\chapter{Point defects in silicon}
-Given the conversion mechnism of SiC in crystalline silicon introduced in \ref{section:assumed_prec} the understanding of carbon and silicon interstitial point defects in c-Si is of great interest.
+Given the conversion mechnism of SiC in crystalline silicon introduced in section \ref{section:assumed_prec} the understanding of carbon and silicon interstitial point defects in c-Si is of great interest.
Both types of defects are examined in the following both by classical potential as well as density functional theory calculations.
In case of the classical potential calculations a simulation volume of nine silicon lattice constants in each direction is used.
Calculations are performed in an isothermal-isobaric NPT ensemble.
Coupling to the heat bath is achieved by the Berendsen thermostat with a time constant of 100 fs.
The temperature is set to zero Kelvin.
-Pressure is controlled by a Berendsen barostat again using a time constant of 100 fs and a bulk modulus of 100 GPa for silicon.
+Pressure is controlled by a Berendsen barostat \cite{berendsen84} again using a time constant of 100 fs and a bulk modulus of 100 GPa for silicon.
To exclude surface effects periodic boundary conditions are applied.
Due to the restrictions in computer time three silicon lattice constants in each direction are considered sufficiently large enough for DFT calculations.
The ions are relaxed by a conjugate gradient method.
-The cell volume and shape is allowed to change using the pressure control algorithm of Parinello and Rahman \cite{}.
+The cell volume and shape is allowed to change using the pressure control algorithm of Parrinello and Rahman \cite{parrinello81}.
Periodic boundary conditions in each direction are applied.
All point defects are calculated for the neutral charge state.
This is nicely reproduced by the DFT calculations performed in this work.
It has turned out to be very difficult to capture the results of quantum-mechanical calculations in analytical potential models.
-Among the established analytical potentials only the EDIP \cite{} and Stillinger-Weber \cite{} potential reproduce the correct order in energy of the defects.
+Among the established analytical potentials only the EDIP \cite{bazant97,justo98} and Stillinger-Weber \cite{stillinger85} potential reproduce the correct order in energy of the defects.
However, these potenitals show shortcomings concerning the description of other physical properties and are unable to describe the C-C and C-Si interaction.
In fact the Erhard/Albe potential calculations favor the tetrahedral defect configuration.
The hexagonal configuration is not stable opposed to results of the authors of the potential \cite{albe_sic_pot}.
\caption{Kinetic energy plot of the relaxation process of the hexagonal silicon self-interstitial defect simulation using the Erhard/Albe classical potential.}
\label{fig:defects:kin_si_hex}
\end{figure}
-To exclude failures in the implementation of the potential or the MD code itself the hexagonal defect structure was double-checked with the PARCAS MD code \cite{}.
+To exclude failures in the implementation of the potential or the MD code itself the hexagonal defect structure was double-checked with the PARCAS MD code \cite{parcas_md}.
The same type of interstitial arises using random insertions.
In addition, variations exist in which the displacement is only along two \hkl<1 0 0> axes ($E_\text{f}=3.8\text{ eV}$) or along a single \hkl<1 0 0> axes ($E_\text{f}=3.6\text{ eV}$) successively approximating the tetdrahedral configuration and formation energy.
The existence of these local minima located near the tetrahedral configuration seems to be an artifact of the analytical potential without physical authenticity revealing basic problems of analytical potential models for describing defect structures.
The blue torus, reinforcing the assumption of the p orbital, illustrates the resulting spin up electron density.
In addition, the energy level diagram shows a net amount of two spin up electrons.
-\section[Migration of the carbon \hkl<1 0 0> interstitial]{\boldmath Migration of the carbon \hkl<1 0 0> interstitial}
+\section[Migration of the carbon \hkl<1 0 0> interstitial]{Migration of the carbon \boldmath\hkl<1 0 0> interstitial}
\label{subsection:100mig}
In the following the problem of interstitial carbon migration in silicon is considered.
The theoretical description performed in this work is improved compared to a former study \cite{capaz94}, which underestimates the experimental value by 35 \%.
In addition the bond-ceneterd configuration, for which spin polarized calculations are necessary, is found to be a real local minimum instead of a saddle point configuration.
-\section{Combination of point defects}
+\section{Combination of adjacent point defects}
-The structural and energetic properties of combinations of point defects are investigated in the following.
-The focus is on combinations of the \hkl<0 0 -1> dumbbell interstitial with a second defect.
+The structural and energetic properties of combinations of point defects are examined in the following.
+Investigations are restricted to quantum-mechanical calculations.
+
+\subsection[Combinations with a C-Si \hkl<1 0 0>-type interstitial]{\boldmath Combinations with a C-Si \hkl<1 0 0>-type interstitial}
+
+This section focuses on combinations of the \hkl<0 0 -1> dumbbell interstitial with a second defect.
The second defect is either another \hkl<1 0 0>-type interstitial occupying different orientations, a vacany or a substitutional carbon atom.
Several distances of the two defects are examined.
-Investigations are restricted to quantum-mechanical calculations.
\begin{figure}[th]
\begin{center}
A binding energy of -0.50 eV is observed.
{\color{red}Todo: Jahn-Teller distortion (vacancy) $\rightarrow$ actually three possibilities. Due to the initial defect, symmetries are broken. The system should have relaxed into the minumum energy configuration!?}
-{\color{blue}Todo: Si int + vac and C sub ...?
-Investigation of vacancy, Si and C interstitital.
-As for the ground state of the single Si self-int, a 110 is also assumed as the lowest possibility in combination with other defects (which is a cruel assumption)!
+\subsection{Combinations of Si self-interstitials and substitutional carbon}
+
+{\color{blue}TODO: Explain why this might be important.}
+The ground state of a single Si self-interstitial was found to be the Si \hkl<1 1 0> self-interstitial configuration.
+For the follwoing study the same type of self-interstitial is assumed to provide the energetically most favorable configuration in combination with a C substitutional.
+
+\begin{table}[ht!]
+\begin{center}
+\begin{tabular}{l c c c c c c}
+\hline
+\hline
+C$_{\text{sub}}$ & \hkl<1 1 0> & \hkl<-1 1 0> & \hkl<0 1 1> & \hkl<0 -1 1> &
+ \hkl<1 0 1> & \hkl<-1 0 1> \\
+\hline
+1 & \RM{1} & \RM{3} & \RM{3} & \RM{1} & \RM{3} & \RM{1} \\
+2 & \RM{2} & A & A & \RM{2} & C & \RM{5} \\
+3 & \RM{3} & \RM{1} & \RM{3} & \RM{1} & \RM{1} & \RM{3} \\
+4 & \RM{4} & B & D & E & F & D \\
+5 & \RM{5} & C & A & \RM{2} & A & \RM{2} \\
+\hline
+\hline
+\end{tabular}
+\end{center}
+\caption{Equivalent configurations of \hkl<1 1 0>-type Si self-interstitials created at position I of figure \ref{fig:defects:pos_of_comb} and substitutional C created at positions 1 to 5.}
+\label{tab:defects:comb_csub_si110}
+\end{table}
+Table \ref{tab:defects:comb_csub_si110} shows equivalent configurations of \hkl<1 1 0>-type Si self-interstitials and substitutional C.
+The notation of figure \ref{fig:defects:pos_of_comb} is used with the six possible Si self-interstitials created at the usual C-Si dumbbell position.
+Substitutional C is created at positions 1 to 5.
+
+{\color{blue}TODO:
+Results of energies ...
+Thus ...
}
\section{Migration in systems of combined defects}
{\color{red}Todo: DB mig along 110 (at the starting of this section)?}
-{\color{red}Todo: Migration of Si int + vac and C sub ...?}
+{\color{red}Todo: Migration of Si int + vac and C sub/int ...?}
{\color{red}Todo: Model of kick-out and kick-in mechnism?}
Thus, carbon interstitials and vacancies located close together are assumed to end up in such a configuration in which the carbon atom is tetrahedrally coordinated and bound to four silicon atoms as expected in silicon carbide.
In contrast to the above, this would suggest a silicon carbide precipitation by succesive creation of substitutional carbon instead of the agglomeration of C-Si dumbbell interstitials followed by an abrupt precipitation.
+{\color{red}Todo:
+C atoms in 100 DB tightend in 110 direction, which is important for stress compensation in some combined constellations.
+}
+{\color{red}Todo:
+Most of the combinations should only be thought of intermediate configurations, which need to be transformed in the later SiC precipitation process.
+}
+{\color{red}Todo:
+Better structure, better language, better methodology!
+}
+{\color{red}Todo:
+Fit of lennard-jones an other rep + attr potentials in 110 interaction data!
+}
+
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