silicon",
}
+@Article{isomae93,
+ author = "Seiichi Isomae and Tsutomu Ishiba and Toshio Ando and
+ Masao Tamura",
+ collaboration = "",
+ title = "Annealing behavior of Me{V} implanted carbon in
+ silicon",
+ publisher = "AIP",
+ year = "1993",
+ journal = "Journal of Applied Physics",
+ volume = "74",
+ number = "6",
+ pages = "3815--3820",
+ keywords = "SILICON; ION IMPLANTATION; WAFERS; CARBON IONS; MEV
+ RANGE 0110; TEM; SIMS; INFRARED SPECTRA; STRAINS; DEPTH
+ PROFILES",
+ URL = "http://link.aip.org/link/?JAP/74/3815/1",
+ doi = "10.1063/1.354474",
+ notes = "c at interstitial location for rt implantation in si",
+}
+
@Article{strane96,
title = "Carbon incorporation into Si at high concentrations by
ion implantation and solid phase epitaxy",
notes = "c diffusion due to si self-interstitials",
}
+@Article{strane93,
+ author = "J. W. Strane and H. J. Stein and S. R. Lee and B. L.
+ Doyle and S. T. Picraux and J. W. Mayer",
+ collaboration = "",
+ title = "Metastable SiGe{C} formation by solid phase epitaxy",
+ publisher = "AIP",
+ year = "1993",
+ journal = "Applied Physics Letters",
+ volume = "63",
+ number = "20",
+ pages = "2786--2788",
+ keywords = "SILICON CARBIDES; GERMANIUM CARBIDES; TERNARY ALLOY
+ SYSTEMS; EPITAXY; ION IMPLANTATION; METASTABLE STATES;
+ ANNEALING; TRANSMISSION ELECTRON MICROSCOPY; RUTHERFORD
+ SCATTERING; XRAY DIFFRACTION; STRAINS; SOLIDPHASE
+ EPITAXY; AMORPHIZATION",
+ URL = "http://link.aip.org/link/?APL/63/2786/1",
+ doi = "10.1063/1.110334",
+}
+
@Article{strane94,
author = "J. W. Strane and H. J. Stein and S. R. Lee and S. T.
Picraux and J. K. Watanabe and J. W. Mayer",
notes = "solubility of c in c-si, si-c phase diagram",
}
+@Article{hofker74,
+ author = "W. Hofker and H. Werner and D. Oosthoek and N.
+ Koeman",
+ affiliation = "N. V. Philips' Gloeilampenfabrieken Philips Research
+ Laboratories Eindhoven Netherlands Eindhoven
+ Netherlands",
+ title = "Boron implantations in silicon: {A} comparison of
+ charge carrier and boron concentration profiles",
+ journal = "Applied Physics A: Materials Science \& Processing",
+ publisher = "Springer Berlin / Heidelberg",
+ ISSN = "0947-8396",
+ keyword = "Physics and Astronomy",
+ pages = "125--133",
+ volume = "4",
+ issue = "2",
+ URL = "http://dx.doi.org/10.1007/BF00884267",
+ note = "10.1007/BF00884267",
+ year = "1974",
+ notes = "first time ted (only for boron?)",
+}
+
+@Article{michel87,
+ author = "A. E. Michel and W. Rausch and P. A. Ronsheim and R.
+ H. Kastl",
+ collaboration = "",
+ title = "Rapid annealing and the anomalous diffusion of ion
+ implanted boron into silicon",
+ publisher = "AIP",
+ year = "1987",
+ journal = "Applied Physics Letters",
+ volume = "50",
+ number = "7",
+ pages = "416--418",
+ keywords = "SILICON; ION IMPLANTATION; ANNEALING; DIFFUSION;
+ BORON; ATOM TRANSPORT; CHARGEDPARTICLE TRANSPORT; VERY
+ HIGH TEMPERATURE; PN JUNCTIONS; SURFACE CONDUCTIVITY",
+ URL = "http://link.aip.org/link/?APL/50/416/1",
+ doi = "10.1063/1.98160",
+ notes = "ted of boron in si",
+}
+
+@Article{cowern90,
+ author = "N. E. B. Cowern and K. T. F. Janssen and H. F. F.
+ Jos",
+ collaboration = "",
+ title = "Transient diffusion of ion-implanted {B} in Si: Dose,
+ time, and matrix dependence of atomic and electrical
+ profiles",
+ publisher = "AIP",
+ year = "1990",
+ journal = "Journal of Applied Physics",
+ volume = "68",
+ number = "12",
+ pages = "6191--6198",
+ keywords = "BORON IONS; ION IMPLANTATION; SILICON; DIFFUSION; TIME
+ DEPENDENCE; ANNEALING; VERY HIGH TEMPERATURE; SIMS;
+ CRYSTALS; AMORPHIZATION",
+ URL = "http://link.aip.org/link/?JAP/68/6191/1",
+ doi = "10.1063/1.346910",
+ notes = "ted of boron in si",
+}
+
@Article{cowern96,
author = "N. E. B. Cowern and A. Cacciato and J. S. Custer and
F. W. Saris and W. Vandervorst",
quasi-direct one",
}
+@Conference{powell93,
+ author = "A. R. Powell and K. Eberl and F. E. LeGoues and B. A.
+ Ek and S. S. Iyer",
+ collaboration = "",
+ title = "Stability of strained Si[sub 1 - y]{C}[sub y] random
+ alloy layers",
+ publisher = "AVS",
+ year = "1993",
+ journal = "J. Vac. Sci. Technol. B",
+ volume = "11",
+ number = "3",
+ pages = "1064--1068",
+ location = "Ottawa (Canada)",
+ keywords = "SILICON ALLOYS; CARBON ALLOYS; STRAINS; THICKNESS;
+ METASTABLE PHASES; TWINNING; DISLOCATIONS; MOLECULAR
+ BEAM EPITAXY; EPITAXIAL LAYERS; CRITICAL PHENOMENA;
+ TEMPERATURE RANGE 400--1000 K; BINARY ALLOYS",
+ URL = "http://link.aip.org/link/?JVB/11/1064/1",
+ doi = "10.1116/1.587008",
+ notes = "substitutional c in si by mbe",
+}
+
@Article{osten99,
author = "H. J. Osten and J. Griesche and S. Scalese",
collaboration = "",
compounds",
URL = "http://link.aip.org/link/?APL/74/836/1",
doi = "10.1063/1.123384",
- notes = "substitutional c in si",
+ notes = "substitutional c in si by mbe",
}
@Article{hohenberg64,
si, dft",
}
+@Article{yagi02,
+ title = "Phosphorous Doping of Strain-Induced
+ Si$_{1-y}${C}$_{y}$ Epitaxial Films Grown\\
+ by Low-Temperature Chemical Vapor Deposition",
+ author = "Shuhei Yagi and Katsuya Abe and Takashi Okabayashi and
+ Yuichi Yoneyama and Akira Yamada and Makoto Konagai",
+ journal = "Japanese Journal of Applied Physics",
+ volume = "41",
+ number = "Part 1, No. 4B",
+ pages = "2472--2475",
+ numpages = "3",
+ year = "2002",
+ URL = "http://jjap.jsap.jp/link?JJAP/41/2472/",
+ doi = "10.1143/JJAP.41.2472",
+ publisher = "The Japan Society of Applied Physics",
+ notes = "experimental charge carrier mobility in strained si",
+}
+
@Article{chang05,
title = "Electron Transport Model for Strained Silicon-Carbon
Alloy",
URL = "http://jjap.ipap.jp/link?JJAP/44/2257/",
doi = "10.1143/JJAP.44.2257",
publisher = "The Japan Society of Applied Physics",
- notes = "enhance of electron mobility in starined si",
+ notes = "enhance of electron mobility in strained si",
}
@Article{osten97,
projects / lectures / latex.git / blobdiff