing so, reusing the wave functions of the previous migration step the final structure, i.e.\ configuration $\beta$, is obtained with zero magnetization and an increase in configurational energy by \unit[0.2]{eV}.
-Obviously a different energy minimum of the electronic system is obtained indicating hysteresis behavior.
-However, since the total energy is lower for the magnetic result it is believed to constitute the real, i.e.\ global, minimum with respect to electronic minimization.
+Indeed, investigating the migration path from configurations $\alpha$ to $\beta$ and, in doing so, reusing the wave functions of the previous migration step, the final structure, i.e.\ configuration $\beta$, is obtained with zero magnetization and an increase in configurational energy by \unit[0.2]{eV}.
+Obviously, a different energy minimum of the electronic system is obtained indicating hysteresis behavior.
+However, since the total energy is lower for the magnetic result, it is believed to constitute the real, i.e.\ global, minimum with respect to electronic minimization.
%
% a b transition
A low activation energy of \unit[0.1]{eV} is observed for the a$\rightarrow$b transition.
Obviously, agglomeration of C$_{\text{i}}$ and C$_{\text{s}}$ is energetically favorable except for separations along one of the \hkl<1 1 0> directions.
The energetically most favorable configuration (configuration $\beta$) forms a strong but compressively strained C-C bond with a separation distance of \unit[0.142]{nm} sharing a Si lattice site.
Again, conclusions concerning the probability of formation are drawn by investigating respective migration paths.
-Since C$_{\text{s}}$ is unlikely to exhibit a low activation energy for migration the focus is on C$_{\text{i}}$.
+Since C$_{\text{s}}$ is unlikely to exhibit a low activation energy for migration, the focus is on C$_{\text{i}}$.
Pathways starting from the next most favored configuration, i.e.\ \cs{} located at position 2, into configuration $\alpha$ and $\beta$ are investigated, which show activation energies above \unit[2.2]{eV} and \unit[2.5]{eV}.
The respective barriers and structures are displayed in Fig.~\ref{fig:051-xxx}.
For the transition into configuration $\beta$, as before, the non-magnetic configuration is obtained.
These structures are investigated in the following.
Resulting binding energies of a C$_{\text{i}}$ DB and a nearby vacancy are listed in the second row of Table~\ref{tab:defects:c-v}.
-\begin{table}[tp]
-\begin{center}
-\begin{tabular}{c c c c c c}
-\hline
-\hline
-1 & 2 & 3 & 4 & 5 & R \\
-\hline
--5.39 ($\rightarrow$ C$_{\text{S}}$) & -0.59 & -3.14 & -0.54 & -0.50 & -0.31\\
-\hline
-\hline
-\end{tabular}
-\end{center}
-\caption[Binding energies of combinations of the \ci{} {\hkl[0 0 -1]} defect with a vacancy located at positions 1 to 5 according to Fig.~\ref{fig:defects:combos_ci}.]{Binding energies of combinations of the \ci{} \hkl[0 0 -1] defect with a vacancy located at positions 1 to 5 according to Fig.~\ref{fig:defects:combos_ci}. R corresponds to the position located at $\frac{a_{\text{Si}}}{2}\hkl[3 2 3]$ relative to the initial defect position, which is the maximum realizable distance due to periodic boundary conditions.}
-\label{tab:defects:c-v}
-\end{table}
-\begin{figure}[tp]
-\begin{center}
-\subfigure[\underline{$E_{\text{b}}=-0.59\,\text{eV}$}]{\label{fig:defects:059}\includegraphics[width=0.25\textwidth]{00-1dc/0-59.eps}}
-\hspace{0.7cm}
-\subfigure[\underline{$E_{\text{b}}=-3.14\,\text{eV}$}]{\label{fig:defects:314}\includegraphics[width=0.25\textwidth]{00-1dc/3-14.eps}}\\
-\subfigure[\underline{$E_{\text{b}}=-0.54\,\text{eV}$}]{\label{fig:defects:054}\includegraphics[width=0.25\textwidth]{00-1dc/0-54.eps}}
-\hspace{0.7cm}
-\subfigure[\underline{$E_{\text{b}}=-0.50\,\text{eV}$}]{\label{fig:defects:050}\includegraphics[width=0.25\textwidth]{00-1dc/0-50.eps}}
-\end{center}
-\caption[Relaxed structures of defect combinations obtained by creating a vacancy at positions 2, 3, 4 and 5.]{Relaxed structures of defect combinations obtained by creating a vacancy at positions 2 (a), 3 (b), 4 (c) and 5 (d).}
-\label{fig:defects:comb_db_06}
-\end{figure}
+\begin{table}[tp]%
+\begin{center}%
+\begin{tabular}{c c c c c c}%
+\hline%
+\hline%
+1 & 2 & 3 & 4 & 5 & R \\%
+\hline%
+-5.39 ($\rightarrow$ C$_{\text{S}}$) & -0.59 & -3.14 & -0.54 & -0.50 & -0.31\\%
+\hline%
+\hline%
+\end{tabular}%
+\end{center}%
+\caption[Binding energies of combinations of the \ci{} {\hkl[0 0 -1]} defect with a vacancy located at positions 1 to 5 according to Fig.~\ref{fig:defects:combos_ci}.]{Binding energies of combinations of the \ci{} \hkl[0 0 -1] defect with a vacancy located at positions 1 to 5 according to Fig.~\ref{fig:defects:combos_ci}. R corresponds to the position located at $\frac{a_{\text{Si}}}{2}\hkl[3 2 3]$ relative to the initial defect position, which is the maximum realizable distance due to periodic boundary conditions.}%
+\label{tab:defects:c-v}%
+\end{table}%
+\begin{figure}[tp]%
+\begin{center}%
+\subfigure[\underline{$E_{\text{b}}=-0.59\,\text{eV}$}]{\label{fig:defects:059}\includegraphics[width=0.25\textwidth]{00-1dc/0-59.eps}}%
+\hspace{0.7cm}%
+\subfigure[\underline{$E_{\text{b}}=-3.14\,\text{eV}$}]{\label{fig:defects:314}\includegraphics[width=0.25\textwidth]{00-1dc/3-14.eps}}\\%
+\subfigure[\underline{$E_{\text{b}}=-0.54\,\text{eV}$}]{\label{fig:defects:054}\includegraphics[width=0.25\textwidth]{00-1dc/0-54.eps}}%
+\hspace{0.7cm}%
+\subfigure[\underline{$E_{\text{b}}=-0.50\,\text{eV}$}]{\label{fig:defects:050}\includegraphics[width=0.25\textwidth]{00-1dc/0-50.eps}}%
+\end{center}%
+\caption[Relaxed structures of defect combinations obtained by creating a vacancy at positions 2, 3, 4 and 5.]{Relaxed structures of defect combinations obtained by creating a vacancy at positions 2 (a), 3 (b), 4 (c) and 5 (d).}%
+\label{fig:defects:comb_db_06}%
+\end{figure}%
Figure~\ref{fig:defects:comb_db_06} shows the associated configurations.
All investigated structures are preferred compared to isolated, largely separated defects.
In contrast to C$_{\text{s}}$, this is also valid for positions along \hkl[1 1 0] resulting in an entirely attractive interaction between defects of these types.
With a binding energy of \unit[-5.39]{eV}, this is the energetically most favorable configuration observed.
A great amount of strain energy is reduced by removing the Si atom at position 3, which is illustrated in Fig.~\ref{fig:defects:314}.
The DB structure shifts towards the position of the vacancy, which replaces the Si atom usually bound to and at the same time strained by the \si{} DB atom.
-Due to the displacement into the \hkl[1 -1 0] direction the bond of the DB Si atom to the Si atom on the top left breaks and instead forms a bond to the Si atom located in \hkl[1 -1 1] direction, which is not shown in Fig.~\ref{fig:defects:314}.
+Due to the displacement into the \hkl[1 -1 0] direction, the bond of the DB Si atom to the Si atom on the top left breaks and instead forms a bond to the Si atom located in \hkl[1 -1 1] direction, which is not shown in Fig.~\ref{fig:defects:314}.
A binding energy of \unit[-3.14]{eV} is obtained for this structure composing another energetically favorable configuration.
A vacancy created at position 2 enables the relaxation of Si atom number 1 mainly in \hkl[0 0 -1] direction.
The bond to Si atom number 5 breaks.
Hence, the \si{} DB atom is not only displaced along \hkl[0 0 -1] but also and to a greater extent in \hkl[1 1 0] direction.
The C atom is slightly displaced in \hkl[0 1 -1] direction.
A binding energy of \unit[-0.59]{eV} indicates the occurrence of much less strain reduction compared to that in the latter configuration.
-Evidently this is due to a smaller displacement of Si atom 1, which would be directly bound to the replaced Si atom at position 2.
-In the case of a vacancy created at position 4, even a slightly higher binding energy of \unit[-0.54]{eV} is observed, while the Si atom at the bottom left, which is bound to the \ci{} DB atom, is vastly displaced along \hkl[1 0 -1].
-However the displacement of the C atom along \hkl[0 0 -1] is less compared to the one in the previous configuration.
-Although expected due to the symmetric initial configuration, Si atom number 1 is not displaced correspondingly and also the \si DB atom is displaced to a greater extent in \hkl[-1 0 0] than in \hkl[0 -1 0] direction.
+Evidently, this is due to a smaller displacement of Si atom 1, which would be directly bound to the replaced Si atom at position 2.
+In the case of a vacancy created at position 4, even a slightly higher binding energy of \unit[-0.54]{eV} is observed while the Si atom at the bottom left, which is bound to the \ci{} DB atom, is vastly displaced along \hkl[1 0 -1].
+However, the displacement of the C atom along \hkl[0 0 -1] is less compared to the one in the previous configuration.
+Although expected due to the symmetric initial configuration, Si atom number 1 is not displaced correspondingly and also the \si{} DB atom is displaced to a greater extent in \hkl[-1 0 0] than in \hkl[0 -1 0] direction.
The symmetric configuration is, thus, assumed to constitute a local maximum, which is driven into the present state by the conjugate gradient method used for relaxation.
Fig.~\ref{fig:defects:050} shows the relaxed structure of a vacancy created at position 5.
The Si DB atom is largely displaced along \hkl[1 1 0] and somewhat less along \hkl[0 0 -1], which corresponds to the direction towards the vacancy.
-The \si DB atom approaches Si atom number 1.
+The \si{} DB atom approaches Si atom number 1.
Indeed, a non-zero charge density is observed in between these two atoms exhibiting a cylinder-like shape superposed with the charge density known from the DB itself.
Strain reduced by this huge displacement is partially absorbed by tensile strain on Si atom number 1 originating from attractive forces of the C atom and the vacancy.
A binding energy of \unit[-0.50]{eV} is observed.
The migration pathways of configuration~\ref{fig:defects:314} and~\ref{fig:defects:059} into the ground-state configuration, i.e.\ the \cs{} configuration, are shown in Fig.~\ref{fig:314-539} and~\ref{fig:059-539} respectively.
-\begin{figure}[tp]
-\begin{center}
-\includegraphics[width=0.7\textwidth]{314-539.ps}
-\end{center}
-\caption[Migration barrier and structures of the transition of the initial C$_{\text{i}}$ {\hkl[0 0 -1]} DB and a V created at position 3 into a C$_{\text{s}}$ configuration.]{Migration barrier and structures of the transition of the initial C$_{\text{i}}$ \hkl[0 0 -1] DB and a V created at position 3 (left) into a C$_{\text{s}}$ configuration (right). An activation energy of \unit[0.1]{eV} is observed.}
-\label{fig:314-539}
-\end{figure}
-\begin{figure}[tp]
-\begin{center}
-\includegraphics[width=0.7\textwidth]{059-539.ps}
-\end{center}
-\caption[Migration barrier and structures of the transition of the initial C$_{\text{i}}$ {\hkl[0 0 -1]} DB and a V created at position 2 into a C$_{\text{s}}$ configuration.]{Migration barrier and structures of the transition of the initial C$_{\text{i}}$ \hkl[0 0 -1] DB and a V created at position 2 (left) into a C$_{\text{s}}$ configuration (right). An activation energy of \unit[0.6]{eV} is observed.}
-\label{fig:059-539}
-\end{figure}
+\begin{figure}[tp]%
+\begin{center}%
+\includegraphics[width=0.7\textwidth]{314-539.ps}%
+\end{center}%
+\caption[Migration barrier and structures of the transition of the initial C$_{\text{i}}$ {\hkl[0 0 -1]} DB and a V created at position 3 into a C$_{\text{s}}$ configuration.]{Migration barrier and structures of the transition of the initial C$_{\text{i}}$ \hkl[0 0 -1] DB and a V created at position 3 (left) into a C$_{\text{s}}$ configuration (right). An activation energy of \unit[0.1]{eV} is observed.}%
+\label{fig:314-539}%
+\end{figure}%
+\begin{figure}[tp]%
+\begin{center}%
+\includegraphics[width=0.7\textwidth]{059-539.ps}%
+\end{center}%
+\caption[Migration barrier and structures of the transition of the initial C$_{\text{i}}$ {\hkl[0 0 -1]} DB and a V created at position 2 into a C$_{\text{s}}$ configuration.]{Migration barrier and structures of the transition of the initial C$_{\text{i}}$ \hkl[0 0 -1] DB and a V created at position 2 (left) into a C$_{\text{s}}$ configuration (right). An activation energy of \unit[0.6]{eV} is observed.}%
+\label{fig:059-539}%
+\end{figure}%
Activation energies as low as \unit[0.1]{eV} and \unit[0.6]{eV} are observed.
-In the first case the Si and C atom of the DB move towards the vacant and initial DB lattice site respectively.
-In total three Si-Si and one more Si-C bond is formed during transition.
+In the first case, the Si and C atom of the DB move towards the vacant and initial DB lattice site respectively.
+In total, three Si-Si and one more Si-C bond is formed during transition.
The activation energy of \unit[0.1]{eV} is needed to tilt the DB structure.
Once this barrier is overcome, the C atom forms a bond to the top left Si atom and the \si{} atom capturing the vacant site is forming new tetrahedral bonds to its neighbored Si atoms.
These new bonds and the relaxation into the \cs{} configuration are responsible for the gain in configurational energy.
For the reverse process approximately \unit[2.4]{eV} are needed, which is 24 times higher than the forward process.
-In the second case the lowest barrier is found for the migration of Si number 1, which is substituted by the C$_{\text{i}}$ atom, towards the vacant site.
-A net amount of five Si-Si and one Si-C bond are additionally formed during transition.
+In the second case, the lowest barrier is found for the migration of Si number 1, which is substituted by the C$_{\text{i}}$ atom, towards the vacant site.
+A net amount of five Si-Si bonds and one Si-C bond are additionally formed during transition.
An activation energy of \unit[0.6]{eV} necessary to overcome the migration barrier is found.
This energy is low enough to constitute a feasible mechanism in SiC precipitation.
-To reverse this process \unit[5.4]{eV} are needed, which make this mechanism very improbable.
+To reverse this process, \unit[5.4]{eV} are needed, which make this mechanism very improbable.
%
The migration path is best described by the reverse process.
Starting at \unit[100]{\%}, energy is needed to break the bonds of Si atom 1 to its neighbored Si atoms as well as the bond of the C atom to Si atom number 5.
At \unit[50]{\%} displacement, these bonds are broken.
-Due to this and due to the formation of new bonds, e.g. the bond of Si atom number 1 to Si atom number 5, a less steep increase of configurational energy is observed.
+Due to this, and due to the formation of new bonds, e.g.\ the bond of Si atom number 1 to Si atom number 5, a less steep increase of configurational energy is observed.
In a last step, the just recently formed bond of Si atom number 1 to Si atom number 5 is broken up again as well as the bond of the initial Si DB atom and its Si neighbor in \hkl[-1 -1 -1] direction, which explains the repeated boost in energy.
Finally, the system gains some configurational energy by relaxation into the configuration corresponding to \unit[0]{\%} displacement.
%
In both cases, the formation of additional bonds is responsible for the vast gain in energy rendering almost impossible the reverse processes.
In summary, pairs of C$_{\text{i}}$ DBs and vacancies, like no other before, show highly attractive interactions for all investigated combinations independent of orientation and separation direction of the defects.
-Furthermore, small activation energies, even for transitions into the ground state exist.
-If the vacancy is created at position 1 the system will end up in a configuration of C$_{\text{s}}$ anyways.
+Furthermore, small activation energies, even for transitions into the ground state, exist.
+If the vacancy is created at position 1, the system will end up in a configuration of C$_{\text{s}}$ anyways.
Based on these results, a high probability for the formation of C$_{\text{s}}$ must be concluded.
\subsection{Combinations of \si{} and \cs}
\label{subsection:si-cs}
-So far the C-Si \hkl<1 0 0> DB interstitial was found to be the energetically most favorable configuration.
-In fact substitutional C exhibits a configuration more than \unit[3]{eV} lower with respect to the formation energy.
+So far, the C-Si \hkl<1 0 0> DB interstitial was found to be the energetically most favorable configuration.
+In fact, substitutional C exhibits a configuration more than \unit[3]{eV} lower with respect to the formation energy.
However, the configuration does not account for the accompanying Si self-interstitial that is generated once a C atom occupies the site of a Si atom.
With regard to the IBS process, in which highly energetic C atoms enter the Si target being able to kick out Si atoms from their lattice sites, such configurations are absolutely conceivable and a significant influence on the precipitation process might be attributed to them.
-Thus, combinations of \cs{} and an additional \si{} are examined in the following.
+Thus, combinations of \cs{} with an additional \si{} are examined in the following.
The ground-state of a single \si{} was found to be the \si{} \hkl<1 1 0> DB configuration.
-For the following study the same type of self-interstitial is assumed to provide the energetically most favorable configuration in combination with \cs.
+For the following study, the same type of self-interstitial is assumed to provide the energetically most favorable configuration in combination with \cs.
\begin{table}[tp]
\begin{center}
%
The relaxed structure is displayed in the bottom right of Fig.~\ref{fig:162-097}.
Compressive strain originating from the Si$_{\text{i}}$ is compensated by tensile strain inherent to the C$_{\text{s}}$ configuration.
-The Si$_{\text{i}}$ DB atoms are displaced towards the lattice site occupied by the C$_{\text{s}}$ atom in such a way that the Si$_{\text{i}}$ DB atom closest to the C atom does no longer form bonds to its top Si neighbors, but to the next neighbored Si atom along \hkl[1 1 0].
+The Si$_{\text{i}}$ DB atoms are displaced towards the lattice site occupied by the C$_{\text{s}}$ atom in such a way that the Si$_{\text{i}}$ DB atom closest to the C atom does no longer form bonds to its top Si neighbors but to the next neighbored Si atom along \hkl[1 1 0].
%
In the same way the energetically most unfavorable configuration can be explained, which is configuration \RM{3}.
The \cs{} is located next to the lattice site shared by the \si{} \hkl[1 1 0] DB in \hkl[1 -1 1] direction.
An activation energy as low as \unit[0.12]{eV} is necessary for the migration into the ground-state configuration.
Accordingly, the C$_{\text{i}}$ \hkl<1 0 0> DB configuration is assumed to occur more likely.
However, only \unit[0.77]{eV} are needed for the reverse process, i.e.\ the formation of C$_{\text{s}}$ and a Si$_{\text{i}}$ DB out of the ground state.
-Due to the low activation energy this process must be considered to be activated without much effort either thermally or by introduced energy of the implantation process.
+Due to the low activation energy, this process must be considered to be activated without much effort either thermally or by introduced energy of the implantation process.
\begin{figure}[tp]
\begin{center}
The interaction of the defects is well approximated by a Lennard-Jones (LJ) 6-12 potential, which is used for curve fitting.
Unable to model possible positive values of the binding energy, i.e.\ unfavorable configurations, located to the right of the minimum, the LJ fit should rather be thought of as a guide for the eye describing the decrease of the interaction strength, i.e.\ the absolute value of the binding energy, with increasing separation distance.
The binding energy quickly drops to zero.
-The LJ fit estimates almost zero interaction already at \unit[0.6]{nm}.
- indicating a low interaction capture radius of the defect pair.
+The LJ fit estimates almost zero interaction already at \unit[0.6]{nm} indicating a low interaction capture radius of the defect pair.
%As can be seen, the interaction strength, i.e.\ the absolute value of the binding energy, quickly drops to zero with increasing separation distance.
%Almost zero interaction may be assumed already at distances about \unit[0.5-0.6]{nm}, indicating a low interaction capture radius of the defect pair.
In IBS, highly energetic collisions are assumed to easily produce configurations of defects exhibiting separation distances exceeding the capture radius.
-For this reason C$_{\text{s}}$ without a Si$_{\text{i}}$ DB located within the immediate proximity, which is, thus, unable to form the thermodynamically stable C$_{\text{i}}$ \hkl<1 0 0> DB, constitutes a most likely configuration to be found in IBS.
-In particular in IBS, which constitutes a system driven far from equilibrium, respective defect configurations might exist that do not combine into the ground-state configuration.
+For this reason, C$_{\text{s}}$ without a Si$_{\text{i}}$ DB located within the immediate proximity, which is, thus, unable to form the thermodynamically stable C$_{\text{i}}$ \hkl<1 0 0> DB, constitutes a most likely configuration to be found in IBS.
+Particularly in IBS, which constitutes a system driven far from equilibrium, respective defect configurations might exist that do not combine into the ground-state configuration.
Thus, the existence of C$_{\text{s}}$ is very likely.
\label{section:defects:noneq_process_01}
% the ab initio md, where to put
-Similar to what was previously mentioned, configurations of C$_{\text{s}}$ and a Si$_{\text{i}}$ DB might be particularly important at higher temperatures due to the low activation energy necessary for its formation.
+Similar to what was previously mentioned, configurations of C$_{\text{s}}$ and a Si$_{\text{i}}$ DB might be eminently important at higher temperatures due to the low activation energy necessary for its formation.
At higher temperatures, the contribution of entropy to structural formation increases, which might result in a spatial separation even for defects located within the capture radius.
Indeed, an {\em ab initio} MD run at \unit[900]{$^{\circ}$C} starting from configuration \RM{1}, which -- based on the above findings -- is assumed to recombine into the ground state configuration, results in a separation of the C$_{\text{s}}$ and Si$_{\text{i}}$ DB by more than 4 neighbor distances realized in a repeated migration mechanism of annihilating and arising Si$_{\text{i}}$ DBs.
The atomic configurations for two different points in time are shown in Fig.~\ref{fig:defects:md}.
\end{figure}
The barrier, which is even lower than the one for \ci{}, indeed indicates highly mobile \si.
In fact, a similar transition is expected if the \si{} atom, which does not change the lattice site during transition, is located next to a \cs{} atom.
-Due to the low barrier the initial separation of the \cs{} and \si{} atom are very likely to occur.
+Due to the low barrier, the initial separation of the \cs{} and \si{} atom are very likely to occur.
Further investigations revealed transition barriers of \unit[0.94]{eV} for the Si$_{\text{i}}$ \hkl[1 1 0] DB to the hexagonal Si$_{\text{i}}$, \unit[0.53]{eV} for the Si$_{\text{i}}$ \hkl[1 1 0] DB to the tetrahedral Si$_{\text{i}}$ and \unit[0.35]{eV} for the hexagonal Si$_{\text{i}}$ to the tetrahedral Si$_{\text{i}}$ configuration.
The respective configurational energies are shown in Fig.~\ref{fig:defects:si_mig2}.
\begin{figure}[tp]
\section{Applicability: Competition of \ci{} and \cs-\si{}}
\label{section:ea_app}
-As has been shown, the energetically most favorable configuration of \cs{} and \si{} is obtained for \cs{} located at the neighbored lattice site along the \hkl<1 1 0> bond chain of a Si$_{\text{i}}$ \hkl<1 1 0> DB.
+As has been shown, the energetically most favorable configuration of \cs{} and \si{} is obtained for \cs{} located at the neighbored lattice site along the \hkl[1 1 0] bond chain of a Si$_{\text{i}}$ \hkl[1 1 0] DB.
However, the energy of formation is slightly higher than that of the C$_{\text{i}}$ \hkl<1 0 0> DB, which constitutes the ground state for a C impurity introduced into otherwise perfect c-Si.
For a possible clarification of the controversial views on the participation of C$_{\text{s}}$ in the precipitation mechanism by classical potential simulations, test calculations need to ensure the proper description of the relative formation energies of combined structures of C$_{\text{s}}$ and Si$_{\text{i}}$ compared to C$_{\text{i}}$.
\caption{Formation energies of defect configurations of a single C impurity in otherwise perfect c-Si determined by classical potential and {\em ab initio} methods. The formation energies are given in eV. T denotes the tetrahedral and the subscripts i and s indicate the interstitial and substitutional configuration. Superscripts a, b and c denote configurations of C$_{\text{s}}$ located at the first, second and third nearest neighbored lattice site with respect to the Si$_{\text{i}}$ atom.}
\label{tab:defect_combos}
\end{table}
-Obviously the EA potential properly describes the relative energies of formation.
+Obviously, the EA potential properly describes the relative energies of formation.
Combined structures of C$_{\text{s}}$ and Si$_{\text{i}}$ T are energetically less favorable than the ground state C$_{\text{i}}$ \hkl<1 0 0> DB configuration.
-With increasing separation distance the energies of formation decrease.
+With increasing separation distance, the energies of formation decrease.
However, even for non-interacting defects, the energy of formation, which is then given by the sum of the formation energies of the separated defects (\unit[4.15]{eV}) is still higher than that of the C$_{\text{i}}$ \hkl<1 0 0> DB.
Unexpectedly, the structure of a Si$_{\text{i}}$ \hkl<1 1 0> DB and a neighbored C$_{\text{s}}$, which is the most favored configuration of a C$_{\text{s}}$ and Si$_{\text{i}}$ DB according to quantum-mechanical calculations, likewise constitutes an energetically favorable configuration within the EA description, which is even preferred over the two least separated configurations of C$_{\text{s}}$ and Si$_{\text{i}}$ T.
This is attributed to an effective reduction in strain enabled by the respective combination.
Obtained results for separated point defects in Si are in good agreement to previous theoretical work on this subject, both for intrinsic defects~\cite{leung99,al-mushadani03} as well as for C point defects~\cite{dal_pino93,capaz94}.
The ground-state configurations of these defects, i.e.\ the Si$_{\text{i}}$ \hkl<1 1 0> and C$_{\text{i}}$ \hkl<1 0 0> DB, are reproduced and compare well to previous findings of theoretical investigations on Si$_{\text{i}}$~\cite{leung99,al-mushadani03} as well as theoretical~\cite{dal_pino93,capaz94,burnard93,leary97,jones04} and experimental~\cite{watkins76,song90} studies on C$_{\text{i}}$.
-A quantitatively improved activation energy of \unit[0.9]{eV} for a qualitatively equal migration path based on studies by Capaz et.~al.~\cite{capaz94} to experimental values~\cite{song90,lindner06,tipping87} ranging from \unit[0.70--0.87]{eV} reinforce their derived mechanism of diffusion for C$_{\text{i}}$ in Si
+A quantitatively improved activation energy of \unit[0.9]{eV} for a qualitatively equal migration path based on studies by Capaz et~al.~\cite{capaz94} to experimental values~\cite{song90,lindner06,tipping87} ranging from \unit[0.70--0.87]{eV} reinforce their derived mechanism of diffusion for C$_{\text{i}}$ in Si
However, it turns out that the BC configuration is not a saddle point configuration as proposed by Capaz et~al.~\cite{capaz94} but constitutes a real local minimum if the electron spin is properly accounted for.
A net magnetization of two electrons, which is already clear by simple molecular orbital theory considerations on the bonding of the $sp$ hybridized C atom, is settled.
By investigating the charge density isosurface it turns out that the two resulting spin up electrons are localized in a torus around the C atom.
-With an activation energy of \unit[0.9]{eV} the C$_{\text{i}}$ carbon interstitial can be expected to be highly mobile at prevailing temperatures in the process under investigation, i.e.\ IBS.
+With an activation energy of \unit[0.9]{eV}, the C$_{\text{i}}$ carbon interstitial can be expected to be highly mobile at prevailing temperatures in the process under investigation, i.e.\ IBS.
Since the \ci{} \hkl<1 0 0> DB is the ground-state configuration and highly mobile, possible migration of these DBs to form defect agglomerates, as demanded by the model introduced in section~\ref{section:assumed_prec}, is considered possible.
-Unfortunately the description of the same processes fails if classical potential methods are used.
+Unfortunately, the description of the same processes fails if classical potential methods are used.
Already the geometry of the most stable DB configuration differs considerably from that obtained by first-principles calculations.
The classical approach is unable to reproduce the correct character of bonding due to the deficiency of quantum-mechanical effects in the potential.
Nevertheless, both methods predict the same type of interstitial as the ground-state configuration and also the order in energy of the remaining defects is reproduced fairly well.
Contrasts are also assumed for Si$_{\text{i}}$.
Once precipitation occurs, regions of dark contrasts disappear in favor of Moir\'e patterns indicating 3C-SiC in c-Si due to the mismatch in the lattice constant.
Until then, however, these regions could either be composed of stretched coherent SiC and interstitials or of already contracted incoherent SiC surrounded by Si and interstitials, where the latter is too small to be detected in HREM.
-In both cases Si$_{\text{i}}$ might be attributed a third role, which is the partial compensation of tensile strain that is present either in the stretched SiC or at the interface of the contracted SiC and the Si host.
+In both cases, Si$_{\text{i}}$ might be attributed a third role, which is the partial compensation of tensile strain that is present either in the stretched SiC or at the interface of the contracted SiC and the Si host.
Furthermore, the experimentally observed alignment of the \hkl(h k l) planes of the precipitate and the substrate is satisfied by the mechanism of successive positioning of C$_{\text{s}}$.
In contrast, there is no obvious reason for the topotactic orientation of an agglomerate consisting exclusively of C-Si dimers, which would necessarily involve a much more profound change in structure for the transition into SiC.
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