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73 Molecular dynamics simulation study\\
74 of the silicon carbide precipitation process
79 \textsc{\small \underline{F. Zirkelbach}$^1$, J. K. N. Lindner$^1$,
80 K. Nordlund$^2$, B. Stritzker$^1$}\\
84 \begin{minipage}{2.0cm}
86 \includegraphics[height=1.6cm]{uni-logo.eps}
89 \begin{minipage}{8.0cm}
92 $^1$ Experimentalphysik IV, Institut f"ur Physik,\\
93 Universit"at Augsburg, Universit"atsstr. 1,\\
94 D-86135 Augsburg, Germany
98 \begin{minipage}{2.3cm}
100 \includegraphics[height=1.5cm]{Lehrstuhl-Logo.eps}
106 \begin{minipage}{4.0cm}
108 \includegraphics[height=1.6cm]{logo_eng.eps}
111 \begin{minipage}{8.0cm}
114 $^2$ Accelerator Laboratory, Department of Physical Sciences,\\
115 University of Helsinki, Pietari Kalmink. 2,\\
116 00014 Helsinki, Finland
125 % no contents for such a short talk!
132 Motivation / Introduction
137 Reasons for understanding the SiC precipitation process:
140 \item 3C-SiC wide band gap semiconductor formation
141 \item Strained Si (no precipitation wanted!)
148 \begin{minipage}{8cm}
152 \item {\color{orange}fcc} $+$
153 \item {\color{gray}fcc shifted $1/4$ of volume diagonal}
155 \item Lattice constants: $4a_{Si}\approx5a_{SiC}$
156 \item Silicon density:
158 \frac{n_{SiC}}{n_{Si}}=
159 \frac{4/a_{SiC}^3}{8/a_{Si}^3}=
160 \frac{5^3}{2\cdot4^3}={\color{cyan}97,66}\,\%
165 \begin{minipage}{4cm}
166 \includegraphics[width=4cm]{sic_unit_cell.eps}
175 Motivation / Introduction
181 Supposed conversion mechanism of heavily carbon doped Si into SiC:
185 \begin{minipage}{3.8cm}
186 \includegraphics[width=3.7cm]{sic_prec_seq_01.eps}
189 \begin{minipage}{3.8cm}
190 \includegraphics[width=3.7cm]{sic_prec_seq_02.eps}
193 \begin{minipage}{3.8cm}
194 \includegraphics[width=3.7cm]{sic_prec_seq_03.eps}
199 \begin{minipage}{3.8cm}
200 Formation of C-Si dumbbells on regular c-Si lattice sites
203 \begin{minipage}{3.8cm}
204 Agglomeration into large clusters (embryos)\\
207 \begin{minipage}{3.8cm}
208 Precipitation of 3C-SiC + Creation of interstitials\\
213 Experimentally observed:
215 \item Minimal diameter of precipitation: 4 - 5 nm
216 \item (hkl)-planes identical for Si and SiC
231 \item Microscopic description of N particle system
232 \item Analytical interaction potential
233 \item Hamilton's equations of motion as propagation rule\\
234 in 6N-dimensional phase space
235 \item Observables obtained by time average
242 \item Integrator: Velocity Verlet, timestep: $1\, fs$
243 \item Ensemble control: NVT, Berendsen thermostat, $\tau=100.0$
244 \item Potential: Tersoff-like bond order potential\\
246 E = \frac{1}{2} \sum_{i \neq j} \pot_{ij}, \quad
247 \pot_{ij} = f_C(r_{ij}) \left[ f_R(r_{ij}) + b_{ij} f_A(r_{ij}) \right]
250 {\scriptsize P. Erhart and K. Albe. Phys. Rev. B 71 (2005) 035211}
254 \begin{picture}(0,0)(-240,-70)
255 \includegraphics[width=5cm]{tersoff_angle.eps}
268 Interstitial experiments:
273 \item Initial configuration: $9\times9\times9$ unit cells Si
274 \item Periodic boundary conditions
276 \item Insertion of Si / C atom at
278 \item $(0,0,0)$ $\rightarrow$ {\color{red}tetrahedral}
279 \item $(-1/8,-1/8,1/8)$ $\rightarrow$ {\color{green}hexagonal}
280 \item $(-1/8,-1/8,-1/4)$, $(-1/4,-1/4,-1/4)$\\
281 $\rightarrow$ {\color{magenta}110 dumbbell}
282 \item random positions (critical distance check)
284 \item Relaxation time: $2\, ps$
285 \item Optional heating-up
288 \begin{picture}(0,0)(-210,-45)
289 \includegraphics[width=6cm]{unit_cell.eps}
298 } - Si self-interstitial experiments
302 \begin{minipage}[t]{4.3cm}
303 \underline{Tetrahedral}\\
305 \includegraphics[width=3.8cm]{si_self_int_tetra_0.eps}
307 \begin{minipage}[t]{4.3cm}
308 \underline{110 dumbbell}\\
310 \includegraphics[width=3.8cm]{si_self_int_dumbbell_0.eps}
312 \begin{minipage}[t]{4.3cm}
313 \underline{Hexagonal} \hspace{4pt}
314 \href{../video/si_self_int_hexa.avi}{$\rhd$}\\
315 $E_f^{\star}\approx4.48\, eV$ (unstable!)\\
316 \includegraphics[width=3.8cm]{si_self_int_hexa_0.eps}
319 \underline{Random insertion}
321 \begin{minipage}{4.3cm}
323 \includegraphics[width=3.8cm]{si_self_int_rand_397_0.eps}
325 \begin{minipage}{4.3cm}
327 \includegraphics[width=3.8cm]{si_self_int_rand_375_0.eps}
329 \begin{minipage}{4.3cm}
331 \includegraphics[width=3.8cm]{si_self_int_rand_356_0.eps}
340 } - Carbon interstitial experiments
344 \begin{minipage}[t]{4.3cm}
345 \underline{Tetrahedral}\\
347 \includegraphics[width=3.8cm]{c_in_si_int_tetra_0.eps}
349 \begin{minipage}[t]{4.3cm}
350 \underline{110 dumbbell}\\
352 \includegraphics[width=3.8cm]{c_in_si_int_dumbbell_0.eps}
354 \begin{minipage}[t]{4.3cm}
355 \underline{Hexagonal} \hspace{4pt}
356 \href{../video/c_in_si_int_hexa.avi}{$\rhd$}\\
357 $E_f^{\star}\approx5.6\, eV$ (unstable!)\\
358 \includegraphics[width=3.8cm]{c_in_si_int_hexa_0.eps}
361 \underline{Random insertion}
365 \begin{minipage}[t]{3.3cm}
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376 \begin{minipage}[t]{3.3cm}
377 $E_f=2.39\, eV$ \hspace{2pt}
378 \href{../video/c_in_si_int_rand_239.avi}{$\rhd$}\\
379 \includegraphics[width=3.1cm]{c_in_si_int_rand_239_0.eps}
381 \begin{minipage}[t]{3.0cm}
382 $E_f=3.41\, eV$ \hspace{2pt}
383 \href{../video/c_in_si_int_rand_341.avi}{$\rhd$}\\
384 \includegraphics[width=3.3cm]{c_in_si_int_rand_341_0.eps}
399 SiC precipitation experiments:
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408 \item Initial configuration: $31\times31\times31$ unit cells Si
409 \item Periodic boundary conditions
410 \item $T=450\, ^{\circ}C$
411 \item Equilibration of $E_{kin}$ and $E_{pot}$ for $600\, fs$
414 \rput(3.5,3.2){\rnode{insert}{\psframebox[fillstyle=solid,fillcolor=red]{
416 Insertion of $6000$ carbon atoms at constant\\
419 \item Total simulation volume {\pnode{in1}}
420 \item Volume of minimal SiC precipitation {\pnode{in2}}
421 \item Volume of necessary amount of Si {\pnode{in3}}
424 \rput(3.5,1){\rnode{cool}{\psframebox[fillstyle=solid,fillcolor=cyan]{
426 Cooling down to $20\, ^{\circ}C$
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449 SiC-precipitation experiments:
451 \begin{minipage}[t]{6.3cm}
452 \includegraphics[width=6.0cm]{../plot/sic_prec_energy.ps}
453 \includegraphics[width=6.0cm]{../plot/sic_prec_temp.ps}
455 \begin{minipage}[t]{6cm}
456 \includegraphics[width=6.0cm]{../plot/sic_pc.ps}
457 \includegraphics[width=6.0cm]{../plot/sic_prec_pc.ps}
471 \item Importance of understanding C in Si
472 \item Interstitial configurations in silicon using the Albe potential
473 \item Indication of SiC precipitation
479 \item Displacement and stress calculations
480 \item Diffusion dependence of temperature and carbon concentration
481 \item Analyzing results of the precipitation simulation runs
482 \item Analyzing self-designed Si/SiC interface