-
-\begin{slide}
-
- {\large\bf
- Fabrication of silicon carbide
- }
-
- \small
-
- Alternative approach:
- Ion beam synthesis (IBS) of burried 3C-SiC layers in Si\hkl(1 0 0)
- \begin{itemize}
- \item \underline{Implantation step 1}\\
- 180 keV C$^+$, $D=7.9\times 10^{17}$ cm$^{-2}$, $T_{\text{i}}=500\,^{\circ}\mathrm{C}$\\
- $\Rightarrow$ box-like distribution of equally sized
- and epitactically oriented SiC precipitates
-
- \item \underline{Implantation step 2}\\
- 180 keV C$^+$, $D=0.6\times 10^{17}$ cm$^{-2}$, $T_{\text{i}}=250\,^{\circ}\mathrm{C}$\\
- $\Rightarrow$ destruction of SiC nanocrystals
- in growing amorphous interface layers
- \item \underline{Annealing}\\
- $T=1250\,^{\circ}\mathrm{C}$, $t=10\,\text{h}$\\
- $\Rightarrow$ homogeneous, stoichiometric SiC layer
- with sharp interfaces
- \end{itemize}
-
- \begin{minipage}{6.3cm}
- \includegraphics[width=6cm]{ibs_3c-sic.eps}\\[-0.2cm]
- {\tiny
- XTEM micrograph of single crystalline 3C-SiC in Si\hkl(1 0 0)
- }
- \end{minipage}
-\framebox{
- \begin{minipage}{6.3cm}
- \begin{center}
- {\color{blue}
- Precipitation mechanism not yet fully understood!
- }
- \renewcommand\labelitemi{$\Rightarrow$}
- \small
- \underline{Understanding the SiC precipitation}
- \begin{itemize}
- \item significant technological progress in SiC thin film formation
- \item perspectives for processes relying upon prevention of SiC precipitation
- \end{itemize}
- \end{center}
- \end{minipage}
-}
-
-\end{slide}