An activation energy of \unit[2.2]{eV} is necessary to reorientate the \hkl[0 0 -1] into the \hkl[1 1 0] DB configuration, which is \unit[1.3]{eV} higher in energy.
Residing in this state another \unit[0.90]{eV} is enough to make the C atom form a \hkl[0 0 -1] DB configuration with the Si atom of the neighbored lattice site.
In contrast to quantum-mechanical calculations, in which the direct transition is the energetically most favorable transition and the transition composed of the intermediate migration steps is very unlikely to occur, the just presented pathway is much more conceivable in classical potential simulations, since the energetically most favorable transition found so far is likewise composed of two migration steps with activation energies of \unit[2.2]{eV} and \unit[0.5]{eV}, for which the intermediate state is the BC configuration, which is unstable.
-Thus the just proposed migration path, which involves the \hkl[1 1 0] interstitial configuration, becomes even more probable than the initially proposed path, which involves the BC configuration that is, in fact, unstable.
+Thus, the just proposed migration path, which involves the \hkl[1 1 0] interstitial configuration, becomes even more probable than the initially proposed path, which involves the BC configuration that is, in fact, unstable.
Due to these findings, the respective path is proposed to constitute the diffusion-describing path.
The evolution of structure and configurational energy is displayed again in Fig.~\ref{fig:defects:involve110}.
\begin{figure}[tp]
The C atom of the second and the Si atom of the initial DB move towards each other forming a bond, which results in a somewhat lower binding energy of \unit[-2.25]{eV}.
The corresponding defect structure is displayed in Fig.~\ref{fig:defects:225}.
In this configuration the initial Si and C DB atoms are displaced along \hkl[1 0 0] and \hkl[-1 0 0] in such a way that the Si atom is forming tetrahedral bonds with two Si and two C atoms.
-The C and Si atom constituting the second defect are as well displaced in such a way, that the C atom forms tetrahedral bonds with four Si neighbors, a configuration expected in SiC.
+The C and Si atom constituting the second defect are as well displaced in such a way that the C atom forms tetrahedral bonds with four Si neighbors, a configuration expected in SiC.
The two carbon atoms, which are spaced by \unit[2.70]{\AA}, do not form a bond but anyhow reside in a shorter distance than expected in SiC.
Si atom number 2 is pushed towards the C atom, which results in the breaking of the bond to Si atom number 4.
Breaking of the $\sigma$ bond is indeed confirmed by investigating the charge density isosurface of this configuration.
The C atoms are spaced by \unit[3.14]{\AA}, which is very close to the expected C-C next neighbor distance of \unit[3.08]{\AA} in SiC.
Figure~\ref{fig:defects:205} displays the results of a \hkl[0 0 1] DB inserted at position 3.
The binding energy is \unit[-2.05]{eV}.
-Both DBs are tilted along the same direction remaining aligned in parallel and the second DB is pushed downwards in such a way, that the four DB atoms form a rhomboid.
+Both DBs are tilted along the same direction remaining aligned in parallel and the second DB is pushed downwards in such a way that the four DB atoms form a rhomboid.
Both C atoms form tetrahedral bonds to four Si atoms.
However, Si atom number 1 and number 3, which are bound to the second \ci{} atom are also bound to the initial C atom.
These four atoms of the rhomboid reside in a plane and, thus, do not match the situation in SiC.
%In case a) only the first displacement is compensated by the substitutional carbon atom.
%This results in a somewhat higher binding energy of -0.51 eV.
%The binding energy gets even higher in case b) ($E_{\text{b}}=-0.15\text{ eV}$), in which the substitutional carbon is located further away from the initial dumbbell.
-%In both cases, silicon atom number 1 is displaced in such a way, that the bond to silicon atom number 5 vanishes.
+%In both cases, silicon atom number 1 is displaced in such a way that the bond to silicon atom number 5 vanishes.
%In case of~\ref{fig:defects:comb_db_04} a) the carbon atoms form a bond with a distance of 1.5 \AA, which is close to the C-C distance expected in diamond or graphit.
%Both carbon atoms are highly attracted by each other resulting in large displacements and high strain energy in the surrounding.
%A binding energy of 0.26 eV is observed.
\end{figure}
Figure~\ref{fig:defects:comb_db_06} shows the associated configurations.
All investigated structures are preferred compared to isolated, largely separated defects.
-In contrast to C$_{\text{s}}$ this is also valid for positions along \hkl[1 1 0] resulting in an entirely attractive interaction between defects of these types.
+In contrast to C$_{\text{s}}$, this is also valid for positions along \hkl[1 1 0] resulting in an entirely attractive interaction between defects of these types.
Even for the largest possible distance (R) achieved in the calculations of the periodic supercell a binding energy as low as \unit[-0.31]{eV} is observed.
The creation of a vacancy at position 1 results in a configuration of substitutional C on a Si lattice site and no other remaining defects.
The \ci{} DB atom moves to position 1 where the vacancy is created and the \si{} DB atom recaptures the DB lattice site.
The migration path is best described by the reverse process.
Starting at \unit[100]{\%}, energy is needed to break the bonds of Si atom 1 to its neighbored Si atoms as well as the bond of the C atom to Si atom number 5.
At \unit[50]{\%} displacement, these bonds are broken.
-Due to this and due to the formation of new bonds, e.g. the bond of Si atom number 1 to Si atom number 5, a less steep increase of configurational energy is observed.
+Due to this, and due to the formation of new bonds, e.g. the bond of Si atom number 1 to Si atom number 5, a less steep increase of configurational energy is observed.
In a last step, the just recently formed bond of Si atom number 1 to Si atom number 5 is broken up again as well as the bond of the initial Si DB atom and its Si neighbor in \hkl[-1 -1 -1] direction, which explains the repeated boost in energy.
Finally, the system gains some configurational energy by relaxation into the configuration corresponding to \unit[0]{\%} displacement.
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