Again, this is a quite promising result, since the C atoms are taking the appropriate coordination as expected in 3C-SiC.
However, this is contrary to the initial precipitation model proposed in section \ref{section:assumed_prec}, which assumes that the transformation into 3C-SiC takes place in a very last step once enough C-Si dumbbells agglomerated.
+{\color{red}Todo: Summarize again! Mention, that the agglomeration necessary in order to form 3C-SiC is missing.}
+
\begin{figure}[!ht]
\begin{center}
\includegraphics[width=12cm]{12_pc_thesis.ps}\\
Due to the continuity of high amounts of damage investigations of atomic configurations below remain hard to identify even for the highest temperature.
Other than in the low concentration simulations analyzed defect structures are no longer necessarily aligned to the primarily existing but succesively disappearing c-Si host matrix inhibiting or at least hampering their identification and classification.
As for low temperatures order in the short range exists decreasing with increasing distance.
-The increase of the amount of Si-C pairs at 0.186 nm could pe positively interpreted since this type of bond also exists in 3C-SiC.
+The increase of the amount of Si-C pairs at 0.186 nm could be positively interpreted since this type of bond also exists in 3C-SiC.
On the other hand the amount of next neighboured C atoms with a distance of approximately 0.15 nm, which is the distance of C in graphite or diamond, is likewise increased.
Thus, higher temperatures seem to additionally enhance a conflictive process, that is the formation of C agglomerates, instead of the desired process of 3C-SiC formation.
This is supported by the C-C peak at 0.252 nm, which corresponds to the second next neighbour distance in the diamond structure of elemental C.
This is similar for the Si-C peak at approximately 0.35 nm.
In this case, the Si and the C atom are bound to a central Si atom.
-Regarding these findings there is clear evidence ...
+Regarding these findings there is a clear evidence of the formation of an amorphous SiC-like phase for all high concentration simulations performed at various temperatures.
+No significant structural change is observed for elevated temperatures.
+However, with the disappearance of the peaks at the respective cut-off radii one limitation of the short range potential seems to be accomplished.
+In addition, sharper peaks in the radial distributions at distances that are also expected for a-SiC might indicate a slight acceleration of the dynamics carried out at elevated temperatures, that is an expeditious formation of a structure superiorly compareable to a-SiC.
+The increase in temperature leads to the occupation of new defect states, which is particularly evident for low carbon concentrations.
+The question remains whether these states are only occupied due to the additional supply of kinetic energy and, thus, have to be considered unnatural for temperatures applied in IBS or whether the increase in temperature indeed enabled infrequent transitions to occur much faster, thus, leading to the intended acceleration of the dynamics and weakening of the unphysical quirks inherent to the potential.
+{\color{red}Todo: Formation energy of C sub and nearby Si self-int, to see whether this is a preferable state!}
+In the first case these occupied states would be expected to be higher in energy than the states occupied at low temperatures.
+Since substitutional C without the presence of a Si self-interstitial is energetically more favorable than the lowest defect structure obtained without removing a Si atom, that is the \hkl<1 0 0> dumbbell interstitial, and the migration of Si self-interstitials towards the sample surface can be assumed for real life experiments \cite{}, this approach is accepted as an accelerated way of approximatively describing the structural evolution.
+{\color{red}Todo: If C sub and Si self-int is energetically more favorable, the migration towards the surface can be kicked out. Otherwise we should actually care about removal of Si! In any way these findings suggest a different prec model.}
-This said, there is clear evidence that this is amorphous SiC
-However there is no significant change in structure.
-But there is a decrease in the artifacts of the potential.
-So, first limitations might be condiered as
-Now, more temperature to increase infrequent events ...
+\begin{figure}[!ht]
+\begin{center}
+\includegraphics[width=12cm]{fe_and_t.ps}
+\end{center}
+\caption{Free energy and temperature plot of plain silicon in the region around the transition temperature.}
+\label{fig:md:fe_and_t}
+\end{figure}
+The assumed applicability as discussed above and the remaining absence of either agglomeration of substitutional C in low concentration simulations or amorphous to crystalline transition in high concentration simulations suggests to further increase the system temperature.
+So far, the highest temperature applied corresponds to 95 \% of the absolute silicon melting temperature, which is 2450 K and specific to the Erhard/Albe potential.
+However, melting is not predicted to occur instantly after exceeding the melting point due to additionally required transition enthalpy and hysteresis behaviour.
+To check for the possibly highest temperature at which a transition fails to appear plain silicon is heated up using a heating rate of $1\,^{\circ}\mathrm{C}/\text{ps}$.
+Figure \ref{fig:md:fe_and_t} shows the free energy and temperature evolution in the region around the transition temperature.
+Indeed a transition and the accompanying critical behaviour of the free energy is first observed at approximately 3125 K, which corresponds to 128 \% of the silicon melting temperature.
+The difference in free energy is 0.58 eV per atom corresponding to $55.7 \text{ kJ/mole}$, which compares quite well to the silicon enthalpy of melting of $50.2 \text{ kJ/mole}$.
+The late transition probably occurs due to the high heating rate and, thus, a large hysteresis behaviour extending the temperature of transition.
+To avoid melting transitions in further simulations system temperatures well below the transition point are considered safe.
+Thus, in the following system temperatures of 100 \% and 120 \% of the silicon melting point are used.
\subsection{Constructed 3C-SiC precipitate in crystalline silicon}
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