\subsection{SiC bulk crystal growth}
-The industrial Acheson process \cite{acheson} is utilized to produce SiC on a large scale by thermal reaction of silicon dioxide (silica sand) and carbon (coal).
+The industrial Acheson process \cite{knippenberg63} is utilized to produce SiC on a large scale by thermal reaction of silicon dioxide (silica sand) and carbon (coal).
The heating is accomplished by a core of graphite centrally placed in the furnace, which is heated up to a maximum temperature of \unit[2700]{$^{\circ}$C}, after which the temperature is gradually lowered.
Due to the insufficient and uncontrollable purity, material produced by this method, originally termed carborundum by Acheson, can hardly be used for device applications.
However, it is often used as an abrasive material and as seed crystals for subsequent vapor phase growth and sublimation processes.
A significant breakthrough was made in 1955 by Lely, who proposed a sublimation process for growing higher purity bulk SiC single crystals \cite{lely55}.
In the so called Lely process, a tube of porous graphite is surrounded by polycrystalline SiC as gained by previously described processes.
-Lely (sublimation)
+Heating the hollow carbon cylinder to \unit[2500]{$^{\circ}$C} leads to sublimation of the material at the hot outer wall and diffusion through the porous graphite tube followed by an uncontrolled crystallization on the slightly cooler parts of the inner graphite cavity resulting in the formation of randomly sized, hexagonally shaped platelets, which exibit a layered structure of various alpha polytypes with equal \hkl{0001} orientation.
+
+Subsequent research \cite{tairov78,tairov81} resulted in the implementation of a seeded growth sublimation process wherein only one large crystal of a single polytype is grown.
+In the so called modified Lely or modified sublimation process nucleation occurs on a SiC seed crystal located at the top or bottom of a cylindrical growth cavity.
+As in the Lely process, SiC sublimes at a temperature of \unit[2400]{$^{\circ}$C} from a polycrystalline source diffusing through a porous graphite retainer along carefully adjusted thermal and pressure gradients.
+Controlled nucleation occurs on the SiC seed, which is held at approximately \unit[2200]{$^{\circ}$C}.
+The growth process is commonly done in a high-purity argon atmosphere.
+The method was successfully applied to grow 6H and 4H boules with diameters up to \unit[60]{mm} \cite{tairov81,barrett91,barrett93,stein93}.
+This refined versions of the physical vapor transport (PVT) technique enabled the reproducible boule growth of device quality SiC crystals, which were for instance used to fabricate blue light emitting diodes with increased quantum efficiencies \cite{hoffmann82}.
+
+Although significant advances have been achieved in the field of SiC bulk crystal growth, a variety of problems remain.
+The high temperatures required in PVT growth processes limit the range of materials used in the hot zones of the reactors, for which mainly graphite is used.
+The porous material constitutes a severe source of contamination, e.g. with the dopants N, B and Al, which is particularly effective at low temperatures due to the low growth rate.
+Since the vapor pressure of Si is much higher than that of C, a careful manipulation of the Si vapor content above the seed crystal is required.
+Additionally, to preserve epitaxial growth conditions, graphitization of the seed crystal has to be avoided.
+Avoiding defects constitutes a mojor difficulty.
+These defects include growth spirals (stepped screw dislocations), subgrain boundaries and twins as well as micropipes (micron sized voids extending along the c axis of the crystal) and 3C inclusions at the seed crystal in hexagonal growth systems.
+Micropipe-free growth of 6H-SiC has been realized by a reduction of the temperature gradient in the sublimation furnace resulting in near-equilibrium growth conditions in order to avoid stresses, which is, however, accompanied by a reduction of the growth rate \cite{schulze98}.
+Further efforts have to be expended to find relations between the growth parameters, the kind of polytype and the occurrence and concentration of defects, which are of fundamental interest and might help to improve the purity of the bulk materials.
-modified Lely or modified sublimation
+\subsection{SiC epitaxial thin film growth}
+
+Crystalline SiC layers have been grown by a large number of techniques on the surfaces of different substrates.
+Most of the crystal growth processes are based on chemical vapor deposition (CVD), solid-source molecular beam epitaxy (MBE) and gas-source MBE on Si as well as SiC substrates, which will be exclusively reviewed in the following.
-though significant advances have been achieved a bunch of defects ...
-\subsection{SiC epitaxial thin film growth}
\section{Ion beam synthesis of cubic silicon carbide}
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