firs very beta version

diff --git a/nlsop/poster/nlsop_ibmm2006.tex b/nlsop/poster/nlsop_ibmm2006.tex
index 43271f5..285a42c 100644 (file)
--- a/nlsop/poster/nlsop_ibmm2006.tex
+++ b/nlsop/poster/nlsop_ibmm2006.tex
@@ -277,6 +277,14 @@ Three contributions to the amorphization process controlled by:
                                      corresponding to $3 \, nm$ of substrat
                                      removal
                        \end{itemize}
+
+               \subsection*{3.3 {\color{blue} TRIM collision statistics}}
+               \begin{center}
+                       \includegraphics[width=8cm]{trim_coll_e.eps}
+               \end{center}
+               \begin{center}
+               $\Rightarrow$ mean constant energy loss per collision of an ion
+               \end{center}
        \end{kasten}
 \end{spalte}
 \begin{spalte}
@@ -314,17 +322,19 @@ Three contributions to the amorphization process controlled by:
                             of lamellar structure - the recipe}}
                \subsubsection*{4.4.1 Constant carbon concentration}
                        \makebox[11cm]{%
-                               \parbox[c]{6cm}{%
-                       \includegraphics[width=6cm]{multiple_impl_cp_e.eps}
-                               }
                                \parbox[c]{5cm}{%
                        \begin{itemize}
                                \item multiple implantation \\ steps
                                \item energies: $180$ - $10 \, keV$
+                               \item higher temeprature\\
+                                     $\rightarrow$ prevent amorphization
                        \end{itemize}
                        $\Rightarrow$ nearly constant carbon distribution
                        ($10 \, at.\%$)
                                }
+                               \parbox[c]{6cm}{%
+                       \includegraphics[width=6cm]{multiple_impl_cp_e.eps}
+                               }
                        }
                \subsubsection*{4.4.2 2 MeV C$^+$ implantation
                                               step}